JPH11302075A - Low temperature sintered dielectric porcelain composition - Google Patents

Low temperature sintered dielectric porcelain composition

Info

Publication number
JPH11302075A
JPH11302075A JP10122678A JP12267898A JPH11302075A JP H11302075 A JPH11302075 A JP H11302075A JP 10122678 A JP10122678 A JP 10122678A JP 12267898 A JP12267898 A JP 12267898A JP H11302075 A JPH11302075 A JP H11302075A
Authority
JP
Japan
Prior art keywords
glass
low
quartz
dielectric porcelain
borosilicate glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10122678A
Other languages
Japanese (ja)
Inventor
Noboru Kojima
暢 小島
Yasuo Suzuki
靖生 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FDK Corp
Original Assignee
FDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FDK Corp filed Critical FDK Corp
Priority to JP10122678A priority Critical patent/JPH11302075A/en
Publication of JPH11302075A publication Critical patent/JPH11302075A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/004Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of particles or flakes
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Insulating Materials (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a low temp. sintered dielectric porcelain compsn. having a low dielectric constant, capable of ensuring a sufficient sintering density by low temp. sintering and used for electronic parts for a high frequency region. SOLUTION: The dielectric porcelain compsn. consists of 20-40 wt.% quartz and 60-80 wt.% borosilicate glass, this glass consists of 75-85 wt.% SiO2 , 14-20 wt.% B2 O3 and 1-5 wt.% K2 O, and 0.1-5 wt.% Al2 O3 based on the weight of the glass may further be added to the glass.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、低温焼結誘電体磁
器組成物に関するもので、より具体的には、高周波用積
層インダクタ,コンデンサ,共振器等の高周波用多層セ
ラミックス基板に用いられる低温焼結誘電体磁器組成物
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a low-temperature sintered dielectric porcelain composition, and more specifically to a low-temperature sintered ceramic used for high-frequency multilayer ceramic substrates such as high-frequency multilayer inductors, capacitors and resonators. The present invention relates to a dielectric ceramic composition.

【0002】[0002]

【発明の背景】従来の積層インダクタ等の高周波用素子
に用いられる多層セラミックス基板の材料としては、ア
ルミナ,コージェライト,ムライト,フォルステライ
ト,石英,シリカガラスの中の少なくとも1種を含むフ
ィラーと、ガラスとで構成されたものが用いられてい
る。
BACKGROUND OF THE INVENTION Conventional multilayer ceramic substrates used for high-frequency devices such as multilayer inductors include a filler containing at least one of alumina, cordierite, mullite, forsterite, quartz and silica glass; What is composed of glass is used.

【0003】しかしながら、上記したフィラーとガラス
で構成した従来のセラミックス基板では、誘電率が5〜
7と高いため、高周波用インダクタンスの材料として用
いるには、自己共振周波数が低く、高周波領域ではQが
不十分となる。このことは、高周波用の電子部品として
使用する際に、所望の特性が得られなくなるという問題
を有する。そして、このことは、周波数が高くなるほど
顕著となる。
However, the conventional ceramic substrate composed of the above filler and glass has a dielectric constant of 5 to 5.
7, the material has a low self-resonance frequency to be used as a material for a high-frequency inductance, and the Q becomes insufficient in a high-frequency region. This has a problem that desired characteristics cannot be obtained when used as high-frequency electronic components. This becomes more pronounced as the frequency increases.

【0004】本発明は、上記した背景に鑑みてなされた
もので、その目的とするところは、上記した問題を解決
し、低誘電率で誘電損失を低くし、しかもAgやAg−
Pd,Cu等の低抵抗な導体と一体焼結可能な低温焼成
で十分な焼結密度を得ることができる高周波領域で使用
する積層インダクタ,コンデンサ,共振器等の高周波用
多層セラミックス基板に用いられる低温焼結誘電体磁器
組成物を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above background, and has as its object to solve the above-mentioned problems, to reduce the dielectric loss with a low dielectric constant, and to further reduce the loss of Ag or Ag-.
Used in high-frequency multilayer ceramic substrates such as multilayer inductors, capacitors, and resonators used in high-frequency regions where sufficient sintering density can be obtained by low-temperature sintering that can be sintered together with low-resistance conductors such as Pd and Cu. An object of the present invention is to provide a low-temperature sintered dielectric ceramic composition.

