JPS5248061B2 - - Google Patents

Info

Publication number
JPS5248061B2
JPS5248061B2 JP49089915A JP8991574A JPS5248061B2 JP S5248061 B2 JPS5248061 B2 JP S5248061B2 JP 49089915 A JP49089915 A JP 49089915A JP 8991574 A JP8991574 A JP 8991574A JP S5248061 B2 JPS5248061 B2 JP S5248061B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49089915A
Other languages
Japanese (ja)
Other versions
JPS5058986A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5058986A publication Critical patent/JPS5058986A/ja
Publication of JPS5248061B2 publication Critical patent/JPS5248061B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302Controlling tubes by external information, e.g. programme control
    • H01J37/3023Programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP49089915A 1973-09-19 1974-08-07 Expired JPS5248061B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US398734A US3866013A (en) 1973-09-19 1973-09-19 Method and apparatus for controlling movable means such as an electron beam

Publications (2)

Publication Number Publication Date
JPS5058986A JPS5058986A (enrdf_load_stackoverflow) 1975-05-22
JPS5248061B2 true JPS5248061B2 (enrdf_load_stackoverflow) 1977-12-07

Family

ID=23576583

Family Applications (2)

Application Number Title Priority Date Filing Date
JP49089915A Expired JPS5248061B2 (enrdf_load_stackoverflow) 1973-09-19 1974-08-07
JP5274177A Granted JPS5333584A (en) 1973-09-19 1977-05-10 Device for controlling charged beam

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP5274177A Granted JPS5333584A (en) 1973-09-19 1977-05-10 Device for controlling charged beam

Country Status (7)

Country Link
US (1) US3866013A (enrdf_load_stackoverflow)
JP (2) JPS5248061B2 (enrdf_load_stackoverflow)
CA (1) CA1013074A (enrdf_load_stackoverflow)
DE (1) DE2443625C2 (enrdf_load_stackoverflow)
FR (1) FR2244202B1 (enrdf_load_stackoverflow)
GB (1) GB1438737A (enrdf_load_stackoverflow)
IT (1) IT1020326B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5778814U (enrdf_load_stackoverflow) * 1980-10-31 1982-05-15

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2294489A1 (fr) * 1974-12-13 1976-07-09 Thomson Csf Dispositif pour le trace programme de dessins par bombardement de particules
US4056730A (en) * 1976-07-12 1977-11-01 International Business Machines Corporation Apparatus for detecting registration marks on a target such as a semiconductor wafer
US4099062A (en) * 1976-12-27 1978-07-04 International Business Machines Corporation Electron beam lithography process
US4147937A (en) * 1977-11-01 1979-04-03 Fujitsu Limited Electron beam exposure system method and apparatus
JPS5511303A (en) * 1978-07-10 1980-01-26 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron-beam exposure device
JPS5521156A (en) * 1978-08-02 1980-02-15 Fujitsu Ltd Electronic beam exposing system
DE102014105452B3 (de) * 2014-04-16 2015-08-27 Von Ardenne Gmbh Anordnung zum Ablenken eines mittels einer Elektronenstrahlkanone erzeugten Elektronenstrahls, Verfahren zum Erzeugen eines Ablenksignals und Verfahren zum Betreiben einer Elektronenstrahlkanone
DE102014105451B3 (de) * 2014-04-16 2015-08-27 Von Ardenne Gmbh Anordnung zum Ablenken eines mittels einer Elektronenstrahlkanone erzeugten Elektronenstrahls, Verfahren zum Erzeugen eines Ablenksignals und Verfahren zum Betreiben einer Elektronenstrahlkanone

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3789185A (en) * 1969-12-15 1974-01-29 Ibm Electron beam deflection control apparatus
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5778814U (enrdf_load_stackoverflow) * 1980-10-31 1982-05-15

Also Published As

Publication number Publication date
JPS5328749B2 (enrdf_load_stackoverflow) 1978-08-16
CA1013074A (en) 1977-06-28
FR2244202A1 (enrdf_load_stackoverflow) 1975-04-11
FR2244202B1 (enrdf_load_stackoverflow) 1976-10-22
JPS5058986A (enrdf_load_stackoverflow) 1975-05-22
DE2443625C2 (de) 1983-10-27
GB1438737A (en) 1976-06-09
IT1020326B (it) 1977-12-20
US3866013A (en) 1975-02-11
DE2443625A1 (de) 1975-03-20
JPS5333584A (en) 1978-03-29

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