JPH11309425A - Washing tank - Google Patents

Washing tank

Info

Publication number
JPH11309425A
JPH11309425A JP12042998A JP12042998A JPH11309425A JP H11309425 A JPH11309425 A JP H11309425A JP 12042998 A JP12042998 A JP 12042998A JP 12042998 A JP12042998 A JP 12042998A JP H11309425 A JPH11309425 A JP H11309425A
Authority
JP
Japan
Prior art keywords
rectifying
tank
main body
cleaning
upper lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12042998A
Other languages
Japanese (ja)
Inventor
Masayuki Yatougo
真之 八藤後
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kaijo Corp
Original Assignee
Kaijo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaijo Corp filed Critical Kaijo Corp
Priority to JP12042998A priority Critical patent/JPH11309425A/en
Publication of JPH11309425A publication Critical patent/JPH11309425A/en
Pending legal-status Critical Current

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  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

PROBLEM TO BE SOLVED: To allow the water stream to easily form a laminar flow in a flow straightening type washing tank. SOLUTION: The washing tank 20 is provided with a tank main body 11 for string an article 2 to be washed inside and washing the article 2 to be washed with a fed washing liquid 1, a liquid feeding port 12 provided on the bottom of the tank main body 11, a flow straightening plate 13 provided on the lower part inside the tank main body 11 and on the upper side of the liquid feed port 12 to form plural flow straightening holes 13a, and a flow straightening upper cover 21 provided on an open face at the upper side of the tank main body 11 to enable to open and close it to form plural flow straightening holes 21a having taper surfaces made smaller in the opening diameter upward.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、槽本体内に入れた
ウェーハや基板等の被洗浄物を洗浄する整流式の洗浄槽
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rectifying type cleaning tank for cleaning an object to be cleaned such as a wafer or a substrate placed in a tank body.

【0002】[0002]

【従来の技術】図4は、従来の整流式の洗浄槽の一例を
示す正面の断面図である。図4において、洗浄槽10の
槽本体11の底部には給液口12が設けられているとと
もに、槽本体11の内部下方であって給液口12の上方
には整流板13が設けられている。この整流板13に
は、多数の整流穴13aが形成されている。槽本体11
に被洗浄物2を収容するとともに、ポンプ等で給液口1
2から槽本体11内に洗浄液1を供給し、槽本体11の
上側の開口面からオーバーフローさせて洗浄液1を貯留
槽14で受けるようにして、被洗浄物2の洗浄を行って
いる。
2. Description of the Related Art FIG. 4 is a front sectional view showing an example of a conventional rectifying type cleaning tank. In FIG. 4, a liquid supply port 12 is provided at the bottom of the tank body 11 of the cleaning tank 10, and a current plate 13 is provided below the inside of the tank body 11 and above the liquid supply port 12. I have. The rectifying plate 13 has a number of rectifying holes 13a. Tank body 11
The cleaning object 2 is accommodated in the
The cleaning liquid 1 is supplied into the tank main body 11 from the tank 2, overflows from the upper opening surface of the tank main body 11, and the cleaning liquid 1 is received in the storage tank 14.

【0003】[0003]

【発明が解決しようとする課題】しかし、前述の従来の
洗浄槽10では、整流板13から出た洗浄液1は、槽本
体11の側壁に向かって流れるので(図4中、矢印方
向)、洗浄液1の流れが層流になりにくいという問題が
あった。そして、図4に示すように、槽本体11内の下
部の側壁近傍で乱流1aが生じて、被洗浄物2の全ての
ポイントで均一な水流(流速)を得ることができず、被
洗浄物2の一部にパーティクルが残存するという問題が
あった。特に、整流式の洗浄槽10では、槽本体11の
開口面側から洗浄液1をオーバーフローさせているの
で、洗浄液1の滞留箇所が発生してパーティクルが残る
という問題があった。また、槽本体11の上側開口面に
向かって洗浄液1をきれいに流すのは困難であり、槽本
体11の上側開口面の空気に一度ふれた洗浄液1が再度
槽本体11内に戻ることが多かった。このため、DIW
の比抵抗管理が困難になるという問題があった。
However, in the above-described conventional cleaning tank 10, since the cleaning liquid 1 flowing out of the current plate 13 flows toward the side wall of the tank main body 11 (in the direction of the arrow in FIG. 4), the cleaning liquid is removed. There was a problem that the flow of 1 was difficult to become a laminar flow. Then, as shown in FIG. 4, a turbulent flow 1a occurs near the lower side wall in the tank body 11, and a uniform water flow (flow velocity) cannot be obtained at all points of the object 2 to be cleaned. There is a problem that particles remain in a part of the object 2. In particular, in the rectifying type cleaning tank 10, since the cleaning liquid 1 overflows from the opening side of the tank main body 11, there is a problem that a stagnation portion of the cleaning liquid 1 is generated and particles remain. Also, it is difficult to cleanly flow the cleaning liquid 1 toward the upper opening surface of the tank body 11, and the cleaning liquid 1 once touched by the air on the upper opening surface of the tank body 11 often returns to the inside of the tank body 11 again. . For this reason, DIW
However, there is a problem that it is difficult to control the specific resistance.

