JPS5024641B2 - - Google Patents

Info

Publication number
JPS5024641B2
JPS5024641B2 JP47103216A JP10321672A JPS5024641B2 JP S5024641 B2 JPS5024641 B2 JP S5024641B2 JP 47103216 A JP47103216 A JP 47103216A JP 10321672 A JP10321672 A JP 10321672A JP S5024641 B2 JPS5024641 B2 JP S5024641B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP47103216A
Other languages
Japanese (ja)
Other versions
JPS4962203A (US08092553-20120110-C00004.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47103216A priority Critical patent/JPS5024641B2/ja
Priority to US405106A priority patent/US3902906A/en
Priority to GB4771973A priority patent/GB1418216A/en
Priority to DE2352139A priority patent/DE2352139C2/de
Publication of JPS4962203A publication Critical patent/JPS4962203A/ja
Publication of JPS5024641B2 publication Critical patent/JPS5024641B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP47103216A 1972-10-17 1972-10-17 Expired JPS5024641B2 (US08092553-20120110-C00004.png)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP47103216A JPS5024641B2 (US08092553-20120110-C00004.png) 1972-10-17 1972-10-17
US405106A US3902906A (en) 1972-10-17 1973-10-10 Photosensitive material with quinone diazide moiety containing polymer
GB4771973A GB1418216A (en) 1972-10-17 1973-10-12 Photosensitive polymers and photosensitive compositions and plates comprising such polymers
DE2352139A DE2352139C2 (de) 1972-10-17 1973-10-17 Lichtempfindliches Gemisch

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47103216A JPS5024641B2 (US08092553-20120110-C00004.png) 1972-10-17 1972-10-17

Publications (2)

Publication Number Publication Date
JPS4962203A JPS4962203A (US08092553-20120110-C00004.png) 1974-06-17
JPS5024641B2 true JPS5024641B2 (US08092553-20120110-C00004.png) 1975-08-18

Family

ID=14348293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47103216A Expired JPS5024641B2 (US08092553-20120110-C00004.png) 1972-10-17 1972-10-17

Country Status (4)

Country Link
US (1) US3902906A (US08092553-20120110-C00004.png)
JP (1) JPS5024641B2 (US08092553-20120110-C00004.png)
DE (1) DE2352139C2 (US08092553-20120110-C00004.png)
GB (1) GB1418216A (US08092553-20120110-C00004.png)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55179186U (US08092553-20120110-C00004.png) * 1979-06-11 1980-12-23
JPS6217587U (US08092553-20120110-C00004.png) * 1985-07-12 1987-02-02
EP1314552A2 (en) 1998-04-06 2003-05-28 Fuji Photo Film Co., Ltd. Photosensitive resin composition

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
JPS538128A (en) * 1976-07-09 1978-01-25 Fuji Photo Film Co Ltd Photosolubilizable composition
US4359520A (en) * 1977-11-23 1982-11-16 International Business Machines Corporation Enhancement of resist development
JPS5488403A (en) * 1977-12-21 1979-07-13 Okamoto Kagaku Kogyo Kk Block sensitive layer for printing
US4229514A (en) * 1978-12-29 1980-10-21 Konishiroku Photo Industry Co., Ltd. Photosensitive composition
JPS569740A (en) * 1979-07-05 1981-01-31 Fuji Photo Film Co Ltd Image forming method
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS57210342A (en) * 1981-06-19 1982-12-23 Toppan Printing Co Ltd Manufacture of gravure plate
JPS58205147A (ja) * 1982-05-25 1983-11-30 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
JPS63198046A (ja) * 1987-02-13 1988-08-16 Konica Corp 耐処理薬品性及びインキ着肉性に優れた感光性組成物
DE3852559T2 (de) * 1987-03-12 1995-05-24 Konishiroku Photo Ind Lichtempfindliche positive Flachdruckplatte.
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物
DE3820699A1 (de) * 1988-06-18 1989-12-21 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JP2865147B2 (ja) * 1990-06-20 1999-03-08 関西ペイント株式会社 ポジ型感光性電着塗料組成物
DE4106357A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit 2-diazo-1,3-dicarbonyl-gruppen, verfahren zu deren herstellung und verwendung in einem positiv arbeitenden aufzeichnungsmaterial
DE4106356A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial
JP3064595B2 (ja) * 1991-04-26 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
US5223373A (en) * 1991-04-29 1993-06-29 Industrial Technology Research Institute Positive working photosensitive composition and photosensitive electrodeposition composition prepared therefrom
US5229245A (en) * 1991-07-26 1993-07-20 Industrial Technology Research Institute Positively working photosensitive composition
US5445919A (en) * 1993-06-14 1995-08-29 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JP3503839B2 (ja) * 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
RU2153986C2 (ru) 1996-04-23 2000-08-10 Хорселл Грэфик Индастриз Лимитед Термочувствительная композиция и способ ее применения для изготовления литографической печатной формы
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US5858626A (en) * 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
ATE204388T1 (de) 1997-07-05 2001-09-15 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
JP4996060B2 (ja) * 2004-05-12 2012-08-08 キヤノン株式会社 スルホン酸エステル基と、アミド基を有するポリマーを含む荷電制御剤、それを用いた静電荷像現像用トナー、画像形成方法および画像形成装置
CN1965002B (zh) * 2004-05-12 2010-05-05 佳能株式会社 具有磺酸基或磺酸酯基和酰胺基的聚合物和生产它的方法
JP4500160B2 (ja) * 2004-12-24 2010-07-14 大阪有機化学工業株式会社 アミドフェノールの製造法
JP5300271B2 (ja) * 2008-01-21 2013-09-25 キヤノン株式会社 スルホン酸エステル基とアミド基を有する重合体の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL80569C (US08092553-20120110-C00004.png) * 1949-07-23
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
NL130926C (US08092553-20120110-C00004.png) * 1959-09-04
DE1447592A1 (de) * 1964-12-24 1969-02-13 Agfa Gevaert Ag Lichtvernetzbare Schichten
GB1136544A (en) * 1966-02-28 1968-12-11 Agfa Gevaert Nv Photochemical cross-linking of polymers
US3579343A (en) * 1967-04-25 1971-05-18 Konishiroku Photo Ind Photoresist-forming compositions
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
US3687663A (en) * 1970-05-19 1972-08-29 Ind Dyestuff Co Diazo-oxides of sulfonic acid amides and/or esters and photographic element and use thereof
US3644118A (en) * 1970-08-31 1972-02-22 Ibm Polydiacrylyl photosensitive compositions
US3759711A (en) * 1970-09-16 1973-09-18 Eastman Kodak Co Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55179186U (US08092553-20120110-C00004.png) * 1979-06-11 1980-12-23
JPS6217587U (US08092553-20120110-C00004.png) * 1985-07-12 1987-02-02
EP1314552A2 (en) 1998-04-06 2003-05-28 Fuji Photo Film Co., Ltd. Photosensitive resin composition

Also Published As

Publication number Publication date
JPS4962203A (US08092553-20120110-C00004.png) 1974-06-17
US3902906A (en) 1975-09-02
DE2352139C2 (de) 1983-01-20
GB1418216A (en) 1975-12-17
DE2352139A1 (de) 1974-04-25

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