JPH11326371A - Inspection jig - Google Patents

Inspection jig

Info

Publication number
JPH11326371A
JPH11326371A JP10133645A JP13364598A JPH11326371A JP H11326371 A JPH11326371 A JP H11326371A JP 10133645 A JP10133645 A JP 10133645A JP 13364598 A JP13364598 A JP 13364598A JP H11326371 A JPH11326371 A JP H11326371A
Authority
JP
Japan
Prior art keywords
electrode
inspection
test
layer
inspection jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10133645A
Other languages
Japanese (ja)
Inventor
Tatsuhiro Okano
達広 岡野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP10133645A priority Critical patent/JPH11326371A/en
Publication of JPH11326371A publication Critical patent/JPH11326371A/en
Pending legal-status Critical Current

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  • Measuring Leads Or Probes (AREA)
  • Testing Of Short-Circuits, Discontinuities, Leakage, Or Incorrect Line Connections (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an inspection jig which is free from positional diviation and contact failure between an inspecting electrode and an electrode as an object to be inspected as caused when a continuity test is conducted by depressing the inspecting electrode onto the object to be inspected. SOLUTION: An inspecting electrode 15 is formed on one surface of an insulation layer 13 while a wire layer 16 on the other surface thereof and the inspecting electrode 15 is electrically connected to the wire layer 16. A U-shaped cut 17 is made in the insulation layer 13 at the peripheral part of the inspecting electrode 15 containing a part of the wire layer 16 to make the inspecting electrode 15 easily move vertically.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置や配線
回路基板等の導通検査をするために用いられる検査治具
基板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inspection jig substrate used for inspecting continuity of a semiconductor device, a printed circuit board, and the like.

【0002】[0002]

【従来の技術】従来の半導体装置や配線回路基板の導通
検査は、図3に示すように絶縁層21の片面に検査電極
22が、もう一方の面に配線層23が形成された検査治
具を用いて、被検査体の電極部に検査治具の検査電極を
押圧することで導通検査を行っている。
2. Description of the Related Art In a conventional continuity test of a semiconductor device or a printed circuit board, as shown in FIG. 3, a test jig in which a test electrode 22 is formed on one surface of an insulating layer 21 and a wiring layer 23 is formed on another surface. Is used to perform a continuity test by pressing an inspection electrode of an inspection jig against an electrode portion of an object to be inspected.

【0003】[0003]

【発明が解決しようとする課題】従来の導通検査は、検
査治具の下面に弾性のあるゴムシートを敷いてその上か
ら被検査体を押圧し導通検査を行っている。従来の検査
治具構造では被検査体を押しつけた際に検査電極がゴム
シート側に沈み込み、接触抵抗が不均一になったり、検
査電極のピッチズレが発生したりする。また、検査電極
と被検査体との接触時に被検査体の電極に酸化膜が形成
されている場合には検査電極と被検査体との接触抵抗が
高く、検査不良が発生するという問題がある。
In the conventional continuity test, a continuity test is performed by placing an elastic rubber sheet on the lower surface of an inspection jig and pressing an object to be inspected from above. In the conventional inspection jig structure, when an object to be inspected is pressed, the inspection electrode sinks into the rubber sheet side, and the contact resistance becomes non-uniform or the pitch of the inspection electrode is shifted. Further, when an oxide film is formed on the electrode of the test object at the time of contact between the test electrode and the test object, there is a problem that the contact resistance between the test electrode and the test object is high, and a test failure occurs. .

【0004】本発明は上記問題点に鑑みなされたもの
で、検査電極を被検査体に押圧して導通検査を行う際被
検査体電極との位置ズレ及び接触不良を起こさない検査
治具を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and provides an inspection jig which does not cause positional displacement and poor contact with an electrode to be inspected when an inspection electrode is pressed against the object to be inspected to conduct a continuity inspection. The purpose is to do.

