JPH1131716A - Manufacture of semiconductor device and semiconductor chip - Google Patents

Manufacture of semiconductor device and semiconductor chip

Info

Publication number
JPH1131716A
JPH1131716A JP9186161A JP18616197A JPH1131716A JP H1131716 A JPH1131716 A JP H1131716A JP 9186161 A JP9186161 A JP 9186161A JP 18616197 A JP18616197 A JP 18616197A JP H1131716 A JPH1131716 A JP H1131716A
Authority
JP
Japan
Prior art keywords
semiconductor chip
wiring board
bump electrodes
bump
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9186161A
Other languages
Japanese (ja)
Inventor
Taku Kikuchi
卓 菊池
Seishi Imasu
誠士 今須
Ikuo Yoshida
育生 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9186161A priority Critical patent/JPH1131716A/en
Publication of JPH1131716A publication Critical patent/JPH1131716A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/741Apparatus for manufacturing means for bonding, e.g. connectors
    • H01L24/743Apparatus for manufacturing layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/17Structure, shape, material or disposition of the bump connectors after the connecting process of a plurality of bump connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/741Apparatus for manufacturing means for bonding, e.g. connectors
    • H01L2224/743Apparatus for manufacturing layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83192Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)
  • Die Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent reliability in connection between the electrode pad of a wiring board and the bump electrode of a semiconductor chip from being deteriorated due to voids remaining between the wiring board and the semiconductor chip. SOLUTION: A semiconductor chip 2 in which plural bump electrodes 4 are arranged on the circuit face in an array, extended from the central part to the surrounding part is prepared. Then, sheet-shaped adhesive 5 made of thermosetting resin is adhered to one surface of the wiring board 1. Afterwards, the semiconductor chip 2 is placed through the adhesive 5 on one surface of the wiring board 1 with the circuit face of the semiconductor chip 2 facing the surface of the wiring board. Then, the semiconductor chip 2 is pressed while being heated, and the bump electrode 4 of the semiconductor chip 2 is pressure-welded to an electrode pad 1A of the wiring board 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置に関
し、特に、配線基板の一表面上にフェースダウン方式で
半導体チップを実装する半導体装置に適用して有効な技
術に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to a technique effective when applied to a semiconductor device in which a semiconductor chip is mounted on one surface of a wiring board by a face-down method.

【0002】[0002]

【従来の技術】配線基板の一表面上にフェースダウン
(Face Down)方式で半導体チップを実装する実装技術
として、配線基板と半導体チップとの間に接着材を介在
して行う実装技術が開発されている。この実装技術は、
まず、回路形成面に複数のバンプ電極が配置された半導
体チップを準備する。次に、配線基板の一表面のチップ
塔載領域に、例えばエポキシ系の熱硬化性樹脂からなる
シート状の接着材を貼り付ける。次に、配線基板の一表
面に半導体チップの回路形成面を向い合わせた状態で、
配線基板の一表面のチップ塔載領域上に接着材を介在し
て半導体チップを載置する。次に、加熱しながら半導体
チップを押圧し、配線基板の電極パッドに半導体チップ
のバンプ電極を圧接する。この工程において、接着材
は、一旦溶融し、その後に硬化する。半導体チップは、
接着材の硬化によって配線基板に接着固定される。ま
た、半導体チップのバンプ電極は、接着材の熱収縮力及
び熱硬化収縮力等の圧縮力によって配線基板の電極パッ
ドに圧接された状態にて電気的にかつ機械的に接続され
る。これにより、配線基板の一表面上に半導体チップが
実装される。
2. Description of the Related Art Face-down on one surface of a wiring board
As a mounting technique for mounting a semiconductor chip by a (Face Down) method, a mounting technique for interposing an adhesive between a wiring board and a semiconductor chip has been developed. This mounting technology
First, a semiconductor chip having a plurality of bump electrodes arranged on a circuit forming surface is prepared. Next, a sheet-like adhesive made of, for example, an epoxy-based thermosetting resin is attached to the chip mounting area on one surface of the wiring board. Next, with the circuit forming surface of the semiconductor chip facing one surface of the wiring board,
The semiconductor chip is mounted on the chip mounting area on one surface of the wiring substrate with an adhesive interposed therebetween. Next, the semiconductor chip is pressed while being heated, and the bump electrodes of the semiconductor chip are pressed against the electrode pads of the wiring board. In this step, the adhesive temporarily melts and then hardens. Semiconductor chips are
The adhesive is fixed to the wiring board by the curing of the adhesive. Further, the bump electrodes of the semiconductor chip are electrically and mechanically connected in a state of being pressed against the electrode pads of the wiring board by a compressive force such as a heat shrinkage force and a thermosetting shrinkage force of the adhesive. Thereby, the semiconductor chip is mounted on one surface of the wiring board.

【0003】このようにして半導体チップの実装を行う
実装技術においては、配線基板と半導体チップとの間に
接着材が充填された構造となるので、配線基板と半導体
チップとの熱膨張係数の差によってバンプ電極に集中す
る熱応力を緩和することができる。また、配線基板に半
導体チップを実装した後、配線基板と半導体チップとの
間に樹脂を充填する必要がないので、低コスト化を図る
ことができる。従って、この実装技術は、配線基板の一
表面上にフェースダウン方式で半導体チップを実装する
パッケージ構造の半導体装置の製造や、配線基板の一表
面上にフェースダウン方式で複数の半導体チップを実装
するモジュール構造の半導体装置の製造に有効である。
[0003] In the mounting technique for mounting a semiconductor chip in this manner, since a structure is used in which an adhesive is filled between the wiring board and the semiconductor chip, the difference in thermal expansion coefficient between the wiring board and the semiconductor chip is obtained. Thereby, thermal stress concentrated on the bump electrode can be reduced. Further, after the semiconductor chip is mounted on the wiring board, it is not necessary to fill the space between the wiring board and the semiconductor chip with a resin, so that the cost can be reduced. Therefore, this mounting technique manufactures a semiconductor device having a package structure in which a semiconductor chip is mounted on one surface of a wiring board in a face-down manner, and mounts a plurality of semiconductor chips in a face-down manner on one surface of a wiring board. This is effective for manufacturing a semiconductor device having a module structure.

【0004】なお、前述の実装技術については、例え
ば、特開平4−345041号公報並びに特開平5−1
75280号公報に記載されている。
The above-mentioned mounting technology is disclosed in, for example, Japanese Patent Application Laid-Open Nos.
No. 75280.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、前述の
実装技術においては、以下の問題が生じる。
However, the following problems occur in the above-described mounting technology.

【0006】配線基板の一表面上に接着材を介在して載
置された半導体チップを押圧する際、接着材に空気の巻
き込みによるボイド(気泡欠陥)が発生する。半導体チッ
プの周辺部にて発生したボイドは、半導体チップの押圧
によって配線基板と半導体チップとの間から外部に押し
出されるが、半導体チップの中央部にて発生したボイド
は、半導体チップの周辺部に配置されたバンプ電極によ
って邪魔され、配線基板と半導体チップとの間に取り残
される。
[0006] When a semiconductor chip mounted on one surface of a wiring substrate with an adhesive interposed therebetween is pressed, voids (bubble defects) are generated due to entrainment of air in the adhesive. Voids generated in the peripheral portion of the semiconductor chip are pushed out from between the wiring board and the semiconductor chip by the pressure of the semiconductor chip, but voids generated in the central portion of the semiconductor chip are formed in the peripheral portion of the semiconductor chip. It is disturbed by the arranged bump electrodes and is left behind between the wiring board and the semiconductor chip.

【0007】このため、接着材に含まれている水分がボ
イド内に溜り、ボイド内に溜った水分によって配線基板
の電極パッドと半導体チップのバンプ電極との接続部に
腐食が生じ、配線基板の電極パッドと半導体チップのバ
ンプ電極との接続信頼性が低下する。
For this reason, the moisture contained in the adhesive material accumulates in the voids, and the moisture accumulated in the voids causes corrosion at the connection portions between the electrode pads of the wiring board and the bump electrodes of the semiconductor chip. The connection reliability between the electrode pads and the bump electrodes of the semiconductor chip is reduced.

