JPH1164690A - Optical semiconductor device - Google Patents

Optical semiconductor device

Info

Publication number
JPH1164690A
JPH1164690A JP9227882A JP22788297A JPH1164690A JP H1164690 A JPH1164690 A JP H1164690A JP 9227882 A JP9227882 A JP 9227882A JP 22788297 A JP22788297 A JP 22788297A JP H1164690 A JPH1164690 A JP H1164690A
Authority
JP
Japan
Prior art keywords
optical semiconductor
semiconductor element
frame
sealing
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9227882A
Other languages
Japanese (ja)
Inventor
Mitsugi Uratani
貢 浦谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP9227882A priority Critical patent/JPH1164690A/en
Publication of JPH1164690A publication Critical patent/JPH1164690A/en
Pending legal-status Critical Current

Links

Landscapes

  • Optical Couplings Of Light Guides (AREA)
  • Semiconductor Lasers (AREA)
  • Light Receiving Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To make it possible to normally and stably operate an optical semiconductor element for a long period by making the hermetic sealing of the optical semiconductor element perfect. SOLUTION: This package has an optical semiconductor element S loading part 1a in the central part of its front surface and consists of a base body 1 which is provided with a frame part 2 enclosing the loading part on its outer peripheral part, the optical semiconductor element S which is adhered and fixed onto the loading part 1a of the base body 1, an optical fiber 6 which is mounted through the frame part 2 and of which one end faces the optical semiconductor element S and a sealing packing material 7 which is packed in the inner side of the frame part 2 and seals the optical semiconductor element S. In such a case, the sealing packing material 7 consists of an org. resin having an average coefft. of thermal expansion at 0 to 300 deg.C of 0.7×10<-5> to 1.1×10<-5> / deg.C.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は光通信等に使用され
る光半導体装置に関するものである。
The present invention relates to an optical semiconductor device used for optical communication and the like.

【0002】[0002]

【従来の技術】従来、光通信等に使用される光半導体装
置は、まず酸化アルミニウム質焼結体やエポキシ樹脂等
の電気絶縁材料から成り、その上面の略中央部に光半導
体素子を載置するための載置部を有し、かつ上面外周部
に貫通穴を設けた枠部を有する基体と、該基体の枠部に
設けた貫通穴に挿通され、ガラス、樹脂等の接着材を介
して取着固定されている光ファイバーと、前記基体の枠
部に両端が枠部の内外部に突出するように設けられ、枠
部の外側に突出する一端が外部電気回路に接続される複
数個のリード部材と、前記基体の枠部上面に封止材を介
して取着され枠部の内側を気密に封止する蓋体とから構
成される光半導体素子収納用パッケージを準備し、この
光半導体素子収納用パッケージの基体上面の載置部上に
シリコンから成る光伝送モジュール基板に実装されたレ
ーザーダイオードやフォトダイオード等からなる光半導
体素子を載置固定するとともに該光半導体素子の各電極
をリード部材にボンディングワイヤ等の電気的接続手段
を介して電気的に接続し、しかる後、枠部の上面に蓋体
を封止材を介して接合させ、枠部を有する基体と蓋体と
から成る容器内部に光半導体素子を気密に収容すること
によって製作されている。
2. Description of the Related Art Conventionally, an optical semiconductor device used for optical communication or the like is made of an electrically insulating material such as an aluminum oxide sintered body or an epoxy resin, and an optical semiconductor element is mounted on a substantially central portion of an upper surface thereof. And a base having a frame portion provided with a through hole in the outer peripheral portion of the upper surface, and a through hole provided in the frame portion of the base, through an adhesive such as glass, resin, or the like. An optical fiber that is fixedly attached to the frame, and a plurality of optical fibers provided at both ends of the frame of the base so as to protrude inside and outside the frame, and one end protruding outside the frame is connected to an external electric circuit. An optical semiconductor element housing package comprising a lead member and a lid attached to the upper surface of the frame portion of the base via a sealing material to hermetically seal the inside of the frame portion is prepared. It is made of silicon on the mounting part on the top surface of the base of the element storage package An optical semiconductor element such as a laser diode or a photodiode mounted on a transmission module substrate is mounted and fixed, and each electrode of the optical semiconductor element is electrically connected to a lead member via an electrical connection means such as a bonding wire. Thereafter, a lid is bonded to the upper surface of the frame via a sealing material, and the optical semiconductor element is air-tightly housed in a container including the base having the frame and the lid. .

【0003】かかる光半導体装置は光半導体素子にリー
ド部材を介して外部電気回路から供給される電気信号を
印加し、光半導体素子に光を励起させるとともに該励起
した光を光ファイバーに伝達させることによって、或い
は光ファイバーを伝達する光を光半導体素子に照射し、
光半導体素子に照射された光に対応する電気信号を発生
させるととも該発生した電気信号をリード部材を介し取
り出すことによって光通信に使用される。
In such an optical semiconductor device, an electric signal supplied from an external electric circuit is applied to the optical semiconductor element via a lead member to excite the optical semiconductor element and transmit the excited light to an optical fiber. Or irradiating the optical semiconductor element with light transmitted through the optical fiber,
The optical semiconductor device is used for optical communication by generating an electric signal corresponding to the light applied to the optical semiconductor element and extracting the generated electric signal through a lead member.

