JPS5070040A - - Google Patents

Info

Publication number
JPS5070040A
JPS5070040A JP49052179A JP5217974A JPS5070040A JP S5070040 A JPS5070040 A JP S5070040A JP 49052179 A JP49052179 A JP 49052179A JP 5217974 A JP5217974 A JP 5217974A JP S5070040 A JPS5070040 A JP S5070040A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49052179A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5070040A publication Critical patent/JPS5070040A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
JP49052179A 1973-05-10 1974-05-10 Pending JPS5070040A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB2228473A GB1462618A (en) 1973-05-10 1973-05-10 Reducing the reflectance of surfaces to radiation
US46735474A 1974-05-06 1974-05-06
US05/656,757 US4013465A (en) 1973-05-10 1976-02-09 Reducing the reflectance of surfaces to radiation

Publications (1)

Publication Number Publication Date
JPS5070040A true JPS5070040A (ja) 1975-06-11

Family

ID=27258096

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49052179A Pending JPS5070040A (ja) 1973-05-10 1974-05-10

Country Status (5)

Country Link
US (1) US4013465A (ja)
JP (1) JPS5070040A (ja)
DE (1) DE2422298A1 (ja)
FR (1) FR2228630B1 (ja)
GB (1) GB1462618A (ja)

Cited By (20)

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JPH01252902A (ja) * 1988-04-01 1989-10-09 Kuraray Co Ltd 低反射回折格子およびその作製方法
JP2001525269A (ja) * 1997-12-11 2001-12-11 エシロール アテルナジオナール カンパニー ジェネラーレ デ オプティック 有用な面微細構造を含む眼鏡レンズおよびその製法
JP2007264594A (ja) * 2006-03-01 2007-10-11 Nissan Motor Co Ltd 反射防止微細構造、反射防止成形体及びその製造方法
JPWO2005109042A1 (ja) * 2004-05-12 2008-03-21 松下電器産業株式会社 光学素子及びその製造方法
WO2008102902A1 (ja) 2007-02-20 2008-08-28 Canon Kabushiki Kaisha 光学用部材、それを用いた光学系及び光学用部材の製造方法
EP1972968A2 (en) 2005-02-18 2008-09-24 Canon Kabushiki Kaisha Optical transparent member and optical system using the same
JP2009042472A (ja) * 2007-08-08 2009-02-26 Canon Inc 光学素子
WO2009145049A1 (ja) 2008-05-27 2009-12-03 ザ・インクテック株式会社 反射防止膜及びその製造方法
JP2010513961A (ja) * 2006-12-22 2010-04-30 シュライフリング ウント アパラーテバウ ゲゼルシャフト ミット ベシュレンクテル ハフツング 反射減衰量の大きな光回転結合器
WO2010125690A1 (ja) 2009-05-01 2010-11-04 サスティナブル・テクノロジー株式会社 光透過性基体の透過可視光量増加剤及びそれを用いた高光透過性基体の製造方法
US7859768B2 (en) 2007-07-27 2010-12-28 Canon Kabushiki Kaisha Optical element and optical apparatus
EP2390229A1 (en) 2010-05-07 2011-11-30 Canon Kabushiki Kaisha Precursor sol of aluminum oxide, optical member, and method for producing optical member
US8226250B2 (en) 2008-08-29 2012-07-24 Canon Kabushiki Kaisha Optical element and optical system
WO2012153686A1 (ja) * 2011-05-11 2012-11-15 シャープ株式会社 照明装置及び表示装置
US8501270B2 (en) 2005-02-18 2013-08-06 Canon Kabushiki Kaisha Optical transparent member and optical system using the same
EP2644661A1 (en) 2012-03-29 2013-10-02 Canon Kabushiki Kaisha Precursor sol of aluminum oxide and method for manufacturing the same, method for manufacturing optical member, optical member, and optical system
EP2653453A1 (en) 2012-04-16 2013-10-23 Canon Kabushiki Kaisha Optical member, method for manufacturing optical member, and optical film of optical member
JP2014522251A (ja) * 2011-04-07 2014-09-04 ノバルティス アーゲー ナノ構造要素を有する光学構造、使用方法及び製造方法
KR20150037746A (ko) 2012-07-31 2015-04-08 다이니폰 인사츠 가부시키가이샤 반사 방지 물품, 화상 표시 장치 및 반사 방지 물품의 제조용 금형
KR20150039710A (ko) 2012-07-31 2015-04-13 다이니폰 인사츠 가부시키가이샤 반사 방지 물품, 화상 표시 장치, 반사 방지 물품의 제조용 금형 및 반사 방지 물품의 제조용 금형의 제조 방법

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JP4502445B2 (ja) * 2000-03-16 2010-07-14 大日本印刷株式会社 反射防止フィルムの製造方法
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Cited By (34)

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JPH01252902A (ja) * 1988-04-01 1989-10-09 Kuraray Co Ltd 低反射回折格子およびその作製方法
JP2001525269A (ja) * 1997-12-11 2001-12-11 エシロール アテルナジオナール カンパニー ジェネラーレ デ オプティック 有用な面微細構造を含む眼鏡レンズおよびその製法
JPWO2005109042A1 (ja) * 2004-05-12 2008-03-21 松下電器産業株式会社 光学素子及びその製造方法
US7811684B2 (en) 2005-02-18 2010-10-12 Canon Kabushiki Kaisha Optical transparent member and optical system using the same
US7931936B2 (en) 2005-02-18 2011-04-26 Canon Kabushiki Kaisha Optical transparent member and optical system using the same
EP1972968A2 (en) 2005-02-18 2008-09-24 Canon Kabushiki Kaisha Optical transparent member and optical system using the same
US8501270B2 (en) 2005-02-18 2013-08-06 Canon Kabushiki Kaisha Optical transparent member and optical system using the same
JP2007264594A (ja) * 2006-03-01 2007-10-11 Nissan Motor Co Ltd 反射防止微細構造、反射防止成形体及びその製造方法
JP2010513961A (ja) * 2006-12-22 2010-04-30 シュライフリング ウント アパラーテバウ ゲゼルシャフト ミット ベシュレンクテル ハフツング 反射減衰量の大きな光回転結合器
US8163333B2 (en) 2007-02-20 2012-04-24 Canon Kabushiki Kaisha Optical member, optical system using the optical member, and method of manufacturing an optical member
US8541049B2 (en) 2007-02-20 2013-09-24 Canon Kabushiki Kaisha Optical member, optical system using the optical member, and method of manufacturing an optical member
WO2008102902A1 (ja) 2007-02-20 2008-08-28 Canon Kabushiki Kaisha 光学用部材、それを用いた光学系及び光学用部材の製造方法
US8034437B2 (en) 2007-02-20 2011-10-11 Canon Kabushiki Kaisha Optical member, optical system using the optical member, and method of manufacturing an optical member
US8084082B2 (en) 2007-02-20 2011-12-27 Canon Kabushiki Kaisha Optical member, optical system using the optical member, and method of manufacturing an optical member
US7771832B2 (en) 2007-02-20 2010-08-10 Canon Kabushiki Kaisha Optical member, optical system using the optical member, and method of manufacturing an optical member
EP2977794A1 (en) 2007-02-20 2016-01-27 Canon Kabushiki Kaisha Optical member, optical system using the optical member, and method of manufacturing an optical member
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GB1462618A (en) 1977-01-26
DE2422298A1 (de) 1974-11-28
FR2228630A1 (ja) 1974-12-06
US4013465A (en) 1977-03-22
FR2228630B1 (ja) 1978-01-13
AU6879874A (en) 1975-11-13

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