JPS583372B2 - デンシビ−ムオハンドウタイキタイトイチアワセスル ホウホウオヨビ ソウチ - Google Patents

デンシビ−ムオハンドウタイキタイトイチアワセスル ホウホウオヨビ ソウチ

Info

Publication number
JPS583372B2
JPS583372B2 JP49069278A JP6927874A JPS583372B2 JP S583372 B2 JPS583372 B2 JP S583372B2 JP 49069278 A JP49069278 A JP 49069278A JP 6927874 A JP6927874 A JP 6927874A JP S583372 B2 JPS583372 B2 JP S583372B2
Authority
JP
Japan
Prior art keywords
semiconductor substrate
electron beam
alignment
detection mark
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49069278A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5037096A (enrdf_load_stackoverflow
Inventor
アラン・ジョゼフ・サイモン
テレンス・ウイリアム・オキーフ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Westinghouse Electric Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of JPS5037096A publication Critical patent/JPS5037096A/ja
Publication of JPS583372B2 publication Critical patent/JPS583372B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP49069278A 1973-06-19 1974-06-19 デンシビ−ムオハンドウタイキタイトイチアワセスル ホウホウオヨビ ソウチ Expired JPS583372B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37144773A 1973-06-19 1973-06-19
US00402250A US3840749A (en) 1973-06-19 1973-10-01 Method and apparatus for electron beam alignment with a semiconductor member

Publications (2)

Publication Number Publication Date
JPS5037096A JPS5037096A (enrdf_load_stackoverflow) 1975-04-07
JPS583372B2 true JPS583372B2 (ja) 1983-01-21

Family

ID=27005390

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49069278A Expired JPS583372B2 (ja) 1973-06-19 1974-06-19 デンシビ−ムオハンドウタイキタイトイチアワセスル ホウホウオヨビ ソウチ

Country Status (6)

Country Link
US (1) US3840749A (enrdf_load_stackoverflow)
JP (1) JPS583372B2 (enrdf_load_stackoverflow)
CA (1) CA1005176A (enrdf_load_stackoverflow)
DE (1) DE2428303A1 (enrdf_load_stackoverflow)
FR (1) FR2234659B1 (enrdf_load_stackoverflow)
GB (1) GB1477871A (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3895234A (en) * 1973-06-15 1975-07-15 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a member
US4008402A (en) * 1974-07-18 1977-02-15 Westinghouse Electric Corporation Method and apparatus for electron beam alignment with a member by detecting X-rays
JPS6041360B2 (ja) * 1977-05-18 1985-09-17 株式会社東芝 カ−ソル表示方式
US4310743A (en) * 1979-09-24 1982-01-12 Hughes Aircraft Company Ion beam lithography process and apparatus using step-and-repeat exposure
JPS57119380U (enrdf_load_stackoverflow) * 1981-01-19 1982-07-24
GB2109538A (en) * 1981-11-02 1983-06-02 Philips Electronic Associated Electron beam alignment
US4968894A (en) * 1989-06-29 1990-11-06 Texas Instruments Incorporated Electrical field enhanced electron image projector
US6061606A (en) 1998-08-25 2000-05-09 International Business Machines Corporation Geometric phase analysis for mask alignment
US6476401B1 (en) * 1999-09-16 2002-11-05 Applied Materials, Inc. Moving photocathode with continuous regeneration for image conversion in electron beam lithography
FR2943456A1 (fr) * 2009-03-19 2010-09-24 Centre Nat Rech Scient Procede de lithographie electronique a imagerie de cathodoluminescence.
JP7007152B2 (ja) * 2017-10-19 2022-01-24 株式会社アドバンテスト 三次元積層造形装置および積層造形方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT301620B (de) * 1967-10-23 1972-08-15 Siemens Ag Verfahren zum herstellen einer photolackmaske fuer halbleiterzwecke
US3710101A (en) * 1970-10-06 1973-01-09 Westinghouse Electric Corp Apparatus and method for alignment of members to electron beams

Also Published As

Publication number Publication date
JPS5037096A (enrdf_load_stackoverflow) 1975-04-07
US3840749A (en) 1974-10-08
FR2234659B1 (enrdf_load_stackoverflow) 1978-10-20
DE2428303A1 (de) 1975-03-27
GB1477871A (en) 1977-06-29
FR2234659A1 (enrdf_load_stackoverflow) 1975-01-17
CA1005176A (en) 1977-02-08

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