【0004】したがって、本発明が解決しようとする課
題は、整流式の洗浄槽において、水流が層流になりやす
くすることである。
[0004] Therefore, an object to be solved by the present invention is to make a water flow easily laminar in a rectifying type washing tank.

【0005】[0005]

【課題を解決するための手段】上述の課題を解決するた
めに、請求項1の発明は、被洗浄物を内部に収容し、供
給される洗浄液により前記被洗浄物を洗浄するための槽
本体と、前記槽本体の底部に設けられた給液口と、前記
槽本体の内部下方であって前記給液口の上側に設けら
れ、複数の第1整流穴を形成した整流板と、前記槽本体
の上側の開口面に開閉可能に設けられ、上方に向かって
開口径を小さくしたテーパー面を有する第2整流穴を複
数形成した整流上蓋とを備えることを特徴とする。請求
項2の発明は、請求項1に記載の洗浄槽において、前記
整流上蓋の下面側では、各前記第2整流穴の外縁が隣接
していることを特徴とする。
According to a first aspect of the present invention, there is provided a tank body for accommodating an object to be cleaned and cleaning the object with a supplied cleaning liquid. A liquid supply port provided at the bottom of the tank body, a flow straightening plate provided below the inside of the tank body and above the liquid supply port, and formed with a plurality of first flow straightening holes; A rectifying upper lid is provided on the upper opening surface of the main body so as to be openable and closable, and has a plurality of second rectifying holes having a tapered surface whose opening diameter is reduced upward. According to a second aspect of the present invention, in the cleaning tank according to the first aspect, an outer edge of each of the second rectifying holes is adjacent to a lower surface side of the rectifying upper lid.

【0006】[0006]

【作用】本発明においては、洗浄液は、槽本体の底部の
給液口を通って槽本体内に入り込み、さらに整流板の第
1整流穴を通り、被洗浄物を洗浄し、整流上蓋の第2整
流穴から槽本体外に流出する。したがって、洗浄液は、
槽本体の側壁に向かって流れることなく、均一に下方か
ら上方に向かって流れるので、槽本体内の洗浄液が層流
になる。さらに、第2整流穴は、洗浄液の入り込む側
(下面側)から上方に向かって開口径を小さくしたテー
パー面を有するので、洗浄液が整流上蓋に当たって乱流
が起こることがない。
In the present invention, the cleaning liquid enters the tank body through the liquid supply port at the bottom of the tank body, and further passes through the first straightening hole of the straightening plate to wash the object to be cleaned, and the washing liquid is supplied to the first straightening hole of the straightening upper lid. 2 It flows out of the tank body from the rectification hole. Therefore, the cleaning liquid is
The cleaning liquid in the tank main body has a laminar flow because it flows uniformly upward from below without flowing toward the side wall of the tank main body. Further, since the second rectifying hole has a tapered surface whose opening diameter is reduced upward from the side where the cleaning liquid enters (lower surface side), the turbulence does not occur when the cleaning liquid hits the rectifying upper lid.

【0007】[0007]

【発明の実施の形態】以下、図面等を参照して、本発明
の一実施形態について説明する。なお、以下の実施形態
において、従来例と同一部分には同一符号を付してい
る。図1は、本発明による洗浄槽の一実施形態を示す正
面の断面図である。洗浄槽20は、整流式のものであ
り、被洗浄物2、例えばシリコンウェーハや液晶ディス
プレイのガラス基板を槽本体11内に収容するととも
に、槽本体11内に供給した洗浄液1で洗浄するもので
ある。なお、被洗浄物2は、槽本体11内で、その底面
に設置された受け台(図示せず)により支持される。
An embodiment of the present invention will be described below with reference to the drawings. In the following embodiments, the same parts as those of the conventional example are denoted by the same reference numerals. FIG. 1 is a front sectional view showing an embodiment of the cleaning tank according to the present invention. The cleaning tank 20 is of a rectifying type, in which an object 2 to be cleaned, for example, a silicon wafer or a glass substrate of a liquid crystal display, is accommodated in the tank body 11 and is cleaned with the cleaning liquid 1 supplied into the tank body 11. is there. In addition, the to-be-cleaned object 2 is supported in the tank main body 11 by the receiving stand (not shown) installed in the bottom face.

