JPS498983B1 - - Google Patents

Info

Publication number
JPS498983B1
JPS498983B1 JP45095977A JP9597770A JPS498983B1 JP S498983 B1 JPS498983 B1 JP S498983B1 JP 45095977 A JP45095977 A JP 45095977A JP 9597770 A JP9597770 A JP 9597770A JP S498983 B1 JPS498983 B1 JP S498983B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP45095977A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS498983B1 publication Critical patent/JPS498983B1/ja
Pending legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0073—Seals
    • F27D99/0075—Gas curtain seals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J6/00—Heat treatments such as Calcining; Fusing ; Pyrolysis
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
    • F27B9/028—Multi-chamber type furnaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/08—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated heated through chamber walls
    • F27B9/082—Muffle furnaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D1/00—Casings; Linings; Walls; Roofs
    • F27D1/18—Door frames; Doors, lids, removable covers
    • F27D1/1858—Doors
    • F27D2001/1891—Doors for separating two chambers in the furnace

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Engineering & Computer Science (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
  • Tunnel Furnaces (AREA)
JP45095977A 1969-11-03 1970-11-02 Pending JPS498983B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US87409369A 1969-11-03 1969-11-03

Publications (1)

Publication Number Publication Date
JPS498983B1 true JPS498983B1 (ja) 1974-03-01

Family

ID=25362962

Family Applications (1)

Application Number Title Priority Date Filing Date
JP45095977A Pending JPS498983B1 (ja) 1969-11-03 1970-11-02

Country Status (5)

Country Link
US (1) US3618919A (ja)
JP (1) JPS498983B1 (ja)
FR (1) FR2068909A5 (ja)
GB (1) GB1291746A (ja)
NL (1) NL7016075A (ja)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
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DE3425523A1 (de) * 1984-07-11 1986-01-23 Hans Lingl Anlagenbau Und Verfahrenstechnik Gmbh & Co Kg, 7910 Neu-Ulm Tunneltrockner fuer ziegel oder dergleichen
FR2583064B1 (fr) * 1985-06-05 1987-08-14 Air Liquide Procede de traitement thermique, hotte pour la mise en oeuvre de ce procede et son utilisation dans les fours de traitement thermique
DE3640324A1 (de) * 1986-11-26 1988-06-09 Ipsen Ind Int Gmbh Verfahren und vorrichtung zur gestaltung einer flammenfront an einer beschickungsoeffnung eines waermebehandlungsofens
FR2612619B1 (fr) * 1987-03-17 1989-07-13 Air Liquide Procede pour limiter les entrees d'air dans un four et four pour la mise en oeuvre de ce procede
US4823680A (en) * 1987-12-07 1989-04-25 Union Carbide Corporation Wide laminar fluid doors
DE4100232C2 (de) * 1991-01-07 1993-09-30 Riedhammer Gmbh Co Kg Einrichtung zur Regelung des in einem Ofenraum herrschenden Gasdrucks
DE10038597C1 (de) * 2000-08-08 2002-03-21 Schott Glas Schmelzwanne mit einem verschließbaren Gemenge-Einlegekanal
US6541353B1 (en) * 2000-08-31 2003-04-01 Micron Technology, Inc. Atomic layer doping apparatus and method
US6623686B1 (en) * 2000-09-28 2003-09-23 Bechtel Bwxt Idaho, Llc System configured for applying a modifying agent to a non-equidimensional substrate
US6800172B2 (en) * 2002-02-22 2004-10-05 Micron Technology, Inc. Interfacial structure for semiconductor substrate processing chambers and substrate transfer chambers and for semiconductor substrate processing chambers and accessory attachments, and semiconductor substrate processor
US6858264B2 (en) * 2002-04-24 2005-02-22 Micron Technology, Inc. Chemical vapor deposition methods
US6814813B2 (en) 2002-04-24 2004-11-09 Micron Technology, Inc. Chemical vapor deposition apparatus
US6838114B2 (en) * 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US6821347B2 (en) 2002-07-08 2004-11-23 Micron Technology, Inc. Apparatus and method for depositing materials onto microelectronic workpieces
US6955725B2 (en) 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US20040069409A1 (en) * 2002-10-11 2004-04-15 Hippo Wu Front opening unified pod door opener with dust-proof device
US6926775B2 (en) 2003-02-11 2005-08-09 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US6818249B2 (en) * 2003-03-03 2004-11-16 Micron Technology, Inc. Reactors, systems with reaction chambers, and methods for depositing materials onto micro-device workpieces
US7335396B2 (en) 2003-04-24 2008-02-26 Micron Technology, Inc. Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers
US7235138B2 (en) 2003-08-21 2007-06-26 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
US7344755B2 (en) 2003-08-21 2008-03-18 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers
US7422635B2 (en) 2003-08-28 2008-09-09 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
US7056806B2 (en) 2003-09-17 2006-06-06 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
US7282239B2 (en) * 2003-09-18 2007-10-16 Micron Technology, Inc. Systems and methods for depositing material onto microfeature workpieces in reaction chambers
US7323231B2 (en) * 2003-10-09 2008-01-29 Micron Technology, Inc. Apparatus and methods for plasma vapor deposition processes
US7581511B2 (en) 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US7647886B2 (en) 2003-10-15 2010-01-19 Micron Technology, Inc. Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
US7258892B2 (en) * 2003-12-10 2007-08-21 Micron Technology, Inc. Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
US7906393B2 (en) * 2004-01-28 2011-03-15 Micron Technology, Inc. Methods for forming small-scale capacitor structures
US7584942B2 (en) * 2004-03-31 2009-09-08 Micron Technology, Inc. Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US7156470B1 (en) * 2004-06-28 2007-01-02 Wright James P Wheel trim hub cover
CN101454107B (zh) * 2006-05-29 2013-03-27 平克塞莫系统有限公司 对工件或元件进行温度处理的方法和装置
DE102006029593A1 (de) * 2006-05-29 2007-12-13 Pink Gmbh Vakuumtechnik Verfahren und Vorrichtung zur Herstellung einer Lotverbindung
US7736583B2 (en) * 2006-10-12 2010-06-15 The Boc Group, Inc. Gas curtain assemby for muffled continuous furnaces
JP5109376B2 (ja) * 2007-01-22 2012-12-26 東京エレクトロン株式会社 加熱装置、加熱方法及び記憶媒体
SE529925C2 (sv) * 2007-03-14 2008-01-08 Aga Ab Lucktätningsanordning för industriugn
WO2012127303A1 (en) * 2011-03-21 2012-09-27 Centrotherm Photovoltaics Ag Barrier for a continuous annealing furnace
CN105126706A (zh) * 2015-09-29 2015-12-09 山东钢铁股份有限公司 一种桶装油品化冻装置及方法
CN106813496B (zh) * 2017-03-20 2022-09-27 芜湖东旭光电科技有限公司 马弗炉及其密封盖、以及用于操作密封盖的工具
DE102018124521A1 (de) * 2018-10-04 2020-04-09 Brückner Maschinenbau GmbH & Co. KG Behandlungsanlage für eine durch einen Behandlungsofen hindurchführbare flexible Materialbahn, insbesondere Kunststofffolie

Also Published As

Publication number Publication date
DE2053212B2 (de) 1973-01-11
DE2053212A1 (de) 1972-02-03
NL7016075A (ja) 1971-05-05
FR2068909A5 (ja) 1971-09-03
GB1291746A (en) 1972-10-04
US3618919A (en) 1971-11-09

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