FR2244202A1 - - Google Patents

Info

Publication number
FR2244202A1
FR2244202A1 FR7427488A FR7427488A FR2244202A1 FR 2244202 A1 FR2244202 A1 FR 2244202A1 FR 7427488 A FR7427488 A FR 7427488A FR 7427488 A FR7427488 A FR 7427488A FR 2244202 A1 FR2244202 A1 FR 2244202A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7427488A
Other languages
French (fr)
Other versions
FR2244202B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2244202A1 publication Critical patent/FR2244202A1/fr
Application granted granted Critical
Publication of FR2244202B1 publication Critical patent/FR2244202B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
FR7427488A 1973-09-19 1974-08-02 Expired FR2244202B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US398734A US3866013A (en) 1973-09-19 1973-09-19 Method and apparatus for controlling movable means such as an electron beam

Publications (2)

Publication Number Publication Date
FR2244202A1 true FR2244202A1 (enrdf_load_stackoverflow) 1975-04-11
FR2244202B1 FR2244202B1 (enrdf_load_stackoverflow) 1976-10-22

Family

ID=23576583

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7427488A Expired FR2244202B1 (enrdf_load_stackoverflow) 1973-09-19 1974-08-02

Country Status (7)

Country Link
US (1) US3866013A (enrdf_load_stackoverflow)
JP (2) JPS5248061B2 (enrdf_load_stackoverflow)
CA (1) CA1013074A (enrdf_load_stackoverflow)
DE (1) DE2443625C2 (enrdf_load_stackoverflow)
FR (1) FR2244202B1 (enrdf_load_stackoverflow)
GB (1) GB1438737A (enrdf_load_stackoverflow)
IT (1) IT1020326B (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2294489A1 (fr) * 1974-12-13 1976-07-09 Thomson Csf Dispositif pour le trace programme de dessins par bombardement de particules
US4056730A (en) * 1976-07-12 1977-11-01 International Business Machines Corporation Apparatus for detecting registration marks on a target such as a semiconductor wafer
US4099062A (en) * 1976-12-27 1978-07-04 International Business Machines Corporation Electron beam lithography process
US4147937A (en) * 1977-11-01 1979-04-03 Fujitsu Limited Electron beam exposure system method and apparatus
JPS5511303A (en) * 1978-07-10 1980-01-26 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron-beam exposure device
JPS5521156A (en) * 1978-08-02 1980-02-15 Fujitsu Ltd Electronic beam exposing system
JPS5778814U (enrdf_load_stackoverflow) * 1980-10-31 1982-05-15
DE102014105452B3 (de) * 2014-04-16 2015-08-27 Von Ardenne Gmbh Anordnung zum Ablenken eines mittels einer Elektronenstrahlkanone erzeugten Elektronenstrahls, Verfahren zum Erzeugen eines Ablenksignals und Verfahren zum Betreiben einer Elektronenstrahlkanone
DE102014105451B3 (de) * 2014-04-16 2015-08-27 Von Ardenne Gmbh Anordnung zum Ablenken eines mittels einer Elektronenstrahlkanone erzeugten Elektronenstrahls, Verfahren zum Erzeugen eines Ablenksignals und Verfahren zum Betreiben einer Elektronenstrahlkanone

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3789185A (en) * 1969-12-15 1974-01-29 Ibm Electron beam deflection control apparatus
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam

Also Published As

Publication number Publication date
JPS5328749B2 (enrdf_load_stackoverflow) 1978-08-16
CA1013074A (en) 1977-06-28
FR2244202B1 (enrdf_load_stackoverflow) 1976-10-22
JPS5058986A (enrdf_load_stackoverflow) 1975-05-22
DE2443625C2 (de) 1983-10-27
GB1438737A (en) 1976-06-09
IT1020326B (it) 1977-12-20
US3866013A (en) 1975-02-11
DE2443625A1 (de) 1975-03-20
JPS5248061B2 (enrdf_load_stackoverflow) 1977-12-07
JPS5333584A (en) 1978-03-29

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Legal Events

Date Code Title Description
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