【0005】[0005]

【課題を解決するための手段】上記した目的を達成する
ため、本発明に係る低温焼結誘電体磁器組成物では、石
英が20〜40wt%と、硼珪酸ガラスが60〜80w
t%から構成した。そして、前記硼珪酸ガラスの成分
が、SiOとして75〜85wt%,Bとして
14〜20wt%,KOとして1〜5wt%含み、さ
らにAlが硼珪酸ガラスに対して0.1〜5wt
%添加した。ここで各組成の範囲の上限,下限は、それ
ぞれ上記した各範囲の数値を含む。つまり、「A〜B」
は、A以上B以下を意味する。
In order to achieve the above object, in the low-temperature sintered dielectric porcelain composition according to the present invention, quartz is 20 to 40% by weight, and borosilicate glass is 60 to 80 watts.
%. The components of the borosilicate glass is, 75~85Wt% as SiO 2, 14~20wt% as B 2 O 3, comprising 1-5 wt% as K 2 O, and more Al 2 O 3 relative to borosilicate glass 0.1-5wt
% Was added. Here, the upper limit and the lower limit of the range of each composition include the numerical value of each range described above. That is, "AB"
Means A or more and B or less.

【0006】硼珪酸ガラスは、誘電損失を悪化させる要
因となるLi,Naを著しく低減させ、Kを適切な量だ
け含んでいる。従って、係る硼珪酸ガラスを石英に添加
することにより低損失・低誘電率で、900℃以下で焼
結可能となる。つまり、60%未満とすると、十分な焼
結密度が得られなくなる。逆に80%より多く添加する
と、軟化変形する。そこで、60〜80wt%の範囲と
した。
[0006] Borosilicate glass significantly reduces Li and Na, which are factors that cause deterioration of dielectric loss, and contains an appropriate amount of K. Therefore, by adding such borosilicate glass to quartz, sintering can be performed at 900 ° C. or less with low loss and low dielectric constant. That is, if it is less than 60%, a sufficient sintered density cannot be obtained. Conversely, if more than 80% is added, softening deformation occurs. Therefore, the range is set to 60 to 80 wt%.

【0007】また、SiOが75wt%未満とする
と、ガラスの軟化点が低下し、石英と焼成した際に軟化
変形し、所望の形状が得られない。逆に85wt%より
多く添加すると、逆にガラスの軟化点が上昇し、低温焼
結ができなくなる。つまり、石英と焼成した際に、十分
な焼結密度が得られなくなる。そこで、SiOの組成
範囲と75〜85wt%の範囲とした。
On the other hand, if the content of SiO 2 is less than 75 wt%, the softening point of the glass is lowered, and the glass is softened and deformed when sintered with quartz, so that a desired shape cannot be obtained. Conversely, if more than 85 wt% is added, the softening point of the glass increases, and low-temperature sintering becomes impossible. That is, when sintered with quartz, a sufficient sintered density cannot be obtained. Therefore, the composition range of SiO 2 and the range of 75 to 85 wt% were set.

【0008】また、Bが14wt%未満とする
と、ガラスの軟化点が上昇し、石英と焼成した際に、十
分な焼結密度が得られなくなる。逆にBが20w
t%を超えると、ガラスの軟化点が低下し、石英と焼成
した際に軟化変形が発生する。そこで、Bの組成
範囲として14〜20wt%の範囲とした。
If the content of B 2 O 3 is less than 14% by weight, the softening point of the glass increases, and when sintered with quartz, a sufficient sintered density cannot be obtained. Conversely, B 2 O 3 is 20w
If it exceeds t%, the softening point of the glass decreases, and softening deformation occurs when the glass is sintered with quartz. Therefore, the composition range of B 2 O 3 is set to a range of 14 to 20 wt%.