【0008】また、半導体装置の環境試験である温度サ
イクル試験時の熱や実装基板に半導体装置を実装する実
装時の熱によってボイド内に溜った水分が気化膨張し、
配線基板の電極パッドと半導体チップのバンプ電極との
間に隙間が生じ、配線基板の電極パッドと半導体チップ
のバンプ電極との接続信頼性が低下する。
In addition, moisture accumulated in the voids evaporates and expands due to heat during a temperature cycle test, which is an environmental test of the semiconductor device, and heat during mounting of the semiconductor device on a mounting substrate.
A gap is formed between the electrode pad of the wiring board and the bump electrode of the semiconductor chip, and the connection reliability between the electrode pad of the wiring board and the bump electrode of the semiconductor chip is reduced.

【0009】また、配線基板と半導体チップとの熱膨張
係数の差によってバンプ電極に集中する熱応力の緩和効
果が低下し、バンプ電極に変形や亀裂が生じ、配線基板
の電極パッドと半導体チップのバンプ電極との接続信頼
性が低下する。
Also, the effect of reducing the thermal stress concentrated on the bump electrode is reduced due to the difference in the coefficient of thermal expansion between the wiring board and the semiconductor chip, so that the bump electrode is deformed or cracked, and the electrode pad of the wiring board and the semiconductor chip are not connected. The connection reliability with the bump electrode is reduced.

【0010】本発明の目的は、配線基板の電極パッドと
半導体チップのバンプ電極との接続信頼性を高めること
が可能な技術を提供することにある。
An object of the present invention is to provide a technique capable of improving the connection reliability between an electrode pad of a wiring board and a bump electrode of a semiconductor chip.

【0011】本発明の他の目的は、前記目的を達成し、
信頼性の高い半導体装置を提供することにある。
Another object of the present invention is to achieve the above object,
An object is to provide a highly reliable semiconductor device.

【0012】本発明の前記ならびにその他の目的と新規
な特徴は、本明細書の記述及び添付図面によって明らか
になるであろう。
The above and other objects and novel features of the present invention will become apparent from the description of the present specification and the accompanying drawings.

【0013】[0013]

【課題を解決するための手段】本願において開示される
発明のうち、代表的なものの概要を簡単に説明すれば、
下記のとおりである。
SUMMARY OF THE INVENTION Among the inventions disclosed in the present application, the outline of a representative one will be briefly described.
It is as follows.

【0014】半導体装置の製造方法において、回路形成
面にその中央部から周辺部に向って延在する配列で複数
のバンプ電極が配置された半導体チップを準備する工程
と、配線基板の一表面に熱硬化性樹脂からなるシート状
の接着材を貼り付ける工程と、前記配線基板の一表面に
前記半導体チップの回路形成面を向い合わせた状態で、
前記配線基板の一表面上に前記接着材を介在して前記半
導体チップを載置する工程と、加熱しながら前記半導体
チップを押圧し、前記配線基板の電極パッドに前記半導
体チップのバンプ電極を圧接する工程とを備える。
In the method of manufacturing a semiconductor device, a step of preparing a semiconductor chip having a plurality of bump electrodes arranged in an array extending from a central portion to a peripheral portion on a circuit forming surface; A step of attaching a sheet-like adhesive made of a thermosetting resin, and in a state where the circuit forming surface of the semiconductor chip faces one surface of the wiring board,
Placing the semiconductor chip on one surface of the wiring substrate with the adhesive interposed therebetween, pressing the semiconductor chip while heating, and pressing the bump electrode of the semiconductor chip against the electrode pad of the wiring substrate. And a step of performing.

【0015】上述した手段によれば、配線基板の一表面
上に接続材を介在して載置された半導体チップを押圧す
る際、半導体チップの中央部にて発生したボイドは、半
導体チップの中央部から周辺部に向って移動する。この
時、バンプ電極は半導体チップの中央部から周辺部に向
って延在する配列で配置されているので、半導体チップ
の中央部にて発生したボイドは、バンプ電極で邪魔され
ることなく、半導体チップの押圧によって配線基板と半
導体チップとの間から外部に押し出される。従って、配
線基板と半導体チップとの間にボイドが取り残されるこ
とはない。
According to the above-described means, when a semiconductor chip placed on one surface of a wiring board with a connecting member interposed therebetween is pressed, voids generated at the center of the semiconductor chip are removed from the center of the semiconductor chip. Move from the section toward the periphery. At this time, since the bump electrodes are arranged in an array extending from the central portion of the semiconductor chip toward the peripheral portion, voids generated in the central portion of the semiconductor chip are not obstructed by the bump electrodes, and The chip is pushed out from between the wiring substrate and the semiconductor chip by the pressing of the chip. Therefore, no void is left between the wiring board and the semiconductor chip.

【0016】この結果、接着材に含まれている水分がボ
イド内に溜り、ボイド内に溜った水分によって配線基板
の電極パッドと半導体チップのバンプ電極との接続部に
生じる腐食を防止できるので、配線基板の電極パッドと
半導体チップのバンプ電極との接続信頼性を高めること
ができる。
As a result, the moisture contained in the adhesive material accumulates in the voids, and the moisture accumulated in the voids can prevent corrosion generated at the connection between the electrode pad of the wiring board and the bump electrode of the semiconductor chip. The connection reliability between the electrode pads of the wiring board and the bump electrodes of the semiconductor chip can be improved.

【0017】また、半導体装置の環境試験である温度サ
イクル試験時の熱や実装基板に半導体装置を実装する実
装時の熱によってボイド内に溜った水分が気化膨張し、
配線基板の電極パッドと半導体チップのバンプ電極との
間に生じる隙間を防止できるので、配線基板の電極パッ
ドと半導体チップのバンプ電極との接続信頼性を高める
ことができる。
In addition, moisture accumulated in the voids evaporates and expands due to heat during a temperature cycle test, which is an environmental test of the semiconductor device, and heat during mounting of the semiconductor device on a mounting substrate.
Since a gap generated between the electrode pad of the wiring board and the bump electrode of the semiconductor chip can be prevented, the connection reliability between the electrode pad of the wiring board and the bump electrode of the semiconductor chip can be improved.

【0018】また、配線基板と半導体チップとの熱膨張
係数の差によってバンプ電極に集中する熱応力の緩和効
果を維持でき、バンプ電極の変形及び亀裂を防止できる
ので、配線基板の電極パッドと半導体チップのバンプ電
極との接続信頼性を高めることができる。
Further, the effect of reducing the thermal stress concentrated on the bump electrode can be maintained by the difference in the coefficient of thermal expansion between the wiring board and the semiconductor chip, and the deformation and cracking of the bump electrode can be prevented. The reliability of connection between the chip and the bump electrode can be improved.

【0019】また、配線基板の電極パッドと半導体チッ
プのバンプ電極との接続信頼性を高めることができるの
で、半導体装置の信頼性を高めることができる。
Further, since the connection reliability between the electrode pads of the wiring board and the bump electrodes of the semiconductor chip can be improved, the reliability of the semiconductor device can be improved.

【0020】[0020]

【発明の実施の形態】以下、図面を参照して本発明の実
施の形態を詳細に説明する。なお、発明の実施の形態を
説明するための全図において、同一機能を有するものは
同一符号を付け、その繰り返しの説明は省略する。
Embodiments of the present invention will be described below in detail with reference to the drawings. In all the drawings for describing the embodiments of the present invention, components having the same functions are denoted by the same reference numerals, and their repeated description will be omitted.

【0021】(実施形態1)本実施形態1は、配線基板
の一表面上にフェースダウン方式で半導体チップを実装
するパッケージ構造の半導体装置に本発明を適用した例
について説明する。
(Embodiment 1) Embodiment 1 describes an example in which the present invention is applied to a semiconductor device having a package structure in which a semiconductor chip is mounted on one surface of a wiring board by a face-down method.

【0022】図1は、本発明の実施形態1である半導体
装置の模式平面図であり、図2は、図1に示すA−A線
の位置で切った模式断面図である。
FIG. 1 is a schematic plan view of a semiconductor device according to Embodiment 1 of the present invention, and FIG. 2 is a schematic sectional view taken along the line AA shown in FIG.

