JPS4834039A - - Google Patents

Info

Publication number
JPS4834039A
JPS4834039A JP6742071A JP6742071A JPS4834039A JP S4834039 A JPS4834039 A JP S4834039A JP 6742071 A JP6742071 A JP 6742071A JP 6742071 A JP6742071 A JP 6742071A JP S4834039 A JPS4834039 A JP S4834039A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6742071A
Other versions
JPS5122449B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6742071A priority Critical patent/JPS5122449B2/ja
Publication of JPS4834039A publication Critical patent/JPS4834039A/ja
Publication of JPS5122449B2 publication Critical patent/JPS5122449B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Printed Circuit Boards (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
JP6742071A 1971-09-03 1971-09-03 Expired JPS5122449B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6742071A JPS5122449B2 (ja) 1971-09-03 1971-09-03

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6742071A JPS5122449B2 (ja) 1971-09-03 1971-09-03

Publications (2)

Publication Number Publication Date
JPS4834039A true JPS4834039A (ja) 1973-05-15
JPS5122449B2 JPS5122449B2 (ja) 1976-07-09

Family

ID=13344380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6742071A Expired JPS5122449B2 (ja) 1971-09-03 1971-09-03

Country Status (1)

Country Link
JP (1) JPS5122449B2 (ja)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50100979A (ja) * 1973-12-30 1975-08-11
JPS50105379A (ja) * 1974-01-28 1975-08-20
JPS5121784A (en) * 1974-08-17 1976-02-21 Fujitsu Ltd Handotaisochino seizohoho
JPS5134672A (ja) * 1974-09-18 1976-03-24 Matsushita Electric Ind Co Ltd Fuotoetsuchinguhoho
JPS51107773A (ja) * 1975-03-19 1976-09-24 Hitachi Ltd Handotaishoriho
JPS5228267A (en) * 1975-08-28 1977-03-03 Nippon Telegr & Teleph Corp <Ntt> Minute processing
JPS53121468A (en) * 1977-03-31 1978-10-23 Hitachi Ltd Manufacture for semiconductor device
JPS53147468A (en) * 1977-05-27 1978-12-22 Nec Home Electronics Ltd Production of semiconductor device
JPS5427369A (en) * 1977-08-01 1979-03-01 Hitachi Ltd Pattern formation method
JPS5587435A (en) * 1978-12-25 1980-07-02 Fujitsu Ltd Method of producing semiconductor device
JPS5622428A (en) * 1979-08-01 1981-03-03 Toray Ind Inc Polyimide pattern forming method
JPS5633827A (en) * 1979-08-29 1981-04-04 Seiko Epson Corp Photo etching method including surface treatment of substrate
JPS5635422A (en) * 1980-07-31 1981-04-08 Nippon Telegr & Teleph Corp <Ntt> Method of etching
JPS56145504A (en) * 1980-03-10 1981-11-12 Rca Corp Method of copying spiral groove pattern
JPS57207208A (en) * 1981-06-17 1982-12-18 Hitachi Ltd Production of color filter
JPS60104901A (ja) * 1984-10-11 1985-06-10 Dainippon Printing Co Ltd 色分離フイルタ−部の製造法
JPS62139333A (ja) * 1985-12-13 1987-06-23 Nec Corp 赤外線検出素子の製造方法
JP2003528464A (ja) * 2000-03-21 2003-09-24 アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド 高温のディスカム処理を使用して高品質な複数の厚さの酸化物層を形成する方法
JP2006295110A (ja) * 2005-03-14 2006-10-26 Fuji Photo Film Co Ltd スペーサ付カバーガラスの洗浄方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4544231B2 (ja) 2006-10-06 2010-09-15 パナソニック株式会社 半導体チップの製造方法

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50100979A (ja) * 1973-12-30 1975-08-11
JPS50105379A (ja) * 1974-01-28 1975-08-20
JPS5121784A (en) * 1974-08-17 1976-02-21 Fujitsu Ltd Handotaisochino seizohoho
JPS5134672A (ja) * 1974-09-18 1976-03-24 Matsushita Electric Ind Co Ltd Fuotoetsuchinguhoho
JPS51107773A (ja) * 1975-03-19 1976-09-24 Hitachi Ltd Handotaishoriho
JPS5228267A (en) * 1975-08-28 1977-03-03 Nippon Telegr & Teleph Corp <Ntt> Minute processing
JPS53121468A (en) * 1977-03-31 1978-10-23 Hitachi Ltd Manufacture for semiconductor device
JPS53147468A (en) * 1977-05-27 1978-12-22 Nec Home Electronics Ltd Production of semiconductor device
JPS5427369A (en) * 1977-08-01 1979-03-01 Hitachi Ltd Pattern formation method
JPS617730B2 (ja) * 1978-12-25 1986-03-08 Fujitsu Ltd
JPS5587435A (en) * 1978-12-25 1980-07-02 Fujitsu Ltd Method of producing semiconductor device
JPS5622428A (en) * 1979-08-01 1981-03-03 Toray Ind Inc Polyimide pattern forming method
JPS5633827A (en) * 1979-08-29 1981-04-04 Seiko Epson Corp Photo etching method including surface treatment of substrate
JPS56145504A (en) * 1980-03-10 1981-11-12 Rca Corp Method of copying spiral groove pattern
JPS5635422A (en) * 1980-07-31 1981-04-08 Nippon Telegr & Teleph Corp <Ntt> Method of etching
JPS57207208A (en) * 1981-06-17 1982-12-18 Hitachi Ltd Production of color filter
JPS60104901A (ja) * 1984-10-11 1985-06-10 Dainippon Printing Co Ltd 色分離フイルタ−部の製造法
JPS6262021B2 (ja) * 1984-10-11 1987-12-24 Dainippon Printing Co Ltd
JPS62139333A (ja) * 1985-12-13 1987-06-23 Nec Corp 赤外線検出素子の製造方法
JP2003528464A (ja) * 2000-03-21 2003-09-24 アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド 高温のディスカム処理を使用して高品質な複数の厚さの酸化物層を形成する方法
JP4846162B2 (ja) * 2000-03-21 2011-12-28 スパンション エルエルシー 高温のディスカム処理を使用して高品質な複数の厚さの酸化物層を形成する方法
JP2006295110A (ja) * 2005-03-14 2006-10-26 Fuji Photo Film Co Ltd スペーサ付カバーガラスの洗浄方法

Also Published As

Publication number Publication date
JPS5122449B2 (ja) 1976-07-09

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