JPH1131417A - Transparent conductive film and display device - Google Patents

Transparent conductive film and display device

Info

Publication number
JPH1131417A
JPH1131417A JP18287497A JP18287497A JPH1131417A JP H1131417 A JPH1131417 A JP H1131417A JP 18287497 A JP18287497 A JP 18287497A JP 18287497 A JP18287497 A JP 18287497A JP H1131417 A JPH1131417 A JP H1131417A
Authority
JP
Japan
Prior art keywords
transparent conductive
conductive film
platinum group
group metal
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18287497A
Other languages
Japanese (ja)
Other versions
JP3356968B2 (en
Inventor
Naoki Takamiya
直樹 高宮
Hideaki Matsuda
英明 松田
Kazumichi Mori
一倫 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Osaka Cement Co Ltd
Original Assignee
Sumitomo Osaka Cement Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Osaka Cement Co Ltd filed Critical Sumitomo Osaka Cement Co Ltd
Priority to JP18287497A priority Critical patent/JP3356968B2/en
Publication of JPH1131417A publication Critical patent/JPH1131417A/en
Application granted granted Critical
Publication of JP3356968B2 publication Critical patent/JP3356968B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve anti-static effect, electromagnetic shielding effect, salt water resistance and scratch resistance by coating a display surface with the coating, which includes platinum group metal fine grains having a specified mean grain diameter, and after drying it, burning it at a temperature within a specified range so as to form a transparent conductive layer, in which a part of the platinum group metal is converted to the platinum group metal oxide. SOLUTION: Ruthenium agveous sol, which includes fine grains of platinum group metal having a mean particle size of 50 nm or less, and isopropyl alcohol and ethyl alcohol are mixed. This mixture liquid is dispersed for adjustment by an ultrasonic dispersing device so as to obtain the transparent conductive film coating, by applying this coating on a display surface of a cathode-ray tube, and dried, and thereafter, the transparent thin film coating is further coated. This cathode-ray tube is put in a dryer, and burned at 300-1000 deg.C so as to expose a part or all of the platinum group metal, and a low-reflection transparent conductive film is thereby formed. High conductivity is thereby obtained, and charge preventing effect and electromagnetic shielding effect are improved, and transparency and durability are improved.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、特に陰極線管やプ
ラズマディスプレイなどの表示面に用いて透明で優れた
帯電防止効果と電磁波遮蔽効果とを有し、膜強度が大で
耐塩水性、耐酸化性、耐紫外線性などの耐久性も良好
で、しかも透過画像の色相が自然で視認性が良好な透明
導電膜、およびこの透明導電膜を表示面に形成した表示
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is particularly useful for a display surface of a cathode ray tube or a plasma display, etc., and has a transparent and excellent antistatic effect and electromagnetic wave shielding effect, a large film strength, salt water resistance and oxidation resistance. TECHNICAL FIELD The present invention relates to a transparent conductive film having good transparency and durability such as ultraviolet light resistance, and having a natural hue of a transmitted image and good visibility, and a display device having the transparent conductive film formed on a display surface.

【0002】[0002]

【従来の技術】現在、TVブラウン管やコンピュータの
ディスプレイなどとして用いられている陰極線管は、赤
色、緑色、青色に発光する蛍光面に電子ビームを射突さ
せることによって文字や画像を表示面に映し出すもので
あるから、この表示面に発生する静電気により埃が付着
して視認性が低下する他、電磁波を輻射して環境に影響
を及ぼす惧れがある。また最近、壁掛けテレビなどとし
ての応用が進められているプラズマディスプレイにおい
ても、静電気の発生や電磁波輻射の可能性が指摘されて
いる。
2. Description of the Related Art At present, a cathode ray tube used as a TV cathode ray tube or a computer display projects characters and images on a display surface by projecting an electron beam on a phosphor screen emitting red, green and blue light. Therefore, there is a fear that dust adheres to the display surface due to static electricity generated on the display surface to lower visibility, and that the environment is affected by radiating electromagnetic waves. Recently, it has been pointed out that a plasma display, which is being applied to a wall-mounted television or the like, may generate static electricity or emit electromagnetic waves.

【0003】これらの静電気の発生や電磁波輻射の問題
を解決するため、従来は、スパッタ法や蒸着法によって
表示装置の表示面上に透明な金属薄膜を形成するか、ま
たは銀、金などの微粒子を液中に分散させた塗布液を表
示面に塗布し、透明導電膜を形成することにより帯電防
止および/または電磁波遮蔽が図られている。また、表
示面上にこれらの薄膜を形成すると、界面反射が起こっ
て視認性が低下するので、これを防止するために、透明
導電膜の上層および/または下層に、これとは屈折率が
異なる透明薄膜を積層することも行われている。
[0003] In order to solve the problems of generation of static electricity and radiation of electromagnetic waves, conventionally, a transparent metal thin film is formed on a display surface of a display device by a sputtering method or a vapor deposition method, or fine particles such as silver and gold are used. Is applied to a display surface by dispersing the compound in a liquid, and a transparent conductive film is formed to achieve antistatic and / or electromagnetic wave shielding. In addition, when these thin films are formed on the display surface, interface reflection occurs and visibility is reduced. To prevent this, the upper and / or lower layers of the transparent conductive film have different refractive indices. Lamination of a transparent thin film is also performed.

【0004】例えば特開平8−77832号公報には、
電磁波遮蔽効果と反射防止効果に優れた透明導電膜とし
て、平均粒径2〜200nmの少なくとも銀を含む金属
微粒子による透明金属薄膜と、これと屈折率が異なる透
明被膜とからなるものが提案されている。
For example, Japanese Patent Application Laid-Open No. 8-77832 discloses that
As a transparent conductive film excellent in an electromagnetic wave shielding effect and an antireflection effect, a transparent metal thin film made of a metal fine particle containing at least silver having an average particle diameter of 2 to 200 nm and a transparent film having a refractive index different from that of the transparent metal thin film have been proposed. I have.

【0005】[0005]

【発明が解決しようとする課題】これらの方法によれ
ば、帯電防止と電磁波遮蔽効果は期待できるものの、金
属として銀を用いる場合はその光透過スペクトルに依存
して透過光の特定波長に吸収が生じ、導電膜が着色して
透過画像の色相が不自然に見えるという問題、膜が軟質
で擦りキズなどが発生し易いという問題、また銀は塩水
に曝されると変質し、導電膜の表面抵抗値が上昇し電磁
波遮蔽効果が低下するので、特に海岸など塩霧に曝され
る場所では耐久性が乏しいなどの問題があって実用化が
困難であった。本発明は、上記の課題を解決するために
なされたものであって、従ってその目的は、透明で優れ
た帯電防止効果と電磁波遮蔽効果とを有し、膜強度が大
で耐塩水性に代表される耐久性も良好であり、しかも透
過画像の色相が自然で視認性が良好な透明導電膜、およ
びこの透明導電膜が表示面に形成された表示装置を提供
することにある。
According to these methods, although antistatic and electromagnetic wave shielding effects can be expected, when silver is used as a metal, absorption at a specific wavelength of transmitted light depends on its light transmission spectrum. The problem is that the conductive film is colored and the hue of the transmitted image looks unnatural, the film is soft and scratches easily occur, and silver is deteriorated when exposed to salt water, and the surface of the conductive film is deteriorated. Since the resistance value is increased and the electromagnetic wave shielding effect is reduced, there has been a problem that durability is poor especially in a place exposed to salt fog, such as a beach, so that it has been difficult to put it to practical use. The present invention has been made in order to solve the above-described problems, and accordingly, has as its object a transparent and excellent antistatic effect and an electromagnetic wave shielding effect, and has a large film strength and is represented by salt water resistance. Another object of the present invention is to provide a transparent conductive film which has good durability, has a natural hue of a transmitted image, and has good visibility, and a display device having the transparent conductive film formed on a display surface.