【0008】槽本体11は、化学的安定性、機械的強
度、耐酸性及び耐熱性等に優れる石英ガラスやPTFE
(ポリテトラフルオロエチレン)等から形成されてい
る。槽本体11の底部の略中央には、洗浄液1を槽本体
11内に供給するための給液口12が設けられている。
さらに、槽本体11の内部下方であって給液口12の上
方には、多数の整流穴(第1整流穴)13aを形成した
整流板13が取り付けられている。
The tank body 11 is made of quartz glass or PTFE having excellent chemical stability, mechanical strength, acid resistance and heat resistance.
(Polytetrafluoroethylene) and the like. A liquid supply port 12 for supplying the cleaning liquid 1 into the tank main body 11 is provided substantially at the center of the bottom of the tank main body 11.
Further, a rectifying plate 13 having a number of rectifying holes (first rectifying holes) 13a is attached below the inside of the tank body 11 and above the liquid supply port 12.

【0009】また、槽本体11の上側の開口面には、整
流上蓋21が設けられている。整流上蓋21は、本実施
形態では、槽本体11の開口面の略中央部で当接し合う
一対のものから構成されている。洗浄槽20の上側両端
部には、ヒュームの上昇を防止するための上蓋22をそ
れぞれ支持軸23で回動自在に設けるとともに、この上
蓋22に整流上蓋21を取り付けている。よって、上蓋
22の回動に伴って、整流上蓋21を自動で開閉できる
ようにしている。なお、このように整流上蓋21を設け
ることなく、整流上蓋21を単に槽本体11の開口面上
に着脱可能に載置しても良い。整流上蓋21は、槽本体
11と同様の材質(上述)から形成されている。また、
上蓋22の開閉機構としては、図示しないが、アクチュ
エータ、シリンダー、ネジ送り機構又は歯車機構等を用
いて形成される。
A rectifying upper lid 21 is provided on the upper opening surface of the tank body 11. In the present embodiment, the rectifying upper lid 21 is constituted by a pair of rectifying upper lids that come into contact at substantially the center of the opening surface of the tank main body 11. Upper lids 22 for preventing fumes from rising are provided on both upper ends of the cleaning tank 20 so as to be rotatable about support shafts 23, and a rectifying upper lid 21 is attached to the upper lids 22. Therefore, the rectifying upper lid 21 can be automatically opened and closed as the upper lid 22 rotates. The rectifying upper lid 21 may be simply detachably mounted on the opening surface of the tank body 11 without providing the rectifying upper lid 21 in this way. The rectifying upper lid 21 is formed from the same material (described above) as the tank main body 11. Also,
Although not shown, the opening / closing mechanism of the upper lid 22 is formed using an actuator, a cylinder, a screw feed mechanism, a gear mechanism, or the like.

【0010】整流上蓋21には、多数の整流穴(第2整
流穴)21aが形成されている。図2(a)及び(b)
は、それぞれ整流上蓋21の整流穴21aの第1及び第
2実施形態を詳細に示す断面図であり、図3は、整流上
蓋21の整流穴21aを下面側から見た状態を示す平面
図である。整流穴21aは、上方に向かって開口径を小
さくしたテーパー面を有するように形成されている。ま
た、整流上蓋21の下面側(開口径の大きい側)では、
各整流穴21aの外縁が隣接するように配置されてい
る。また、整流穴21aは、図2(a)に示すように下
面側から上面側までの全範囲にわたってテーパー面を設
けても良いが、図2(b)に示すように下面側から一部
の範囲にテーパー面を設けるとともに上面側の一部をス
トレート状に形成しても良い。
The rectifying upper lid 21 has a number of rectifying holes (second rectifying holes) 21a. FIG. 2 (a) and (b)
FIG. 3 is a cross-sectional view showing the first and second embodiments of the rectifying hole 21a of the rectifying upper lid 21 in detail, and FIG. 3 is a plan view showing a state where the rectifying hole 21a of the rectifying upper lid 21 is viewed from the lower surface side. is there. The rectifying hole 21a is formed so as to have a tapered surface whose opening diameter is reduced upward. On the lower surface side (the side with the larger opening diameter) of the rectifying upper lid 21,
The rectification holes 21a are arranged so that the outer edges thereof are adjacent to each other. The rectifying hole 21a may be provided with a tapered surface over the entire range from the lower surface side to the upper surface side as shown in FIG. 2A. However, as shown in FIG. A tapered surface may be provided in the range, and a part of the upper surface may be formed in a straight shape.