【0023】図1及び図2に示すように、本実施形態の
半導体装置は、配線基板1の一表面上にフェースダウン
方式で半導体チップ2を実装したパッケージ構造で構成
されている。
As shown in FIGS. 1 and 2, the semiconductor device of the present embodiment has a package structure in which a semiconductor chip 2 is mounted on one surface of a wiring board 1 in a face-down manner.

【0024】前記配線基板1は、例えば、ガラス繊維に
エポキシ樹脂又はポリイミド樹脂を含浸させた樹脂基板
を多段に積み重ねて積層した多層配線構造の樹脂基板で
構成されている。この場合の配線基板1は、14〜18
×10~6[1/℃]程度の熱膨張係数を有する。本実施
形態の配線基板1の平面形状は、これに限定されない
が、例えば正方形状で構成されている。
The wiring board 1 is composed of, for example, a resin board having a multilayer wiring structure in which resin boards in which glass fibers are impregnated with an epoxy resin or a polyimide resin are stacked in multiple stages and laminated. In this case, the wiring board 1 has 14 to 18
It has a coefficient of thermal expansion of about × 10 to 6 [1 / ° C.]. The planar shape of the wiring board 1 of the present embodiment is not limited to this, but is, for example, a square shape.

【0025】前記配線基板1の一表面のチップ塔載面に
は複数の電極パッド1Aが配置されている。また、配線
基板1の一表面と対向するその裏面には、複数の電極パ
ッド1Bが配置されている。この電極パッド1A、1B
の夫々は、詳細に図示していないが、配線基板1の内部
配線を介して互いに電気的に接続されている。
A plurality of electrode pads 1A are disposed on the chip mounting surface on one surface of the wiring substrate 1. Further, a plurality of electrode pads 1B are arranged on the back surface opposite to the one surface of the wiring board 1. These electrode pads 1A, 1B
Are electrically connected to each other via the internal wiring of the wiring board 1, although not shown in detail.

【0026】前記配線基板1の裏面には複数のバンプ電
極6が配置されている。この複数のバンプ電極6の夫々
は、配線基板1の裏面に配置された複数の電極パッド1
Bの夫々の表面に固着され、電気的にかつ機械的に接続
されている。バンプ電極6は、例えばPb−Sn組成の
金属材で形成されている。
A plurality of bump electrodes 6 are arranged on the back surface of the wiring board 1. Each of the plurality of bump electrodes 6 is connected to a plurality of electrode pads 1 arranged on the back surface of the wiring board 1.
B is fixed to each surface and electrically and mechanically connected. The bump electrode 6 is formed of, for example, a metal material having a Pb-Sn composition.

【0027】前記半導体チップ2は、例えば、単結晶珪
素からなる半導体基板及びこの半導体基板上に形成され
た配線層を主体とする構造で構成されている。この場合
の半導体チップ2は、3.5×10~6[1/℃]程度の
熱膨張係数を有する。本実施形態の半導体チップ2の平
面形状は、これに限定されないが、例えば長方形状で構
成されている。
The semiconductor chip 2 has a structure mainly composed of, for example, a semiconductor substrate made of single crystal silicon and a wiring layer formed on the semiconductor substrate. The semiconductor chip 2 in this case has a coefficient of thermal expansion of about 3.5 × 10 to 6 [1 / ° C.]. The planar shape of the semiconductor chip 2 of the present embodiment is not limited to this, but is, for example, rectangular.

【0028】前記半導体チップ2には記憶回路システム
として例えばSRAM(tatic andom ccess em
ory)が塔載されている。また、半導体チップ2の回路形
成面(図2において下面)には、詳細に図示していない
が、複数の電極パッド2Aが配置されている。この複数
の電極パッド2Aの夫々は、SRAMを構成する素子に
電気的に接続されている。
[0028] The semiconductor in the chip 2, for example SRAM as a memory circuit system (S tatic R andom A ccess M em
ory) is on the tower. Although not shown in detail, a plurality of electrode pads 2A are arranged on the circuit formation surface (the lower surface in FIG. 2) of the semiconductor chip 2. Each of the plurality of electrode pads 2A is electrically connected to an element constituting the SRAM.

【0029】前記半導体チップ2は、その回路形成面を
配線基板1の一表面に向い合わせた状態で、配線基板1
の一表面のチップ塔載領域上に実装されている。即ち、
半導体チップ2は、フェースダウン方式で配線基板1の
一表面上に実装されている。また、前記半導体チップ2
は、配線基板1の一表面のチップ塔載領域に接着材5を
介在して接着固定されている。接着材5は、例えばエポ
キシ系の熱硬化性樹脂で形成されている。
The semiconductor chip 2 is mounted on the wiring board 1 with its circuit forming surface facing one surface of the wiring board 1.
Is mounted on the chip mounting area on one surface. That is,
The semiconductor chip 2 is mounted on one surface of the wiring board 1 in a face-down manner. In addition, the semiconductor chip 2
Are bonded and fixed to a chip mounting area on one surface of the wiring board 1 with an adhesive 5 interposed therebetween. The adhesive 5 is formed of, for example, an epoxy-based thermosetting resin.

【0030】前記半導体チップ2の回路形成面には、詳
細に図示していないが、複数のバンプ電極4が配置され
ている。複数のバンプ電極4の夫々は、半導体チップ2
の回路形成面に配置された複数の電極パッド2Aの夫々
の表面に固着され、電気的にかつ機械的に接続されてい
る。また、複数のバンプ電極4の夫々は、配線基板1の
一表面のチップ塔載領域に配置された複数の電極パッド
1Aの夫々の表面に圧接され、電気的にかつ機械的に接
続されている。このバンプ電極4と電極パッド1Aとの
圧接による接続は、接着材5の熱収縮力及び熱硬化収縮
力等の圧縮力によって行なわれている。
Although not shown in detail, a plurality of bump electrodes 4 are arranged on the circuit forming surface of the semiconductor chip 2. Each of the plurality of bump electrodes 4 is a semiconductor chip 2
Are fixed to the respective surfaces of the plurality of electrode pads 2A arranged on the circuit forming surface of the above, and are electrically and mechanically connected. Further, each of the plurality of bump electrodes 4 is pressed into contact with each of the surfaces of the plurality of electrode pads 1A disposed in the chip mounting area on one surface of the wiring substrate 1, and is electrically and mechanically connected. . The connection between the bump electrode 4 and the electrode pad 1A by pressure contact is performed by a compressive force such as a heat shrinkage force and a thermosetting shrinkage force of the adhesive 5.

【0031】前記バンプ電極4は、これに限定されない
が、例えばボールボンディング法によって形成されたス
タッドバンプ構造で構成されている。ボールボンディン
グ法は、Auワイヤの先端部に形成されたボールを半導
体チップの電極パッドに熱圧着し、その後、ボールの部
分からAuワイヤを切断してバンプ電極を形成する方法
である。
The bump electrode 4 has, for example, but is not limited to, a stud bump structure formed by a ball bonding method. The ball bonding method is a method of thermocompression bonding a ball formed at the tip of an Au wire to an electrode pad of a semiconductor chip, and thereafter cutting the Au wire from the ball portion to form a bump electrode.

【0032】前記複数のバンプ電極4は、図3(バンプ
電極の配置を示す半導体チップの模式平面図)示すよう
に、半導体チップ2の回路形成面の中央部からその周辺
部に向って延在する配列で配置されている。本実施形態
において、複数のバンプ電極4は、これに限定されない
が、半導体チップ2の長辺方向の中心線に沿う配列で一
文字状に配置されている。また、複数のバンプ電極4
は、半導体チップ2の回路形成面の中央部からその周辺
部に向って等ピッチで配置されている。即ち、複数のバ
ンプ電極4は、半導体チップ2の回路形成面の中央部か
らその周辺部に向って放射状に配置されている。
As shown in FIG. 3 (a schematic plan view of a semiconductor chip showing the arrangement of the bump electrodes), the plurality of bump electrodes 4 extend from the center of the circuit forming surface of the semiconductor chip 2 to the periphery thereof. They are arranged in an array. In the present embodiment, the plurality of bump electrodes 4 are arranged in a single character in an array along the center line in the long side direction of the semiconductor chip 2, although not limited thereto. In addition, a plurality of bump electrodes 4
Are arranged at an equal pitch from the center of the circuit forming surface of the semiconductor chip 2 to the periphery thereof. That is, the plurality of bump electrodes 4 are radially arranged from the center of the circuit forming surface of the semiconductor chip 2 to the periphery thereof.

