JPS52146218A - Positive type radiation sensitive material - Google Patents

Positive type radiation sensitive material

Info

Publication number
JPS52146218A
JPS52146218A JP6227476A JP6227476A JPS52146218A JP S52146218 A JPS52146218 A JP S52146218A JP 6227476 A JP6227476 A JP 6227476A JP 6227476 A JP6227476 A JP 6227476A JP S52146218 A JPS52146218 A JP S52146218A
Authority
JP
Japan
Prior art keywords
positive type
radiation sensitive
type radiation
sensitive material
coopolymerize
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6227476A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5347162B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Masataka Miyamura
Akira Miura
Tsukasa Tada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP6227476A priority Critical patent/JPS52146218A/ja
Publication of JPS52146218A publication Critical patent/JPS52146218A/ja
Publication of JPS5347162B2 publication Critical patent/JPS5347162B2/ja
Granted legal-status Critical Current

Links

JP6227476A 1976-05-31 1976-05-31 Positive type radiation sensitive material Granted JPS52146218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6227476A JPS52146218A (en) 1976-05-31 1976-05-31 Positive type radiation sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6227476A JPS52146218A (en) 1976-05-31 1976-05-31 Positive type radiation sensitive material

Publications (2)

Publication Number Publication Date
JPS52146218A true JPS52146218A (en) 1977-12-05
JPS5347162B2 JPS5347162B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1978-12-19

Family

ID=13195391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6227476A Granted JPS52146218A (en) 1976-05-31 1976-05-31 Positive type radiation sensitive material

Country Status (1)

Country Link
JP (1) JPS52146218A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1096321A1 (en) * 1999-10-28 2001-05-02 Sony Corporation Light exposure method
JP2013228447A (ja) * 2012-04-24 2013-11-07 Shin Etsu Chem Co Ltd レジスト下層膜材料及びパターン形成方法
JP2014119659A (ja) * 2012-12-18 2014-06-30 Shin Etsu Chem Co Ltd ポジ型レジスト材料及びこれを用いたパターン形成方法
WO2016035555A1 (ja) * 2014-09-02 2016-03-10 富士フイルム株式会社 非化学増幅型レジスト組成物、非化学増幅型レジスト膜、パターン形成方法、及び、電子デバイスの製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1096321A1 (en) * 1999-10-28 2001-05-02 Sony Corporation Light exposure method
US6613497B1 (en) 1999-10-28 2003-09-02 Sony Corporation Light exposure method
JP2013228447A (ja) * 2012-04-24 2013-11-07 Shin Etsu Chem Co Ltd レジスト下層膜材料及びパターン形成方法
JP2014119659A (ja) * 2012-12-18 2014-06-30 Shin Etsu Chem Co Ltd ポジ型レジスト材料及びこれを用いたパターン形成方法
WO2016035555A1 (ja) * 2014-09-02 2016-03-10 富士フイルム株式会社 非化学増幅型レジスト組成物、非化学増幅型レジスト膜、パターン形成方法、及び、電子デバイスの製造方法
JPWO2016035555A1 (ja) * 2014-09-02 2017-05-25 富士フイルム株式会社 非化学増幅型レジスト組成物、非化学増幅型レジスト膜、パターン形成方法、及び、電子デバイスの製造方法

Also Published As

Publication number Publication date
JPS5347162B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1978-12-19

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