JPS52122236A - Etching device - Google Patents

Etching device

Info

Publication number
JPS52122236A
JPS52122236A JP3817276A JP3817276A JPS52122236A JP S52122236 A JPS52122236 A JP S52122236A JP 3817276 A JP3817276 A JP 3817276A JP 3817276 A JP3817276 A JP 3817276A JP S52122236 A JPS52122236 A JP S52122236A
Authority
JP
Japan
Prior art keywords
etching device
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3817276A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5526190B2 (enExample
Inventor
Yasuhiro Horiike
Masahiro Shibagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP3817276A priority Critical patent/JPS52122236A/ja
Publication of JPS52122236A publication Critical patent/JPS52122236A/ja
Publication of JPS5526190B2 publication Critical patent/JPS5526190B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
JP3817276A 1976-04-07 1976-04-07 Etching device Granted JPS52122236A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3817276A JPS52122236A (en) 1976-04-07 1976-04-07 Etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3817276A JPS52122236A (en) 1976-04-07 1976-04-07 Etching device

Publications (2)

Publication Number Publication Date
JPS52122236A true JPS52122236A (en) 1977-10-14
JPS5526190B2 JPS5526190B2 (enExample) 1980-07-11

Family

ID=12517962

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3817276A Granted JPS52122236A (en) 1976-04-07 1976-04-07 Etching device

Country Status (1)

Country Link
JP (1) JPS52122236A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5539690A (en) * 1978-09-14 1980-03-19 Chiyou Lsi Gijutsu Kenkyu Kumiai Plasma etching device
JPS55154583A (en) * 1979-05-21 1980-12-02 Nippon Telegr & Teleph Corp <Ntt> Etching processing apparatus
JPS5614678U (enExample) * 1979-07-12 1981-02-07
JPS58168230A (ja) * 1982-03-30 1983-10-04 Fujitsu Ltd マイクロ波プラズマ処理方法
JPS61263125A (ja) * 1985-05-15 1986-11-21 Tokuda Seisakusho Ltd ドライエツチング装置
JPH098000A (ja) * 1995-06-20 1997-01-10 Shibaura Eng Works Co Ltd ドライエッチング装置
CN106252268A (zh) * 2015-06-15 2016-12-21 东京毅力科创株式会社 基板处理方法以及基板处理装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921340A (enExample) * 1972-06-17 1974-02-25

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921340A (enExample) * 1972-06-17 1974-02-25

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5539690A (en) * 1978-09-14 1980-03-19 Chiyou Lsi Gijutsu Kenkyu Kumiai Plasma etching device
JPS55154583A (en) * 1979-05-21 1980-12-02 Nippon Telegr & Teleph Corp <Ntt> Etching processing apparatus
JPS5614678U (enExample) * 1979-07-12 1981-02-07
JPS58168230A (ja) * 1982-03-30 1983-10-04 Fujitsu Ltd マイクロ波プラズマ処理方法
JPS61263125A (ja) * 1985-05-15 1986-11-21 Tokuda Seisakusho Ltd ドライエツチング装置
JPH098000A (ja) * 1995-06-20 1997-01-10 Shibaura Eng Works Co Ltd ドライエッチング装置
CN106252268A (zh) * 2015-06-15 2016-12-21 东京毅力科创株式会社 基板处理方法以及基板处理装置
JP2017005184A (ja) * 2015-06-15 2017-01-05 東京エレクトロン株式会社 基板処理方法及び基板処理装置

Also Published As

Publication number Publication date
JPS5526190B2 (enExample) 1980-07-11

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