【0033】次に、前記半導体装置の製造方法について
図4及び図5(製造方法を説明するための模式断面図)を
用いて説明する。
Next, a method of manufacturing the semiconductor device will be described with reference to FIGS. 4 and 5 (schematic sectional views for explaining the manufacturing method).

【0034】まず、図3に示す半導体チップ2を準備す
る。
First, the semiconductor chip 2 shown in FIG. 3 is prepared.

【0035】次に、図4に示すように、配線基板1の一
表面のチップ塔載領域に、例えばエポキシ系の熱硬化性
樹脂からなるシート状の接着材5を貼り付ける。シート
状の接着材5としては、半導体チップ2の外形サイズに
合わせて適切に切断されたものを用いる。
Next, as shown in FIG. 4, a sheet-like adhesive material 5 made of, for example, an epoxy-based thermosetting resin is attached to the chip mounting area on one surface of the wiring board 1. As the sheet-like adhesive 5, a material that is appropriately cut in accordance with the outer size of the semiconductor chip 2 is used.

【0036】次に、前記配線基板1の一表面に半導体チ
ップ2の回路形成面を向かい合わせた状態で、配線基板
1の一表面上に接着材5を介在して半導体チップ2を載
置する。
Next, the semiconductor chip 2 is mounted on one surface of the wiring board 1 with an adhesive 5 interposed therebetween, with the circuit forming surface of the semiconductor chip 2 facing one surface of the wiring board 1. .

【0037】次に、加熱しながら前記半導体チップ2を
配線基板1に向って押圧し、図5に示すように、配線基
板1の電極パッド1Aに半導体チップ2のバンプ電極4
を圧接する。この工程において、接着材5は、一旦溶融
し、その後に硬化する。半導体チップ2は接着材5の溶
融及び硬化によって配線基板1に接着固定され、半導体
チップ2のバンプ電極5は接着材5の熱収縮力及び熱硬
化収縮力等の圧縮力によって配線基板の電極パッドに圧
接された状態にて電気的にかつ機械的に接続される。ま
た、この工程において、接着材5に空気の巻き込みによ
るボイド(気泡欠陥)が発生する。半導体チップ2の周
辺部にて発生したボイドは、半導体チップ2の押圧によ
って配線基板1と半導体チップ2との間からその外部に
押し出される。一方、半導体チップ2の中央部にて発生
したボイドは、半導体チップ2の中央部からその周辺部
に向って移動する。この時、バンプ電極4は半導体チッ
プ2の中央部からその周辺部に向って延在する配列で配
置されているので、半導体チップ2の中央部にて発生し
たボイドは、バンプ電極4で邪魔(阻害)されることな
く、半導体チップ2の押圧によって配線基板1と半導体
チップ2との間からその外部に押し出される。従って、
配線基板1と半導体チップ2との間にボイドが取り残さ
れることはない。この工程により、配線基板1の一表面
上に半導体チップ2が実装される。
Next, the semiconductor chip 2 is pressed against the wiring board 1 while heating, and the bump electrodes 4 of the semiconductor chip 2 are applied to the electrode pads 1A of the wiring board 1 as shown in FIG.
Pressure contact. In this step, the adhesive 5 temporarily melts and then hardens. The semiconductor chip 2 is bonded and fixed to the wiring board 1 by melting and curing of the adhesive 5, and the bump electrodes 5 of the semiconductor chip 2 are compressed by the compressive force of the adhesive 5 such as the heat shrinking force and the thermosetting shrinking force. Electrically and mechanically in a state of being pressed against. Further, in this step, voids (bubble defects) are generated in the adhesive material 5 due to entrainment of air. The void generated in the peripheral portion of the semiconductor chip 2 is pushed out from between the wiring board 1 and the semiconductor chip 2 to the outside by the pressing of the semiconductor chip 2. On the other hand, the void generated at the center of the semiconductor chip 2 moves from the center of the semiconductor chip 2 toward the periphery. At this time, since the bump electrodes 4 are arranged in an array extending from the center of the semiconductor chip 2 toward the periphery thereof, voids generated at the center of the semiconductor chip 2 are obstructed by the bump electrodes 4 ( Without being hindered, the semiconductor chip 2 is pushed out of the space between the wiring board 1 and the semiconductor chip 2 by the pressing of the semiconductor chip 2. Therefore,
No void is left between the wiring board 1 and the semiconductor chip 2. Through this step, the semiconductor chip 2 is mounted on one surface of the wiring board 1.

【0038】次に、前記配線基板1の裏面に配置された
複数の電極パッド1Bの夫々の表面にバンプ電極6を固
着することにより、図1及び図2に示す半導体装置がほ
ぼ完成する。
Next, the semiconductor device shown in FIGS. 1 and 2 is almost completed by fixing the bump electrodes 6 to the respective surfaces of the plurality of electrode pads 1B arranged on the back surface of the wiring board 1.

【0039】この後、半導体装置は、環境試験である温
度サイクル試験が施され、製品として出荷される。製品
として出荷された半導体装置は、図6(実装状態を示す
要部模式断面図)に示すように、実装基板10の一表面
上に実装され、パーソナルコンピュータ等の電子機器に
組み込まれる。実装基板10への半導体装置の実装は、
熱処理を施してバンプ電極6を溶融し、実装基板10の
電極パッド10Aにバンプ電極6を接続することにより
行なわれる。
Thereafter, the semiconductor device is subjected to a temperature cycle test as an environmental test, and is shipped as a product. The semiconductor device shipped as a product is mounted on one surface of the mounting board 10 and incorporated in an electronic device such as a personal computer as shown in FIG. The mounting of the semiconductor device on the mounting board 10
The heat treatment is performed to melt the bump electrodes 6 and connect the bump electrodes 6 to the electrode pads 10A of the mounting substrate 10.

【0040】以上説明したように本実施形態によれば、
以下の効果が得られる。
As described above, according to the present embodiment,
The following effects can be obtained.

【0041】半導体装置の製造方法において、回路形成
面にその中央部から周辺部に向って延在する配列で複数
のバンプ電極4が配置された半導体チップ2を準備する
工程と、配線基板1の一表面に熱硬化性樹脂からなるシ
ート状の接着材5を貼り付ける工程と、前記配線基板1
の一表面に前記半導体チップ2の回路形成面を向い合わ
せた状態で、前記配線基板1の一表面上に前記接着材5
を介在して前記半導体チップ2を載置する工程と、加熱
しながら前記半導体チップ2を押圧し、前記配線基板1
の電極パッド1Aに前記半導体チップ2のバンプ電極4
を圧接する工程とを備える。
In the method of manufacturing a semiconductor device, a step of preparing a semiconductor chip 2 on which a plurality of bump electrodes 4 are arranged in an array extending from a central portion to a peripheral portion on a circuit forming surface; Attaching a sheet-like adhesive material 5 made of a thermosetting resin to one surface;
With the circuit forming surface of the semiconductor chip 2 facing one surface of the wiring board 1, the adhesive 5
Mounting the semiconductor chip 2 with the intermediary of the wiring board 1 and pressing the semiconductor chip 2 while heating.
Of the semiconductor chip 2 on the electrode pad 1A.
And pressing the same.

【0042】これにより、配線基板1の一表面上に接続
材5を介在して載置された半導体チップ2を押圧する
際、半導体チップ2の中央部にて発生したボイドは、半
導体チップ2の中央部から周辺部に向って移動する。こ
の時、バンプ電極4は半導体チップ2の中央部から周辺
部に向って延在する配列で配置されているので、半導体
チップ2の中央部にて発生したボイドは、バンプ電極4
で邪魔(阻害)されることなく、半導体チップ2の押圧に
よって配線基板1と半導体チップ2との間からその外部
に押し出される。従って、配線基板1と半導体チップ2
との間にボイドが取り残されることはない。
Accordingly, when the semiconductor chip 2 placed on one surface of the wiring board 1 with the connecting material 5 interposed therebetween is pressed, voids generated at the center of the semiconductor chip 2 are removed. Move from the center to the periphery. At this time, since the bump electrodes 4 are arranged in an array extending from the central portion of the semiconductor chip 2 toward the peripheral portion, voids generated in the central portion of the semiconductor chip 2
The semiconductor chip 2 is pushed out of the space between the wiring board 1 and the semiconductor chip 2 by the pressing of the semiconductor chip 2 without being disturbed (obstructed). Therefore, the wiring board 1 and the semiconductor chip 2
No void is left behind.

