JPS52104592A - Photopolymerizable material - Google Patents

Photopolymerizable material

Info

Publication number
JPS52104592A
JPS52104592A JP598077A JP598077A JPS52104592A JP S52104592 A JPS52104592 A JP S52104592A JP 598077 A JP598077 A JP 598077A JP 598077 A JP598077 A JP 598077A JP S52104592 A JPS52104592 A JP S52104592A
Authority
JP
Japan
Prior art keywords
photopolymerizable material
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP598077A
Other languages
English (en)
Inventor
Kiyusutaasu Uerunaa
Osutaaroo Rorufu
Yakobi Manfureeto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JPS52104592A publication Critical patent/JPS52104592A/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/108Polyolefin or halogen containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/122Sulfur compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31511Of epoxy ether
    • Y10T428/31525Next to glass or quartz
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31511Of epoxy ether
    • Y10T428/31529Next to metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP598077A 1976-01-23 1977-01-24 Photopolymerizable material Pending JPS52104592A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762602419 DE2602419A1 (de) 1976-01-23 1976-01-23 Photopolymerisierbare masse

Publications (1)

Publication Number Publication Date
JPS52104592A true JPS52104592A (en) 1977-09-02

Family

ID=5968057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP598077A Pending JPS52104592A (en) 1976-01-23 1977-01-24 Photopolymerizable material

Country Status (8)

Country Link
US (1) US4054682A (ja)
JP (1) JPS52104592A (ja)
BE (1) BE850519A (ja)
DE (1) DE2602419A1 (ja)
FR (1) FR2338952A1 (ja)
GB (1) GB1566953A (ja)
IT (1) IT1067967B (ja)
NL (1) NL7700579A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54130633A (en) * 1978-04-01 1979-10-11 Nippon Synthetic Chem Ind Co Ltd:The Ultraviolet-curing coating composition
WO2016021664A1 (ja) * 2014-08-05 2016-02-11 ミヨシ油脂株式会社 マトリックスに紫外線吸収能及び/又は高屈折率を付与するための添加剤とそれを用いた樹脂部材
WO2023190767A1 (ja) * 2022-03-29 2023-10-05 国立研究開発法人産業技術総合研究所 ポリエーテルエーテルケトン分解方法およびこの分解方法によって得られた分解生成物を原料とした新規物質

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4199420A (en) * 1978-04-06 1980-04-22 Stauffer Chemical Company Alkoxymethylbenzophenones as photoinitiators for photopolymerizable compositions and process based thereon
DE2962781D1 (en) * 1978-05-23 1982-07-01 Ciba Geigy Ag New mercaptophenylketones and their use as initiators for the photopolymerisation of ethylenically unsaturated compounds
DE2923602A1 (de) * 1978-06-23 1980-01-10 Sandoz Ag Verwendung von substituierten alkylarylsulfoxiden und phenylarylsulfoxiden als photoinitiatoren
DE3167493D1 (en) * 1980-11-05 1985-01-10 Akzo Nv Photopolymerizable composition, photoinitiator mixture and curing process
JPS6049038A (ja) * 1983-08-29 1985-03-18 Toyobo Co Ltd ナイロンレンズ表面硬化剤
DE3331157A1 (de) * 1983-08-30 1985-03-14 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare mischungen, enthaltend tertiaere amine als photoaktivatoren
DE3505998A1 (de) * 1985-02-21 1986-08-21 Merck Patent Gmbh, 6100 Darmstadt Verwendung thiosubstituierter ketone als photoinitiatoren
JP2622113B2 (ja) * 1986-12-02 1997-06-18 キヤノン 株式会社 転写記録媒体及び画像記録方法
DE3710281A1 (de) * 1987-03-28 1988-10-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3710282A1 (de) * 1987-03-28 1988-10-13 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US4904697A (en) * 1987-04-09 1990-02-27 Merrell Dow Pharmaceuticals Inc. Controlling the growth of certain tumor tissue with chalcone derivatives
US4863968A (en) * 1987-04-09 1989-09-05 Merrell Dow Pharmaceuticals Inc. Methods of treating gout with chalcone derivatives
US4753965A (en) * 1987-04-09 1988-06-28 Merrell Dow Pharmaceuticals, Inc. Method of treating multiple sclerosis with chalcone derivatives
DE3738864A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch
DE3743457A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3743454A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3743455A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3824903A1 (de) * 1988-07-22 1990-02-01 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE4007428A1 (de) * 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH0497152A (ja) * 1990-08-09 1992-03-30 Kansai Paint Co Ltd 光重合性組成物からパターンを形成する方法
CN1305911C (zh) * 2002-04-26 2007-03-21 雅宝公司 一种光引发聚合中的新型胺共引发剂
US20080103222A1 (en) * 2002-04-26 2008-05-01 Albemarle Corporation New Class of Amine Coinitiators in Photoinitiated Polymerizations
US7157535B2 (en) * 2002-06-19 2007-01-02 National Starch And Chemical Investment Holding Corporation Polymeric photoinitiators
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
EP3656824A1 (en) * 2018-11-26 2020-05-27 Agfa-Gevaert Nv Radiation curable inkjet for manufacturing printed circuit boards

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES366028A1 (es) * 1968-04-16 1971-02-16 Bayer Ag Procedimiento para la preparacion de masas moldeables y de revestimiento.
DE2155000A1 (de) * 1971-11-05 1973-05-10 Bayer Ag Thiomethylierte benzophenone
US3827959A (en) * 1973-01-12 1974-08-06 Scm Corp Process for photopolymerization with carbonylated phenyl nuclear sulfonyl chloride sensitizer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54130633A (en) * 1978-04-01 1979-10-11 Nippon Synthetic Chem Ind Co Ltd:The Ultraviolet-curing coating composition
WO2016021664A1 (ja) * 2014-08-05 2016-02-11 ミヨシ油脂株式会社 マトリックスに紫外線吸収能及び/又は高屈折率を付与するための添加剤とそれを用いた樹脂部材
JP2020194171A (ja) * 2014-08-05 2020-12-03 ミヨシ油脂株式会社 マトリックスに紫外線吸収能及び/又は高屈折率を付与するための添加剤とそれを用いた樹脂部材
WO2023190767A1 (ja) * 2022-03-29 2023-10-05 国立研究開発法人産業技術総合研究所 ポリエーテルエーテルケトン分解方法およびこの分解方法によって得られた分解生成物を原料とした新規物質

Also Published As

Publication number Publication date
FR2338952A1 (fr) 1977-08-19
BE850519A (fr) 1977-07-19
IT1067967B (it) 1985-03-21
GB1566953A (en) 1980-05-08
FR2338952B3 (ja) 1979-09-21
NL7700579A (nl) 1977-07-26
DE2602419A1 (de) 1977-07-28
US4054682A (en) 1977-10-18

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