【0004】なお、前記上面外周部に枠部を有する基体
は、例えば、酸化アルミニウム質焼結体から成る場合に
は、酸化アルミニウム、酸化珪素、酸化マグネシウム、
酸化カルシウム等のセラミック原料粉末に有機バインダ
ー、溶剤等を添加混合して泥漿物を作るとともに該泥漿
物をドクターブレード法やカレンダーロール法等により
シート状に成形してセラミックグリーンシートを得、し
かる後、前記セラミックグリーンシートに所定の打ち抜
き加工を施すとともに複数枚積層し、約1500℃の高
温で焼成することによって製作され、またエポキシ樹脂
等の有機樹脂で形成される場合には、トランスファモー
ルド法を採用することによって、具体的には所定金型内
にビスフェノールA型、0- クレーゾルノボラック型等
のエポキシ樹脂と、シリカ、アルミナ等の充填材(フィ
ラー)と、その他の硬化剤、可とう化剤、難燃化助剤、
着色剤、離型剤等から成るタブレット状に成形されたエ
ポキシ樹脂の原料粉末を注入するとともにこれを150
℃〜200℃の温度で熱硬化させることによって製作さ
れる。
[0004] When the base having a frame portion on the outer periphery of the upper surface is made of, for example, an aluminum oxide sintered body, aluminum oxide, silicon oxide, magnesium oxide,
An organic binder, a solvent, etc. are added to and mixed with a ceramic raw material powder such as calcium oxide to form a slurry, and the slurry is formed into a sheet by a doctor blade method, a calendar roll method, or the like to obtain a ceramic green sheet. The ceramic green sheet is manufactured by performing a predetermined punching process and laminating a plurality of the green sheets and firing at a high temperature of about 1500 ° C. When the ceramic green sheet is formed of an organic resin such as an epoxy resin, a transfer molding method is used. By adopting, specifically, an epoxy resin such as bisphenol A type, 0-cresol novolak type, a filler such as silica and alumina, other curing agents, a flexible Agent, flame retardant aid,
A tablet-like epoxy resin raw material powder containing a colorant, a release agent,
It is manufactured by thermosetting at a temperature of from 200C to 200C.

【0005】しかしながら、近時、通信機器に使用され
る光半導体装置は小型にして安価なものが強く要求さ
れ、この要求に基づいて従来の光半導体装置より製造工
程が簡易で部品点数の少ないもの、具体的には光半導体
素子収納用パッケージを上面外周部に枠部を有する基体
で形成し、基体の上面に光半導体素子を、枠部に光ファ
イバーを固定するとともに枠部の内側にエポキシ樹脂等
から成る封止充填剤を充填して光半導体素子を気密に封
止するようになした光半導体装置が提案され、使用され
るようになってきた。
However, recently, there has been a strong demand for small and inexpensive optical semiconductor devices used for communication equipment. Based on this requirement, optical semiconductor devices having a simpler manufacturing process and fewer parts than conventional optical semiconductor devices have been required. Specifically, the package for housing the optical semiconductor element is formed of a base having a frame on the outer peripheral portion of the upper surface, the optical semiconductor element is fixed on the upper surface of the base, the optical fiber is fixed on the frame, and an epoxy resin or the like is provided on the inside of the frame. An optical semiconductor device in which an optical semiconductor element is hermetically sealed by filling an encapsulant filler made of the same has been proposed and used.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、この封
止樹脂充填剤で光半導体素子を気密に封止するようにな
した光半導体装置は封止充填剤として一般にエポキシ樹
脂等の有機樹脂が使用されており、その熱膨張係数は2
0×10-5/℃程度で光半導体素子の熱膨張係数(光半
導体素子がガリウムー砒素から成る場合は0.7×10
-5/℃)と大きく相違することから光半導体素子を封止
充填剤で気密に封止した後、光半導体素子と封止充填剤
とに熱が作用すると両者間に両者の熱膨張係数の相違に
起因して大きな熱応力が発生し、該発生した熱応力によ
って光半導体素子が破損したり、光半導体素子と封止充
填剤との間に剥離が生じ、光半導体素子の気密封止が破
れて光半導体素子を長期間にわたり正常、かつ安定に作
動させることができないという欠点を誘発した。
However, in an optical semiconductor device in which an optical semiconductor element is hermetically sealed with the sealing resin filler, an organic resin such as an epoxy resin is generally used as the sealing filler. Has a coefficient of thermal expansion of 2
The thermal expansion coefficient of the optical semiconductor device is about 0 × 10 −5 / ° C. (0.7 × 10 5 when the optical semiconductor element is made of gallium-arsenic).
-5 / ° C), the optical semiconductor element is hermetically sealed with a sealing filler, and when heat acts on the optical semiconductor element and the sealing filler, the coefficient of thermal expansion between the two increases. A large thermal stress is generated due to the difference, the optical semiconductor element is damaged by the generated thermal stress, or separation occurs between the optical semiconductor element and the sealing filler, and the hermetic sealing of the optical semiconductor element is not performed. This has caused a drawback that the optical semiconductor element cannot be normally and stably operated for a long period of time.

