JPS5245267A - Process for production of semiconductor device - Google Patents
Process for production of semiconductor deviceInfo
- Publication number
- JPS5245267A JPS5245267A JP50121498A JP12149875A JPS5245267A JP S5245267 A JPS5245267 A JP S5245267A JP 50121498 A JP50121498 A JP 50121498A JP 12149875 A JP12149875 A JP 12149875A JP S5245267 A JPS5245267 A JP S5245267A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- selection
- substances
- perform efficient
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50121498A JPS5245267A (en) | 1975-10-07 | 1975-10-07 | Process for production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50121498A JPS5245267A (en) | 1975-10-07 | 1975-10-07 | Process for production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5245267A true JPS5245267A (en) | 1977-04-09 |
Family
ID=14812655
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50121498A Pending JPS5245267A (en) | 1975-10-07 | 1975-10-07 | Process for production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5245267A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8020458B2 (en) | 2006-05-09 | 2011-09-20 | Sumitomo Seika Chemicals Co., Ltd | Sample introducing system |
-
1975
- 1975-10-07 JP JP50121498A patent/JPS5245267A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8020458B2 (en) | 2006-05-09 | 2011-09-20 | Sumitomo Seika Chemicals Co., Ltd | Sample introducing system |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1543235A (en) | Methods of manufacturing semiconductor devices | |
GB1550645A (en) | Methods of manufacturing semiconductor devices | |
JPS523381A (en) | Method of treating semiconductor element | |
CA1029135A (en) | Method of producing metallic contacts on semiconductor device | |
JPS5239377A (en) | Method of manufacturing semiconductor device | |
JPS51124381A (en) | Method of manufacturing semiconductor device using twoolayer mask | |
JPS51134576A (en) | Method of manufacturing semiconductor device | |
JPS5222878A (en) | Process for silicon semiconductor devices | |
JPS5245267A (en) | Process for production of semiconductor device | |
JPS51123074A (en) | Production process of fet | |
JPS5248977A (en) | Method of manufacturing semiconductor device | |
JPS51140469A (en) | Wafer cracking process | |
JPS5245868A (en) | Process for production of plate-from silicone | |
JPS51134074A (en) | Method to manufacture the semiconductor unit | |
JPS51140471A (en) | Device for washing semiconductor wafer | |
JPS51134579A (en) | Semiconductor device | |
JPS5344181A (en) | Production of semiconductor device | |
JPS51132784A (en) | Production method of semiconductor device | |
JPS5230390A (en) | Integrated circuit of the semiconductor | |
JPS522384A (en) | Semiconductor device | |
JPS5240078A (en) | Process for production of semiconductor device | |
JPS5219978A (en) | Manufacture process for a semiconductor device | |
JPS5236981A (en) | Process for production of semiconductor devices | |
JPS53143186A (en) | Production of semiconductor device | |
JPS51123589A (en) | Semi-conductor manufacturing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20051122 |
|
A601 | Written request for extension of time |
Effective date: 20060202 Free format text: JAPANESE INTERMEDIATE CODE: A601 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20060320 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060519 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Effective date: 20081111 Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20081120 |
|
R150 | Certificate of patent (=grant) or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111128 Year of fee payment: 3 |
|
LAPS | Cancellation because of no payment of annual fees |