JPS52133756A - Method of manufacturing phase mask for amplification system - Google Patents

Method of manufacturing phase mask for amplification system

Info

Publication number
JPS52133756A
JPS52133756A JP4857377A JP4857377A JPS52133756A JP S52133756 A JPS52133756 A JP S52133756A JP 4857377 A JP4857377 A JP 4857377A JP 4857377 A JP4857377 A JP 4857377A JP S52133756 A JPS52133756 A JP S52133756A
Authority
JP
Japan
Prior art keywords
amplification system
phase mask
manufacturing phase
manufacturing
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4857377A
Other languages
English (en)
Japanese (ja)
Inventor
Henzeru Harutomutsuto
Boratsuku Urufu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Original Assignee
VEB Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by VEB Carl Zeiss Jena GmbH filed Critical VEB Carl Zeiss Jena GmbH
Publication of JPS52133756A publication Critical patent/JPS52133756A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Polarising Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP4857377A 1976-04-30 1977-04-28 Method of manufacturing phase mask for amplification system Pending JPS52133756A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD19261376A DD126361A1 (enrdf_load_stackoverflow) 1976-04-30 1976-04-30

Publications (1)

Publication Number Publication Date
JPS52133756A true JPS52133756A (en) 1977-11-09

Family

ID=5504372

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4857377A Pending JPS52133756A (en) 1976-04-30 1977-04-28 Method of manufacturing phase mask for amplification system

Country Status (4)

Country Link
JP (1) JPS52133756A (enrdf_load_stackoverflow)
DD (1) DD126361A1 (enrdf_load_stackoverflow)
DE (1) DE2650817A1 (enrdf_load_stackoverflow)
HU (1) HU175322B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62291660A (ja) * 1986-06-10 1987-12-18 Nec Corp 半導体装置の製造方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3374452D1 (en) * 1982-04-05 1987-12-17 Ibm Method of increasing the image resolution of a transmitting mask and improved masks for performing the method
US4902899A (en) * 1987-06-01 1990-02-20 International Business Machines Corporation Lithographic process having improved image quality
US5234780A (en) * 1989-02-13 1993-08-10 Kabushiki Kaisha Toshiba Exposure mask, method of manufacturing the same, and exposure method using the same
JPH0763676A (ja) * 1993-08-27 1995-03-10 Mitsubishi Electric Corp 位相シフトレティクル性能検査装置及び性能検査方法
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4926381A (enrdf_load_stackoverflow) * 1972-07-05 1974-03-08

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4926381A (enrdf_load_stackoverflow) * 1972-07-05 1974-03-08

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62291660A (ja) * 1986-06-10 1987-12-18 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
HU175322B (hu) 1980-06-28
DD126361A1 (enrdf_load_stackoverflow) 1977-07-13
DE2650817A1 (de) 1977-11-17

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