JPS5230848B2 - - Google Patents

Info

Publication number
JPS5230848B2
JPS5230848B2 JP11363173A JP11363173A JPS5230848B2 JP S5230848 B2 JPS5230848 B2 JP S5230848B2 JP 11363173 A JP11363173 A JP 11363173A JP 11363173 A JP11363173 A JP 11363173A JP S5230848 B2 JPS5230848 B2 JP S5230848B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11363173A
Other languages
Japanese (ja)
Other versions
JPS5065233A (sv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11363173A priority Critical patent/JPS5230848B2/ja
Priority to FR7434001A priority patent/FR2246891A1/fr
Priority to US05/513,434 priority patent/US3960560A/en
Priority to DE19742448171 priority patent/DE2448171A1/de
Publication of JPS5065233A publication Critical patent/JPS5065233A/ja
Publication of JPS5230848B2 publication Critical patent/JPS5230848B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
JP11363173A 1973-10-09 1973-10-09 Expired JPS5230848B2 (sv)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP11363173A JPS5230848B2 (sv) 1973-10-09 1973-10-09
FR7434001A FR2246891A1 (sv) 1973-10-09 1974-10-09
US05/513,434 US3960560A (en) 1973-10-09 1974-10-09 Method for producing a photomask
DE19742448171 DE2448171A1 (de) 1973-10-09 1974-10-09 Verfahren zur herstellung einer photomaske

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11363173A JPS5230848B2 (sv) 1973-10-09 1973-10-09

Publications (2)

Publication Number Publication Date
JPS5065233A JPS5065233A (sv) 1975-06-02
JPS5230848B2 true JPS5230848B2 (sv) 1977-08-11

Family

ID=14617113

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11363173A Expired JPS5230848B2 (sv) 1973-10-09 1973-10-09

Country Status (4)

Country Link
US (1) US3960560A (sv)
JP (1) JPS5230848B2 (sv)
DE (1) DE2448171A1 (sv)
FR (1) FR2246891A1 (sv)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5177404A (sv) * 1974-12-26 1976-07-05 Fuji Photo Film Co Ltd
JPS51105821A (en) * 1975-03-14 1976-09-20 Fuji Photo Film Co Ltd Masukugazono keiseihoho
JPS5850342B2 (ja) * 1975-05-12 1983-11-10 富士写真フイルム株式会社 キンゾクガゾウケイセイザイリヨウ
US4101440A (en) * 1975-07-23 1978-07-18 Hitachi, Ltd. Chemically digestive agents
JPS6015055B2 (ja) * 1976-09-06 1985-04-17 富士写真フイルム株式会社 マスク画像の形成方法
JPS5428136A (en) * 1977-08-03 1979-03-02 Fuji Photo Film Co Ltd Manufacture of durable photomask
US4155735A (en) * 1977-11-30 1979-05-22 Ppg Industries, Inc. Electromigration method for making stained glass photomasks
USRE31220E (en) * 1977-11-30 1983-04-26 Ppg Industries, Inc. Electromigration method for making stained glass photomasks
US4309495A (en) * 1978-08-02 1982-01-05 Ppg Industries, Inc. Method for making stained glass photomasks from photographic emulsion
US4350755A (en) * 1980-07-23 1982-09-21 Wang Chia Gee Auger microlithography
US4425423A (en) 1980-07-23 1984-01-10 Wang Chia Gee Auger microlithography with regard to Auger window
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料
JPH0695202B2 (ja) * 1986-05-07 1994-11-24 コニカ株式会社 パタ−ン転写方法及び該方法に使用するハロゲン化銀写真乾板
US5011569A (en) * 1987-02-04 1991-04-30 Andus Corporation Thin film artwork compounds
US4911785A (en) * 1987-02-04 1990-03-27 Andus Corporation The method of forming a thin film artwork compounds
US5278008A (en) * 1990-10-31 1994-01-11 Hughes Aircraft Company Diffraction efficiency control in holographic elements
US5955244A (en) * 1996-08-20 1999-09-21 Quantum Corporation Method for forming photoresist features having reentrant profiles using a basic agent
US5932024A (en) * 1997-07-01 1999-08-03 Moore; Jesse C. Decoating titanium and other metallized glass surfaces
US6303262B1 (en) 1998-06-18 2001-10-16 Mitsubishi Paper Mills Ltd. Photomask material, photomask and methods for the production thereof
US6906540B2 (en) * 2001-09-20 2005-06-14 Wentworth Laboratories, Inc. Method for chemically etching photo-defined micro electrical contacts
US6977515B2 (en) * 2001-09-20 2005-12-20 Wentworth Laboratories, Inc. Method for forming photo-defined micro electrical contacts
JP4732360B2 (ja) 2003-11-14 2011-07-27 ウエントワース ラボラトリーズ，インコーポレイテッド 組立補助材が組み込まれたダイ設計
SG187274A1 (en) 2011-07-14 2013-02-28 3M Innovative Properties Co Etching method and devices produced using the etching method
US11143953B2 (en) 2019-03-21 2021-10-12 International Business Machines Corporation Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3
KR20220017884A (ko) * 2019-06-11 2022-02-14 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 수성 조성물, 이것을 이용한 스테인리스강 표면의 조화처리방법, 그리고 조화처리된 스테인리스강 및 그의 제조방법
US11953828B2 (en) * 2021-01-18 2024-04-09 Longserving Technology Co., Ltd Method of making a picoscopic scale/ nanoscopic scale circuit pattern

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567446A (en) * 1967-05-01 1971-03-02 Eastman Kodak Co Photographic etch-bleach baths
NL162215C (sv) * 1967-07-03 Ibm
US3561963A (en) * 1967-09-11 1971-02-09 Signetics Corp Transparent mask and method for making the same
GB1335964A (en) * 1970-02-17 1973-10-31 Agfa Gevaert Spectral sensitization of light-sensitive silver halide emulsions
US3744904A (en) * 1970-06-11 1973-07-10 Gaf Corp Transparent photographic masks
US3674492A (en) * 1970-12-09 1972-07-04 Bell Telephone Labor Inc Laminar photomask
US3669665A (en) * 1971-02-18 1972-06-13 Ibm Process for making resist stencils from photographic stripping films and for using same

Also Published As

Publication number Publication date
JPS5065233A (sv) 1975-06-02
FR2246891A1 (sv) 1975-05-02
DE2448171A1 (de) 1975-08-21
US3960560A (en) 1976-06-01

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