【0005】[0005]

【課題を解決するための手段】本発明において上記課題
を解決するため、絶縁層に検査電極と配線層が形成され
た検査治具において、前記検査電極周辺部の前記絶縁層
に切り込みを入れたことを特徴とする検査治具としたも
のである。検査電極周辺部の絶縁層に切り込みを入れた
構造の検査治具とすることで、検査電極が沈み込んだ際
に絶縁層の歪みが検査電極に伝わらず、絶縁層の歪みに
よる検査電極の位置ずれが発生しない。また、検査時の
検査電極の沈み込みが各検査電極で独立しているため、
検査電極と被検査体の電気的接触が確実にとれるように
なる。さらにまた、検査電極の周辺部の切り込みによっ
て、検査電極が沈み込む際に検査電極が傾きながら沈み
込み、被検査体の電極表面を擦るように接触するため電
極表面の酸化膜を突き破ることができ、接触不良が改善
される。
In order to solve the above-mentioned problems in the present invention, a cut is made in the insulating layer around the test electrode in a test jig having a test electrode and a wiring layer formed on the insulating layer. An inspection jig characterized by the above. By using an inspection jig with a structure in which a cut is made in the insulating layer around the test electrode, the strain of the insulating layer is not transmitted to the test electrode when the test electrode sinks, and the position of the test electrode due to the distortion of the insulating layer is reduced. No shift occurs. Also, since the subsidence of the test electrode during the test is independent for each test electrode,
Electrical contact between the test electrode and the device under test can be ensured. Furthermore, the notch in the periphery of the test electrode allows the test electrode to sink while tilting when the test electrode sinks, and to rub the electrode surface of the device under test so that it can break through the oxide film on the electrode surface. , Poor contact is improved.

【0006】[0006]

【発明の実施の形態】以下本発明の実施の形態につき説
明する。図1(a)に本発明の検査治具の部分模式斜視
図を、図1(b)に検査治具の部分模式斜視図をA−
A’線で切断した模式断面図を、図2(a)〜(f)に
本発明の検査治具の製造工程を示す模式断面図をそれぞ
れ示す。
Embodiments of the present invention will be described below. FIG. 1A is a partial schematic perspective view of the inspection jig of the present invention, and FIG. 1B is a partial schematic perspective view of the inspection jig.
FIGS. 2A to 2F are schematic cross-sectional views cut along the line A ′, and FIGS.

【0007】本発明の検査治具は図1(a)及び(b)
に示すように、絶縁層13の片面に検査電極15が、も
う一方の面に配線層16が形成されており、検査電極1
5と配線層16は電気的に接続されている。配線層16
の一部を含む検査電極15の周辺部の絶縁層13に
「コ」の字型の切り込み17を入れ、検査電極15が上
下に動き易い構造にしたものである。
The inspection jig of the present invention is shown in FIGS. 1 (a) and 1 (b).
As shown in FIG. 3, the inspection electrode 15 is formed on one surface of the insulating layer 13 and the wiring layer 16 is formed on the other surface.
5 and the wiring layer 16 are electrically connected. Wiring layer 16
Are formed in the insulating layer 13 around the test electrode 15 including a part of the test electrode 15 so that the test electrode 15 can easily move up and down.

【0008】このような構造の検査治具にすることによ
り、検査治具の下にゴム弾性シートを敷いてその上から
被検査体を押圧して導通検査を行う際、検査電極15は
ゴムシート側に沈み込む形になり、ここで検査電極15
の周辺部の絶縁層に切り込み17が入っているため、検
査電極15は押圧に応じて上下方向に動き、被検査体と
接触する検査電極15の先端は僅かではあるが前後方向
に動き被検査体の電極を擦るように接触する。そのた
め、被検査体の電極がアルミニウムの場合表面酸化膜を
突き破るような形で確実な電気的接触が得られる。
With the inspection jig having such a structure, when the rubber elastic sheet is laid under the inspection jig and the object to be inspected is pressed from above, the inspection electrode 15 is connected to the rubber sheet. The test electrode 15
Since the notch 17 is formed in the insulating layer in the peripheral portion of the inspection electrode 15, the inspection electrode 15 moves up and down in response to the pressing, and the tip of the inspection electrode 15 that comes into contact with the inspection object moves slightly in the front-back direction, but slightly. Rub the body electrodes. Therefore, when the electrode of the test object is aluminum, reliable electrical contact can be obtained in such a manner as to break through the surface oxide film.