【0007】また封止充填剤を構成するエポキシ樹脂等
の有機樹脂は耐湿性に劣るため大気中に含まれる水分が
封止充填剤を侵入して光半導体素子に接触し、光半導体
素子の電極等に酸化腐蝕が発生して光半導体素子を常に
正常、かつ安定に作動させることができないという欠点
も誘発される。
Further, since the organic resin such as an epoxy resin constituting the sealing filler is inferior in moisture resistance, moisture contained in the air enters the sealing filler and comes into contact with the optical semiconductor element, and the electrode of the optical semiconductor element is exposed. For example, the optical semiconductor element cannot always operate normally and stably due to oxidation corrosion.

【0008】本発明は上記欠点に鑑み案出されたもの
で、その目的は光半導体素子の気密封止を完全として光
半導体素子を長期間にわたり正常、かつ安定に作動させ
ることができる光半導体装置を提供することにある。
SUMMARY OF THE INVENTION The present invention has been devised in view of the above-mentioned drawbacks, and has as its object to provide an optical semiconductor device in which the hermetic sealing of the optical semiconductor element is completed and the optical semiconductor element can operate normally and stably for a long time. Is to provide.

【0009】[0009]

【課題を解決するための手段】本発明は、上面中央部に
光半導体素子の載置部が、外周部に前記載置部を囲繞す
る枠部を設けた基体と、該基体の載置部に接着固定され
た光半導体素子と、前記枠部を貫通して取着され、一端
が光半導体素子と対向する光ファイバーと、前記枠部の
内側に充填され、光半導体素子を封止する封止充填剤と
から成る光半導体装置であって、前記封止充填剤は0〜
300℃の平均熱膨張係数が0.7×10-5/℃〜1.
1×10-5/℃である有機樹脂から成ることを特徴とす
るものである。
According to the present invention, there is provided a base having an optical semiconductor element mounting portion provided at the center of the upper surface and a frame surrounding the mounting portion at the outer peripheral portion, and a mounting portion of the base. An optical semiconductor element adhered and fixed to the optical fiber, an optical fiber which is attached through the frame portion and has one end facing the optical semiconductor element, and a seal filled inside the frame portion to seal the optical semiconductor element An optical semiconductor device comprising: a filler;
The average coefficient of thermal expansion at 300 ° C is 0.7 × 10 -5 / ° C.
It is characterized by being made of an organic resin of 1 × 10 −5 / ° C.

【0010】また本発明は、前記封止充填剤中に、表面
に半径が10乃至100オングストロームの細孔を有す
る吸湿剤が1乃至50重量%含有されていることを特徴
とするものである。
Further, the present invention is characterized in that the sealing filler contains 1 to 50% by weight of a moisture absorbent having pores having a radius of 10 to 100 angstroms on the surface.

【0011】本発明の光半導体装置によれば、光半導体
素子を気密に封止する封止充填剤の0〜300℃におけ
る平均熱膨張係数を0.7×10-5/℃〜1.1×10
-5/℃とし、光半導体素子の熱膨張係数に近似させたこ
とから光半導体素子を封止充填剤で気密に封止した後、
光半導体素子と封止充填剤とに熱が作用しても両者間に
両者の熱膨張係数の相違に起因する熱応力が発生し、該
発生した熱応力によって光半導体素子が破損したり、光
半導体素子と封止充填剤との間に剥離が生じたりするこ
とはなく、これによって光半導体素子の気密封止が完全
なり、光半導体素子を長期間にわたり正常、かつ安定に
作動させることが可能となる。
According to the optical semiconductor device of the present invention, the sealing filler for hermetically sealing the optical semiconductor element has an average thermal expansion coefficient at 0 to 300 ° C. of 0.7 × 10 −5 / ° C. to 1.1. × 10
-5 / ° C., since the thermal expansion coefficient of the optical semiconductor element was approximated, the optical semiconductor element was hermetically sealed with a sealing filler,
Even when heat acts on the optical semiconductor element and the sealing filler, a thermal stress is generated between the two due to a difference in thermal expansion coefficient between the two, and the generated thermal stress may damage the optical semiconductor element, No delamination occurs between the semiconductor element and the encapsulant, which completes the hermetic sealing of the optical semiconductor element and allows the optical semiconductor element to operate normally and stably for a long period of time Becomes

【0012】また本発明の光半導体装置によれば、封止
充填剤中に、表面に半径が10乃至100オングストロ
ームの細孔を有する吸湿剤を1乃至50重量%含有させ
ておくと、大気中に含まれる水分が封止充填剤に侵入し
てもその侵入した水分は吸湿材に効率的に吸着されて光
半導体素子に接触することは殆どなく、その結果、侵入
した水分によって光半導体素子の電極等に酸化腐蝕を発
生することもなく、光半導体素子を常に正常、かつ安定
に作動させることが可能となる。
Further, according to the optical semiconductor device of the present invention, when the sealing filler contains 1 to 50% by weight of a moisture absorbent having pores having a radius of 10 to 100 angstroms on its surface, it can be used in the atmosphere. Even if the moisture contained in the semiconductor material enters the sealing filler, the infiltrated moisture is efficiently adsorbed by the hygroscopic material and hardly comes into contact with the optical semiconductor element. It is possible to always operate the optical semiconductor element normally and stably without causing oxidative corrosion on the electrodes and the like.

