JPS51142697A - Process of an oxide semiconductor film - Google Patents

Process of an oxide semiconductor film

Info

Publication number
JPS51142697A
JPS51142697A JP6682675A JP6682675A JPS51142697A JP S51142697 A JPS51142697 A JP S51142697A JP 6682675 A JP6682675 A JP 6682675A JP 6682675 A JP6682675 A JP 6682675A JP S51142697 A JPS51142697 A JP S51142697A
Authority
JP
Japan
Prior art keywords
semiconductor film
oxide semiconductor
resistance
wide range
value over
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6682675A
Other languages
Japanese (ja)
Other versions
JPS5812722B2 (en
Inventor
Koichi Shinohara
Yasuhiro Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6682675A priority Critical patent/JPS5812722B2/en
Publication of JPS51142697A publication Critical patent/JPS51142697A/en
Publication of JPS5812722B2 publication Critical patent/JPS5812722B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

PURPOSE:This process of a semiconductor film ensures good reproductivity and the resistance value over wide range from low resistance to high resistance.
JP6682675A 1975-06-02 1975-06-02 Sankabutsu Handout Taihakumakuno Seizouhouhou Expired JPS5812722B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6682675A JPS5812722B2 (en) 1975-06-02 1975-06-02 Sankabutsu Handout Taihakumakuno Seizouhouhou

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6682675A JPS5812722B2 (en) 1975-06-02 1975-06-02 Sankabutsu Handout Taihakumakuno Seizouhouhou

Publications (2)

Publication Number Publication Date
JPS51142697A true JPS51142697A (en) 1976-12-08
JPS5812722B2 JPS5812722B2 (en) 1983-03-10

Family

ID=13327018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6682675A Expired JPS5812722B2 (en) 1975-06-02 1975-06-02 Sankabutsu Handout Taihakumakuno Seizouhouhou

Country Status (1)

Country Link
JP (1) JPS5812722B2 (en)

Also Published As

Publication number Publication date
JPS5812722B2 (en) 1983-03-10

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