JPS52104592A - Photopolymerizable material - Google Patents
Photopolymerizable materialInfo
- Publication number
- JPS52104592A JPS52104592A JP598077A JP598077A JPS52104592A JP S52104592 A JPS52104592 A JP S52104592A JP 598077 A JP598077 A JP 598077A JP 598077 A JP598077 A JP 598077A JP S52104592 A JPS52104592 A JP S52104592A
- Authority
- JP
- Japan
- Prior art keywords
- photopolymerizable material
- photopolymerizable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/108—Polyolefin or halogen containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
- Y10T428/31525—Next to glass or quartz
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
- Y10T428/31529—Next to metal
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19762602419 DE2602419A1 (de) | 1976-01-23 | 1976-01-23 | Photopolymerisierbare masse |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52104592A true JPS52104592A (en) | 1977-09-02 |
Family
ID=5968057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP598077A Pending JPS52104592A (en) | 1976-01-23 | 1977-01-24 | Photopolymerizable material |
Country Status (8)
Country | Link |
---|---|
US (1) | US4054682A (ja) |
JP (1) | JPS52104592A (ja) |
BE (1) | BE850519A (ja) |
DE (1) | DE2602419A1 (ja) |
FR (1) | FR2338952A1 (ja) |
GB (1) | GB1566953A (ja) |
IT (1) | IT1067967B (ja) |
NL (1) | NL7700579A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54130633A (en) * | 1978-04-01 | 1979-10-11 | Nippon Synthetic Chem Ind Co Ltd:The | Ultraviolet-curing coating composition |
WO2016021664A1 (ja) * | 2014-08-05 | 2016-02-11 | ミヨシ油脂株式会社 | マトリックスに紫外線吸収能及び/又は高屈折率を付与するための添加剤とそれを用いた樹脂部材 |
WO2023190767A1 (ja) * | 2022-03-29 | 2023-10-05 | 国立研究開発法人産業技術総合研究所 | ポリエーテルエーテルケトン分解方法およびこの分解方法によって得られた分解生成物を原料とした新規物質 |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4199420A (en) * | 1978-04-06 | 1980-04-22 | Stauffer Chemical Company | Alkoxymethylbenzophenones as photoinitiators for photopolymerizable compositions and process based thereon |
DE2962781D1 (en) * | 1978-05-23 | 1982-07-01 | Ciba Geigy Ag | New mercaptophenylketones and their use as initiators for the photopolymerisation of ethylenically unsaturated compounds |
DE2923602A1 (de) * | 1978-06-23 | 1980-01-10 | Sandoz Ag | Verwendung von substituierten alkylarylsulfoxiden und phenylarylsulfoxiden als photoinitiatoren |
DE3167493D1 (en) * | 1980-11-05 | 1985-01-10 | Akzo Nv | Photopolymerizable composition, photoinitiator mixture and curing process |
JPS6049038A (ja) * | 1983-08-29 | 1985-03-18 | Toyobo Co Ltd | ナイロンレンズ表面硬化剤 |
DE3331157A1 (de) * | 1983-08-30 | 1985-03-14 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbare mischungen, enthaltend tertiaere amine als photoaktivatoren |
DE3505998A1 (de) * | 1985-02-21 | 1986-08-21 | Merck Patent Gmbh, 6100 Darmstadt | Verwendung thiosubstituierter ketone als photoinitiatoren |
JP2622113B2 (ja) * | 1986-12-02 | 1997-06-18 | キヤノン 株式会社 | 転写記録媒体及び画像記録方法 |
DE3710281A1 (de) * | 1987-03-28 | 1988-10-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3710282A1 (de) * | 1987-03-28 | 1988-10-13 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
US4904697A (en) * | 1987-04-09 | 1990-02-27 | Merrell Dow Pharmaceuticals Inc. | Controlling the growth of certain tumor tissue with chalcone derivatives |
US4863968A (en) * | 1987-04-09 | 1989-09-05 | Merrell Dow Pharmaceuticals Inc. | Methods of treating gout with chalcone derivatives |