【0006】[0006]

【課題を解決するための手段】上記の課題を解決するた
めに本発明は、請求項1において、平均粒径が50nm
以下の少なくとも白金族金属微粒子を含む塗料を塗布、
乾燥した後、300℃〜1000℃の範囲内の焼成温度
で焼付けて形成され、前記白金族金属の少なくとも一部
が白金族金属酸化物に転化してなる透明導電層を有する
透明導電膜を提供する。前記において、前記の透明導電
層は、白金族金属と白金族金属酸化物とを合わせて10
重量%以上含有してなることが好ましい。前記の白金族
金属は、少なくともルテニウムであることが好ましい。
また前記の白金族金属酸化物は、少なくとも酸化ルテニ
ウムであることが好ましい。前記において、透明導電層
の上層および/または下層には、前記透明導電層の屈折
率とは異なる屈折率を有する透明薄膜が1層以上設けら
れていることが好ましい。前記透明導電膜の最外層に
は、凹凸を有する透明薄膜が設けられていることが好ま
しい。前記透明導電膜の少なくとも何れか1層には、着
色材が含有されていることが好ましい。本発明はまた請
求項8において、前記の何れかの透明導電膜が表示面上
に形成された表示装置を提供する。
According to the present invention, in order to solve the above-mentioned problems, the present invention is characterized in that the average particle size is 50 nm.
Apply a paint containing at least the following platinum group metal fine particles,
After drying, a transparent conductive film having a transparent conductive layer formed by baking at a firing temperature in the range of 300 ° C. to 1000 ° C., wherein at least a part of the platinum group metal is converted to a platinum group metal oxide is provided. I do. In the above, the transparent conductive layer is made of a platinum group metal and a platinum group metal oxide in total of 10
Preferably, it is contained in an amount of at least% by weight. Preferably, the platinum group metal is at least ruthenium.
Preferably, the platinum group metal oxide is at least ruthenium oxide. In the above, it is preferable that one or more transparent thin films having a refractive index different from the refractive index of the transparent conductive layer are provided in the upper layer and / or the lower layer of the transparent conductive layer. It is preferable that a transparent thin film having irregularities is provided on the outermost layer of the transparent conductive film. It is preferable that at least one layer of the transparent conductive film contains a coloring material. The present invention also provides a display device according to claim 8, wherein any one of the transparent conductive films is formed on a display surface.

【0007】[0007]

【発明の実施の形態】以下、本発明の実施の形態を具体
的に説明する。本発明者らは、表示装置の表示面に用い
ることができ、透明で、優れた帯電防止効果と電磁波遮
蔽効果とを有し耐久性にも優れた透明導電膜を求めて鋭
意研究の結果、平均粒径が50nm以下のルテニウム、
パラジウム、白金、ロジウム、イリジウムまたはオスミ
ウムからなる白金族金属の微粒子を含む塗料を基材に塗
布し、乾燥した後、300℃〜1000℃の範囲内の焼
成温度で焼付けることによって上記の目的が達成できる
ことを見いだし本発明に到達した。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be specifically described below. The present inventors have conducted intensive research on a transparent conductive film that can be used on the display surface of a display device, is transparent, has an excellent antistatic effect and an electromagnetic wave shielding effect, and has excellent durability. Ruthenium having an average particle size of 50 nm or less,
The above object is achieved by applying a paint containing fine particles of a platinum group metal composed of palladium, platinum, rhodium, iridium or osmium to a substrate, drying and baking at a firing temperature in the range of 300 ° C to 1000 ° C. The inventors have found what can be achieved, and have reached the present invention.

【0008】平均粒径が50nm以下の前記白金族金属
微粒子を含む塗料を基材上に塗布し、乾燥後に300℃
〜1000℃の温度で焼き付けて成膜すると、金属微粒
子の粒径が小さいことから微粒子の総表面積が十分に大
きくなり、前記の焼付け温度で白金族金属の一部あるい
は全部が酸化物に転化する。白金族金属の酸化物は、耐
塩水性に代表される化学的安定性が白金族金属より更に
高いばかりでなく、酸化物が生成しても透明導電膜の導
電性が損なわれることはない。焼付け温度が300℃未
満では白金族金属酸化物の生成が不十分であり、100
0℃を越えると基材が損傷を受けたり膜成分が変質する
などの障害が生じる。
[0008] A paint containing the platinum group metal fine particles having an average particle size of 50 nm or less is applied on a substrate, dried and then dried at 300 ° C.
When the film is formed by baking at a temperature of up to 1000 ° C., the total surface area of the fine particles becomes sufficiently large because the particle size of the metal fine particles is small, and a part or all of the platinum group metal is converted to an oxide at the above-mentioned baking temperature. . The platinum group metal oxide has not only higher chemical stability typified by salt water resistance than the platinum group metal, but also does not impair the conductivity of the transparent conductive film even if the oxide is generated. If the baking temperature is lower than 300 ° C., the formation of the platinum group metal oxide is insufficient,
If the temperature exceeds 0 ° C., troubles such as damage to the base material and deterioration of the film components occur.

【0009】酸化物の生成と同時に、前記の温度範囲に
おける焼付けによって得られた透明導電膜中で、金属微
粒子の少なくとも一部は互いに融合し、少なくとも部分
的に連続した金属薄膜および/または金属酸化物薄膜を
形成する。このために本発明の透明導電膜にあっては、
単に金属微粒子が接触することによって得られるよりも
遥かに高い導電性が得られ、その結果として帯電防止効
果・電磁波遮蔽効果が優れているばかりでなく、透明性
が高く耐久性のある透明導電膜が得られる。白金族金属
微粒子の平均粒径が50nmを越えると、酸化物の生成
も粒子の融合も不十分となり、光吸収性が大となって十
分な導電性を得ようとすると透明性が失われ、実用性が
低下する。
At the same time as the formation of the oxide, in the transparent conductive film obtained by baking in the above-mentioned temperature range, at least a part of the metal fine particles fuse with each other to form an at least partially continuous metal thin film and / or metal oxide. An object thin film is formed. For this reason, in the transparent conductive film of the present invention,
A much higher conductivity than that obtained by simply contacting the metal fine particles is obtained, and as a result, not only the antistatic effect and the electromagnetic wave shielding effect are excellent, but also the transparent conductive film having high transparency and durability. Is obtained. When the average particle diameter of the platinum group metal fine particles exceeds 50 nm, formation of oxides and fusion of the particles become insufficient, and transparency is lost when light absorption is increased and sufficient conductivity is obtained. Practicality decreases.