【0009】さらに、KOは、ガラスの軟化点の制御
や溶解性の向上を図るために添加する。そして、上記し
た範囲外、つまり、1wt%未満や5%を超えた量を添
加すると、誘電損失が悪化し、本発明の主目的である低
誘電損失化が阻害される。さらにまた、1%未満の場合
には、ガラスの軟化点が上昇し、低温焼結もできなくな
るという問題も有する。
Further, K 2 O is added to control the softening point of the glass and to improve the solubility. If the amount is outside the above range, that is, less than 1 wt% or more than 5%, the dielectric loss is deteriorated, and the main purpose of the present invention is to reduce the dielectric loss. Furthermore, when it is less than 1%, there is a problem that the softening point of the glass increases, and low-temperature sintering becomes impossible.

【0010】Alは、焼成した際にガラスから熱
膨張係数の大きなクリストバライトの析出を防ぐため添
加している。しかし、Alの誘電率は、9.7で
あるので、添加量が増すと最終的な焼結体の誘電率が上
昇し、本発明の主目的である低誘電率化を阻害する。そ
して、具体的には、ガラスに対して5wt%を超える
と、誘電率が4.5を超えてしまう。そこで、上限を5
wt%とした。また、Alの添加量を0.1wt
%未満とすると、ガラスからクリストバライトの析出を
防止するという効果が発揮できなくなる。そこで、Al
のガラスに対する添加量を0.1〜5wt%とし
た。
[0010] Al 2 O 3 is added to prevent cristobalite having a large thermal expansion coefficient from being precipitated from the glass during firing. However, since the dielectric constant of Al 2 O 3 is 9.7, an increase in the amount of addition increases the dielectric constant of the final sintered body, which hinders the reduction of the dielectric constant, which is the main object of the present invention. . And, specifically, when the content exceeds 5 wt% with respect to glass, the dielectric constant exceeds 4.5. Therefore, the upper limit is 5
wt%. Further, the addition amount of Al 2 O 3 is 0.1 wt.
%, The effect of preventing the precipitation of cristobalite from the glass cannot be exhibited. Then, Al
The amount of 2 O 3 added to the glass was 0.1 to 5 wt%.

【0011】なお、上記した硼珪酸ガラスを構成する3
つの成分の他に、ZnO,CaO,PbOなどを添加し
た従来のガラスでは、誘電率の上昇もしくは誘電損失の
悪化を招くことが確認されている。
The borosilicate glass 3
It has been confirmed that a conventional glass to which ZnO, CaO, PbO, etc. are added in addition to the two components causes an increase in the dielectric constant or deterioration of the dielectric loss.

【0012】[0012]

【発明の実施の形態】平均粒径が2.0〜3.5μmの
硼珪酸ガラスと、平均粒径が0.6〜0.8μmの石英
を用い、両者をボールミルを用いて20時間混合して得
られた混合粉体を乾燥させる。次いで、その乾燥粉体に
対してPVAを添加し、粉末成形により300MPaの
圧力で直径14mm,厚さ2mmに成形した。そして、
その成形品に対して900℃,1時間の焼成条件で焼成
することにより試料を作成した。
DETAILED DESCRIPTION OF THE INVENTION Borosilicate glass having an average particle size of 2.0 to 3.5 .mu.m and quartz having an average particle size of 0.6 to 0.8 .mu.m are mixed for 20 hours using a ball mill. The mixed powder obtained is dried. Next, PVA was added to the dried powder, and the powder was molded to a diameter of 14 mm and a thickness of 2 mm at a pressure of 300 MPa by powder molding. And
A sample was prepared by firing the molded article under the firing conditions of 900 ° C. for 1 hour.

【0013】上記の作成条件のもとで、石英と硼珪酸ガ
ラスの混合比並びに硼珪酸ガラスを構成するSiO
,KOの組成比、さらには硼珪酸ガラスに対
するAlの添加量を適宜変更した試料を製造し、
それぞれに対してコンデンサ法を用いて誘電率と誘電損
失を1MHzにて測定した。その結果、下記表1に示す
ような実験結果が得られた。
Under the above conditions, the mixing ratio of quartz and borosilicate glass and SiO 2 ,
A sample was prepared in which the composition ratio of B 2 O 3 and K 2 O, and the amount of Al 2 O 3 added to the borosilicate glass were appropriately changed,
The dielectric constant and the dielectric loss were measured at 1 MHz for each using the capacitor method. As a result, experimental results as shown in Table 1 below were obtained.