【0011】以上の構成からなる洗浄槽20では、槽本
体11内に被洗浄物2を収容し、槽本体11の給液口1
2から洗浄液1を供給する。供給された洗浄液1は、整
流板13の各整流穴13aを通過して上方に流れ、被洗
浄物2に当たって被洗浄物2を洗浄する。洗浄液1は、
さらに上方に流れると整流上蓋21の各整流穴21aか
ら整流上蓋21の上側に出て槽本体11の上側外周部に
設けられた貯留槽14に溜められる。図1において、洗
浄液1の流れ方向を矢印で示す。
In the cleaning tank 20 having the above structure, the object 2 to be cleaned is accommodated in the tank body 11 and the liquid supply port 1 of the tank body 11 is accommodated.
The cleaning liquid 1 is supplied from 2. The supplied cleaning liquid 1 flows upward through each of the flow straightening holes 13a of the flow straightening plate 13, and hits the cleaning target 2 to clean the cleaning target 2. Cleaning solution 1
When the water flows further upward, it flows out of each of the rectifying holes 21a of the rectifying upper lid 21 to the upper side of the rectifying upper lid 21 and is stored in the storage tank 14 provided on the upper outer peripheral portion of the tank body 11. In FIG. 1, the flow direction of the cleaning liquid 1 is indicated by an arrow.

【0012】ここで、洗浄液1は、整流板13の整流穴
13aから流出するとそのまま上方に流れて整流上蓋2
1の整流穴21aから流出するので、従来例のように槽
本体11の側壁に向かって流れることはなく、均一に下
方から上方に向かって流れる。これにより、槽本体11
内の洗浄液1の流れが層流になる。さらに、整流穴21
aは、洗浄液1の入り込む側(下面側)から上方に向か
って開口径を小さくしたテーパー面を有するので、洗浄
液1が整流上蓋21の下面に当たって乱流が起こること
を防止できる。さらには、本実施形態のように整流上蓋
21の下面側で各整流穴21aの外縁が隣接するように
配置すれば、洗浄液1と整流上蓋21との当接を確実に
防止できるので、好ましい。
When the cleaning liquid 1 flows out of the rectifying hole 13a of the rectifying plate 13, the cleaning liquid 1 flows upward as it is and flows therethrough.
Since the water flows out from the first rectification hole 21a, it does not flow toward the side wall of the tank body 11 as in the conventional example, but flows uniformly from below to above. Thereby, the tank body 11
The flow of the cleaning liquid 1 in the inside becomes a laminar flow. Furthermore, the rectification hole 21
Since a has a tapered surface whose opening diameter is reduced upward from the side (lower surface side) into which the cleaning liquid 1 enters, it is possible to prevent the cleaning liquid 1 from hitting the lower surface of the rectifying upper lid 21 and causing turbulent flow. Further, it is preferable to arrange the rectifying holes 21a such that the outer edges of the rectifying holes 21a are adjacent to each other on the lower surface side of the rectifying upper lid 21 as in this embodiment, because the contact between the cleaning liquid 1 and the rectifying upper lid 21 can be reliably prevented.

【0013】[0013]

【発明の効果】本発明によれば、洗浄液が均一に下方か
ら上方に向かって流れるようになるので、槽本体内の洗
浄液を層流にすることができる。また、整流上蓋の第2
整流穴に設けたテーパー面により、洗浄液が整流上蓋に
当たって乱流が起こることを防止することができる。こ
れにより、被洗浄物のパーティクルの除去の効率を高
め、ウェーハのエッチングレートの均一化を図ることが
できる。また、供給液量に見合った整流上蓋の整流穴の
大きさを決定することにより、槽本体内の圧力を高く保
つことができるため、いったん槽本体の上側から出た洗
浄液が再度槽本体内に戻ることをなくして、DIWの比
抵抗管理を容易に行うことができる。
According to the present invention, the cleaning liquid flows uniformly from below to above, so that the cleaning liquid in the tank main body can be made laminar. In addition, the second
The taper surface provided in the rectifying hole can prevent the cleaning liquid from hitting the rectifying upper lid and causing turbulence. Thereby, the efficiency of removing particles from the object to be cleaned can be increased, and the etching rate of the wafer can be made uniform. In addition, by determining the size of the rectifying hole of the rectifying upper lid according to the supply liquid amount, the pressure inside the tank main body can be kept high, so that the cleaning liquid once flowing out from the upper side of the tank main body is re-entered into the tank main body. Without returning, DIW specific resistance management can be easily performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明による洗浄槽の一実施形態を示す正面の
断面図である。
FIG. 1 is a front sectional view showing an embodiment of a cleaning tank according to the present invention.