【0010】前記の透明導電膜は、白金族金属と白金族
金属酸化物とを合わせて10重量%以上含有することが
好ましい。一般に、帯電防止機能に加えて電磁波遮蔽効
果を発揮させるために必要な透明導電膜の導電性能は下
記の式1によって表される。 S=50+10log(1/ρf)+1.7t√(f/ρ) …式1 式中、 S(dB) ;電磁波遮蔽効果、 ρ(Ω-cm) ;導電膜の体積固有抵抗、 f(MHz) ;電磁波周波数、そして t(cm) ;導電膜の膜厚 である。ここで膜厚tは、透明性確保の観点から1μm
(1×10-4cm)以下程度とすることが好ましいの
で、式1において膜厚tを含む項を無視すれば電磁波遮
蔽効果Sは近似的に下記の式2で表すことができる。 S=50+10log(1/ρf) …式2
The transparent conductive film preferably contains a platinum group metal and a platinum group metal oxide in a total amount of 10% by weight or more. In general, the conductive performance of a transparent conductive film required to exhibit an electromagnetic wave shielding effect in addition to an antistatic function is represented by the following equation 1. S = 50 + 10log (1 / ρf) + 1.7t√ (f / ρ) Formula 1 In the formula, S (dB): electromagnetic wave shielding effect, ρ (Ω-cm): Volume resistivity of the conductive film, f (MHz) Electromagnetic wave frequency, and t (cm); thickness of conductive film. Here, the thickness t is 1 μm from the viewpoint of securing transparency.
(1 × 10 −4 cm) or less, the electromagnetic wave shielding effect S can be approximately expressed by the following expression 2 if the term including the film thickness t is ignored in the expression 1. S = 50 + 10log (1 / ρf) Equation 2

【0011】ここで、S(dB)は、値が大きいほど電磁
波遮蔽効果が大きい。一般に、電磁波遮蔽効果は、S>
30dBであれば有効、更にS>60dBであれば優良とみ
なされる。また、規制対象となる電磁波の周波数は一般
に10kHz〜1000MHzの範囲とされるので、透明導電
膜の導電性としては、103Ω-cm以下の体積固有抵抗値
(ρ)が必要になる。すなわち、透明導電膜の体積固有
抵抗値(ρ)は、より低いほうが、より広範な周波数の
電磁波を有効に遮蔽することができることになる。この
条件を充たすために、透明導電膜には前記の白金族金属
と白金族金属酸化物とを合わせて10重量%以上含有さ
せる必要がある。この含有量が10重量%未満では導電
性が低下し、実質的な電磁波遮蔽効果を得ることが困難
になる。
Here, as the value of S (dB) increases, the electromagnetic wave shielding effect increases. Generally, the electromagnetic wave shielding effect is S>
If it is 30 dB, it is considered to be effective, and if S> 60 dB, it is considered to be excellent. In addition, since the frequency of the electromagnetic wave to be regulated is generally in the range of 10 kHz to 1000 MHz, the conductivity of the transparent conductive film needs to have a volume resistivity (ρ) of 10 3 Ω-cm or less. That is, the lower the volume specific resistance value (ρ) of the transparent conductive film, the more effectively electromagnetic waves of a wider range of frequencies can be shielded. In order to satisfy this condition, it is necessary that the transparent conductive film contains the platinum group metal and the platinum group metal oxide in a total amount of 10% by weight or more. If the content is less than 10% by weight, the conductivity is reduced, and it is difficult to obtain a substantial electromagnetic wave shielding effect.

【0012】前記の条件を充たした上で、透明導電膜の
膜厚は、透明性および反射防止性を考慮すると、200
nm以下とすることが好ましい。得られた透明導電膜
は、平滑な被膜であっても、凹凸状の網目構造を有する
被膜であってもよい。
After satisfying the above conditions, the thickness of the transparent conductive film should be 200 in consideration of transparency and antireflection properties.
nm or less is preferable. The obtained transparent conductive film may be a smooth film or a film having an uneven network structure.

【0013】本発明の透明導電膜に用いる白金族金属
は、ルテニウム、パラジウム、白金、ロジウム、イリジ
ウムまたはオスミウムの何れか1種、または2種以上で
あってよいが、特にルテニウムが好ましい。白金族金属
の中でもルテニウムは比較的安価であり、導電性が高
く、化学的安定性が高く、しかも成膜時には金属微粒子
が融合し易いので、高い透明性を維持しながら導電性を
いっそう向上させることができる。更にルテニウムは、
300℃〜1000℃の範囲内の焼付けによって容易に
RuO2 に転化する。このRuO2 は、耐塩水性に代表
される化学的安定性や導電性がきわめて高く、色相にお
いても400nm〜700nmの可視光域に特定波長の
光吸収ピークが存在しないため、透過画像が不自然に着
色しないという利点がある。更に、少なくとも酸化ルテ
ニウムに転化してなる透明導電膜は屈折率が最適化さ
れ、反射防止性能の面からも好ましいものとなる。透明
導電膜内でのルテニウムおよび酸化ルテニウムの存在状
態は、微粒子状でもよく、また粒子が互いに融合して少
なくとも部分的に連続した状態であってもよい。
The platinum group metal used in the transparent conductive film of the present invention may be any one or more of ruthenium, palladium, platinum, rhodium, iridium and osmium, with ruthenium being particularly preferred. Among the platinum group metals, ruthenium is relatively inexpensive, has high conductivity, high chemical stability, and easily fuses metal particles at the time of film formation, thus further improving conductivity while maintaining high transparency. be able to. In addition, ruthenium
Readily converted to RuO 2 by baking in the range of 300 ° C. to 1000 ° C.. RuO 2 has extremely high chemical stability and electrical conductivity typified by salt water resistance, and does not have a light absorption peak of a specific wavelength in the visible light region of 400 nm to 700 nm even in hue. It has the advantage of not coloring. Further, the transparent conductive film converted into at least ruthenium oxide has an optimized refractive index, and is preferable in terms of antireflection performance. The state of ruthenium and ruthenium oxide present in the transparent conductive film may be in the form of fine particles, or may be in a state where the particles are fused with each other and are at least partially continuous.

【0014】本発明の透明導電膜は、前記の白金族金属
および白金族金属酸化物の他に、膜強度、導電性、透明
性などの一層の向上を目的として、必要なら他の成分、
例えばケイ素、アルミニウム、ジルコニウム、セリウ
ム、チタン、イットリウム、亜鉛、マグネシウム、イン
ジウム、錫、アンチモン、ガリウムなどの酸化物または
複合酸化物の微粒子や、銀、金、銅、ニッケルなどの金
属微粒子や、ケイ素、チタン、ジルコニウムなどの金属
アルコキシドの加水分解物、シリコーンモノマー、シリ
コーンオリゴマーなどの無機系バインダー成分などを適
宜含んでいてもよい。
The transparent conductive film of the present invention may contain, if necessary, other components, in addition to the platinum group metal and the platinum group metal oxide, for the purpose of further improving film strength, conductivity, transparency and the like.
For example, fine particles of oxides or composite oxides such as silicon, aluminum, zirconium, cerium, titanium, yttrium, zinc, magnesium, indium, tin, antimony, and gallium; metal fine particles such as silver, gold, copper, and nickel; and silicon. , A metal alkoxide hydrolyzate such as titanium or zirconium, or an inorganic binder component such as a silicone monomer or silicone oligomer.

