JPS53121463A - Gas phase reaction method for semiconductor substrate - Google Patents
Gas phase reaction method for semiconductor substrateInfo
- Publication number
- JPS53121463A JPS53121463A JP3519877A JP3519877A JPS53121463A JP S53121463 A JPS53121463 A JP S53121463A JP 3519877 A JP3519877 A JP 3519877A JP 3519877 A JP3519877 A JP 3519877A JP S53121463 A JPS53121463 A JP S53121463A
- Authority
- JP
- Japan
- Prior art keywords
- gas phase
- phase reaction
- semiconductor substrate
- reaction method
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010574 gas phase reaction Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3519877A JPS53121463A (en) | 1977-03-31 | 1977-03-31 | Gas phase reaction method for semiconductor substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3519877A JPS53121463A (en) | 1977-03-31 | 1977-03-31 | Gas phase reaction method for semiconductor substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53121463A true JPS53121463A (en) | 1978-10-23 |
JPS6225253B2 JPS6225253B2 (en, 2012) | 1987-06-02 |
Family
ID=12435156
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3519877A Granted JPS53121463A (en) | 1977-03-31 | 1977-03-31 | Gas phase reaction method for semiconductor substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53121463A (en, 2012) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63197762U (en, 2012) * | 1987-06-12 | 1988-12-20 |
-
1977
- 1977-03-31 JP JP3519877A patent/JPS53121463A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6225253B2 (en, 2012) | 1987-06-02 |
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