US4753965A (en) * | 1987-04-09 | 1988-06-28 | Merrell Dow Pharmaceuticals, Inc. | Method of treating multiple sclerosis with chalcone derivatives |
DE3738864A1 (de) * | 1987-11-16 | 1989-05-24 | Hoechst Ag | Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch |
DE3743457A1 (de) * | 1987-12-22 | 1989-07-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3743454A1 (de) * | 1987-12-22 | 1989-07-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3743455A1 (de) * | 1987-12-22 | 1989-07-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3824903A1 (de) * | 1988-07-22 | 1990-02-01 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3832032A1 (de) * | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE4007428A1 (de) * | 1990-03-09 | 1991-09-12 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
JPH0497152A (ja) * | 1990-08-09 | 1992-03-30 | Kansai Paint Co Ltd | 光重合性組成物からパターンを形成する方法 |
CN1305911C (zh) * | 2002-04-26 | 2007-03-21 | 雅宝公司 | 一种光引发聚合中的新型胺共引发剂 |
US20080103222A1 (en) * | 2002-04-26 | 2008-05-01 | Albemarle Corporation | New Class of Amine Coinitiators in Photoinitiated Polymerizations |
US7157535B2 (en) * | 2002-06-19 | 2007-01-02 | National Starch And Chemical Investment Holding Corporation | Polymeric photoinitiators |
US20060293404A1 (en) * | 2003-04-24 | 2006-12-28 | Santobianco John G | New class of amine coinitiators in photoinitiated polymerizations |
EP3656824A1 (en) * | 2018-11-26 | 2020-05-27 | Agfa-Gevaert Nv | Radiation curable inkjet for manufacturing printed circuit boards |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES366028A1 (es) * | 1968-04-16 | 1971-02-16 | Bayer Ag | Procedimiento para la preparacion de masas moldeables y de revestimiento. |
DE2155000A1 (de) * | 1971-11-05 | 1973-05-10 | Bayer Ag | Thiomethylierte benzophenone |
US3827959A (en) * | 1973-01-12 | 1974-08-06 | Scm Corp | Process for photopolymerization with carbonylated phenyl nuclear sulfonyl chloride sensitizer |
-
1976
- 1976-01-23 DE DE19762602419 patent/DE2602419A1/de not_active Withdrawn
- 1976-12-27 IT IT30903/76A patent/IT1067967B/it active
-
1977
- 1977-01-06 US US05/757,382 patent/US4054682A/en not_active Expired - Lifetime
- 1977-01-19 BE BE174191A patent/BE850519A/xx not_active IP Right Cessation
- 1977-01-20 NL NL7700579A patent/NL7700579A/xx not_active Application Discontinuation
- 1977-01-20 FR FR7701579A patent/FR2338952A1/fr active Granted
- 1977-01-21 GB GB2482/77A patent/GB1566953A/en not_active Expired
- 1977-01-24 JP JP598077A patent/JPS52104592A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54130633A (en) * | 1978-04-01 | 1979-10-11 | Nippon Synthetic Chem Ind Co Ltd:The | Ultraviolet-curing coating composition |
WO2016021664A1 (ja) * | 2014-08-05 | 2016-02-11 | ミヨシ油脂株式会社 | マトリックスに紫外線吸収能及び/又は高屈折率を付与するための添加剤とそれを用いた樹脂部材 |
JP2020194171A (ja) * | 2014-08-05 | 2020-12-03 | ミヨシ油脂株式会社 | マトリックスに紫外線吸収能及び/又は高屈折率を付与するための添加剤とそれを用いた樹脂部材 |
WO2023190767A1 (ja) * | 2022-03-29 | 2023-10-05 | 国立研究開発法人産業技術総合研究所 | ポリエーテルエーテルケトン分解方法およびこの分解方法によって得られた分解生成物を原料とした新規物質 |
Also Published As
Publication number | Publication date |
---|---|
FR2338952A1 (fr) | 1977-08-19 |
BE850519A (fr) | 1977-07-19 |
IT1067967B (it) | 1985-03-21 |
GB1566953A (en) | 1980-05-08 |
FR2338952B3 (ja) | 1979-09-21 |
NL7700579A (nl) | 1977-07-26 |
DE2602419A1 (de) | 1977-07-28 |
US4054682A (en) | 1977-10-18 |
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