JPS52105543A - Method of forming superconductive nb3sn layer on niobium surface - Google Patents
Method of forming superconductive nb3sn layer on niobium surfaceInfo
- Publication number
- JPS52105543A JPS52105543A JP2015977A JP2015977A JPS52105543A JP S52105543 A JPS52105543 A JP S52105543A JP 2015977 A JP2015977 A JP 2015977A JP 2015977 A JP2015977 A JP 2015977A JP S52105543 A JPS52105543 A JP S52105543A
- Authority
- JP
- Japan
- Prior art keywords
- niobium surface
- forming superconductive
- nb3sn
- layer
- nb3sn layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5893—Mixing of deposited material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/26—Anodisation of refractory metals or alloys based thereon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0184—Manufacture or treatment of devices comprising intermetallic compounds of type A-15, e.g. Nb3Sn
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/825—Apparatus per se, device per se, or process of making or operating same
- Y10S505/917—Mechanically manufacturing superconductor
- Y10S505/918—Mechanically manufacturing superconductor with metallurgical heat treating
- Y10S505/919—Reactive formation of superconducting intermetallic compound
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49014—Superconductor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Electrochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Electrochemical Coating By Surface Reaction (AREA)
- Physical Vapour Deposition (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2608089A DE2608089C3 (de) | 1976-02-27 | 1976-02-27 | Verfahren zum Herstellen einer supraleitfähigen Nb3 Sn-Schicht auf einer Nioboberfläche für Hochfrequenzanwendungen |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52105543A true JPS52105543A (en) | 1977-09-05 |
Family
ID=5971088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015977A Pending JPS52105543A (en) | 1976-02-27 | 1977-02-25 | Method of forming superconductive nb3sn layer on niobium surface |
Country Status (7)
Country | Link |
---|---|
US (1) | US4105512A (pt-PT) |
JP (1) | JPS52105543A (pt-PT) |
CH (1) | CH606486A5 (pt-PT) |
DE (1) | DE2608089C3 (pt-PT) |
FR (1) | FR2342353A1 (pt-PT) |
GB (1) | GB1553743A (pt-PT) |
NL (1) | NL7700024A (pt-PT) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4352840A (en) * | 1980-11-17 | 1982-10-05 | Turbine Metal Technology, Inc. | Interdispersed phase coatings method |
JPS61183979A (ja) * | 1985-02-08 | 1986-08-16 | Yoshiro Saji | 超電導磁気遮蔽体 |
DE3811695A1 (de) * | 1988-04-07 | 1989-10-19 | Interatom | Verfahren zum herstellen von supraleitfaehigen nb(pfeil abwaerts)3(pfeil abwaerts)sn-schichten auf nioboberflaechen sowie vorrichtung zur durchfuehrung dieses verfahrens |
US5476837A (en) * | 1994-03-14 | 1995-12-19 | Midwest Research Institute | Process for preparing superconducting film having substantially uniform phase development |
US5540787A (en) * | 1995-06-14 | 1996-07-30 | General Electric Company | Method of forming triniobium tin superconductor |
US6495215B1 (en) * | 1999-05-26 | 2002-12-17 | Tokyo Electron Limited | Method and apparatus for processing substrate |
CN113718313B (zh) * | 2021-04-20 | 2023-07-21 | 中国科学院近代物理研究所 | 一种提高铌表面锡成核均匀性的处理方法 |
CN113817990A (zh) * | 2021-09-16 | 2021-12-21 | 中国科学院近代物理研究所 | 一种在超导腔内部对锡源进行局部加热的电磁感应结构 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1254542A (en) * | 1968-02-20 | 1971-11-24 | Plessey Co Ltd | Improvements in or relating to superconducting electrical conductors |
DE2106628C3 (de) * | 1971-02-12 | 1974-02-14 | Siemens Ag, 1000 Berlin U. 8000 Muenchen | Verfahren zur Oberflächenbehandlung von supraleitenden Niob-Hohlraumresonatoren |
DE2239425C3 (de) * | 1972-08-10 | 1978-04-20 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur elektrolytischen Behandlung von Nioboberflächen für Wechselstromanwendungen |
-
1976
- 1976-02-27 DE DE2608089A patent/DE2608089C3/de not_active Expired
- 1976-11-29 CH CH1497276A patent/CH606486A5/xx not_active IP Right Cessation
-
1977
- 1977-01-04 NL NL7700024A patent/NL7700024A/xx not_active Application Discontinuation
- 1977-02-14 FR FR7704098A patent/FR2342353A1/fr active Granted
- 1977-02-15 US US05/768,831 patent/US4105512A/en not_active Expired - Lifetime
- 1977-02-25 JP JP2015977A patent/JPS52105543A/ja active Pending
- 1977-02-25 GB GB8208/77A patent/GB1553743A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US4105512A (en) | 1978-08-08 |
FR2342353B1 (pt-PT) | 1981-01-09 |
GB1553743A (en) | 1979-09-26 |
DE2608089A1 (de) | 1977-09-01 |
FR2342353A1 (fr) | 1977-09-23 |
DE2608089B2 (de) | 1978-06-22 |
CH606486A5 (pt-PT) | 1978-10-31 |
NL7700024A (nl) | 1977-08-30 |
DE2608089C3 (de) | 1979-03-15 |
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