【0013】[0013]

【発明の実施の形態】次に本発明を添付図面に基づき詳
細に説明する。図1は、本発明の光半導体装置の一実施
例を示し、1は基体、2は基体1の上面外周部に形成さ
れた枠部である。この基体1の上面外周部に形成された
枠部2の内側に光半導体素子Sが収容される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 shows an embodiment of an optical semiconductor device according to the present invention, wherein 1 is a base, and 2 is a frame formed on the outer peripheral portion of the upper surface of the base 1. The optical semiconductor element S is housed inside the frame 2 formed on the outer peripheral portion of the upper surface of the base 1.

【0014】前記基体1は光半導体素子Sを支持するた
めの支持部材として作用し、その上面の略中央部に光半
導体素子Sを載置するための載置部1aを有しており、
この載置部1a上にはシリコン等により形成された光伝
送モジュール基板Lに実装された光半導体素子Sがガラ
ス、樹脂等の接着剤を介して載置固定される。
The base 1 functions as a support member for supporting the optical semiconductor element S, and has a mounting portion 1a for mounting the optical semiconductor element S at substantially the center of the upper surface thereof.
An optical semiconductor element S mounted on an optical transmission module substrate L made of silicon or the like is mounted and fixed on the mounting portion 1a via an adhesive such as glass or resin.

【0015】また前記基体1はその上面外周部に前記光
半導体素子Sが載置される載置部1aを囲繞するように
して枠部2が形成されており、該枠部2はその内側に光
半導体素子Sを収容するための空所を形成する作用をな
す。
A frame 2 is formed on the outer periphery of the upper surface of the base 1 so as to surround a mounting portion 1a on which the optical semiconductor element S is mounted. This serves to form a space for accommodating the optical semiconductor element S.

【0016】前記上面外周部に枠部2を有する基体1は
酸化アルミニウム質焼結体やエポキシ樹脂等の電気絶縁
材料から成り、例えば、酸化アルミニウム質焼結体から
成る場合には、酸化アルミニウム、酸化珪素、酸化マグ
ネシウム、酸化カルシウム等のセラミック原料粉末に有
機バインダー、溶剤等を添加混合して泥漿物を作るとと
もに該泥漿物をドクターブレード法やカレンダーロール
法等によりシート状に成形してセラミックグリーンシー
トを得、しかる後、前記セラミックグリーンシートに所
定の打ち抜き加工を施すとともに複数枚積層し、約15
00℃の高温で焼成することによって製作され、またエ
ポキシ樹脂等の有機樹脂で形成される場合には、トラン
スファモールド法を採用することによって、具体的には
所定金型内にビスフェノールA型、0- クレーゾルノボ
ラック型等のエポキシ樹脂と、シリカ、アルミナ等の充
填材(フィラー)と、その他の硬化剤、可とう化剤、難
燃化助剤、着色剤、離型剤等から成るタブレット状に成
形されたエポキシ樹脂の原料粉末を注入するとともにこ
れを150℃〜200℃の温度で熱硬化させることによ
って製作される。
The base 1 having the frame portion 2 on the outer peripheral portion of the upper surface is made of an electrically insulating material such as an aluminum oxide sintered body or an epoxy resin. An organic binder, a solvent, and the like are added to and mixed with ceramic raw material powders such as silicon oxide, magnesium oxide, and calcium oxide to form a slurry, and the slurry is formed into a sheet shape by a doctor blade method, a calendar roll method, or the like to form a ceramic green. After obtaining a sheet, a predetermined punching process is performed on the ceramic green sheet, and a plurality of sheets are laminated.
It is manufactured by firing at a high temperature of 00 ° C., and when it is formed of an organic resin such as an epoxy resin, a transfer mold method is employed, and specifically, a bisphenol A type, -Tablets composed of epoxy resin such as clay sol novolac type, filler such as silica and alumina, and other curing agents, flexible agents, flame retardant aids, coloring agents, release agents, etc. It is manufactured by injecting a molded epoxy resin raw material powder and thermally curing the same at a temperature of 150 ° C. to 200 ° C.

【0017】また前記基体1の枠部2には両端が枠部2
の内外に突出する複数個のリード部材3が設けてあり、
該リード部材3の枠部2内側に突出する領域に光半導体
素子Sの各電極をボンディングワイヤ等の電気的接続手
段4を介して接続し、枠部2の外側に突出する領域を外
部電気回路に電気的に接続させれば光半導体素子Sの各
電極はリード部材3を介し外部電気回路に電気的に接続
されることとなる。
Both ends of the frame 2 of the base 1 are frame 2
Are provided with a plurality of lead members 3 protruding inward and outward.
Each electrode of the optical semiconductor element S is connected to a region of the lead member 3 protruding inside the frame portion 2 through an electric connection means 4 such as a bonding wire, and a region protruding outside the frame portion 2 is connected to an external electric circuit. When the electrodes are electrically connected to each other, the respective electrodes of the optical semiconductor element S are electrically connected to an external electric circuit via the lead member 3.

