JPS5333584A - Device for controlling charged beam - Google Patents

Device for controlling charged beam

Info

Publication number
JPS5333584A
JPS5333584A JP5274177A JP5274177A JPS5333584A JP S5333584 A JPS5333584 A JP S5333584A JP 5274177 A JP5274177 A JP 5274177A JP 5274177 A JP5274177 A JP 5274177A JP S5333584 A JPS5333584 A JP S5333584A
Authority
JP
Japan
Prior art keywords
charged beam
controlling charged
controlling
charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5274177A
Other languages
Japanese (ja)
Other versions
JPS5328749B2 (en
Inventor
Emu Riyan Fuiritsupu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5333584A publication Critical patent/JPS5333584A/en
Publication of JPS5328749B2 publication Critical patent/JPS5328749B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP5274177A 1973-09-19 1977-05-10 Device for controlling charged beam Granted JPS5333584A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US398734A US3866013A (en) 1973-09-19 1973-09-19 Method and apparatus for controlling movable means such as an electron beam

Publications (2)

Publication Number Publication Date
JPS5333584A true JPS5333584A (en) 1978-03-29
JPS5328749B2 JPS5328749B2 (en) 1978-08-16

Family

ID=23576583

Family Applications (2)

Application Number Title Priority Date Filing Date
JP49089915A Expired JPS5248061B2 (en) 1973-09-19 1974-08-07
JP5274177A Granted JPS5333584A (en) 1973-09-19 1977-05-10 Device for controlling charged beam

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP49089915A Expired JPS5248061B2 (en) 1973-09-19 1974-08-07

Country Status (7)

Country Link
US (1) US3866013A (en)
JP (2) JPS5248061B2 (en)
CA (1) CA1013074A (en)
DE (1) DE2443625C2 (en)
FR (1) FR2244202B1 (en)
GB (1) GB1438737A (en)
IT (1) IT1020326B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5521156A (en) * 1978-08-02 1980-02-15 Fujitsu Ltd Electronic beam exposing system

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2294489A1 (en) * 1974-12-13 1976-07-09 Thomson Csf DEVICE FOR THE PROGRAM TRACE OF DRAWINGS BY PARTICLE BOMBARDING
US4056730A (en) * 1976-07-12 1977-11-01 International Business Machines Corporation Apparatus for detecting registration marks on a target such as a semiconductor wafer
US4099062A (en) * 1976-12-27 1978-07-04 International Business Machines Corporation Electron beam lithography process
US4147937A (en) * 1977-11-01 1979-04-03 Fujitsu Limited Electron beam exposure system method and apparatus
JPS5511303A (en) * 1978-07-10 1980-01-26 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron-beam exposure device
JPS5778814U (en) * 1980-10-31 1982-05-15
DE102014105452B3 (en) * 2014-04-16 2015-08-27 Von Ardenne Gmbh Arrangement for deflecting an electron beam generated by means of an electron beam gun, method for generating a deflection signal and method for operating an electron beam gun
DE102014105451B3 (en) * 2014-04-16 2015-08-27 Von Ardenne Gmbh Arrangement for deflecting an electron beam generated by means of an electron beam gun, method for generating a deflection signal and method for operating an electron beam gun

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3789185A (en) * 1969-12-15 1974-01-29 Ibm Electron beam deflection control apparatus
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5521156A (en) * 1978-08-02 1980-02-15 Fujitsu Ltd Electronic beam exposing system
JPS5726408B2 (en) * 1978-08-02 1982-06-04

Also Published As

Publication number Publication date
GB1438737A (en) 1976-06-09
JPS5058986A (en) 1975-05-22
US3866013A (en) 1975-02-11
DE2443625A1 (en) 1975-03-20
FR2244202A1 (en) 1975-04-11
FR2244202B1 (en) 1976-10-22
IT1020326B (en) 1977-12-20
CA1013074A (en) 1977-06-28
JPS5328749B2 (en) 1978-08-16
JPS5248061B2 (en) 1977-12-07
DE2443625C2 (en) 1983-10-27

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