【0015】前記の少なくとも白金族金属微粒子を含む
塗料は、前記の白金族金属の水性ゾルおよび必要ならそ
の他の成分の水性ゾルを好ましくはアルコールと共に混
合し、得られた混合液を超音波分散機などを用いて分散
することにより容易に調製できる。この塗料を基材上に
塗布するには、スピンコート法、ロールコート法、スプ
レー法、バーコート法、ディップ法、メニスカスコート
法、グラビア印刷法などの通常の薄膜塗布技術がいずれ
も使用可能である。この内、スピンコート法は、短時間
で均一な厚みの薄膜を形成することができるので特に好
ましい塗布法である。塗布後、塗膜を乾燥し、300℃
〜1000℃の範囲内の焼成温度で焼付けることによっ
て、基材の表面に白金族金属の少なくとも一部が白金族
金属酸化物に転化してなる透明導電膜を形成することが
できる。
The above-mentioned paint containing at least the platinum group metal fine particles is preferably obtained by mixing the above-mentioned aqueous sol of the platinum group metal and, if necessary, the aqueous sol of other components together with an alcohol. It can be easily prepared by dispersing using a method such as In order to apply this paint on a substrate, any of ordinary thin film application techniques such as spin coating, roll coating, spraying, bar coating, dipping, meniscus coating, and gravure printing can be used. is there. Of these, spin coating is a particularly preferred coating method because a thin film having a uniform thickness can be formed in a short time. After application, the coating film is dried,
By baking at a firing temperature in the range of up to 1000 ° C., a transparent conductive film in which at least a part of the platinum group metal is converted to a platinum group metal oxide can be formed on the surface of the substrate.

【0016】本発明の透明導電膜は、前記の透明導電膜
を透明導電層とし、この上層および/または下層に、前
記透明導電層の屈折率とは異なる屈折率を有する透明薄
膜が1層以上設けられてなることが好ましい。これによ
って、透明導電膜の界面における外光反射を除去または
軽減することができる。
In the transparent conductive film of the present invention, the transparent conductive film is used as a transparent conductive layer, and at least one transparent thin film having a refractive index different from the refractive index of the transparent conductive layer is formed on the upper and / or lower layers. Preferably, it is provided. Thus, external light reflection at the interface of the transparent conductive film can be removed or reduced.

【0017】この透明薄膜は、単に多層薄膜における界
面反射を防止するのみならず、表示装置の表示面に用い
たとき表面を外力から保護する効果も期待されるため、
実用上十分な強度を有する透明薄膜を透明導電層の上層
に設けることが好ましい。
This transparent thin film is expected to not only prevent the interface reflection in the multilayer thin film but also protect the surface from external force when used for the display surface of a display device.
It is preferable to provide a transparent thin film having practically sufficient strength on the transparent conductive layer.

【0018】好適な透明薄膜の素材としては、ケイ素、
アルミニウム、ジルコニウム、セリウム、チタン、イッ
トリウム、亜鉛、マグネシウム、インジウム、錫、アン
チモン、ガリウムなどの酸化物、複合酸化物または窒化
物を挙げることができる。特に下式、 M(OR)m n (式中、MはSi、TiまたはZrであり、RはC1
4 のアルキル基であり、mは1〜4の整数であり、か
つnは4−mである)で表される化合物、またはその部
分加水分解物の1種またはそれ以上の混合物から形成さ
れる透明薄膜が好ましい。更に具体的には、膜の表面硬
度が高く、屈折率が比較的低いSiO2 の透明薄膜を形
成し得る素材として、テトラエトキシシラン(Si(O
254 )が、薄膜形成性、透明性、透明導電層との
接合性、膜強度および反射防止性能の観点から好適に用
いられる。
Preferred materials for the transparent thin film include silicon,
An oxide, a complex oxide, or a nitride of aluminum, zirconium, cerium, titanium, yttrium, zinc, magnesium, indium, tin, antimony, gallium, or the like can be given. In particular, the following formula: M (OR) m R n (where M is Si, Ti or Zr, and R is C 1-
An alkyl group of C 4, m is an integer from 1 to 4, and n is formed from 4-m a is) a compound represented by, or one or more of a mixture of a partial hydrolyzate thereof Transparent thin films are preferred. More specifically, as a material capable of forming a transparent thin film of SiO 2 having a high surface hardness and a relatively low refractive index, tetraethoxysilane (Si (O
C 2 H 5 ) 4 ) is suitably used from the viewpoints of thin film forming property, transparency, bonding property with the transparent conductive layer, film strength and antireflection performance.

【0019】透明薄膜の形成は、透明導電膜の形成に用
いた方法と同様に、前記の成分を含む塗布液(透明薄膜
用塗料)を基材に均一に塗布して成膜する方法によって
行うことができる。塗布は、スピンコート法、ロールコ
ート法、スプレー法、バーコート法、ディップ法、メニ
スカスコート法、グラビア印刷法などの通常の薄膜塗布
技術がいずれも使用可能である。この内、スピンコート
法は、短時間で均一な厚みの薄膜を形成することができ
るので特に好ましい塗布法である。塗布後、塗膜を乾燥
し、焼付けることによって透明薄膜が得られる。
The transparent thin film is formed by a method in which a coating solution containing the above-mentioned components (a coating material for a transparent thin film) is uniformly applied to a base material to form a film, similarly to the method used for forming the transparent conductive film. be able to. For coating, any of ordinary thin film coating techniques such as spin coating, roll coating, spraying, bar coating, dipping, meniscus coating, and gravure printing can be used. Of these, spin coating is a particularly preferred coating method because a thin film having a uniform thickness can be formed in a short time. After coating, the coating film is dried and baked to obtain a transparent thin film.

【0020】一般に、多層薄膜における界面反射防止能
は、薄膜の屈折率と膜厚、および積層薄膜数により決定
されるため、本発明の透明導電膜においても、積層膜数
を考慮して透明導電膜および透明薄膜の厚みを適宜設計
することにより、効果的な反射防止効果が得られる。反
射防止能を有する多層膜では、防止しようとする反射光
の波長をλとするとき、2層構成の反射防止膜であれば
基材側から高屈折率層と低屈折率層とをそれぞれλ/
4,λ/4、またはλ/2,λ/4の光学的膜厚とする
ことによって効果的に反射を防止することができる。ま
た3層構成の反射防止膜であれば基材側から中屈折率
層、高屈折率層および低屈折率層の順にλ/4,λ/
2,λ/4の光学的膜厚とすることが有効とされる。
In general, the antireflection ability of an interface in a multilayer thin film is determined by the refractive index and thickness of the thin film and the number of laminated thin films. By appropriately designing the thickness of the film and the transparent thin film, an effective antireflection effect can be obtained. In a multilayer film having antireflection ability, when the wavelength of reflected light to be prevented is λ, if the antireflection film has a two-layer structure, the high refractive index layer and the low refractive index layer are respectively λ from the substrate side. /
By setting the optical film thickness to 4, λ / 4, or λ / 2, λ / 4, reflection can be effectively prevented. In the case of a three-layered antireflection film, λ / 4, λ /
An optical film thickness of 2, λ / 4 is effective.