【0018】前記リード部材3は枠部2を有する基体1
が酸化アルミニウム質焼結体から成る場合にはタングス
テン、モリブデン等の金属から成り、該金属粉末に有機
溶剤、溶媒を添加混合して得た金属ペーストを基体1と
なるセラミックグリーンシートにスクリーン印刷法等に
より予め所定パターンに印刷塗布しておくことによって
枠部2の内側から外側にかけて形成され、また枠部2を
有する基体1がエポキシ樹脂等の有機樹脂から成る場合
には鉄ーニッケルーコバルト合金や鉄ーニッケル合金等
の金属板から成り、枠部2を有する基体1をトランスフ
ァモールド法により形成する際に予め金型内の所定位置
にリード部材3をセットしておくことによって枠部2の
所定位置に両端を枠部2の内外部に突出させた状態で一
体的に取着される。
The lead member 3 is a base 1 having a frame 2
Is made of a metal such as tungsten, molybdenum or the like, and a metal paste obtained by adding and mixing an organic solvent and a solvent to the metal powder is screen-printed on a ceramic green sheet serving as a substrate 1 Is formed from the inside to the outside of the frame portion 2 by printing and applying a predetermined pattern in advance by, for example, an iron-nickel-cobalt alloy when the base 1 having the frame portion 2 is made of an organic resin such as an epoxy resin. When the base member 1 made of a metal plate such as iron or nickel alloy and having the frame portion 2 is formed by the transfer molding method, the lead member 3 is set at a predetermined position in the mold in advance so that the frame portion 2 has a predetermined shape. At the position, both ends are integrally attached with the both ends protruding inside and outside of the frame portion 2.

【0019】前記リード部材3はまたその露出する外表
面に良導電性で耐蝕性に優れ、かつロウ材と濡れ性の良
いニッケルや金等の金属をめっき法により所定厚み(1
〜20μm)に被着させておくと、リード部材3の酸化
腐蝕を有効に防止することができるとともにリード部材
3とボンディングワイヤ等の電気的接続手段4との接続
及びリード部材3と外部電気回路との接続を信頼性の高
いものとなすことができる。従って、前記リード部材3
はその露出する外表面に良導電性で耐蝕性に優れ、かつ
ロウ材と濡れ性の良いニッケルや金等の金属をめっき法
により1〜20μmの厚みに被着させてることが好まし
い。
The lead member 3 is coated on its exposed outer surface with a metal such as nickel or gold having good conductivity and excellent corrosion resistance and good wettability with a brazing material by a plating method to a predetermined thickness (1).
2020 μm), it is possible to effectively prevent oxidative corrosion of the lead member 3 and to connect the lead member 3 to an electrical connection means 4 such as a bonding wire and to connect the lead member 3 to an external electric circuit. Connection can be made highly reliable. Therefore, the lead member 3
It is preferable that a metal such as nickel or gold having good conductivity and excellent corrosion resistance and good wettability with a brazing material is applied to the exposed outer surface to a thickness of 1 to 20 μm by plating.

【0020】前記基体1の枠部2には更に枠部2を貫通
する貫通穴5が形成されており、該貫通穴5には後述す
る光ファイバー6が枠部2の外側から内側にかけて、か
つその先端を光半導体素子Sに対向するようにして挿通
固定される。
The frame 2 of the base body 1 is further formed with a through hole 5 penetrating the frame 2, and an optical fiber 6 described later extends from the outside to the inside of the frame 2 in the through hole 5. It is inserted and fixed so that the front end faces the optical semiconductor element S.

【0021】なお、前記枠部2の貫通穴5は枠部2にド
リルやレーザーを用いた穴開け加工を施すことによっ
て、或いは枠部2を有する基体1を形成する際に予め金
型を工夫しておいたり、グリーンシートの所定位置に予
め穴開け加工を施しておくことによって所定位置に所定
形状に形成される。
The through-hole 5 of the frame 2 is formed by drilling the frame 2 with a drill or a laser, or by forming a mold in advance when the base 1 having the frame 2 is formed. The green sheet is formed into a predetermined shape at a predetermined position by performing a punching process at a predetermined position of the green sheet in advance.

【0022】また前記枠部2の貫通穴5内に挿通固定さ
れる光ファイバー6は光半導体素子Sの発する光を外部
に伝達する、或いは外部から光を光半導体素子Sに伝達
するための光の伝達路として作用する。
The optical fiber 6 inserted and fixed in the through hole 5 of the frame 2 transmits light emitted from the optical semiconductor element S to the outside or transmits light from the outside to the optical semiconductor element S. Acts as a transmission path.

【0023】更に前記上面外周部に枠部2を有する基体
1は、枠部2の内側に位置する載置部1aに光半導体素
子Sが光伝送モジュール基板Lを介して載置固定され、
該載置部1aに固定された光半導体素子Sはその各電極
が所定のリード部材3にボンディングワイヤ等の電気的
手段4を介して接続した後、枠部2の内側に充填される
封止充填剤7によって完全に気密封止される。
Further, in the base 1 having the frame portion 2 on the outer peripheral portion of the upper surface, the optical semiconductor element S is mounted and fixed on the mounting portion 1a located inside the frame portion 2 via the optical transmission module substrate L.
After the respective electrodes of the optical semiconductor element S fixed to the mounting portion 1a are connected to predetermined lead members 3 via electrical means 4 such as bonding wires, the sealing is filled inside the frame portion 2. It is completely hermetically sealed by the filler 7.

