JPS4998179A - - Google Patents

Info

Publication number
JPS4998179A
JPS4998179A JP48143687A JP14368773A JPS4998179A JP S4998179 A JPS4998179 A JP S4998179A JP 48143687 A JP48143687 A JP 48143687A JP 14368773 A JP14368773 A JP 14368773A JP S4998179 A JPS4998179 A JP S4998179A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48143687A
Other languages
Japanese (ja)
Other versions
JPS5714029B2 (cs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4998179A publication Critical patent/JPS4998179A/ja
Publication of JPS5714029B2 publication Critical patent/JPS5714029B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/60Schottky-barrier diodes 
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP14368773A 1972-12-26 1973-12-24 Expired JPS5714029B2 (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31839472A 1972-12-26 1972-12-26

Publications (2)

Publication Number Publication Date
JPS4998179A true JPS4998179A (cs) 1974-09-17
JPS5714029B2 JPS5714029B2 (cs) 1982-03-20

Family

ID=23238005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14368773A Expired JPS5714029B2 (cs) 1972-12-26 1973-12-24

Country Status (6)

Country Link
JP (1) JPS5714029B2 (cs)
DE (1) DE2363061A1 (cs)
FR (1) FR2211756A1 (cs)
GB (1) GB1444000A (cs)
IT (1) IT1002232B (cs)
NL (1) NL7317158A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638869A (en) * 1979-09-07 1981-04-14 Seiko Epson Corp Manufacture of mos-type semiconductor device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4206540A (en) * 1978-06-02 1980-06-10 International Rectifier Corporation Schottky device and method of manufacture using palladium and platinum intermetallic alloys and titanium barrier
GB2137412B (en) * 1983-03-15 1987-03-04 Standard Telephones Cables Ltd Semiconductor device
GB2265636B (en) * 1989-09-21 1994-05-18 Int Rectifier Corp Platinum diffusion process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638869A (en) * 1979-09-07 1981-04-14 Seiko Epson Corp Manufacture of mos-type semiconductor device

Also Published As

Publication number Publication date
DE2363061A1 (de) 1974-07-04
IT1002232B (it) 1976-05-20
JPS5714029B2 (cs) 1982-03-20
GB1444000A (en) 1976-07-28
FR2211756A1 (cs) 1974-07-19
NL7317158A (cs) 1974-06-28

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