JPS508473A - - Google Patents

Info

Publication number
JPS508473A
JPS508473A JP13391173A JP13391173A JPS508473A JP S508473 A JPS508473 A JP S508473A JP 13391173 A JP13391173 A JP 13391173A JP 13391173 A JP13391173 A JP 13391173A JP S508473 A JPS508473 A JP S508473A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13391173A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS508473A publication Critical patent/JPS508473A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H05B3/0047—Heating devices using lamps for industrial applications for semiconductor manufacture

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
JP13391173A 1972-11-29 1973-11-29 Pending JPS508473A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31044472A 1972-11-29 1972-11-29

Publications (1)

Publication Number Publication Date
JPS508473A true JPS508473A (enrdf_load_stackoverflow) 1975-01-28

Family

ID=23202520

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13391173A Pending JPS508473A (enrdf_load_stackoverflow) 1972-11-29 1973-11-29

Country Status (5)

Country Link
JP (1) JPS508473A (enrdf_load_stackoverflow)
DE (1) DE2359004C3 (enrdf_load_stackoverflow)
FR (1) FR2207757B2 (enrdf_load_stackoverflow)
GB (1) GB1452076A (enrdf_load_stackoverflow)
NL (1) NL7316340A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710240A (en) * 1980-06-20 1982-01-19 Sony Corp Forming method of insulating film
JPS5791526A (en) * 1980-11-28 1982-06-07 Fujitsu Ltd Heating method for substrate surface in vacuum container
JPS60105221A (ja) * 1984-10-11 1985-06-10 Hitachi Ltd 気相ウエハ処理装置
JPS62227475A (ja) * 1986-03-31 1987-10-06 Sekisui Chem Co Ltd 磁性流体を用いた防食処理方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2335043A1 (fr) * 1975-12-11 1977-07-08 Phizichesky Inst Im Procede d'obtention, par croissance, de couches epitaxiales de semi-conducteurs et dispositif pour la mise en oeuvre dudit procede
US4545327A (en) * 1982-08-27 1985-10-08 Anicon, Inc. Chemical vapor deposition apparatus
FR2594529B1 (fr) * 1986-02-19 1990-01-26 Bertin & Cie Appareil pour traitements thermiques de pieces minces, telles que des plaquettes de silicium
US4811493A (en) * 1987-08-05 1989-03-14 Burgio Joseph T Jr Dryer-cooler apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3623712A (en) * 1969-10-15 1971-11-30 Applied Materials Tech Epitaxial radiation heated reactor and process

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3200018A (en) * 1962-01-29 1965-08-10 Hughes Aircraft Co Controlled epitaxial crystal growth by focusing electromagnetic radiation
FR2114105A5 (en) * 1970-11-16 1972-06-30 Applied Materials Techno Epitaxial radiation heated reactor - including a quartz reaction chamber

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3623712A (en) * 1969-10-15 1971-11-30 Applied Materials Tech Epitaxial radiation heated reactor and process

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710240A (en) * 1980-06-20 1982-01-19 Sony Corp Forming method of insulating film
JPS5791526A (en) * 1980-11-28 1982-06-07 Fujitsu Ltd Heating method for substrate surface in vacuum container
JPS60105221A (ja) * 1984-10-11 1985-06-10 Hitachi Ltd 気相ウエハ処理装置
JPS62227475A (ja) * 1986-03-31 1987-10-06 Sekisui Chem Co Ltd 磁性流体を用いた防食処理方法

Also Published As

Publication number Publication date
GB1452076A (en) 1976-10-06
DE2359004A1 (de) 1974-06-06
DE2359004B2 (de) 1982-09-16
NL7316340A (enrdf_load_stackoverflow) 1974-05-31
DE2359004C3 (de) 1983-05-19
FR2207757B2 (enrdf_load_stackoverflow) 1980-01-11
FR2207757A2 (enrdf_load_stackoverflow) 1974-06-21

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