JPS5037096A - - Google Patents

Info

Publication number
JPS5037096A
JPS5037096A JP49069278A JP6927874A JPS5037096A JP S5037096 A JPS5037096 A JP S5037096A JP 49069278 A JP49069278 A JP 49069278A JP 6927874 A JP6927874 A JP 6927874A JP S5037096 A JPS5037096 A JP S5037096A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49069278A
Other languages
Japanese (ja)
Other versions
JPS583372B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5037096A publication Critical patent/JPS5037096A/ja
Publication of JPS583372B2 publication Critical patent/JPS583372B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP49069278A 1973-06-19 1974-06-19 デンシビ−ムオハンドウタイキタイトイチアワセスル ホウホウオヨビ ソウチ Expired JPS583372B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37144773A 1973-06-19 1973-06-19
US00402250A US3840749A (en) 1973-06-19 1973-10-01 Method and apparatus for electron beam alignment with a semiconductor member

Publications (2)

Publication Number Publication Date
JPS5037096A true JPS5037096A (enrdf_load_stackoverflow) 1975-04-07
JPS583372B2 JPS583372B2 (ja) 1983-01-21

Family

ID=27005390

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49069278A Expired JPS583372B2 (ja) 1973-06-19 1974-06-19 デンシビ−ムオハンドウタイキタイトイチアワセスル ホウホウオヨビ ソウチ

Country Status (6)

Country Link
US (1) US3840749A (enrdf_load_stackoverflow)
JP (1) JPS583372B2 (enrdf_load_stackoverflow)
CA (1) CA1005176A (enrdf_load_stackoverflow)
DE (1) DE2428303A1 (enrdf_load_stackoverflow)
FR (1) FR2234659B1 (enrdf_load_stackoverflow)
GB (1) GB1477871A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53142129A (en) * 1977-05-18 1978-12-11 Toshiba Corp Cursor display system
JPS57119380U (enrdf_load_stackoverflow) * 1981-01-19 1982-07-24

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3895234A (en) * 1973-06-15 1975-07-15 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a member
US4008402A (en) * 1974-07-18 1977-02-15 Westinghouse Electric Corporation Method and apparatus for electron beam alignment with a member by detecting X-rays
US4310743A (en) * 1979-09-24 1982-01-12 Hughes Aircraft Company Ion beam lithography process and apparatus using step-and-repeat exposure
GB2109538A (en) * 1981-11-02 1983-06-02 Philips Electronic Associated Electron beam alignment
US4968894A (en) * 1989-06-29 1990-11-06 Texas Instruments Incorporated Electrical field enhanced electron image projector
US6061606A (en) 1998-08-25 2000-05-09 International Business Machines Corporation Geometric phase analysis for mask alignment
US6476401B1 (en) * 1999-09-16 2002-11-05 Applied Materials, Inc. Moving photocathode with continuous regeneration for image conversion in electron beam lithography
FR2943456A1 (fr) * 2009-03-19 2010-09-24 Centre Nat Rech Scient Procede de lithographie electronique a imagerie de cathodoluminescence.
JP7007152B2 (ja) * 2017-10-19 2022-01-24 株式会社アドバンテスト 三次元積層造形装置および積層造形方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1614635A1 (de) * 1967-10-23 1970-03-26 Siemens Ag Verfahren zum Herstellen von Fotolackmasken fuer Halbleiterzwecke
US3710101A (en) * 1970-10-06 1973-01-09 Westinghouse Electric Corp Apparatus and method for alignment of members to electron beams

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53142129A (en) * 1977-05-18 1978-12-11 Toshiba Corp Cursor display system
JPS57119380U (enrdf_load_stackoverflow) * 1981-01-19 1982-07-24

Also Published As

Publication number Publication date
DE2428303A1 (de) 1975-03-27
GB1477871A (en) 1977-06-29
CA1005176A (en) 1977-02-08
US3840749A (en) 1974-10-08
FR2234659A1 (enrdf_load_stackoverflow) 1975-01-17
JPS583372B2 (ja) 1983-01-21
FR2234659B1 (enrdf_load_stackoverflow) 1978-10-20

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