【0024】前記封止充填剤7は、例えば、エポキシ樹
脂等の有機樹脂から成り、ビスフェノールA型エポキシ
樹脂、ノボラック型エポキシ樹脂、グリシジルエステル
型エポキシ樹脂等にアミン系硬化剤、イミダゾール系硬
化剤、酸無水物系硬化剤等の硬化剤を添加混合してペー
スト状のエポキシ樹脂前駆体を得るとともに該エポキシ
樹脂前駆体を枠部2の内側に光半導体素子Sを被覆する
ように充填し、しかる後、これを約80〜200℃の熱
で0.5乃至3時間熱処理し、熱硬化させることによっ
て形成される。
The sealing filler 7 is made of, for example, an organic resin such as an epoxy resin. An amine-based curing agent, an imidazole-based curing agent, a bisphenol A-type epoxy resin, a novolak-type epoxy resin, a glycidyl ester-type epoxy resin, and the like are used. A curing agent such as an acid anhydride-based curing agent is added and mixed to obtain a paste-like epoxy resin precursor, and the epoxy resin precursor is filled inside the frame portion 2 so as to cover the optical semiconductor element S. Thereafter, it is heat-treated at a temperature of about 80 to 200 [deg.] C. for 0.5 to 3 hours, and is thermally cured.

【0025】また前記封止充填剤7は0〜300℃の平
均熱膨張係数を0.7×10-5/℃〜1.1×10-5
℃に設定し、光半導体素子Sの熱膨張係数に近似する熱
膨張係数としたことから光半導体素子Sを封止充填剤7
で気密に封止した後、光半導体素子Sと封止充填剤7と
に熱が作用しても両者間に両者の熱膨張係数の相違に起
因する熱応力が発生し、該発生した熱応力によって光半
導体素子Sが破損したり、光半導体素子Sと封止充填剤
7との間に剥離が生じたりすることはなく、これによっ
て光半導体素子Sの気密封止が完全なり、光半導体素子
Sを長期間にわたり正常、かつ安定に作動させることが
可能となる。
[0025] The sealing filler 7 0.7 average thermal expansion coefficient of 0 to 300 ° C. is × 10 -5 /℃~1.1×10 -5 /
° C. and a thermal expansion coefficient close to the thermal expansion coefficient of the optical semiconductor element S.
Even if heat acts on the optical semiconductor element S and the sealing filler 7, a thermal stress is generated between the optical semiconductor element S and the sealing filler 7 due to a difference in the coefficient of thermal expansion between the two. As a result, the optical semiconductor element S is not damaged or the optical semiconductor element S is not peeled off from the sealing filler 7, whereby the hermetic sealing of the optical semiconductor element S is completed. S can be operated normally and stably for a long period of time.

【0026】なお、前記封止充填剤7の0〜300℃の
平均熱膨張係数を0.7×10-5/℃〜1.1×10-5
/℃の範囲とするには封止充填剤7を構成するエポキシ
樹脂の内部にアルミナやシリカ等のフィラーを80〜9
0重量%程度含有させておくことによって行われる。
[0026] Incidentally, the sealing filler 7 of 0-300 average thermal expansion coefficient 0.7 × 10 -5 /℃~1.1×10 -5 of ℃
/ [Deg.] C., a filler such as alumina or silica is added to the inside of the epoxy resin constituting the sealing filler 7 in a range of 80 to 9%.
It is performed by containing about 0% by weight.

【0027】また前記封止充填剤7はその内部に、表面
に半径が10乃至100オングストロームの細孔を有す
る吸湿材を1.0乃至50重量%含有させておくと大気
中に含まれる水分が封止充填剤7中に侵入して光半導体
素子Sやリード部材3及びボンディングワイヤ等の電気
的接続手段4に接触するのを有効に防止することがで
き、侵入する水分によって光半導体素子Sの電極やリー
ド部材3、或いはボンディングワイヤ等の電気的接続手
段4に酸化腐蝕が発生することはなく、光半導体素子S
を常に正常、かつ安定に作動させることが可能となる。
従って、前記枠部2を有する基体1はその内部に、表面
に半径が10乃至100オングストロームの細孔を有す
る吸湿材を1乃至50重量%含有させておくことが好ま
しい。
When the sealing filler 7 contains 1.0 to 50% by weight of a hygroscopic material having pores having a radius of 10 to 100 angstroms on its surface, moisture contained in the atmosphere is reduced. Invasion into the sealing filler 7 and contact with the optical semiconductor element S, the lead member 3, and the electrical connection means 4 such as a bonding wire can be effectively prevented. Oxidative corrosion does not occur in the electrical connection means 4 such as electrodes, lead members 3 or bonding wires, and the optical semiconductor element S
Can always be operated normally and stably.
Therefore, it is preferable that the base 1 having the frame portion 2 contains 1 to 50% by weight of a hygroscopic material having pores having a radius of 10 to 100 angstroms on its surface.

【0028】前記封止充填剤7に含有される吸湿材は例
えば、表面に半径が10乃至100オングストロームの
細孔を有する球状シリカ粒子から成り、封止充填剤7と
なるエポキシ樹脂前駆体に予め所定量添加しておくこと
によって封止充填体7中に含有される。
The hygroscopic material contained in the sealing filler 7 is composed of, for example, spherical silica particles having pores having a radius of 10 to 100 angstroms on the surface. By adding a predetermined amount, it is contained in the sealing filling 7.

