Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP7215776ApriorityCriticalpatent/JPS52155397A/en
Publication of JPS52155397ApublicationCriticalpatent/JPS52155397A/en
Apparatuses And Processes For Manufacturing Resistors
(AREA)
Abstract
PURPOSE: To obtain uniformly composed Ta-Al-system thin film by separating target of Ta, Al while separating Ta, Al and forming thin film while rotating substrate holder.
COPYRIGHT: (C)1977,JPO&Japio
JP7215776A1976-06-211976-06-21Production method of highly resistive thin film
PendingJPS52155397A
(en)