【0009】以下、本発明の検査治具の形成法について
図2(a)〜(f)を用いて説明する。金属基板11上
に絶縁樹脂層12及び絶縁層13を形成する(図2
(a)参照)。ここで、金属基板11は導電性を有する
金属であれば使用可能であるが、ここでは製造プロセス
上ステンレス板が好ましい。絶縁樹脂層12は検査電極
14を電解めっきで形成するために使用されるもので、
絶縁性を有する樹脂であれば使用可能であるが、後工程
で最終的に剥離・除去されるため、電解めっきプロセス
には充分な耐性を有し、且つ剥離処理が容易な液状の感
光性レジスト又はドライフィルムレジストが好適であ
る。絶縁層13は検査治具の絶縁基板になるもので、絶
縁性、耐熱性及び機械的強度が求められ、ポリエステ
ル、エポキシ、アクリル及びポリイミド樹脂等が使用可
能であるが、ポリイミド樹脂が好適である。
Hereinafter, a method of forming the inspection jig of the present invention will be described with reference to FIGS. An insulating resin layer 12 and an insulating layer 13 are formed on a metal substrate 11.
(A)). Here, the metal substrate 11 can be used as long as it is a metal having conductivity, but a stainless steel plate is preferable here in terms of a manufacturing process. The insulating resin layer 12 is used for forming the inspection electrode 14 by electrolytic plating.
Any resin can be used as long as it has insulating properties. However, since it is finally stripped and removed in a later step, it is a liquid photosensitive resist that has sufficient resistance to the electrolytic plating process and is easy to strip. Alternatively, a dry film resist is suitable. The insulating layer 13 serves as an insulating substrate of the inspection jig, and is required to have insulation properties, heat resistance, and mechanical strength. Polyester, epoxy, acrylic, polyimide resin, and the like can be used, but polyimide resin is preferable. .

【0010】次に、絶縁樹脂層12及び絶縁層13に検
査電極を形成するための円錐台状の開口部14をエキシ
マレーザ加工にて形成する(図2(b)参照)。
Next, a truncated cone-shaped opening 14 for forming a test electrode is formed in the insulating resin layer 12 and the insulating layer 13 by excimer laser processing (see FIG. 2B).

【0011】次に、金属基板11をめっき電極にして電
解めっきにて開口部14に検査電極15を形成する(図
2(c)参照)。
Next, using the metal substrate 11 as a plating electrode, an inspection electrode 15 is formed in the opening 14 by electrolytic plating (see FIG. 2C).

【0012】次に、絶縁層13及び検査電極15上に導
体層を形成し、パターニング処理して配線層16を形成
する(図2(d)参照)。配線層16の形成には、フォ
トエッチング法やセミアディティブ法を用いることがで
きる。
Next, a conductor layer is formed on the insulating layer 13 and the inspection electrode 15 and patterned to form a wiring layer 16 (see FIG. 2D). For forming the wiring layer 16, a photoetching method or a semi-additive method can be used.

【0013】次に、検査電極15周辺部の絶縁層13に
エキシマレーザを用いて、10〜30μm幅の「コ」の
字型の切り込み17を形成する(図2(e)参照)。
「コ」の字型の切り込み17をエキシマレーザで加工す
る際絶縁樹脂層12の一部も加工されるがこの絶縁樹脂
層12は最終的に剥離・除去されるため特に問題になる
ようなことはない。
Next, a U-shaped cut 17 having a width of 10 to 30 μm is formed in the insulating layer 13 around the inspection electrode 15 by using an excimer laser (see FIG. 2E).
A part of the insulating resin layer 12 is also processed when the "U" -shaped notch 17 is processed by the excimer laser. However, since the insulating resin layer 12 is finally peeled and removed, there is a problem in particular. There is no.