【0021】特に、製造上の容易さや経済性を考慮する
と、透明導電層の上層に、屈折率が比較的低く、ハード
コート性を兼ね備えたSiO2 膜(屈折率1.46)を
λ/4の膜厚で形成することが好適である。
In particular, considering the ease of manufacture and economy, an SiO 2 film (refractive index: 1.46) having a relatively low refractive index and having a hard coat property is formed on the upper layer of the transparent conductive layer at λ / 4. It is preferable that the film is formed to have a film thickness.

【0022】透明導電層を含む2層以上からなる本発明
の透明導電膜は、透明導電層および前記の透明薄膜の焼
付けを順次に行ってもよく、または同時に行ってもよ
い。例えば透明導電膜用塗料を表示装置の表示面に塗布
し、その上層に透明薄膜用塗料を塗布し、乾燥後に30
0℃〜1000℃の温度で一括焼き付けることによっ
て、透明導電層と透明薄膜とを同時に形成し、低反射透
明導電膜を形成してもよい。
In the transparent conductive film of the present invention comprising two or more layers including a transparent conductive layer, the baking of the transparent conductive layer and the transparent thin film may be performed sequentially or simultaneously. For example, a paint for a transparent conductive film is applied to the display surface of a display device, a paint for a transparent thin film is applied thereon, and after drying, 30
The transparent conductive layer and the transparent thin film may be simultaneously formed by baking at a temperature of 0 ° C. to 1000 ° C. to form a low-reflection transparent conductive film.

【0023】前記透明導電膜の最外層には、凹凸を有す
る透明薄膜を設けることが好ましい。この凹凸を有する
透明薄膜は、透明導電膜の表面反射光を散乱させ、表示
面に優れた防眩性を与える効果がある。
It is preferable to provide a transparent thin film having irregularities on the outermost layer of the transparent conductive film. The transparent thin film having the irregularities scatters light reflected on the surface of the transparent conductive film, and has an effect of giving excellent antiglare properties to the display surface.

【0024】本発明の透明導電膜の少なくとも何れか1
層には、着色材が含有されていてもよい。この着色材
は、透過画像のコントラストの向上や、透過光・反射光
の色彩調整のために用いられる。この着色材としては、
例えばモノアゾピグメント、キナクリドン、アイアンオ
キサイド・エロー、ジスアゾピグメント、フタロシアニ
ングリーン、フタロシアニンブルー、シアニンブルー、
フラバンスロンエロー、ジアンスラキノリルレッド、イ
ンダンスロンブルー、チオインジゴボルドー、ペリノン
オレンジ、ペリレンスカーレット、ペリレンレッド17
8、ペリレンマルーン、ジオキサジンバイオレット、イ
ソインドリンエロー、ニッケルニトロソエロー、マダー
レーキ、銅アゾメチンエロー、アニリンブラック、アル
カリブルー、亜鉛華、酸化チタン、弁柄、酸化クロム、
鉄黒、チタンエロー、コバルトブルー、セルリアンブル
ー、コバルトグリーン、アルミナホワイト、ビリジア
ン、カドミウムエロー、カドミウムレッド、朱、リトポ
ン、黄鉛、モリブデートオレンジ、クロム酸亜鉛、硫酸
カルシウム、硫酸バリウム、炭酸カルシウム、鉛白、群
青、マンガンバイオレット、コバルトバイオレット、エ
メラルドグリーン、紺青、カーボンブラックなどの有機
および無機顔料、ならびにアゾ染料、アントラキノン染
料、インジゴイド染料、フタロシアニン染料、カルボニ
ウム染料、キノンイミン染料、メチン染料、キノリン染
料、ニトロ染料、ニトロソ染料、ベンゾキノン染料、ナ
フトキノン染料、ナフタルイミド染料、ペリノン染料な
どの染料を挙げることができる。これらの着色材は単独
で、または2種以上を組み合わせて用いることができ
る。
At least one of the transparent conductive films of the present invention
The layer may contain a coloring material. This coloring material is used for improving the contrast of a transmitted image and adjusting the color of transmitted light and reflected light. As this coloring material,
For example, monoazo pigment, quinacridone, iron oxide yellow, disazo pigment, phthalocyanine green, phthalocyanine blue, cyanine blue,
Flavanthrone yellow, dianthraquinolyl red, indanthrone blue, thioindigo bordeaux, perinone orange, perylene scarlet, perylene red 17
8, perylene maroon, dioxazine violet, isoindoline yellow, nickel nitroso yellow, madder lake, copper azomethine yellow, aniline black, alkali blue, zinc white, titanium oxide, red iron oxide, chrome oxide,
Iron black, titanium yellow, cobalt blue, cerulean blue, cobalt green, alumina white, viridian, cadmium yellow, cadmium red, vermilion, lithopone, graphite, molybdate orange, zinc chromate, calcium sulfate, barium sulfate, calcium carbonate, lead Organic and inorganic pigments such as white, ultramarine, manganese violet, cobalt violet, emerald green, navy blue, and carbon black, as well as azo dyes, anthraquinone dyes, indigoid dyes, phthalocyanine dyes, carbonium dyes, quinone imine dyes, methine dyes, quinoline dyes, and nitro dyes Dyes such as dyes, nitroso dyes, benzoquinone dyes, naphthoquinone dyes, naphthalimide dyes and perinone dyes can be mentioned. These coloring materials can be used alone or in combination of two or more.

【0025】用いる着色材の種類と量は、対応する透明
導電膜の光学的な膜特性に対応して適宜選択されるべき
である。透明性薄膜の吸光度Aは、一般的には下記の式
で表される。 A=log10(I0 /I)=εCD 式中、I0 ;入射光、I;透過光、C;色濃度、D;光
距離、ε;モル吸光係数である。
The type and amount of the coloring material to be used should be appropriately selected according to the optical film characteristics of the corresponding transparent conductive film. The absorbance A of the transparent thin film is generally represented by the following equation. A = log 10 (I 0 / I) = εCD where I 0 is incident light, I is transmitted light, C is color density, D is light distance, and ε is molar extinction coefficient.

【0026】本発明の透明導電膜では、一般にモル吸光
係数がε>10の着色材が用いられる。また、着色材の
配合量は、使用する着色材のモル吸光係数に依存して変
わるが、一般に、着色材を配合した積層膜および単層膜
の吸光度Aが0.0004〜3abs.の範囲内となるよう
な量であることが好ましい。これらの条件が満たされな
い場合は透明度および/または反射防止効果が低下す
る。上記着色材を透明導電層に配合する場合、その配合
量は、金属の含有量に対して20重量%以下、特に10
重量%以下とすることが好ましい。10重量%を越える
と、導電性の低下が認められ、20重量%を越えると、
電磁波遮蔽効果に支障を来すことになる。
In the transparent conductive film of the present invention, a coloring material having a molar extinction coefficient ε> 10 is generally used. The amount of the coloring material varies depending on the molar extinction coefficient of the coloring material used. Generally, the absorbance A of the laminated film and the single-layer film containing the coloring material is in the range of 0.0004 to 3 abs. Preferably, the amount is such that If these conditions are not satisfied, the transparency and / or the antireflection effect will decrease. When the coloring material is blended with the transparent conductive layer, the blending amount is 20% by weight or less, particularly 10
% By weight or less. If it exceeds 10% by weight, a decrease in conductivity is observed.
This will hinder the electromagnetic wave shielding effect.

