JPS50100979A - - Google Patents
Info
- Publication number
- JPS50100979A JPS50100979A JP103474A JP103474A JPS50100979A JP S50100979 A JPS50100979 A JP S50100979A JP 103474 A JP103474 A JP 103474A JP 103474 A JP103474 A JP 103474A JP S50100979 A JPS50100979 A JP S50100979A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP103474A JPS50100979A (ja) | 1973-12-30 | 1973-12-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP103474A JPS50100979A (ja) | 1973-12-30 | 1973-12-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50100979A true JPS50100979A (ja) | 1975-08-11 |
Family
ID=11490269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP103474A Pending JPS50100979A (ja) | 1973-12-30 | 1973-12-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS50100979A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5591118A (en) * | 1978-12-28 | 1980-07-10 | Fujitsu Ltd | Production of semiconductor device |
| JPS6016417A (ja) * | 1983-07-08 | 1985-01-28 | Agency Of Ind Science & Technol | 半導体結晶成長法 |
| JPS60204695A (ja) * | 1984-03-28 | 1985-10-16 | Mitsubishi Metal Corp | 人工ダイヤモンド皮膜の析出形成方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3615956A (en) * | 1969-03-27 | 1971-10-26 | Signetics Corp | Gas plasma vapor etching process |
| JPS4834039A (ja) * | 1971-09-03 | 1973-05-15 |
-
1973
- 1973-12-30 JP JP103474A patent/JPS50100979A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3615956A (en) * | 1969-03-27 | 1971-10-26 | Signetics Corp | Gas plasma vapor etching process |
| JPS4834039A (ja) * | 1971-09-03 | 1973-05-15 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5591118A (en) * | 1978-12-28 | 1980-07-10 | Fujitsu Ltd | Production of semiconductor device |
| JPS6016417A (ja) * | 1983-07-08 | 1985-01-28 | Agency Of Ind Science & Technol | 半導体結晶成長法 |
| JPS60204695A (ja) * | 1984-03-28 | 1985-10-16 | Mitsubishi Metal Corp | 人工ダイヤモンド皮膜の析出形成方法 |