JPH118194A - 露光条件測定方法、投影光学系の評価方法及びリソグラフィシステム - Google Patents

露光条件測定方法、投影光学系の評価方法及びリソグラフィシステム

Info

Publication number
JPH118194A
JPH118194A JP10113907A JP11390798A JPH118194A JP H118194 A JPH118194 A JP H118194A JP 10113907 A JP10113907 A JP 10113907A JP 11390798 A JP11390798 A JP 11390798A JP H118194 A JPH118194 A JP H118194A
Authority
JP
Japan
Prior art keywords
exposure
substrate
resist
pattern
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10113907A
Other languages
English (en)
Japanese (ja)
Other versions
JPH118194A5 (enExample
Inventor
Kengo Takemasa
建吾 武正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10113907A priority Critical patent/JPH118194A/ja
Publication of JPH118194A publication Critical patent/JPH118194A/ja
Publication of JPH118194A5 publication Critical patent/JPH118194A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10113907A 1997-04-25 1998-04-23 露光条件測定方法、投影光学系の評価方法及びリソグラフィシステム Pending JPH118194A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10113907A JPH118194A (ja) 1997-04-25 1998-04-23 露光条件測定方法、投影光学系の評価方法及びリソグラフィシステム

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10906397 1997-04-25
JP9-109063 1997-04-25
JP10113907A JPH118194A (ja) 1997-04-25 1998-04-23 露光条件測定方法、投影光学系の評価方法及びリソグラフィシステム

Publications (2)

Publication Number Publication Date
JPH118194A true JPH118194A (ja) 1999-01-12
JPH118194A5 JPH118194A5 (enExample) 2005-09-22

Family

ID=26448853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10113907A Pending JPH118194A (ja) 1997-04-25 1998-04-23 露光条件測定方法、投影光学系の評価方法及びリソグラフィシステム

Country Status (1)

Country Link
JP (1) JPH118194A (enExample)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002091440A1 (en) * 2001-05-07 2002-11-14 Nikon Corporation Optical characteristic measuring method, exposure method, and device manufacturing method
US6706456B2 (en) 2000-10-05 2004-03-16 Nikon Corporation Method of determining exposure conditions, exposure method, device manufacturing method, and storage medium
JP2007010312A (ja) * 2005-03-30 2007-01-18 Fujifilm Holdings Corp 投影ヘッドピント位置測定方法および露光方法
JPWO2007043535A1 (ja) * 2005-10-07 2009-04-16 株式会社ニコン 光学特性計測方法、露光方法及びデバイス製造方法、並びに検査装置及び計測方法
CN102402126A (zh) * 2010-09-17 2012-04-04 中芯国际集成电路制造(上海)有限公司 一种用于检测光刻过程中照明条件的结构及其检测方法
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6706456B2 (en) 2000-10-05 2004-03-16 Nikon Corporation Method of determining exposure conditions, exposure method, device manufacturing method, and storage medium
WO2002091440A1 (en) * 2001-05-07 2002-11-14 Nikon Corporation Optical characteristic measuring method, exposure method, and device manufacturing method
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
KR101229808B1 (ko) * 2005-03-30 2013-02-15 후지필름 가부시키가이샤 투영 헤드 포커스 위치 측정 방법 및 노광 방법
JP2007010312A (ja) * 2005-03-30 2007-01-18 Fujifilm Holdings Corp 投影ヘッドピント位置測定方法および露光方法
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JPWO2007043535A1 (ja) * 2005-10-07 2009-04-16 株式会社ニコン 光学特性計測方法、露光方法及びデバイス製造方法、並びに検査装置及び計測方法
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN102402126A (zh) * 2010-09-17 2012-04-04 中芯国际集成电路制造(上海)有限公司 一种用于检测光刻过程中照明条件的结构及其检测方法

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