【0014】次に、検査電極15、配線層16及び絶縁
層13に切り込み17が形成された上記基板を専用の剥
離液に浸漬し、金属基板11及び絶縁樹脂層12を剥離
・除去し、絶縁層13に検査電極15、配線層16及び
切り込み17が形成された本発明の検査治具を得ること
ができる(図2(f)参照)。ここで、配線層16側に
保護層を形成した後金属基板11及び絶縁樹脂層12を
剥離・除去し、検査治具とすることもできる。
Next, the substrate on which the cuts 17 are formed in the test electrode 15, the wiring layer 16 and the insulating layer 13 is immersed in a dedicated stripping solution, and the metal substrate 11 and the insulating resin layer 12 are stripped and removed. An inspection jig of the present invention in which the inspection electrode 15, the wiring layer 16, and the cutout 17 are formed in the layer 13 can be obtained (see FIG. 2F). Here, after forming the protective layer on the wiring layer 16 side, the metal substrate 11 and the insulating resin layer 12 may be peeled off and removed to form an inspection jig.

【0015】[0015]

【実施例】以下実施例により本発明を詳細に説明する。
まず、0.3mm厚のステンレス板からなる金属基板1
1上にドライフィルムレジスト(H−K850:日立化
成工業(株)製)をラミネートして絶縁樹脂層12を形
成した。さらに、25μm厚のポリイミドフィルムを貼
着し絶縁層13を形成した。
The present invention will be described in detail with reference to the following examples.
First, a metal substrate 1 made of a 0.3 mm thick stainless steel plate was used.
1 was laminated with a dry film resist (H-K850: manufactured by Hitachi Chemical Co., Ltd.) to form an insulating resin layer 12. Further, a polyimide film having a thickness of 25 μm was attached to form an insulating layer 13.

【0016】次に、絶縁層13及び絶縁樹脂層12の所
定位置にエキシマレーザ加工機を用いて40μmφの円
錐台状の開口部14を形成した。エキシマレーザの加工
条件は、エネルギ密度1.5J/cm2 であった。
Next, a truncated cone-shaped opening 14 having a diameter of 40 μm was formed at a predetermined position of the insulating layer 13 and the insulating resin layer 12 using an excimer laser processing machine. The processing condition of the excimer laser was an energy density of 1.5 J / cm 2 .

【0017】次に、金属基板11をめっき電極にして、
電解ニッケルめっきにて開口部14にニッケル金属から
なる検査電極15を形成した。
Next, the metal substrate 11 is used as a plating electrode,
An inspection electrode 15 made of nickel metal was formed in the opening 14 by electrolytic nickel plating.

【0018】次に、絶縁層13及び検査電極15上に銅
をスパッタリングして3000Å厚の薄膜導体層を形成
し、セミアディティブプロセスにて10〜15μm厚の
配線層16を形成した。
Next, copper was sputtered on the insulating layer 13 and the inspection electrode 15 to form a thin conductor layer having a thickness of 3000 mm, and a wiring layer 16 having a thickness of 10 to 15 μm was formed by a semi-additive process.

【0019】次に、検査電極15周辺部の絶縁層13に
エキシマレーザーを用いて「コ」の字型の30μm幅の
貫通孔を形成し、きり込み17を作製した。
Next, a U-shaped 30 μm wide through-hole was formed in the insulating layer 13 around the inspection electrode 15 using an excimer laser, and a cut 17 was formed.

【0020】次に、検査電極15、配線層16及び切り
込み17が形成された基板を10%の苛性ソーダ溶液に
浸せきし、金属基板11及び絶縁樹脂層12を剥離・除
去することで、絶縁層13に検査電極15、配線層16
及び切り込み17が形成された本発明の検査治具を作製
することができた。本発明の検査治具を用いてアルミニ
ウム電極を有する被検査体を検査した結果、安定した導
通接触が得られた。
Next, the substrate on which the inspection electrode 15, the wiring layer 16, and the cutout 17 are formed is immersed in a 10% caustic soda solution, and the metal substrate 11 and the insulating resin layer 12 are peeled off and removed. Inspection electrode 15, wiring layer 16
And the inspection jig of this invention in which the notch 17 was formed was able to be manufactured. As a result of inspecting the inspection object having the aluminum electrode using the inspection jig of the present invention, stable conductive contact was obtained.

