JPS5222479A - Method of inspecting masks - Google Patents

Method of inspecting masks

Info

Publication number
JPS5222479A
JPS5222479A JP9875175A JP9875175A JPS5222479A JP S5222479 A JPS5222479 A JP S5222479A JP 9875175 A JP9875175 A JP 9875175A JP 9875175 A JP9875175 A JP 9875175A JP S5222479 A JPS5222479 A JP S5222479A
Authority
JP
Japan
Prior art keywords
inspecting masks
masks
inspecting
inspection
troublesomeness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9875175A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5521459B2 (cs
Inventor
Tsunehiro Naganami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9875175A priority Critical patent/JPS5222479A/ja
Publication of JPS5222479A publication Critical patent/JPS5222479A/ja
Publication of JPS5521459B2 publication Critical patent/JPS5521459B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP9875175A 1975-08-13 1975-08-13 Method of inspecting masks Granted JPS5222479A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9875175A JPS5222479A (en) 1975-08-13 1975-08-13 Method of inspecting masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9875175A JPS5222479A (en) 1975-08-13 1975-08-13 Method of inspecting masks

Publications (2)

Publication Number Publication Date
JPS5222479A true JPS5222479A (en) 1977-02-19
JPS5521459B2 JPS5521459B2 (cs) 1980-06-10

Family

ID=14228152

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9875175A Granted JPS5222479A (en) 1975-08-13 1975-08-13 Method of inspecting masks

Country Status (1)

Country Link
JP (1) JPS5222479A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55108738A (en) * 1979-02-13 1980-08-21 Fujitsu Ltd Inspection for registration of photomask
JPS5680132A (en) * 1979-12-06 1981-07-01 Nec Corp Inspection of mask
US5283205A (en) * 1991-03-19 1994-02-01 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a semiconductor device on a substrate having an anisotropic expansion/contraction characteristic

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55108738A (en) * 1979-02-13 1980-08-21 Fujitsu Ltd Inspection for registration of photomask
JPS5680132A (en) * 1979-12-06 1981-07-01 Nec Corp Inspection of mask
US5283205A (en) * 1991-03-19 1994-02-01 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a semiconductor device on a substrate having an anisotropic expansion/contraction characteristic

Also Published As

Publication number Publication date
JPS5521459B2 (cs) 1980-06-10

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