JPS5019426A - - Google Patents
Info
- Publication number
- JPS5019426A JPS5019426A JP5079274A JP5079274A JPS5019426A JP S5019426 A JPS5019426 A JP S5019426A JP 5079274 A JP5079274 A JP 5079274A JP 5079274 A JP5079274 A JP 5079274A JP S5019426 A JPS5019426 A JP S5019426A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US358728A US3920454A (en) | 1973-05-09 | 1973-05-09 | Fabrication of iron oxide pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5019426A true JPS5019426A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1975-02-28 |
| JPS5134293B2 JPS5134293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-09-25 |
Family
ID=23410786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5079274A Expired JPS5134293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1973-05-09 | 1974-05-09 |
Country Status (7)
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5579443A (en) * | 1978-12-01 | 1980-06-14 | Hughes Aircraft Co | Film coating method |
| JPS5993445A (ja) * | 1982-11-19 | 1984-05-29 | Hitachi Ltd | 金属酸化膜形成用組成物及び該組成物を使用する金属酸化膜形成方法 |
| JPS6232603U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1985-08-09 | 1987-02-26 | ||
| JPS62241967A (ja) * | 1986-04-05 | 1987-10-22 | カセラ・アクチエンゲゼルシヤフト | アゾ染料の製造方法 |
| JP2014119658A (ja) * | 2012-12-18 | 2014-06-30 | Shin Etsu Chem Co Ltd | ネガ型レジスト材料及びこれを用いたパターン形成方法 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5427804U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1977-07-25 | 1979-02-23 | ||
| US4348473A (en) * | 1981-03-04 | 1982-09-07 | Xerox Corporation | Dry process for the production of microelectronic devices |
| RU2158228C1 (ru) * | 1999-05-28 | 2000-10-27 | Институт катализа им. Г.К. Борескова СО РАН | Способ получения железосодержащих оксидных материалов |
| US7939129B2 (en) | 2004-01-26 | 2011-05-10 | Pilington North America, Inc. | Deposition of iron oxide coatings on a glass substrate |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3335008A (en) * | 1964-04-02 | 1967-08-08 | Eastman Kodak Co | Photographic elements containing ferrocene derivative and method of processing |
| GB1095567A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1964-04-15 | |||
| US3352888A (en) * | 1964-11-02 | 1967-11-14 | American Cyanamid Co | Organometallo-semiconducting materials |
| US3577235A (en) * | 1969-02-17 | 1971-05-04 | Eastman Kodak Co | Electrophotographic composition and element |
| CA972142A (en) * | 1970-04-08 | 1975-08-05 | Minnesota Mining And Manufacturing Company | Photoconductive compositions |
| US3681227A (en) * | 1970-06-29 | 1972-08-01 | Corning Glass Works | Microcircuit mask and method |
| US3695908A (en) * | 1970-06-29 | 1972-10-03 | Raymond E Szupillo | Thin films of alpha fe2o3 and method of forming |
-
1973
- 1973-05-09 US US358728A patent/US3920454A/en not_active Expired - Lifetime
-
1974
- 1974-03-28 CA CA196,271A patent/CA1042732A/en not_active Expired
- 1974-03-29 FR FR7411452A patent/FR2229083B1/fr not_active Expired
- 1974-05-08 IT IT68450/74A patent/IT1014142B/it active
- 1974-05-08 NL NL7406191.A patent/NL160144C/xx not_active IP Right Cessation
- 1974-05-09 JP JP5079274A patent/JPS5134293B2/ja not_active Expired
- 1974-05-09 GB GB2047374A patent/GB1465110A/en not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5579443A (en) * | 1978-12-01 | 1980-06-14 | Hughes Aircraft Co | Film coating method |
| JPS5993445A (ja) * | 1982-11-19 | 1984-05-29 | Hitachi Ltd | 金属酸化膜形成用組成物及び該組成物を使用する金属酸化膜形成方法 |
| JPS6232603U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1985-08-09 | 1987-02-26 | ||
| JPS62241967A (ja) * | 1986-04-05 | 1987-10-22 | カセラ・アクチエンゲゼルシヤフト | アゾ染料の製造方法 |
| JP2014119658A (ja) * | 2012-12-18 | 2014-06-30 | Shin Etsu Chem Co Ltd | ネガ型レジスト材料及びこれを用いたパターン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| NL160144B (nl) | 1979-04-17 |
| DE2421974B2 (de) | 1977-04-28 |
| FR2229083B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-10-08 |
| IT1014142B (it) | 1977-04-20 |
| FR2229083A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-12-06 |
| GB1465110A (en) | 1977-02-23 |
| DE2421974A1 (de) | 1974-11-28 |
| JPS5134293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-09-25 |
| US3920454A (en) | 1975-11-18 |
| NL160144C (nl) | 1979-09-17 |
| NL7406191A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-11-12 |
| CA1042732A (en) | 1978-11-21 |