【0021】[0021]

【発明の効果】本発明の検査治具を用いることにより、
検査時に検査電極の沈み込みによる絶縁層の歪が発生す
ることなく、検査電極の位置ずれのない検査をすること
ができる。さらに、検査電極周辺部に形成した切り込み
によって、検査電極と被検査体とが接触する際に検査電
極先端が被検査体の電極表面を擦るように沈み込むた
め、被検査体の電極表面の酸化膜を突き破り、導通接触
の安定性が向上した。
By using the inspection jig of the present invention,
Inspection without displacement of the inspection electrode can be performed without distortion of the insulating layer due to sinking of the inspection electrode during the inspection. Furthermore, the notch formed around the test electrode causes the tip of the test electrode to sink into the surface of the test object when the test electrode comes into contact with the test object, thereby oxidizing the electrode surface of the test object. Through the membrane, the stability of the conductive contact was improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は、本発明の検査治具の部分模式斜視図
を示す。(b)は、本発明の検査治具の部分模式斜視図
をA−A’線で切断した模式断面図を示す。
FIG. 1A is a partial schematic perspective view of an inspection jig of the present invention. (B) is a schematic cross-sectional view of a partial schematic perspective view of the inspection jig of the present invention, taken along line AA ′.

【図2】(a)〜(f)は、本発明の検査治具の製造工
程を工程順に示す模式断面図である。
FIGS. 2A to 2F are schematic cross-sectional views showing the steps of manufacturing the inspection jig of the present invention in the order of steps.

【図3】従来の検査治具の構成を示す模式断面図であ
る。
FIG. 3 is a schematic sectional view showing a configuration of a conventional inspection jig.

【符号の説明】[Explanation of symbols]

11……金属基板 12……絶縁樹脂層 13、21……絶縁層 14……開口部 15、22……検査電極 16、23……配線層 17……切り込み 11 Metal substrate 12 Insulating resin layer 13, 21 Insulating layer 14 Opening 15, 22 Inspection electrode 16, 23 Wiring layer 17 Notch

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】絶縁層に検査電極と配線層が形成された検
査治具において、前記検査電極周辺部の前記絶縁層に切
り込みを入れたことを特徴とする検査治具。
1. An inspection jig in which an inspection electrode and a wiring layer are formed on an insulating layer, wherein a cut is made in the insulating layer around the inspection electrode.
JP10133645A 1998-05-15 1998-05-15 Inspection jig Pending JPH11326371A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10133645A JPH11326371A (en) 1998-05-15 1998-05-15 Inspection jig

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10133645A JPH11326371A (en) 1998-05-15 1998-05-15 Inspection jig

Publications (1)

Publication Number Publication Date
JPH11326371A true JPH11326371A (en) 1999-11-26

Family

ID=15109660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10133645A Pending JPH11326371A (en) 1998-05-15 1998-05-15 Inspection jig

Country Status (1)

Country Link
JP (1) JPH11326371A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001249145A (en) * 1999-12-28 2001-09-14 Micronics Japan Co Ltd Probe card and method of manufacturing it
JP2010042500A (en) * 2008-08-12 2010-02-25 Samsung Electro-Mechanics Co Ltd Method of manufacturing microelectromechanical parts

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06123746A (en) * 1992-10-12 1994-05-06 Tokyo Seimitsu Co Ltd Probe card
JPH09281144A (en) * 1996-04-15 1997-10-31 Nec Corp Probe card and its manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06123746A (en) * 1992-10-12 1994-05-06 Tokyo Seimitsu Co Ltd Probe card
JPH09281144A (en) * 1996-04-15 1997-10-31 Nec Corp Probe card and its manufacture

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001249145A (en) * 1999-12-28 2001-09-14 Micronics Japan Co Ltd Probe card and method of manufacturing it
JP2010042500A (en) * 2008-08-12 2010-02-25 Samsung Electro-Mechanics Co Ltd Method of manufacturing microelectromechanical parts

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