JPS5185826A - - Google Patents

Info

Publication number
JPS5185826A
JPS5185826A JP50149041A JP14904175A JPS5185826A JP S5185826 A JPS5185826 A JP S5185826A JP 50149041 A JP50149041 A JP 50149041A JP 14904175 A JP14904175 A JP 14904175A JP S5185826 A JPS5185826 A JP S5185826A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50149041A
Inventor
Toroteru Jatsuku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of JPS5185826A publication Critical patent/JPS5185826A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
JP50149041A 1974-12-13 1975-12-13 Pending JPS5185826A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7441130A FR2294489A1 (fr) 1974-12-13 1974-12-13 Dispositif pour le trace programme de dessins par bombardement de particules

Publications (1)

Publication Number Publication Date
JPS5185826A true JPS5185826A (ja) 1976-07-27

Family

ID=9146138

Family Applications (2)

Application Number Title Priority Date Filing Date
JP50149041A Pending JPS5185826A (ja) 1974-12-13 1975-12-13
JP1985125130U Pending JPS61134034U (ja) 1974-12-13 1985-08-14

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP1985125130U Pending JPS61134034U (ja) 1974-12-13 1985-08-14

Country Status (7)

Country Link
US (1) US4051381A (ja)
JP (2) JPS5185826A (ja)
DE (1) DE2556151A1 (ja)
FR (1) FR2294489A1 (ja)
GB (1) GB1529819A (ja)
NL (1) NL7514441A (ja)
SE (1) SE403412B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58105543A (ja) * 1981-12-03 1983-06-23 エテック・システムズ・インコーポレイテッド ゲ−トアレ−特徴描写のための方法
JPS5941831A (ja) * 1982-08-31 1984-03-08 Toshiba Corp 電子ビ−ム描画方法

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2339909A1 (fr) * 1976-01-30 1977-08-26 Thomson Csf Systeme pour le dessin programme par bombardement de particules
FR2361190A1 (fr) * 1976-08-09 1978-03-10 Zeiss Carl Fa Procede et dispositif d'usinage a froid par faisceau electronique
JPS5394773A (en) * 1977-01-31 1978-08-19 Cho Lsi Gijutsu Kenkyu Kumiai Method of connecting graph in charged beam exposing device
JPS5493364A (en) * 1977-12-30 1979-07-24 Fujitsu Ltd Exposure system for electron beam
JPS5577142A (en) * 1978-12-07 1980-06-10 Toshiba Corp Electron beam exposure apparatus
JPS55146931A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Depicting method by electronic beam
US4310743A (en) * 1979-09-24 1982-01-12 Hughes Aircraft Company Ion beam lithography process and apparatus using step-and-repeat exposure
US4382186A (en) * 1981-01-12 1983-05-03 Energy Sciences Inc. Process and apparatus for converged fine line electron beam treatment of objects
JPS57174467A (en) * 1981-04-20 1982-10-27 Inoue Japax Res Inc Ion working device
DD203429A1 (de) * 1981-08-03 1983-10-19 Eichhorn Hans Guenther Schaltungsanordnung zur steuerung eines korpuskularstrahls
GB8415623D0 (en) * 1984-06-19 1984-07-25 Nixon W C Charged particle sources
US4673794A (en) * 1985-05-10 1987-06-16 National Research Institute For Metals Electron beam welding method
US4740904A (en) * 1985-11-01 1988-04-26 Nagle John B Line following system and process
JPS6394623A (ja) * 1986-10-09 1988-04-25 Hitachi Ltd 描画装置
US4929838A (en) * 1988-02-16 1990-05-29 Fujitsu Limited Magnetic object lens for an electron beam exposure apparatus which processes a wafer carried on a continuously moving stage
JP2501726B2 (ja) * 1991-10-08 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション コンピュ―タ・イメ―ジ生成装置及びデ―タ減縮方法
DE19642116C2 (de) 1996-10-12 2000-12-07 Fraunhofer Ges Forschung Verfahren zur strukturierten Energieübertragung mit Elektronenstrahlen
DE102017213608B4 (de) 2017-08-04 2020-06-18 Tayyar Bayrakci Gleichstromzyklonabscheider
US20220390828A1 (en) * 2021-06-07 2022-12-08 United Microelectronics Corp. Method of making mask pattern and method of forming pattern in layer

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT301620B (de) * 1967-10-23 1972-08-15 Siemens Ag Verfahren zum herstellen einer photolackmaske fuer halbleiterzwecke
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
DE2038119C3 (de) * 1970-07-31 1974-01-17 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Lichtzeicheneinrichtung mit einer drehbar gelagerten Objektscheibe. Zusatz zii:1588412
FR39852E (fr) * 1972-06-30 1932-03-24 Ig Farbenindustrie Ag Procédé de production de colorants solides pour cuve
US3778626A (en) * 1972-07-28 1973-12-11 Western Electric Co Mechanical scan system for ion implantation
US3894271A (en) * 1973-08-31 1975-07-08 Ibm Method and apparatus for aligning electron beams
US3866013A (en) * 1973-09-19 1975-02-11 Ibm Method and apparatus for controlling movable means such as an electron beam
US3914608A (en) * 1973-12-19 1975-10-21 Westinghouse Electric Corp Rapid exposure of micropatterns with a scanning electron microscope
US3900737A (en) * 1974-04-18 1975-08-19 Bell Telephone Labor Inc Electron beam exposure system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58105543A (ja) * 1981-12-03 1983-06-23 エテック・システムズ・インコーポレイテッド ゲ−トアレ−特徴描写のための方法
JPS5941831A (ja) * 1982-08-31 1984-03-08 Toshiba Corp 電子ビ−ム描画方法

Also Published As

Publication number Publication date
NL7514441A (nl) 1976-06-15
DE2556151A1 (de) 1976-06-16
GB1529819A (en) 1978-10-25
DE2556151C2 (ja) 1987-05-07
JPS61134034U (ja) 1986-08-21
FR2294489A1 (fr) 1976-07-09
FR2294489B1 (ja) 1977-04-08
SE7514083L (sv) 1976-06-14
US4051381A (en) 1977-09-27
SE403412B (sv) 1978-08-14

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