【0043】この結果、接着材4に含まれている水分が
ボイド内に溜り、ボイド内に溜った水分によって配線基
板1の電極パッド1Aと半導体チップ2のバンプ電極4
との接続部に生じる腐食を防止できるので、配線基板1
の電極パッド1Aと半導体チップ2のバンプ電極4との
接続信頼性を高めることができる。
As a result, the moisture contained in the adhesive 4 accumulates in the voids, and the moisture accumulated in the voids causes the electrode pads 1 A of the wiring board 1 and the bump electrodes 4 of the semiconductor chip 2.
Can prevent corrosion occurring at the connection portion with the wiring board 1
The connection reliability between the electrode pad 1A and the bump electrode 4 of the semiconductor chip 2 can be improved.

【0044】また、半導体装置の環境試験である温度サ
イクル試験時の熱や実装基板10に半導体装置を実装す
る実装時の熱によってボイド内に溜った水分が気化膨張
し、配線基板1の電極パッド1Aと半導体チップ2のバ
ンプ電極4との間に生じる隙間を防止できるので、配線
基板1の電極パッド1Aと半導体チップ2のバンプ電極
4との接続信頼性を高めることができる。
In addition, moisture accumulated in the voids evaporates and expands due to heat during a temperature cycle test, which is an environmental test of the semiconductor device, and heat during mounting of the semiconductor device on the mounting board 10, and the electrode pads of the wiring board 1 are expanded. Since the gap generated between 1A and the bump electrode 4 of the semiconductor chip 2 can be prevented, the connection reliability between the electrode pad 1A of the wiring board 1 and the bump electrode 4 of the semiconductor chip 2 can be improved.

【0045】また、配線基板1と半導体チップ2との熱
膨張係数の差によってバンプ電極4に集中する熱応力の
緩和効果を維持でき、バンプ電極4の変形及び亀裂を防
止できるので、配線基板1の電極パッド1Aと半導体チ
ップ2のバンプ電極4との接続信頼性を高めることがで
きる。
Also, the effect of reducing the thermal stress concentrated on the bump electrode 4 can be maintained by the difference in the coefficient of thermal expansion between the wiring board 1 and the semiconductor chip 2, and the deformation and cracking of the bump electrode 4 can be prevented. The connection reliability between the electrode pad 1A and the bump electrode 4 of the semiconductor chip 2 can be improved.

【0046】また、配線基板1の電極パッド1Aと半導
体チップ2のバンプ電極4との接続信頼性を高めること
ができるので、半導体装置の信頼性を高めることができ
る。
Further, since the connection reliability between the electrode pads 1A of the wiring board 1 and the bump electrodes 4 of the semiconductor chip 2 can be improved, the reliability of the semiconductor device can be improved.

【0047】なお、本実施形態では、複数のバンプ電極
4を一文字状に配置した例について説明したが、複数の
バンプ電極4は、図7−(A)に示すように、半導体チッ
プ2の短辺方向の中心線に沿う配列で一文字状に配置し
てもよい。また、図7−(B)に示すように、半導体チッ
プ2の中央部からその周辺部に向う配列で十字状に配置
してもよい。この場合、バンプ電極4の数を増加するこ
とができる。また、図7(C)に示すように、半導体チッ
プ2の中央部からその周辺部に向う配列でX字状に配置
してもよい。この場合、バンプ電極4の数を更に増加す
ることができる。また、図7−(D)に示すように、半導
体チップ2の中央部からその周辺部に向う配列で米字状
に配置してもよい。この場合、バンプ電極4の数を更に
増加することができる。また、半導体チップ2の中央部
からその周辺部に向って放射状に延在する配列であれ
ば、どのような形状で配置してもよい。
In this embodiment, an example in which the plurality of bump electrodes 4 are arranged in a single character has been described. However, as shown in FIG. They may be arranged in a single character in an arrangement along the center line in the side direction. Further, as shown in FIG. 7- (B), the semiconductor chips 2 may be arranged in a cross shape from the center of the semiconductor chip 2 toward the periphery thereof. In this case, the number of bump electrodes 4 can be increased. Further, as shown in FIG. 7C, the semiconductor chips 2 may be arranged in an X shape from the center to the periphery of the semiconductor chips 2. In this case, the number of bump electrodes 4 can be further increased. Further, as shown in FIG. 7- (D), the semiconductor chips 2 may be arranged in a U-shape from the center to the periphery thereof. In this case, the number of bump electrodes 4 can be further increased. The semiconductor chip 2 may be arranged in any shape as long as it extends radially from the center of the semiconductor chip 2 toward the periphery thereof.

【0048】また、本実施形態では、エポキシ系の熱硬
化性樹脂からなるシート状の接着材4を用いた例につい
て説明したが、例えばエポキシ系の熱硬化性樹脂に多数
の導電性粒子が混入された異方性導電膜(ACF:nis
otropic onductive ilm)からなる接着材を用いても
よい。また、熱硬化性樹脂からなる液状の接着材を用い
てもよい。この場合、接着材は配線基板1の一表面のチ
ップ塔載領域に塗布する。
In this embodiment, an example is described in which a sheet-like adhesive 4 made of an epoxy-based thermosetting resin is used. For example, a large number of conductive particles are mixed in an epoxy-based thermosetting resin. anisotropic conductive film (ACF: A nis
otropic C onductive F ilm) an adhesive may be used consisting of. Alternatively, a liquid adhesive made of a thermosetting resin may be used. In this case, the adhesive is applied to the chip mounting area on one surface of the wiring board 1.

【0049】また、本実施形態では、バンプ電極4をボ
ールボンディング法で形成した例について説明したが、
バンプ電極4はボール供給法で形成してもよい。
In this embodiment, the example in which the bump electrode 4 is formed by the ball bonding method has been described.
The bump electrodes 4 may be formed by a ball supply method.

【0050】(実施形態2)本実施形態2は、配線基板
の一表面上にフェースダウン方式で半導体チップを実装
するパッケージ構造の半導体装置に本発明を適用した例
について説明する。
(Embodiment 2) Embodiment 2 describes an example in which the present invention is applied to a semiconductor device having a package structure in which a semiconductor chip is mounted on one surface of a wiring board by a face-down method.

【0051】図8は、本発明の実施形態2である半導体
装置の模式平面図であり、図9は、図8に示すB−B線
の位置で切った模式断面図である。
FIG. 8 is a schematic plan view of the semiconductor device according to the second embodiment of the present invention, and FIG. 9 is a schematic sectional view taken along the line BB shown in FIG.

【0052】図8及び図9に示すように、本実施形態の
半導体装置は、配線基板1の一表面上にフェースダウン
方式で半導体チップ3を実装したパッケージ構造で構成
されている。
As shown in FIGS. 8 and 9, the semiconductor device of the present embodiment has a package structure in which a semiconductor chip 3 is mounted on one surface of a wiring board 1 in a face-down manner.

【0053】前記配線基板1は、例えば、ガラス繊維に
エポキシ樹脂又はポリイミド樹脂を含浸させた樹脂基板
を多段に積み重ねて積層した多層配線構造の樹脂基板で
構成されている。本実施形態の配線基板1の平面形状
は、これに限定されないが、例えば正方形状で構成され
ている。配線基板1の一表面のチップ塔載面には複数の
電極パッド1Aが配置され、また、配線基板1の一表面
と対向するその裏面には複数の電極パッド1Bが配置さ
れている。この複数の電極パッド1Bの夫々の表面には
バンプ電極6が電気的にかつ機械的に接続されている。
The wiring board 1 is composed of, for example, a resin board having a multilayer wiring structure in which resin boards in which glass fiber is impregnated with an epoxy resin or a polyimide resin are stacked and laminated in multiple stages. The planar shape of the wiring board 1 of the present embodiment is not limited to this, but is, for example, a square shape. A plurality of electrode pads 1A are arranged on the chip mounting surface on one surface of the wiring substrate 1, and a plurality of electrode pads 1B are arranged on the back surface opposite to the one surface of the wiring substrate 1. A bump electrode 6 is electrically and mechanically connected to each surface of the plurality of electrode pads 1B.

