JPS493226B1 - - Google Patents

Info

Publication number
JPS493226B1
JPS493226B1 JP1382470A JP1382470A JPS493226B1 JP S493226 B1 JPS493226 B1 JP S493226B1 JP 1382470 A JP1382470 A JP 1382470A JP 1382470 A JP1382470 A JP 1382470A JP S493226 B1 JPS493226 B1 JP S493226B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1382470A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS493226B1 publication Critical patent/JPS493226B1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • H01L21/3043Making grooves, e.g. cutting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00Severing by tearing or breaking
    • Y10T225/10Methods
    • Y10T225/12With preliminary weakening
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00Severing by tearing or breaking
    • Y10T225/30Breaking or tearing apparatus
    • Y10T225/307Combined with preliminary weakener or with nonbreaking cutter
    • Y10T225/321Preliminary weakener
    • Y10T225/325With means to apply moment of force to weakened work
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49789Obtaining plural product pieces from unitary workpiece
    • Y10T29/4979Breaking through weakened portion
JP1382470A 1969-02-19 1970-02-19 Pending JPS493226B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US80053569A 1969-02-19 1969-02-19

Publications (1)

Publication Number Publication Date
JPS493226B1 true JPS493226B1 (ja) 1974-01-25

Family

ID=25178646

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1382470A Pending JPS493226B1 (ja) 1969-02-19 1970-02-19

Country Status (7)

Country Link
US (1) US3559855A (ja)
JP (1) JPS493226B1 (ja)
DE (1) DE2007099C3 (ja)
FR (1) FR2044689B1 (ja)
GB (1) GB1297561A (ja)
IE (1) IE33717B1 (ja)
NL (1) NL7001925A (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3707760A (en) * 1971-05-19 1973-01-02 Sieburg Ind Inc Method and device for article working such as fracturing of semiconductor slices and separating semiconductor chips
US3918150A (en) * 1974-02-08 1975-11-11 Gen Electric System for separating a semiconductor wafer into discrete pellets
DE2510167B2 (de) * 1975-03-08 1976-12-16 ELMEG-Elektro-Mechanik GmbH, 315OPeine Fassung zur aufnahme elektromagnetischer relais
DE2629358C3 (de) * 1976-06-30 1980-01-24 Elmeg-Elektro-Mechanik Gmbh, 3150 Peine Anordnung mit einer Fassung zur Aufnahme elektrischer Schaltungselemente
US4203127A (en) * 1977-07-18 1980-05-13 Motorola, Inc. Package and method of packaging semiconductor wafers
GB2168840A (en) * 1984-08-22 1986-06-25 Plessey Co Plc Customerisation of integrated logic devices
JPS6469534A (en) * 1987-09-10 1989-03-15 Kazuo Sato Method for cutting workpiece, such as glass
JPH07100615B2 (ja) * 1988-03-29 1995-11-01 和郎 佐藤 ガラス加工物切断装置
DE4006070A1 (de) * 1990-02-27 1991-09-12 Braun Ag Verfahren und einrichtung zum zerteilen einer scheibe aus halbleitermaterial
JP3227800B2 (ja) * 1992-06-30 2001-11-12 富士ゼロックス株式会社 脆性板切断方法およびその装置
US6412677B1 (en) * 1998-09-16 2002-07-02 Hoya Corporation Cutting method for plate glass mother material
JP2001185519A (ja) * 1999-12-24 2001-07-06 Hitachi Ltd 半導体装置及びその製造方法
DE10030388A1 (de) * 2000-06-21 2002-01-03 Schott Glas Verfahren zur Herstellung von Glassubstraten für elektronische Speichermedien
TW515781B (en) * 2001-07-27 2003-01-01 Hannstar Display Corp Method for dividing fragile material and laminated glass
US20060024922A1 (en) * 2004-07-27 2006-02-02 Da-Tung Wen Method for cutting wafer
DE102007001133B4 (de) * 2007-01-05 2008-09-04 Mdi Schott Advanced Processing Gmbh Verfahren und Vorrichtung zum Brechen von Dünnglasscheiben
US20080303855A1 (en) * 2007-06-07 2008-12-11 Alan Bidwell Compliant Sealing Materials and Methods For Sealing Nozzles For A Micro-Fluid Ejection Head
US20220270925A1 (en) * 2019-07-22 2022-08-25 Massachusetts Institute Of Technology Flexing semiconductor structures and related techniques

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1481711A (fr) * 1965-06-02 1967-05-19 Nippon Electric Co Dispositif pour briser une masse semi-conductrice en morceaux élémentaires

Also Published As

Publication number Publication date
DE2007099A1 (de) 1970-09-10
DE2007099C3 (de) 1979-09-06
DE2007099B2 (de) 1979-01-11
FR2044689B1 (ja) 1975-03-21
FR2044689A1 (ja) 1971-02-26
IE33717L (en) 1970-08-19
GB1297561A (ja) 1972-11-22
NL7001925A (ja) 1970-08-21
IE33717B1 (en) 1974-10-02
US3559855A (en) 1971-02-02

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