CA1042732A - Fabrication of iron oxide pattern and patterns so prepared - Google Patents
Fabrication of iron oxide pattern and patterns so preparedInfo
- Publication number
- CA1042732A CA1042732A CA196,271A CA196271A CA1042732A CA 1042732 A CA1042732 A CA 1042732A CA 196271 A CA196271 A CA 196271A CA 1042732 A CA1042732 A CA 1042732A
- Authority
- CA
- Canada
- Prior art keywords
- film
- procedure
- layer
- iron
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 title claims description 16
- 238000000034 method Methods 0.000 claims abstract description 53
- 229920000642 polymer Polymers 0.000 claims abstract description 52
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 239000002904 solvent Substances 0.000 claims abstract description 28
- 229910052742 iron Inorganic materials 0.000 claims abstract description 22
- 239000000178 monomer Substances 0.000 claims abstract description 20
- 125000001424 substituent group Chemical group 0.000 claims abstract description 18
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000001301 oxygen Substances 0.000 claims abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 14
- 239000012298 atmosphere Substances 0.000 claims abstract description 9
- 229920006395 saturated elastomer Polymers 0.000 claims abstract description 6
- 150000002506 iron compounds Chemical class 0.000 claims abstract description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 3
- 230000003647 oxidation Effects 0.000 claims description 32
- 238000007254 oxidation reaction Methods 0.000 claims description 32
- 238000010894 electron beam technology Methods 0.000 claims description 19
- 238000009736 wetting Methods 0.000 claims description 11
- 230000001590 oxidative effect Effects 0.000 claims description 10
- 238000000059 patterning Methods 0.000 claims description 8
- 238000004132 cross linking Methods 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 230000001427 coherent effect Effects 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims description 2
- 230000014759 maintenance of location Effects 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims 3
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 28
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 5
- 230000000711 cancerogenic effect Effects 0.000 abstract description 2
- 231100000315 carcinogenic Toxicity 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 60
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 15
- 239000000243 solution Substances 0.000 description 13
- 238000006116 polymerization reaction Methods 0.000 description 12
- 239000000047 product Substances 0.000 description 11
- 229920002554 vinyl polymer Polymers 0.000 description 11
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 230000015556 catabolic process Effects 0.000 description 6
- 230000001419 dependent effect Effects 0.000 description 6
- SZVJSHCCFOBDDC-UHFFFAOYSA-N ferrosoferric oxide Chemical compound O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 6
- 239000003999 initiator Substances 0.000 description 6
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 238000011161 development Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 229920006254 polymer film Polymers 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000009987 spinning Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- -1 vinyl ferrocene Chemical compound 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- 238000007605 air drying Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920001195 polyisoprene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 102220586009 ATP-dependent Clp protease proteolytic subunit, mitochondrial_I20S_mutation Human genes 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229910016867 Fe(CO3) Inorganic materials 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 150000001336 alkenes Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000010960 commercial process Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000011243 crosslinked material Substances 0.000 description 1
- VGBAECKRTWHKHC-UHFFFAOYSA-N cyclopenta-1,3-diene;1-ethenylcyclopenta-1,3-diene;iron(2+) Chemical compound [Fe+2].C=1C=C[CH-]C=1.[CH2-]C=C1C=CC=C1 VGBAECKRTWHKHC-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- CIGUMSCCQRZFMR-UHFFFAOYSA-N disodium oxido-(oxido(dioxo)chromio)oxy-dioxochromium sulfuric acid Chemical compound [Na+].[Na+].OS(O)(=O)=O.[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O CIGUMSCCQRZFMR-UHFFFAOYSA-N 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical group O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007342 radical addition reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US358728A US3920454A (en) | 1973-05-09 | 1973-05-09 | Fabrication of iron oxide pattern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1042732A true CA1042732A (en) | 1978-11-21 |
Family
ID=23410786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA196,271A Expired CA1042732A (en) | 1973-05-09 | 1974-03-28 | Fabrication of iron oxide pattern and patterns so prepared |
Country Status (7)
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5427804U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1977-07-25 | 1979-02-23 | ||
| US4332879A (en) * | 1978-12-01 | 1982-06-01 | Hughes Aircraft Company | Process for depositing a film of controlled composition using a metallo-organic photoresist |
| US4348473A (en) * | 1981-03-04 | 1982-09-07 | Xerox Corporation | Dry process for the production of microelectronic devices |
| JPS5993445A (ja) * | 1982-11-19 | 1984-05-29 | Hitachi Ltd | 金属酸化膜形成用組成物及び該組成物を使用する金属酸化膜形成方法 |
| JPS6232603U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1985-08-09 | 1987-02-26 | ||
| IN169343B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1986-04-05 | 1991-09-28 | Cassella Farbwerke Mainkur Ag | |
| RU2158228C1 (ru) * | 1999-05-28 | 2000-10-27 | Институт катализа им. Г.К. Борескова СО РАН | Способ получения железосодержащих оксидных материалов |
| US7939129B2 (en) | 2004-01-26 | 2011-05-10 | Pilington North America, Inc. | Deposition of iron oxide coatings on a glass substrate |
| JP5819810B2 (ja) * | 2012-12-18 | 2015-11-24 | 信越化学工業株式会社 | ネガ型レジスト材料及びこれを用いたパターン形成方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3335008A (en) * | 1964-04-02 | 1967-08-08 | Eastman Kodak Co | Photographic elements containing ferrocene derivative and method of processing |
| GB1095567A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1964-04-15 | |||
| US3352888A (en) * | 1964-11-02 | 1967-11-14 | American Cyanamid Co | Organometallo-semiconducting materials |
| US3577235A (en) * | 1969-02-17 | 1971-05-04 | Eastman Kodak Co | Electrophotographic composition and element |
| CA972142A (en) * | 1970-04-08 | 1975-08-05 | Minnesota Mining And Manufacturing Company | Photoconductive compositions |
| US3681227A (en) * | 1970-06-29 | 1972-08-01 | Corning Glass Works | Microcircuit mask and method |
| US3695908A (en) * | 1970-06-29 | 1972-10-03 | Raymond E Szupillo | Thin films of alpha fe2o3 and method of forming |
-
1973
- 1973-05-09 US US358728A patent/US3920454A/en not_active Expired - Lifetime
-
1974
- 1974-03-28 CA CA196,271A patent/CA1042732A/en not_active Expired
- 1974-03-29 FR FR7411452A patent/FR2229083B1/fr not_active Expired
- 1974-05-08 IT IT68450/74A patent/IT1014142B/it active
- 1974-05-08 NL NL7406191.A patent/NL160144C/xx not_active IP Right Cessation
- 1974-05-09 JP JP5079274A patent/JPS5134293B2/ja not_active Expired
- 1974-05-09 GB GB2047374A patent/GB1465110A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL160144B (nl) | 1979-04-17 |
| DE2421974B2 (de) | 1977-04-28 |
| JPS5019426A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1975-02-28 |
| FR2229083B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-10-08 |
| IT1014142B (it) | 1977-04-20 |
| FR2229083A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-12-06 |
| GB1465110A (en) | 1977-02-23 |
| DE2421974A1 (de) | 1974-11-28 |
| JPS5134293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-09-25 |
| US3920454A (en) | 1975-11-18 |
| NL160144C (nl) | 1979-09-17 |
| NL7406191A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-11-12 |
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