【0054】前記半導体チップ3は、例えば、単結晶珪
素からなる半導体基板及びこの半導体基板上に形成され
た配線層を主体とする構造で構成されている。本実施形
態の半導体チップ3の平面形状は、これに限定されない
が、例えば正方形状で構成されている。
The semiconductor chip 3 has a structure mainly composed of, for example, a semiconductor substrate made of single crystal silicon and a wiring layer formed on the semiconductor substrate. The planar shape of the semiconductor chip 3 of the present embodiment is not limited to this, but is, for example, a square shape.

【0055】前記半導体チップ2には例えば論理回路シ
ステムが塔載されている。また、半導体チップ3の回路
形成面(図2において下面)には、詳細に図示していない
が、複数の電極パッド3Aが配置されている。この複数
の電極パッド3Aの夫々は、論理回路システムを構成す
る素子に電気的に接続されている。
For example, a logic circuit system is mounted on the semiconductor chip 2. Although not shown in detail, a plurality of electrode pads 3A are arranged on the circuit formation surface (the lower surface in FIG. 2) of the semiconductor chip 3. Each of the plurality of electrode pads 3A is electrically connected to an element constituting a logic circuit system.

【0056】前記半導体チップ3は、その回路形成面を
配線基板1の一表面に向い合わせた状態で、配線基板1
の一表面のチップ塔載領域上に実装されている。また、
前記半導体チップ3は、配線基板1の一表面のチップ塔
載領域に接着材5を介在して接着固定されている。接着
材5は、例えばエポキシ系の熱硬化性樹脂で形成されて
いる。
The semiconductor chip 3 is mounted on the wiring board 1 with its circuit forming surface facing one surface of the wiring board 1.
Is mounted on the chip mounting area on one surface. Also,
The semiconductor chip 3 is bonded and fixed to a chip mounting area on one surface of the wiring board 1 with an adhesive 5 interposed therebetween. The adhesive 5 is formed of, for example, an epoxy-based thermosetting resin.

【0057】前記半導体チップ3の回路形成面には、詳
細に図示していないが、複数のバンプ電極4が配置され
ている。複数のバンプ電極4の夫々は、半導体チップ3
の回路形成面に配置された複数の電極パッド3Aの夫々
の表面に固着され、電気的にかつ機械的に接続されてい
る。また、複数のバンプ電極4の夫々は、配線基板1の
一表面のチップ塔載領域に配置された複数の電極パッド
1Aの夫々の表面に圧接され、電気的にかつ機械的に接
続されている。このバンプ電極4と電極パッド1Aとの
圧接による接続は、接着材5の熱収縮力及び熱硬化収縮
力等の圧縮力によって行なわれている。バンプ電極4
は、これに限定されないが、例えばボールボンディング
法によって形成されたスタッドバンプ構造で構成されて
いる。
Although not shown in detail, a plurality of bump electrodes 4 are arranged on the circuit forming surface of the semiconductor chip 3. Each of the plurality of bump electrodes 4 is a semiconductor chip 3
Are fixed to the respective surfaces of the plurality of electrode pads 3A arranged on the circuit formation surface of the above, and are electrically and mechanically connected. Further, each of the plurality of bump electrodes 4 is pressed into contact with each of the surfaces of the plurality of electrode pads 1A disposed in the chip mounting area on one surface of the wiring substrate 1, and is electrically and mechanically connected. . The connection between the bump electrode 4 and the electrode pad 1A by pressure contact is performed by a compressive force such as a heat shrinkage force and a thermosetting shrinkage force of the adhesive 5. Bump electrode 4
Although not limited to this, is constituted by a stud bump structure formed by, for example, a ball bonding method.

【0058】図9及び図10(バンプ電極の配置を示す
半導体チップの模式平面図)に示すように、前記複数の
バンプ電極4のうち、複数のバンプ電極4Aは、半導体
チップ3の中央部付近において行列状に配置されてい
る。また、複数のバンプ電極4のうち、複数のバンプ電
極4Bは、半導体チップ3の周辺部において、半導体チ
ップ3の外周囲に沿って配置されている。このバンプ電
極4Bの配列ピッチ2Pは、バンプ電極4Aの配列ピッ
チP1に比べて広くなっている。即ち、複数のバンプ電
極4は、半導体チップ3の中央部付近において密の状態
で配置され、半導体チップ3の周辺部分において疎の状
態で配置されている。
As shown in FIGS. 9 and 10 (schematic plan views of the semiconductor chip showing the arrangement of the bump electrodes), among the plurality of bump electrodes 4, the plurality of bump electrodes 4 A are located near the center of the semiconductor chip 3. Are arranged in a matrix. Further, among the plurality of bump electrodes 4, the plurality of bump electrodes 4 </ b> B are arranged along the outer periphery of the semiconductor chip 3 in the peripheral portion of the semiconductor chip 3. The arrangement pitch 2P of the bump electrodes 4B is wider than the arrangement pitch P1 of the bump electrodes 4A. That is, the plurality of bump electrodes 4 are densely arranged near the center of the semiconductor chip 3 and are sparsely arranged around the semiconductor chip 3.

【0059】次に、前記半導体装置の製造方法につい
て、図11及び図12(製造方法を説明するための模式
断面図)を用いて説明する。
Next, a method of manufacturing the semiconductor device will be described with reference to FIGS. 11 and 12 (schematic sectional views for explaining the manufacturing method).

【0060】まず、図10に示す半導体チップ3を準備
する。半導体チップ3の回路形成面の中央部付近には密
の状態で複数のバンプ電極4Aが配置され、その周辺部
には疎の状態で複数のバンプ電極4Bが配置されてい
る。
First, the semiconductor chip 3 shown in FIG. 10 is prepared. A plurality of bump electrodes 4A are arranged in a dense state near the center of the circuit forming surface of the semiconductor chip 3, and a plurality of bump electrodes 4B are arranged in a sparse state in the periphery thereof.

【0061】次に、図11に示すように、配線基板1の
一表面のチップ塔載領域に、例えばエポキシ系の熱硬化
性樹脂からなるシート状の接着材5を貼り付ける。シー
ト状の接着材5としては、半導体チップ2の外形サイズ
に合わせて適切に切断されたものを用いる。
Next, as shown in FIG. 11, a sheet-like adhesive material 5 made of, for example, an epoxy-based thermosetting resin is attached to the chip mounting area on one surface of the wiring board 1. As the sheet-like adhesive 5, a material that is appropriately cut in accordance with the outer size of the semiconductor chip 2 is used.

【0062】次に、前記配線基板1の一表面に半導体チ
ップ2の回路形成面を向かい合わせた状態で、配線基板
1の一表面上に接着材5を介在して半導体チップ3を載
置する。
Next, the semiconductor chip 3 is placed on one surface of the wiring board 1 with an adhesive 5 interposed therebetween, with the circuit forming surface of the semiconductor chip 2 facing one surface of the wiring board 1. .