【0027】本発明の表示装置は、前記の何れかの透明
導電膜が表示面上に形成されてなっている。この表示装
置は、表示面の帯電が防止されているので画像表示面に
埃などが付着せず、電磁波が遮蔽されるので各種の電磁
波障害が防止され、光透過性に優れているので画像が明
るく、透過画像の色相が自然であり、膜厚が均一なので
表示面の外観が良好であり、耐スクラッチ性が良好であ
り、しかも耐塩水性が高いので塩霧に曝されるような環
境にあっても耐久性が高い。また透明導電層の他に、前
記の透明薄膜および/または凹凸を有する透明薄膜が形
成されていれば、外光に対する反射防止効果および/ま
たは防眩効果も得られる。
In the display device of the present invention, any one of the transparent conductive films described above is formed on a display surface. This display device prevents the charging of the display surface, so that dust and the like do not adhere to the image display surface, shields electromagnetic waves, prevents various types of electromagnetic wave interference, and is excellent in light transmissivity. It is bright, the hue of the transmitted image is natural, the film thickness is uniform, the appearance of the display surface is good, the scratch resistance is good, and the salt water resistance is high, so it is suitable for environments exposed to salt fog. Even high durability. If the transparent thin film and / or the transparent thin film having irregularities are formed in addition to the transparent conductive layer, an antireflection effect and / or an antiglare effect for external light can be obtained.

【0028】[0028]

【実施例】以下、実施例により本発明を具体的に説明す
るが、本発明はこれらの実施例によって限定されるもの
ではない。実施例および比較例に共通の原液として、下
記のものを調製した。 (ルテニウム水性ゾル)0.15ミリモル/lの塩化ル
テニウムを含む水溶液と、0.024ミリモル/lの水
素化ホウ素ナトリウム水溶液とを混合し、得られたコロ
イド状分散液を濃縮し、0.198モル/lのルテニウ
ム微粒子を含む水性ゾルを得た。ルテニウム微粒子の平
均粒径は20nmであった。 (銀水性ゾル)クエン酸ナトリウム二水和物(14
g)、硫酸第一鉄(7.5g)を溶解させた水溶液(6
0g)を5℃に保持した状態で、これに硝酸銀(2.5
g)を溶解した水溶液(25g)を加え、赤褐色の銀ゾ
ルを得た。この銀ゾルを遠心分離により水洗して不純物
イオンを除去した後、純水を加えて0.185モル/l
の銀微粒子を含む水性ゾルを得た。銀微粒子の平均粒径
は10nmであった。 (透明薄膜塗料A)テトラエトキシシラン(0.8g)
と0.1N塩酸(0.8g)とエチルアルコール(9
8.4g)とを混合し、均一な溶液とした。
EXAMPLES The present invention will now be described specifically with reference to examples, but the present invention is not limited to these examples. The following were prepared as stock solutions common to Examples and Comparative Examples. (Ruthenium aqueous sol) An aqueous solution containing 0.15 mmol / l ruthenium chloride and a 0.024 mmol / l aqueous sodium borohydride solution were mixed, and the obtained colloidal dispersion was concentrated to 0.198 mmol / l. An aqueous sol containing mol / l of ruthenium fine particles was obtained. The average particle size of the ruthenium fine particles was 20 nm. (Silver aqueous sol) sodium citrate dihydrate (14
g) and an aqueous solution (6 g) in which ferrous sulfate (7.5 g) is dissolved.
0 g) was kept at 5 ° C., and silver nitrate (2.5 g) was added thereto.
An aqueous solution (25 g) in which g) was dissolved was added to obtain a red-brown silver sol. The silver sol was washed with water by centrifugation to remove impurity ions, and then added with pure water to obtain 0.185 mol / l.
An aqueous sol containing silver fine particles was obtained. The average particle size of the silver fine particles was 10 nm. (Transparent thin film paint A) Tetraethoxysilane (0.8 g)
And 0.1 N hydrochloric acid (0.8 g) and ethyl alcohol (9
8.4 g) to obtain a uniform solution.

【0029】(実施例1)透明導電膜塗料の調製 : ルテニウム水性ゾル 40g イソプロピルアルコール 10g エチルアルコール 50g 上記の成分を混合し、得られた混合液を超音波分散機
(BRANSON ULTRASONICS社製「ソニファイヤー45
0」)で分散し、透明導電膜塗料を調製した。
(Example 1) Preparation of a transparent conductive film paint : Ruthenium aqueous sol 40 g Isopropyl alcohol 10 g Ethyl alcohol 50 g The above components were mixed, and the resulting mixture was mixed with an ultrasonic dispersing machine (Sonifire manufactured by BRANSON ULTRASONICS). 45
0 ") to prepare a transparent conductive film paint.

【0030】成膜:上記の透明導電膜塗料をブラウン管
の表示面にスピンコーターを用いて塗布し、乾燥後、こ
の塗布面に前記の透明薄膜塗料Aを、同様にスピンコー
ターを用いて塗布し、このブラウン管を乾燥機に入れ、
450℃で1時間焼付け処理して低反射透明導電膜を形
成することにより、反射防止、高導電膜を有する実施例
1の陰極線管を作成した。
Film formation : The above-mentioned transparent conductive film paint is applied to the display surface of a cathode ray tube using a spin coater, and after drying, the above-mentioned transparent thin film paint A is applied to the application surface similarly using a spin coater. , Put this CRT in the dryer,
The cathode ray tube of Example 1 having an anti-reflection and high conductive film was formed by baking at 450 ° C. for 1 hour to form a low-reflection transparent conductive film.

【0031】(実施例2)透明導電膜塗料の調製 : ルテニウム水性ゾル 40g イソプロピルアルコール 10g エチルアルコール 50g 上記の成分を混合し、実施例1と同様に処理して透明導
電膜塗料を調製した。
(Example 2) Preparation of transparent conductive film paint : Ruthenium aqueous sol 40 g isopropyl alcohol 10 g ethyl alcohol 50 g The above components were mixed and treated in the same manner as in Example 1 to prepare a transparent conductive film paint.

【0032】成膜:上記の透明導電膜塗料を用い、焼付
け温度を600℃とした以外は実施例1と同様に処理し
て、反射防止、高導電膜を有する実施例2の陰極線管を
作成した。
Film formation : A cathode ray tube of Example 2 having an anti-reflection and high conductive film was prepared by using the above transparent conductive film paint and treating it in the same manner as in Example 1 except that the baking temperature was 600 ° C. did.

【0033】(比較例1)透明導電膜塗料の調製 : ルテニウム水性ゾル 40g イソプロピルアルコール 10g エチルアルコール 50g 上記の成分を混合し、実施例1と同様に処理して透明導
電膜塗料を調製した。 成膜 :上記の透明導電膜塗料を用い、焼付け温度を15
0℃とした以外は実施例1と同様に処理して反射防止、
高導電膜を有する比較例1の陰極線管を作成した。
(Comparative Example 1)Preparation of transparent conductive film paint : Aqueous ruthenium sol 40 g isopropyl alcohol 10 g ethyl alcohol 50 g
An electrocoat was prepared. Film formation : Using the above transparent conductive paint, baking temperature of 15
Except that the temperature was set to 0 ° C., the same treatment as in Example 1 was performed to prevent reflection,
A cathode ray tube of Comparative Example 1 having a high conductive film was prepared.