【0029】前記封止充填剤7に含有される吸湿材はそ
の表面の細孔半径が10オングストローム未満であると
封止充填剤7に侵入した水分を吸湿材に完全に吸着させ
ることが困難となり、また100オングストロームを超
えると吸湿材の比重が軽くなり、吸湿材を封止充填剤7
の全体に分散含有させるのが困難となる。従って、前記
封止充填剤7の内部に吸湿材を含有させておく場合、吸
湿材表面の細孔半径は10オングストローム〜100オ
ングストロームの範囲としておくことが好ましい。
If the surface of the moisture absorbing material contained in the sealing filler 7 has a pore radius of less than 10 angstroms, it is difficult to completely adsorb the moisture that has entered the sealing filler 7 to the moisture absorbing material. If it exceeds 100 angstroms, the specific gravity of the hygroscopic material becomes light, and the hygroscopic material becomes
, It is difficult to disperse and contain the whole. Therefore, when a moisture absorbing material is contained in the sealing filler 7, the pore radius of the surface of the moisture absorbing material is preferably set in a range of 10 Å to 100 Å.

【0030】前記封止充填剤7に含有される吸湿材はま
たその含有量が1重量%未満であると封止充填剤7にお
ける水分の侵入通過を有効に阻止することができず、ま
た50重量%を超えるとエポキシ樹脂前駆体の流れ性が
悪くなって光半導体素子S等を完全、緻密に被覆するこ
とができなくなる危険性がある。従って、前記封止充填
剤7の内部に吸湿材を含有させておく場合、吸湿材の含
有量は1乃至50重量%の範囲としておくことが好まし
い。
If the content of the hygroscopic material contained in the sealing filler 7 is less than 1% by weight, it is impossible to effectively prevent the penetration and passage of moisture in the sealing filler 7, If the content is more than 10% by weight, the flowability of the epoxy resin precursor deteriorates, and there is a risk that the optical semiconductor element S or the like cannot be completely and densely coated. Therefore, when a moisture absorbing material is contained in the sealing filler 7, the content of the moisture absorbing material is preferably set in the range of 1 to 50% by weight.

【0031】かくして本発明の光半導体装置によれば、
光半導体素子Sにリード部材3を介して外部電気回路か
ら供給される電気信号を印加し、光半導体素子Sに光を
励起させるとともに該励起した光を光ファイバー6に伝
達させることによって、或いは光ファイバー6を伝達す
る光を光半導体素子Sに照射し、光半導体素子Sに照射
された光に対応する電気信号を発生させるとともに該発
生した電気信号をリード部材3を介し取り出すことによ
って光通信に使用される。
Thus, according to the optical semiconductor device of the present invention,
By applying an electric signal supplied from an external electric circuit to the optical semiconductor element S via the lead member 3 to excite the optical semiconductor element S and transmit the excited light to the optical fiber 6, or The optical semiconductor element S is used for optical communication by irradiating the optical semiconductor element S with light transmitting the light, generating an electric signal corresponding to the light irradiated on the optical semiconductor element S, and extracting the generated electric signal through the lead member 3. You.

【0032】なお、本発明は上述の実施例に限定される
ものではなく、本発明の要旨を逸脱しない範囲であれば
種々の変更は可能である。
The present invention is not limited to the above-described embodiment, and various changes can be made without departing from the scope of the present invention.

【0033】[0033]

【発明の効果】本発明の光半導体装置によれば、光半導
体素子を気密に封止する封止充填剤の0〜300℃にお
ける平均熱膨張係数を0.7×10-5/℃〜1.1×1
-5/℃とし、光半導体素子の熱膨張係数に近似させた
ことから光半導体素子を封止充填剤で気密に封止した
後、光半導体素子と封止充填剤とに熱が作用しても両者
間に両者の熱膨張係数の相違に起因する熱応力が発生
し、該発生した熱応力によって光半導体素子が破損した
り、光半導体素子と封止充填剤との間に剥離が生じたり
することはなく、これによって光半導体素子の気密封止
が完全なり、光半導体素子を長期間にわたり正常、かつ
安定に作動させることが可能となる。
According to the optical semiconductor device of the present invention, the sealing filler for hermetically sealing the optical semiconductor element has an average coefficient of thermal expansion at 0.7 to 10-5 / ° C. .1 × 1
After the optical semiconductor element was hermetically sealed with a sealing filler, heat was applied to the optical semiconductor element and the sealing filler because the coefficient of thermal expansion was set to 0 −5 / ° C. and approximated to the thermal expansion coefficient of the optical semiconductor element. However, a thermal stress is generated between the two due to a difference in thermal expansion coefficient between the two, and the generated thermal stress damages the optical semiconductor element or causes separation between the optical semiconductor element and the sealing filler. Therefore, the hermetic sealing of the optical semiconductor element is completed, and the optical semiconductor element can be operated normally and stably for a long period of time.