【0063】次に、加熱しながら前記半導体チップ3を
配線基板1に向って押圧し、図12に示すように、配線
基板1の電極パッド1Aに半導体チップ3のバンプ電極
4を圧接する。この工程において、接着材5は、一旦溶
融し、その後に硬化する。半導体チップ3は接着材5の
溶融及び硬化によって配線基板1に接着固定され、半導
体チップ3のバンプ電極5は接着材5の熱収縮力及び熱
硬化収縮力等の圧縮力によって配線基板1の電極パッド
1Aに圧接された状態にて電気的にかつ機械的に接続さ
れる。また、この工程において、接着材5に空気の巻き
込みによるボイドが発生する。半導体チップ3の周辺部
にて発生したボイドは、半導体チップ3の押圧によって
配線基板1と半導体チップ2との間からその外部に押し
出される。一方、半導体チップ3の中央部付近にて発生
したボイドは、半導体チップ3の中央部付近からその周
辺部に向って移動する。この時、半導体チップ3の周辺
部に配置されたバンプ電極4Bの配列ピッチが広くなっ
ているので、半導体チップ2の中央部付近にて発生した
ボイドは、バンプ電極4Bで邪魔(阻害)されることな
く、半導体チップ2の押圧によって配線基板1と半導体
チップ2との間からその外部に押し出される。従って、
配線基板1と半導体チップ2との間にボイドが取り残さ
れることはない。この工程により、配線基板1の一表面
上に半導体チップ3が実装される。
Next, the semiconductor chip 3 is pressed toward the wiring board 1 while heating, and the bump electrodes 4 of the semiconductor chip 3 are pressed against the electrode pads 1A of the wiring board 1 as shown in FIG. In this step, the adhesive 5 temporarily melts and then hardens. The semiconductor chip 3 is bonded and fixed to the wiring board 1 by melting and curing the adhesive 5, and the bump electrodes 5 of the semiconductor chip 3 are electrically connected to the electrodes of the wiring board 1 by a compressive force such as a heat shrinking force and a thermosetting shrinking force of the adhesive 5. Electrically and mechanically connected in a state of being pressed against the pad 1A. In this step, a void is generated in the adhesive 5 due to the entrainment of air. The void generated in the peripheral portion of the semiconductor chip 3 is pushed out from between the wiring board 1 and the semiconductor chip 2 by the pressing of the semiconductor chip 3. On the other hand, the void generated near the center of the semiconductor chip 3 moves from the vicinity of the center of the semiconductor chip 3 toward the periphery. At this time, since the arrangement pitch of the bump electrodes 4B arranged in the peripheral portion of the semiconductor chip 3 is wide, voids generated near the central portion of the semiconductor chip 2 are obstructed (inhibited) by the bump electrodes 4B. Instead, the semiconductor chip 2 is pushed out of the space between the wiring board 1 and the semiconductor chip 2 by the pressing of the semiconductor chip 2. Therefore,
No void is left between the wiring board 1 and the semiconductor chip 2. Through this step, the semiconductor chip 3 is mounted on one surface of the wiring board 1.

【0064】次に、前記配線基板1の裏面に配置された
複数の電極パッド1Bの夫々の表面にバンプ電極6を固
着することにより、図8及び図9に示す半導体装置がほ
ぼ完成する。
Next, the semiconductor device shown in FIGS. 8 and 9 is almost completed by fixing the bump electrodes 6 on the respective surfaces of the plurality of electrode pads 1B arranged on the back surface of the wiring board 1.

【0065】この後、半導体装置は、環境試験である温
度サイクル試験が施され、製品として出荷される。製品
として出荷された半導体装置は、図13(実装状態を示
す要部模式断面図)に示すように、実装基板10の一表
面上に実装され、パーソナルコンピュータ等の電子機器
に組み込まれる。実装基板10への半導体装置の実装
は、熱処理を施してバンプ電極6を溶融し、実装基板1
0の電極パッド10Aにバンプ電極6を接続することに
より行なわれる。
Thereafter, the semiconductor device is subjected to a temperature cycle test as an environmental test, and is shipped as a product. The semiconductor device shipped as a product is mounted on one surface of the mounting board 10 as shown in FIG. 13 (a schematic cross-sectional view of a main part showing a mounting state) and is incorporated in an electronic device such as a personal computer. To mount the semiconductor device on the mounting substrate 10, heat treatment is performed to melt the bump electrodes 6, and
This is performed by connecting the bump electrode 6 to the 0 electrode pad 10A.

【0066】以上説明したように、本実施形態によれ
ば、半導体装置の製造において、配線基板1の一表面上
に接続材5を介在して載置された半導体チップ3を押圧
する際、半導体チップ3の周辺部に配置されたバンプ電
極4Bの配列ピッチが広くなっているので、半導体チッ
プ3の中央部付近にて発生したボイドは、バンプ電極4
Bで邪魔(阻害)されることなく、半導体チップ2の押圧
によって配線基板1と半導体チップ2との間からその外
部に押し出される。従って、配線基板1と半導体チップ
2との間にボイドが取り残されることはない。この結
果、前述の実施形態1と同様の効果が得られる。
As described above, according to the present embodiment, when the semiconductor chip 3 placed on one surface of the wiring board 1 with the connecting material 5 interposed therebetween is pressed in the manufacture of the semiconductor device, Since the arrangement pitch of the bump electrodes 4B arranged on the periphery of the chip 3 is wide, voids generated near the center of the semiconductor chip 3
The semiconductor chip 2 is pushed out of the space between the wiring board 1 and the semiconductor chip 2 by the pressing of the semiconductor chip 2 without being disturbed (obstructed) by B. Therefore, no void is left between the wiring board 1 and the semiconductor chip 2. As a result, the same effects as in the first embodiment can be obtained.

【0067】以上、本発明者によってなされた発明を、
前記実施形態に基づき具体的に説明したが、本発明は、
前記実施形態に限定されるものではなく、その要旨を逸
脱しない範囲において種々変更可能であることは勿論で
ある。
As described above, the invention made by the present inventor is:
Although specifically described based on the embodiment, the present invention
It is needless to say that the present invention is not limited to the above-described embodiment, but can be variously modified without departing from the scope of the invention.

【0068】例えば、本発明は、配線基板の一表面上に
フェースダウン方式で複数の半導体チップを実装し、1
つの回路システムを構成するモジュール(Module)構造
の半導体装置に適用できる。
For example, according to the present invention, a plurality of semiconductor chips are mounted on one surface of a wiring board in a face-down manner.
The present invention can be applied to a semiconductor device having a module structure that constitutes one circuit system.

【0069】[0069]

【発明の効果】本願において開示される発明のうち代表
的なものによって得られる効果を簡単に説明すれば、下
記のとおりである。
The effects obtained by the representative ones of the inventions disclosed in the present application will be briefly described as follows.

【0070】本発明によれば、配線基板の電極パッドと
半導体チップのバンプ電極との接続信頼性を高めること
ができる。
According to the present invention, the connection reliability between the electrode pads of the wiring board and the bump electrodes of the semiconductor chip can be improved.

【0071】また、本発明によれば、信頼性の高い半導
体装置を提供することができる。
Further, according to the present invention, a highly reliable semiconductor device can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施形態1である半導体装置の模式平
面図である。
FIG. 1 is a schematic plan view of a semiconductor device according to a first embodiment of the present invention.

【図2】図1に示すA−A線の位置で切った模式断面図
である。
FIG. 2 is a schematic cross-sectional view taken along a line AA shown in FIG.

【図3】バンプ電極の配置を示す半導体チップの模式平
面図である。
FIG. 3 is a schematic plan view of a semiconductor chip showing an arrangement of bump electrodes.

【図4】前記半導体装置の製造方法を説明するための模
式断面図である。
FIG. 4 is a schematic cross-sectional view for explaining a method for manufacturing the semiconductor device.

【図5】前記半導体装置の製造方法を説明するための模
式断面図である。
FIG. 5 is a schematic cross-sectional view for explaining the method for manufacturing the semiconductor device.

【図6】前記半導体装置を実装基板に実装した状態の要
部模式断面図である。
FIG. 6 is a schematic cross-sectional view of a main part in a state where the semiconductor device is mounted on a mounting board.

【図7】バンプ電極のその他の配置例を示す半導体チッ
プの模式平面図である。
FIG. 7 is a schematic plan view of a semiconductor chip showing another arrangement example of bump electrodes.

【図8】本発明の実施形態2である半導体装置の模式平
面図である。
FIG. 8 is a schematic plan view of a semiconductor device according to a second embodiment of the present invention.

【図9】図9に示すB−B線の位置で切った模式断面図
である。
9 is a schematic cross-sectional view taken along the line BB shown in FIG.

【図10】バンプ電極の配置を示す半導体チップの模式
平面図である。
FIG. 10 is a schematic plan view of a semiconductor chip showing an arrangement of bump electrodes.

【図11】前記半導体装置の製造方法を説明するための
模式断面図である。
FIG. 11 is a schematic cross-sectional view for explaining the method for manufacturing the semiconductor device.

