JPS5311175A - High frequency ion plating apparatus - Google Patents

High frequency ion plating apparatus

Info

Publication number
JPS5311175A
JPS5311175A JP8502176A JP8502176A JPS5311175A JP S5311175 A JPS5311175 A JP S5311175A JP 8502176 A JP8502176 A JP 8502176A JP 8502176 A JP8502176 A JP 8502176A JP S5311175 A JPS5311175 A JP S5311175A
Authority
JP
Japan
Prior art keywords
high frequency
ion plating
plating apparatus
frequency ion
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8502176A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5440392B2 (OSRAM
Inventor
Toshio Negishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP8502176A priority Critical patent/JPS5311175A/ja
Publication of JPS5311175A publication Critical patent/JPS5311175A/ja
Publication of JPS5440392B2 publication Critical patent/JPS5440392B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP8502176A 1976-07-19 1976-07-19 High frequency ion plating apparatus Granted JPS5311175A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8502176A JPS5311175A (en) 1976-07-19 1976-07-19 High frequency ion plating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8502176A JPS5311175A (en) 1976-07-19 1976-07-19 High frequency ion plating apparatus

Publications (2)

Publication Number Publication Date
JPS5311175A true JPS5311175A (en) 1978-02-01
JPS5440392B2 JPS5440392B2 (OSRAM) 1979-12-03

Family

ID=13847065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8502176A Granted JPS5311175A (en) 1976-07-19 1976-07-19 High frequency ion plating apparatus

Country Status (1)

Country Link
JP (1) JPS5311175A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63109162A (ja) * 1986-10-24 1988-05-13 Res Dev Corp Of Japan イオンプレ−テイング方法とその装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63109162A (ja) * 1986-10-24 1988-05-13 Res Dev Corp Of Japan イオンプレ−テイング方法とその装置

Also Published As

Publication number Publication date
JPS5440392B2 (OSRAM) 1979-12-03

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