【0034】また本発明の光半導体装置によれば、封止
充填剤中に、表面に半径が10乃至100オングストロ
ームの細孔を有する吸湿剤を1乃至50重量%含有させ
ておくと、大気中に含まれる水分が封止充填剤に侵入し
てもその侵入した水分は吸湿材に効率的に吸着されて光
半導体素子に接触することは殆どなく、その結果、侵入
した水分によって光半導体素子の電極等に酸化腐蝕を発
生することもなく、光半導体素子を常に正常、かつ安定
に作動させることが可能となる。
Further, according to the optical semiconductor device of the present invention, when the sealing filler contains 1 to 50% by weight of a moisture absorbent having pores having a radius of 10 to 100 Å on the surface, it is possible to obtain Even if the moisture contained in the semiconductor material enters the sealing filler, the infiltrated moisture is efficiently adsorbed by the hygroscopic material and hardly comes into contact with the optical semiconductor element. It is possible to always operate the optical semiconductor element normally and stably without causing oxidative corrosion on the electrodes and the like.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の光半導体装置の一実施例を示す断面図
である。
FIG. 1 is a sectional view showing one embodiment of an optical semiconductor device of the present invention.

【符号の説明】[Explanation of symbols]

1・・・基体 1a・・載置部 2・・・枠部 3・・・リード部材 5・・・貫通穴 6・・・光ファイバー 7・・・封止充填剤 S・・・光半導体素子 DESCRIPTION OF SYMBOLS 1 ... Base 1a ... Mounting part 2 ... Frame part 3 ... Lead member 5 ... Through-hole 6 ... Optical fiber 7 ... Sealing filler S ... Optical semiconductor element

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】上面中央部に光半導体素子の載置部が、外
周部に前記載置部を囲繞する枠部を設けた基体と、該基
体の載置部に接着固定された光半導体素子と、前記枠部
を貫通して取着され、一端が光半導体素子と対向する光
ファイバーと、前記枠部の内側に充填され、光半導体素
子を封止する封止充填剤とから成る光半導体装置であっ
て、前記封止充填剤は0〜300℃の平均熱膨張係数が
0.7×10-5/℃〜1.1×10-5/℃である有機樹
脂から成ることを特徴とする光半導体装置。
An optical semiconductor device in which a mounting portion of an optical semiconductor element is provided at a central portion of an upper surface, a frame having an outer peripheral portion provided with a frame surrounding the mounting portion, and an optical semiconductor device adhesively fixed to the mounting portion of the substrate. And an optical fiber attached through the frame portion, one end of which faces the optical semiconductor element, and a sealing filler filled inside the frame portion and sealing the optical semiconductor element. a is, the sealing filler is characterized in that the average thermal expansion coefficient of 0 to 300 ° C. consists 0.7 × 10 -5 /℃~1.1×10 -5 / ℃ at which the organic resin Optical semiconductor device.
【請求項2】前記封止充填剤中に、表面に半径が10乃
至100オングストロームの細孔を有する吸湿剤が1乃
至50重量%含有されていることを特徴とする請求項1
記載の光半導体装置。
2. The sealing filler according to claim 1, further comprising 1 to 50% by weight of a moisture absorbent having pores having a radius of 10 to 100 Å on the surface.
The optical semiconductor device according to the above.
JP9227882A 1997-08-25 1997-08-25 Optical semiconductor device Pending JPH1164690A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9227882A JPH1164690A (en) 1997-08-25 1997-08-25 Optical semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9227882A JPH1164690A (en) 1997-08-25 1997-08-25 Optical semiconductor device

Publications (1)

Publication Number Publication Date
JPH1164690A true JPH1164690A (en) 1999-03-05

Family

ID=16867825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9227882A Pending JPH1164690A (en) 1997-08-25 1997-08-25 Optical semiconductor device

Country Status (1)

Country Link
JP (1) JPH1164690A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006090846A1 (en) * 2005-02-24 2006-08-31 Kyocera Corporation Faraday rotator mirror and method for fabricating same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006090846A1 (en) * 2005-02-24 2006-08-31 Kyocera Corporation Faraday rotator mirror and method for fabricating same
US7924493B2 (en) 2005-02-24 2011-04-12 Kyocera Corporation Faraday rotator mirror and method for manufacturing the same

Similar Documents

Publication Publication Date Title
JPH1164690A (en) Optical semiconductor device
JP3660790B2 (en) Optical semiconductor element storage package
JP3443522B2 (en) Optical semiconductor element storage package
JP3677377B2 (en) Optical semiconductor element storage package
JP3663282B2 (en) Optical semiconductor element storage package
JP2746826B2 (en) Electronic component storage package
JP2724079B2 (en) Package for storing semiconductor elements
JP2828553B2 (en) Semiconductor device
JP2003133461A (en) Package for containing optical semiconductor element
JPH1146041A (en) Package containing optical semiconductor element
JPH1195069A (en) Housing package for optical semiconductor element
JPH1164688A (en) Optical semiconductor element-housing packaging
JP3981256B2 (en) Optical semiconductor element storage package
JP2003304027A (en) Package for housing optical semiconductor element
JP3522132B2 (en) Optical semiconductor element storage package
JP3659451B2 (en) Optical semiconductor device
JP2003037196A (en) Package for housing optical semiconductor element
JPH1146042A (en) Optical semiconductor element containing package
JPH1174569A (en) Optical semiconductor device
JPH1146043A (en) Optical semiconductor element containing package
JP4360567B2 (en) Package for storing semiconductor elements
JP2004063928A (en) Optical semiconductor device
JP2003101123A (en) Package for storage of optical semiconductor element
JP3152856B2 (en) Electronic component storage container sealing method
JP2831219B2 (en) Semiconductor device

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20040511