【0034】(比較例2)透明導電膜塗料の調製 : 銀水性ゾル 40g イソプロピルアルコール 10g エチルアルコール 50g 上記の成分を混合し、実施例1と同様に処理して透明導
電膜塗料を調製した。 成膜 :上記の透明導電膜塗料を用い、比較例1と同様に
処理して反射防止、高導電膜を有する比較例2の陰極線
管を作成した。
(Comparative Example 2)Preparation of transparent conductive film paint : Aqueous silver sol 40 g isopropyl alcohol 10 g ethyl alcohol 50 g
An electrocoat was prepared. Film formation : Using the above transparent conductive film paint, as in Comparative Example 1.
Cathode ray of Comparative Example 2 having anti-reflection and high conductive film by processing
A tube was created.

【0035】(評価測定)陰極線管上に形成された低反
射透明導電膜の性能を下記の装置または方法で測定し、
また外観を目視により評価した。 X線回折分析:フィリップス社製「PW1710」 表面抵抗 :三菱油化社製「ロレスタAP」(4端子
法) 電磁波遮蔽性:0.5MHz基準で前記式1により計算 耐塩水性 :塩水浸漬3日後の0.5MHz電磁波遮蔽
性 スクラッチ試験:1kgの荷重下に、シャープペンシル
先端の金属部分で膜表面を擦り、傷の付き具合を目視に
より評価。 ○;傷なし △;やや傷付き ×;傷付き 透過率 :東京電色社製「Automatic Haze Meter H
III DP」 ヘーズ :東京電色社製「Automatic Haze meter HII
I DP」 透過率差 :日立製作所製「U-3500」形自記分光光度計
を用い、可視光領域で の最大透過率と最小透過率との差を求めた。 (可視光領域における最大−最小透過率差が小さいほど
透過率がよりフラットになり、透過画像の色相が鮮明と
なる。特に10%以下では、透過画像の色彩が黒色に近
づき、より高度な鮮明さを持つようになる。) 視感反射率:EG&G GAMMASCIENTIFIC社製「MODEL C-11」 反射色 :ミノルタカメラ社製「CR-300」 (CIE表色系を使用し、CIE色度図における白色点(x=
0.3137,y=0.3198)からのズレの距離を
Δx,Δyを用いて√(Δx2 +Δy2 )と表した。こ
れにより、√(Δx2 +Δy2 )の値がより「0」に近
いものほど反射色が白色、すなわち目に優しい自然光に
近いものとなる。) 視認性 :低反射性能、反射色、透過色を含む総合評
価 ○ ;良好 ○△;やや良好 △ ;可 △×;やや不良 × ;不良 以上の評価試験の内、物理化学的試験結果を表1に、光
学的試験結果を表2に示す。
(Evaluation Measurement) The performance of the low-reflection transparent conductive film formed on the cathode ray tube was measured by the following apparatus or method.
The appearance was visually evaluated. X-ray diffraction analysis: Philips "PW1710" Surface resistance: Mitsubishi Yuka "Loresta AP" (4-terminal method) Electromagnetic shielding: Calculated by the above formula 1 based on 0.5 MHz Salt water: 3 days after salt water immersion 0.5 MHz electromagnetic wave shielding property Scratch test: Under a load of 1 kg, the film surface was rubbed with a metal part at the tip of a mechanical pencil, and the degree of scratching was visually evaluated. ○: no scratch △: slightly scratched ×: scratched Transmittance: “Automatic Haze Meter H” manufactured by Tokyo Denshoku
III DP "Haze:" Automatic Haze meter HII manufactured by Tokyo Denshoku Co., Ltd. "
IDP ”Transmittance difference: The difference between the maximum transmittance and the minimum transmittance in the visible light region was determined using a“ U-3500 ”type self-recording spectrophotometer manufactured by Hitachi, Ltd. (The smaller the maximum-minimum transmittance difference in the visible light region, the flatter the transmittance and the sharper the hue of the transmitted image. Particularly, when the difference is 10% or less, the color of the transmitted image approaches black, and the higher the sharpness. Luminous reflectance: "MODEL C-11" manufactured by EG & G GAMMASCIENTIFIC Inc. Reflection color: "CR-300" manufactured by Minolta Camera (CIE colorimetric system, white in CIE chromaticity diagram Point (x =
0.3137, y = 0.3198), and Δ (Δx 2 + Δy 2 ) using Δx and Δy. Thus, the closer the value of √ (Δx 2 + Δy 2 ) is to “0”, the whiter the reflection color becomes, that is, the closer to the natural light that is easy on the eyes. ) Visibility: Comprehensive evaluation including low reflection performance, reflection color, and transmission color ○: good ○ △; somewhat good △: acceptable △ ×; somewhat poor ×: poor Among the above evaluation tests, the physicochemical test results are shown. Table 1 shows the optical test results.

【0036】[0036]

【表1】 [Table 1]

【表2】 [Table 2]

【0037】表1の結果から、本発明に従いルテニウム
微粒子を含む塗料を塗布し、450℃または600℃で
焼成した実施例1、実施例2の陰極線管は、X線回折分
析の結果、透明導電膜に酸化ルテニウムの存在が確認さ
れ、焼成温度が150℃の比較例1では酸化ルテニウム
の存在は認められなかった。この実施例1、実施例2を
比較例1と比べると、物理化学的特性(表1)で表面抵
抗は大差なく、電磁波遮蔽性、耐塩水性および耐スクラ
ッチ性は大幅に改善されたことがわかる。光学的特性
(表2)では、視感反射率が減少し視認性に優れ、反射
色は白色点に近くなり透過画像が自然な色に見えるよう
に改善された。これらの光学的特性の総合として実施例
1、実施例2の視認性評価は、比較例1に比べて明らか
に優れたものとなった。比較例2は導電材料として銀を
用いたが、耐塩水性が悪く耐久性に乏しいばかりでな
く、視感反射率が大きく反射色の偏りも大きいので視認
性の点でも不良と判定された。
From the results shown in Table 1, the cathode ray tubes of Examples 1 and 2 which were coated with a coating material containing ruthenium microparticles according to the present invention and baked at 450 ° C. or 600 ° C. were analyzed by X-ray diffraction. The presence of ruthenium oxide was confirmed in the film, and the presence of ruthenium oxide was not recognized in Comparative Example 1 in which the firing temperature was 150 ° C. Comparing Example 1 and Example 2 with Comparative Example 1, it can be seen that the surface resistance is not much different from the physicochemical characteristics (Table 1), and that the electromagnetic wave shielding property, salt water resistance and scratch resistance are greatly improved. . In the optical characteristics (Table 2), the luminous reflectance was reduced, the visibility was excellent, and the reflected color was close to the white point, and the transmitted image was improved so as to look natural. As a whole of these optical characteristics, the visibility evaluation of Examples 1 and 2 was clearly superior to Comparative Example 1. In Comparative Example 2, silver was used as the conductive material. However, not only the salt water resistance was poor and the durability was poor, but also the luminous reflectance was large and the reflection color was largely biased.