【図2】図1の整流蓋の整流穴を詳細に示す断面図であ
り、(a)及び(b)はそれぞれ第1及び第2実施形態
を示す。
FIGS. 2A and 2B are cross-sectional views illustrating a flow straightening hole of the flow straightening lid of FIG. 1 in detail, and FIGS. 2A and 2B illustrate first and second embodiments, respectively.

【図3】図1の整流蓋の整流穴を下面側から見た状態を
示す平面図である。
FIG. 3 is a plan view showing a state in which a rectifying hole of the rectifying lid of FIG. 1 is viewed from a lower surface side.

【図4】従来の整流式の洗浄槽の一例を示す正面の断面
図である。
FIG. 4 is a front sectional view showing an example of a conventional rectifying type cleaning tank.

【符号の説明】[Explanation of symbols]

1 洗浄液 2 被洗浄物 11 槽本体 13 整流板 13a 整流穴(第1整流穴) 14 貯留槽 20 洗浄槽 21 整流上蓋 21a 整流穴(第2整流穴) 22 上蓋 REFERENCE SIGNS LIST 1 cleaning liquid 2 object to be cleaned 11 tank body 13 rectifying plate 13a rectifying hole (first rectifying hole) 14 storage tank 20 cleaning tank 21 rectifying upper lid 21a rectifying hole (second rectifying hole) 22 upper lid

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 被洗浄物を内部に収容し、供給される洗
浄液により前記被洗浄物を洗浄するための槽本体と、 前記槽本体の底部に設けられた給液口と、 前記槽本体の内部下方であって前記給液口の上側に設け
られ、複数の第1整流穴を形成した整流板と、 前記槽本体の上側の開口面に開閉可能に設けられ、上方
に向かって開口径を小さくしたテーパー面を有する第2
整流穴を複数形成した整流上蓋とを備えることを特徴と
する洗浄槽。
1. A tank body for accommodating an object to be cleaned therein and for cleaning the object to be cleaned with a supplied cleaning liquid; a liquid supply port provided at a bottom portion of the tank body; A rectifying plate provided below the inside and above the liquid supply port and formed with a plurality of first rectifying holes, and provided on the upper opening surface of the tank main body so as to be openable and closable, and has an opening diameter upward. Second with reduced taper surface
A cleaning tank, comprising: a rectifying upper lid having a plurality of rectifying holes.
【請求項2】 請求項1に記載の洗浄槽において、 前記整流上蓋の下面側では、各前記第2整流穴の外縁が
隣接していることを特徴とする洗浄槽。
2. The washing tank according to claim 1, wherein an outer edge of each of the second straightening holes is adjacent to a lower surface of the straightening upper lid.
JP12042998A 1998-04-30 1998-04-30 Washing tank Pending JPH11309425A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12042998A JPH11309425A (en) 1998-04-30 1998-04-30 Washing tank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12042998A JPH11309425A (en) 1998-04-30 1998-04-30 Washing tank

Publications (1)

Publication Number Publication Date
JPH11309425A true JPH11309425A (en) 1999-11-09

Family

ID=14786004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12042998A Pending JPH11309425A (en) 1998-04-30 1998-04-30 Washing tank

Country Status (1)

Country Link
JP (1) JPH11309425A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110142272A (en) * 2019-05-07 2019-08-20 德淮半导体有限公司 A kind of cowling panel and groove-type cleaning machine
JP2021517645A (en) * 2018-03-22 2021-07-26 ロベルト・ボッシュ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツングRobert Bosch Gmbh Sensor configuration

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021517645A (en) * 2018-03-22 2021-07-26 ロベルト・ボッシュ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツングRobert Bosch Gmbh Sensor configuration
CN110142272A (en) * 2019-05-07 2019-08-20 德淮半导体有限公司 A kind of cowling panel and groove-type cleaning machine

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