JPS524833A - Manufacturing method of electron-beam exposure resist use high molecul ar materials - Google Patents

Manufacturing method of electron-beam exposure resist use high molecul ar materials

Info

Publication number
JPS524833A
JPS524833A JP8132275A JP8132275A JPS524833A JP S524833 A JPS524833 A JP S524833A JP 8132275 A JP8132275 A JP 8132275A JP 8132275 A JP8132275 A JP 8132275A JP S524833 A JPS524833 A JP S524833A
Authority
JP
Japan
Prior art keywords
manufacturing
electron
materials
use high
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8132275A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5533055B2 (enExample
Inventor
Shoei Fujishige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP8132275A priority Critical patent/JPS524833A/ja
Publication of JPS524833A publication Critical patent/JPS524833A/ja
Publication of JPS5533055B2 publication Critical patent/JPS5533055B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Processes Of Treating Macromolecular Substances (AREA)
JP8132275A 1975-06-30 1975-06-30 Manufacturing method of electron-beam exposure resist use high molecul ar materials Granted JPS524833A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8132275A JPS524833A (en) 1975-06-30 1975-06-30 Manufacturing method of electron-beam exposure resist use high molecul ar materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8132275A JPS524833A (en) 1975-06-30 1975-06-30 Manufacturing method of electron-beam exposure resist use high molecul ar materials

Publications (2)

Publication Number Publication Date
JPS524833A true JPS524833A (en) 1977-01-14
JPS5533055B2 JPS5533055B2 (enExample) 1980-08-28

Family

ID=13743152

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8132275A Granted JPS524833A (en) 1975-06-30 1975-06-30 Manufacturing method of electron-beam exposure resist use high molecul ar materials

Country Status (1)

Country Link
JP (1) JPS524833A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55105244A (en) * 1979-02-06 1980-08-12 Victor Co Of Japan Ltd Electron beam resist
EP1122607A1 (en) * 2000-02-07 2001-08-08 Shipley Company LLC High resolution photoresist compositions

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5853576U (ja) * 1981-10-07 1983-04-12 ア−ス製薬株式会社 燻蒸器
DE3513307A1 (de) * 1985-04-13 1986-10-16 Henkel KGaA, 4000 Düsseldorf Elektrisches geraet zum verdampfen von insektizidem wirkstoff

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4947081A (enExample) * 1972-09-12 1974-05-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4947081A (enExample) * 1972-09-12 1974-05-07

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55105244A (en) * 1979-02-06 1980-08-12 Victor Co Of Japan Ltd Electron beam resist
EP1122607A1 (en) * 2000-02-07 2001-08-08 Shipley Company LLC High resolution photoresist compositions

Also Published As

Publication number Publication date
JPS5533055B2 (enExample) 1980-08-28

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