JPS499589A - - Google Patents

Info

Publication number
JPS499589A
JPS499589A JP47033539A JP3353972A JPS499589A JP S499589 A JPS499589 A JP S499589A JP 47033539 A JP47033539 A JP 47033539A JP 3353972 A JP3353972 A JP 3353972A JP S499589 A JPS499589 A JP S499589A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP47033539A
Other languages
Japanese (ja)
Other versions
JPS5318554B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE2214204A priority Critical patent/DE2214204C3/de
Application filed filed Critical
Priority to JP3353972A priority patent/JPS5318554B2/ja
Publication of JPS499589A publication Critical patent/JPS499589A/ja
Publication of JPS5318554B2 publication Critical patent/JPS5318554B2/ja
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/18—Stationary reactors having moving elements inside
    • B01J19/1862—Stationary reactors having moving elements inside placed in series
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00076—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements inside the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/0015—Controlling the temperature by thermal insulation means
    • B01J2219/00153—Vacuum spaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00164—Controlling or regulating processes controlling the flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00168—Controlling or regulating processes controlling the viscosity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Mixers Of The Rotary Stirring Type (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP3353972A 1972-03-23 1972-04-05 Expired JPS5318554B2 (enrdf_load_stackoverflow)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE2214204A DE2214204C3 (de) 1972-03-23 1972-03-23 Reaktor zur kontinuierlichen Polymerisation
JP3353972A JPS5318554B2 (enrdf_load_stackoverflow) 1972-03-23 1972-04-05

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2214204A DE2214204C3 (de) 1972-03-23 1972-03-23 Reaktor zur kontinuierlichen Polymerisation
JP3353972A JPS5318554B2 (enrdf_load_stackoverflow) 1972-03-23 1972-04-05

Publications (2)

Publication Number Publication Date
JPS499589A true JPS499589A (enrdf_load_stackoverflow) 1974-01-28
JPS5318554B2 JPS5318554B2 (enrdf_load_stackoverflow) 1978-06-15

Family

ID=25762941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3353972A Expired JPS5318554B2 (enrdf_load_stackoverflow) 1972-03-23 1972-04-05

Country Status (2)

Country Link
JP (1) JPS5318554B2 (enrdf_load_stackoverflow)
DE (1) DE2214204C3 (enrdf_load_stackoverflow)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4948572A (enrdf_load_stackoverflow) * 1972-09-12 1974-05-10
JPS5565428A (en) * 1978-11-10 1980-05-16 Tdk Corp Direct formation of thin film pattern
JPS55151328A (en) * 1979-05-16 1980-11-25 Hitachi Ltd Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film
JPS5939927U (ja) * 1982-09-07 1984-03-14 株式会社日立国際電気 薄膜生成装置の基板加熱装置
JPS6027123A (ja) * 1983-07-25 1985-02-12 Semiconductor Energy Lab Co Ltd 光プラズマ気相反応法
JPS6089920A (ja) * 1983-08-11 1985-05-20 ジエニアス　インコ−ポレイテツド 蒸気沈積装置
JPS6134929A (ja) * 1984-07-26 1986-02-19 Res Dev Corp Of Japan 半導体結晶成長装置
JPS6311668A (ja) * 1986-06-30 1988-01-19 Ulvac Corp Ｃｖｄ法
JPS6311669A (ja) * 1986-06-30 1988-01-19 Ulvac Corp Ｃｖｄ法
CN110284220A (zh) * 2019-06-19 2019-09-27 浙江春元科纺有限公司 一种具有预混功能的混棉机及其混棉工艺

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4948572A (enrdf_load_stackoverflow) * 1972-09-12 1974-05-10
JPS5565428A (en) * 1978-11-10 1980-05-16 Tdk Corp Direct formation of thin film pattern
JPS55151328A (en) * 1979-05-16 1980-11-25 Hitachi Ltd Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film
JPS5939927U (ja) * 1982-09-07 1984-03-14 株式会社日立国際電気 薄膜生成装置の基板加熱装置
JPS6027123A (ja) * 1983-07-25 1985-02-12 Semiconductor Energy Lab Co Ltd 光プラズマ気相反応法
JPS6089920A (ja) * 1983-08-11 1985-05-20 ジエニアス　インコ−ポレイテツド 蒸気沈積装置
JPS6134929A (ja) * 1984-07-26 1986-02-19 Res Dev Corp Of Japan 半導体結晶成長装置
JPS6311668A (ja) * 1986-06-30 1988-01-19 Ulvac Corp Ｃｖｄ法
JPS6311669A (ja) * 1986-06-30 1988-01-19 Ulvac Corp Ｃｖｄ法
CN110284220A (zh) * 2019-06-19 2019-09-27 浙江春元科纺有限公司 一种具有预混功能的混棉机及其混棉工艺
CN110284220B (zh) * 2019-06-19 2020-09-15 浙江春元科纺有限公司 一种具有预混功能的混棉机及其混棉工艺

Also Published As

Publication number Publication date
JPS5318554B2 (enrdf_load_stackoverflow) 1978-06-15
DE2214204C3 (de) 1975-12-11
DE2214204A1 (de) 1973-10-04
DE2214204B2 (de) 1975-04-17

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