【0038】[0038]

【発明の効果】本発明の透明導電膜は、平均粒径が50
nm以下の少なくとも白金族金属微粒子を含む塗料を塗
布、乾燥した後、300℃〜1000℃の範囲内の焼成
温度で焼付けて形成され、前記白金族金属の少なくとも
一部が白金族金属酸化物に転化してなる透明導電層を有
するものであるので、優れた帯電防止効果と電磁波遮蔽
効果とを有し、かつ耐塩水性、耐スクラッチ性が高い。
またこの透明導電膜が形成された表示装置は表示面の透
明性が高く透過画像の色相が自然で鮮明である。前記の
透明導電層が少なくともルテニウムを含むものであれ
ば、前記の焼付け温度で容易にRuO2 に転化し、比較
的安価でありながら、耐塩水性、化学的安定性、耐スク
ラッチ性が更に改善され、色相面においても透過画像が
より自然となる利点がある。透明導電層の上層および/
または下層に、透明導電層の屈折率とは異なる屈折率を
有する透明薄膜が1層以上設けられていれば、低反射の
透明導電膜が得られる。本発明の表示装置は、前記の透
明導電膜が表示面上に形成されてなるものであるので、
優れた帯電防止効果と電磁波遮蔽効果とを有し、耐塩水
性が良好で耐久性があり、耐スクラッチ性が高く、表示
面の透明性が高く、かつ透過画像の色相が自然で鮮明で
あり、実用性の高い表示装置となる。
The transparent conductive film of the present invention has an average particle size of 50.
After coating and drying a coating containing at least platinum group metal fine particles of not more than nm, the coating is formed by baking at a firing temperature in the range of 300 ° C. to 1000 ° C., and at least a part of the platinum group metal is converted to a platinum group metal oxide. Since it has a transparent conductive layer formed by inversion, it has an excellent antistatic effect and an electromagnetic wave shielding effect, and has high salt water resistance and scratch resistance.
Further, the display device on which the transparent conductive film is formed has high transparency of the display surface, and the hue of the transmitted image is natural and clear. If the transparent conductive layer contains at least ruthenium, it is easily converted to RuO 2 at the baking temperature, and while being relatively inexpensive, salt water resistance, chemical stability, and scratch resistance are further improved. Also, there is an advantage that the transmitted image is more natural on the hue surface. An upper layer of the transparent conductive layer and / or
Alternatively, when at least one transparent thin film having a refractive index different from the refractive index of the transparent conductive layer is provided as a lower layer, a transparent conductive film having low reflection can be obtained. In the display device of the present invention, since the transparent conductive film is formed on a display surface,
It has excellent antistatic effect and electromagnetic wave shielding effect, has good salt water resistance, is durable, has high scratch resistance, has high transparency of the display surface, and the hue of the transmitted image is natural and clear, A highly practical display device is obtained.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI G09F 9/00 307 G09F 9/00 307Z H01B 1/08 H01B 1/08 H01J 29/88 H01J 29/88 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification code FI G09F 9/00 307 G09F 9/00 307Z H01B 1/08 H01B 1/08 H01J 29/88 H01J 29/88

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 平均粒径が50nm以下の少なくとも白
金族金属微粒子を含む塗料を塗布、乾燥した後、300
℃〜1000℃の範囲内の焼成温度で焼付けて形成さ
れ、前記白金族金属の少なくとも一部が白金族金属酸化
物に転化してなる透明導電層を有することを特徴とする
透明導電膜。
After coating and drying a paint containing at least a platinum group metal fine particle having an average particle size of 50 nm or less, the paint is dried.
A transparent conductive film having a transparent conductive layer formed by baking at a firing temperature in a range of from about 1000C to about 1000C, wherein at least a part of the platinum group metal is converted to a platinum group metal oxide.
【請求項2】 前記の透明導電層が白金族金属と白金族
金属酸化物とを合わせて10重量%以上含有してなるこ
とを特徴とする請求項1に記載の透明導電膜。
2. The transparent conductive film according to claim 1, wherein the transparent conductive layer contains a platinum group metal and a platinum group metal oxide in a total amount of 10% by weight or more.
【請求項3】 前記の白金族金属が少なくともルテニウ
ムであることを特徴とする請求項1に記載の透明導電
膜。
3. The transparent conductive film according to claim 1, wherein said platinum group metal is at least ruthenium.
【請求項4】 前記の白金族金属酸化物が少なくとも酸
化ルテニウムであることを特徴とする請求項1に記載の
透明導電膜。
4. The transparent conductive film according to claim 1, wherein said platinum group metal oxide is at least ruthenium oxide.
【請求項5】 透明導電層の上層および/または下層
に、前記透明導電層の屈折率とは異なる屈折率を有する
透明薄膜が1層以上設けられたことを特徴とする請求項
1に記載の透明導電膜。
5. The transparent conductive layer according to claim 1, wherein one or more transparent thin films having a refractive index different from the refractive index of the transparent conductive layer are provided on the upper and / or lower layers of the transparent conductive layer. Transparent conductive film.
【請求項6】 透明導電膜の最外層に、凹凸を有する透
明薄膜が設けられたことを特徴とする請求項1に記載の
透明導電膜。
6. The transparent conductive film according to claim 1, wherein a transparent thin film having irregularities is provided on an outermost layer of the transparent conductive film.
【請求項7】 前記透明導電膜の少なくとも何れか1層
に着色材が含有されてなることを特徴とする請求項1に
記載の透明導電膜。
7. The transparent conductive film according to claim 1, wherein at least one layer of the transparent conductive film contains a coloring material.
【請求項8】 前記請求項1〜請求項7の何れかに記載
の透明導電膜が表示面上に形成されたことを特徴とする
表示装置。
8. A display device, wherein the transparent conductive film according to claim 1 is formed on a display surface.
JP18287497A 1997-07-08 1997-07-08 Transparent conductive film, method of manufacturing the same, and display device Expired - Fee Related JP3356968B2 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1106712A1 (en) * 1999-12-01 2001-06-13 Ebara Corporation Method and apparatus of producing thin film of metal or metal compound
JP2006237357A (en) * 2005-02-25 2006-09-07 Shinshu Univ Transparent thin film electrode and elecrochemical storage element including the same
KR100786854B1 (en) * 2001-02-06 2007-12-20 삼성에스디아이 주식회사 A filter for a display, a method for preparing the same and a display comprising the same
US7507447B2 (en) 2002-02-26 2009-03-24 Fujifilm Corporation Transparent conductive film, method for producing same and method for forming pattern

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1106712A1 (en) * 1999-12-01 2001-06-13 Ebara Corporation Method and apparatus of producing thin film of metal or metal compound
KR100786854B1 (en) * 2001-02-06 2007-12-20 삼성에스디아이 주식회사 A filter for a display, a method for preparing the same and a display comprising the same
US7507447B2 (en) 2002-02-26 2009-03-24 Fujifilm Corporation Transparent conductive film, method for producing same and method for forming pattern
JP2006237357A (en) * 2005-02-25 2006-09-07 Shinshu Univ Transparent thin film electrode and elecrochemical storage element including the same
JP4621912B2 (en) * 2005-02-25 2011-02-02 国立大学法人信州大学 Transparent thin film electrode and electrochemical storage device having the same

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