【図12】前記半導体装置の製造方法を説明するための
模式断面図である。
FIG. 12 is a schematic cross-sectional view for explaining the method for manufacturing the semiconductor device.

【図13】前記半導体装置を実装基板に実装した状態の
要部模式断面図である。
FIG. 13 is a schematic cross-sectional view of a main part in a state where the semiconductor device is mounted on a mounting board.

【符号の説明】[Explanation of symbols]

1…配線基板、1A,1B…電極パッド、2…半導体チ
ップ、2A…電極パッド、3…半導体チップ、3A…電
極パッド、4…バンプ電極、5…接着材、6…バンプ電
極、10…実装基板、10A…電極パッド。
DESCRIPTION OF SYMBOLS 1 ... Wiring board, 1A, 1B ... electrode pad, 2 ... semiconductor chip, 2A ... electrode pad, 3 ... semiconductor chip, 3A ... electrode pad, 4 ... bump electrode, 5 ... adhesive, 6 ... bump electrode, 10 ... mounting Substrate, 10A ... electrode pad.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 回路形成面にその中央部から周辺部に向
って延在する配列で複数のバンプ電極が配置された半導
体チップを準備する工程と、配線基板の一表面に前記半
導体チップの回路形成面を向い合わせた状態で、前記配
線基板の一表面に接着材を介在して半導体チップを押圧
する工程を備えたことを特徴とする半導体装置の製造方
法。
A step of preparing a semiconductor chip having a plurality of bump electrodes arranged on a circuit forming surface in an array extending from a central portion to a peripheral portion thereof; and forming a circuit of the semiconductor chip on one surface of a wiring board. A method of manufacturing a semiconductor device, comprising: a step of pressing a semiconductor chip on one surface of the wiring substrate with an adhesive interposed therebetween with the forming surfaces facing each other.
【請求項2】 回路形成面にその中央部から周辺部に向
って延在する配列で複数のバンプ電極が配置された半導
体チップを準備する工程と、配線基板の一表面に熱硬化
性樹脂からなるシート状の接着材を貼り付ける工程と、
前記配線基板の一表面に前記半導体チップの回路形成面
を向い合わせた状態で、前記配線基板の一表面上に前記
接着材を介在して前記半導体チップを載置する工程と、
加熱しながら前記半導体チップを押圧し、前記配線基板
の電極パッドに前記半導体チップのバンプ電極を圧接す
る工程とを備えたことを特徴とする半導体装置の製造方
法。
2. A step of preparing a semiconductor chip on which a plurality of bump electrodes are arranged in an array extending from a central portion to a peripheral portion on a circuit forming surface; Attaching a sheet-like adhesive material,
Placing the semiconductor chip on one surface of the wiring substrate with the adhesive interposed therebetween, with the circuit forming surface of the semiconductor chip facing one surface of the wiring substrate;
Pressing the semiconductor chip while heating, and pressing a bump electrode of the semiconductor chip against an electrode pad of the wiring board.
【請求項3】 前記複数のバンプ電極は、一文字状又は
十文字状若しくはX字状に配置されていることを特徴と
する請求項1又は請求項2に記載の半導体装置の製造方
法。
3. The method for manufacturing a semiconductor device according to claim 1, wherein the plurality of bump electrodes are arranged in a single character, a cross, or an X shape.
【請求項4】 回路形成面の中央部付近に密の状態で複
数のバンプ電極が配置され、前記回路形成面の周辺部に
疎の状態で複数のバンプ電極が配置された半導体チップ
を準備する工程と、配線基板の一表面に前記半導体チッ
プの回路形成面を向い合わせた状態で、前記配線基板の
一表面に接着材を介在して前記半導体チップを押圧する
工程とを備えたことを特徴とする半導体装置の製造方
法。
4. A semiconductor chip in which a plurality of bump electrodes are densely arranged near a central portion of a circuit forming surface and a plurality of bump electrodes are arranged sparsely in a peripheral portion of the circuit forming surface is prepared. And a step of pressing the semiconductor chip with an adhesive interposed on one surface of the wiring board with the circuit forming surface of the semiconductor chip facing one surface of the wiring board. Manufacturing method of a semiconductor device.
【請求項5】 回路形成面の中央部付近に密の状態で複
数のバンプ電極が配置され、前記回路形成面の周辺部に
疎の状態で複数のバンプ電極が配置された半導体チップ
を準備する工程と、配線基板の一表面に熱硬化性樹脂か
らなるシート状の接着材を貼り付ける工程と、前記配線
基板の一表面に前記半導体チップの回路形成面を向い合
わせた状態で、前記配線基板の一表面上に前記接着材を
介在して前記半導体チップを載置する工程と、加熱しな
がら前記半導体チップを押圧し、前記配線基板の電極パ
ッドに前記半導体チップのバンプ電極を圧接する工程と
を備えたことを特徴とする半導体装置の製造方法。
5. A semiconductor chip in which a plurality of bump electrodes are densely arranged near a central portion of a circuit forming surface and a plurality of bump electrodes are arranged sparsely in a peripheral portion of the circuit forming surface is prepared. A step of attaching a sheet-like adhesive made of a thermosetting resin to one surface of the wiring board; and forming the circuit board of the semiconductor chip on one surface of the wiring board. Placing the semiconductor chip on one surface with the adhesive interposed therebetween, pressing the semiconductor chip while heating, and pressing a bump electrode of the semiconductor chip against an electrode pad of the wiring board. A method for manufacturing a semiconductor device, comprising:
【請求項6】 回路形成面にその中央部から周辺部に向
って延在する配列で複数のバンプ電極が配置されている
ことを特徴とする半導体チップ。
6. A semiconductor chip, wherein a plurality of bump electrodes are arranged on a circuit forming surface in an array extending from a central portion to a peripheral portion thereof.
【請求項7】 回路形成面の中央部付近に密の状態で複
数のバンプ電極が配置され、前記回路形成面の周辺部に
疎の状態で複数のバンプ電極が配置されていることを特
徴とする半導体チップ。
7. A plurality of bump electrodes are arranged in a dense state near a central portion of a circuit forming surface, and a plurality of bump electrodes are arranged in a sparse state in a peripheral portion of the circuit forming surface. Semiconductor chip.
JP9186161A 1997-07-11 1997-07-11 Manufacture of semiconductor device and semiconductor chip Pending JPH1131716A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9186161A JPH1131716A (en) 1997-07-11 1997-07-11 Manufacture of semiconductor device and semiconductor chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9186161A JPH1131716A (en) 1997-07-11 1997-07-11 Manufacture of semiconductor device and semiconductor chip

Publications (1)

Publication Number Publication Date
JPH1131716A true JPH1131716A (en) 1999-02-02

Family

ID=16183462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9186161A Pending JPH1131716A (en) 1997-07-11 1997-07-11 Manufacture of semiconductor device and semiconductor chip

Country Status (1)

Country Link
JP (1) JPH1131716A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001168505A (en) * 1999-12-09 2001-06-22 Matsushita Electric Ind Co Ltd Method of mounting work provided with bump
JP2007258755A (en) * 2007-06-27 2007-10-04 Sony Corp Semiconductor device
WO2009099145A1 (en) * 2008-02-08 2009-08-13 Hitachi Chemical Company, Ltd. Semiconductor chip and packaging method of semiconductor chip
EP2249381A1 (en) * 2008-02-19 2010-11-10 Liquid Design Systems, Inc. Semiconductor chip and semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001168505A (en) * 1999-12-09 2001-06-22 Matsushita Electric Ind Co Ltd Method of mounting work provided with bump
JP2007258755A (en) * 2007-06-27 2007-10-04 Sony Corp Semiconductor device
JP4618275B2 (en) * 2007-06-27 2011-01-26 ソニー株式会社 Semiconductor device
WO2009099145A1 (en) * 2008-02-08 2009-08-13 Hitachi Chemical Company, Ltd. Semiconductor chip and packaging method of semiconductor chip
EP2249381A1 (en) * 2008-02-19 2010-11-10 Liquid Design Systems, Inc. Semiconductor chip and semiconductor device
EP2249381A4 (en) * 2008-02-19 2012-11-21 Liquid Design Systems Inc Semiconductor chip and semiconductor device

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