【0014】[0014]

【表1】 [Table 1]

【0015】[0015]

【表2】 上記の表から明らかなように、試料2〜6は、ガラスと
石英の混合比を10%刻みで変えて実験を行ったもの
で、試料2は硼珪酸ガラスの量が少ないため、焼結密度
(相対密度)が十分でない(80.8%)。また試料6
は、硼珪酸ガラスの量が多く軟化変形を生じた。さら
に、中間の試料3〜試料5は、誘電率も低く十分な焼結
密度が得られた。さらに、試料9に示すように、ガラス
と石英の混合比が50:50(試料2と同じ)である
と、やはり焼結不足となり、所望の特性が得られる材料
を製造できない。同様に、試料13のように、ガラスと
石英の混合比が90:10(試料6と同じでガラスの量
が多い)とすると、軟化変形を生じた。この結果から石
英:硼珪酸ガラスの比は、20:80から40:60の
範囲が望ましいことがわかる(各境界値を含む)。
[Table 2] As is clear from the above table, Samples 2 to 6 were obtained by performing experiments by changing the mixing ratio of glass and quartz in increments of 10%. Sample 2 has a small amount of borosilicate glass, (Relative density) is not sufficient (80.8%). Sample 6
Has a large amount of borosilicate glass and causes softening deformation. Furthermore, the intermediate samples 3 to 5 had a low dielectric constant and a sufficient sintered density. Furthermore, as shown in Sample 9, when the mixing ratio of glass and quartz is 50:50 (the same as Sample 2), the sintering is also insufficient, and a material having desired characteristics cannot be produced. Similarly, when the mixing ratio of glass and quartz was 90:10 (the same as in Sample 6, the amount of glass was large) as in Sample 13, softening deformation occurred. From this result, it is understood that the ratio of quartz: borosilicate glass is preferably in the range of 20:80 to 40:60 (including each boundary value).

【0016】一方、試料1は、Bが12.1wt
%と少ないため、焼結不足となった。また、試料7は、
が21.1wt%と多いため、軟化変形を生じ
た。従って、Bが多くても少なくても不良品とな
った。
On the other hand, the sample 1 contains 12.1 wt% of B 2 O 3 .
%, The sintering was insufficient. Sample 7 is
Since B 2 O 3 was as large as 21.1 wt%, softening deformation occurred. Therefore, a defective product was obtained regardless of whether B 2 O 3 was large or small.

【0017】試料8は、SiOが86.4wt%と多
いとともにBが11.1wt%と少ないため、焼
結不足となった。また、試料14は、SiOが74.
4wt%と少ないとともに、Bが23.1wt%
と多いため、軟化変形を生じた。従って、SiOが多
くても少なくても不良品となった。
Sample 8 was insufficient in sintering because SiO 2 was as large as 86.4 wt% and B 2 O 3 was as small as 11.1 wt%. Further, the sample 14 has a SiO 2 content of 74.
As low as 4 wt%, B 2 O 3 is 23.1 wt%
Therefore, softening deformation occurred. Accordingly, defective products were obtained regardless of whether the amount of SiO 2 was large or small.

【0018】また、試料15は、Alが0、つま
り添加していないため、クリストバライトが生成され熱
膨張係数の異常を示し、不良品となった。また、試料1
6は、KOが0.5と少ないため、ガラスの軟化点が
上昇し、950℃でも焼結不足となり、低温焼結ができ
ないことが確認できた。
In Sample 15, cristobalite was generated because Al 2 O 3 was 0, that is, no Al 2 O 3 was added. Sample 1
In No. 6, since the K 2 O was as small as 0.5, the softening point of the glass increased, and sintering was insufficient even at 950 ° C., and it was confirmed that low-temperature sintering was impossible.

【0019】そして、その他の組成比では、誘電率も低
く、900℃という低温で焼結することが確認できた。
そして、具体的な硼珪酸ガラスの組成比の範囲として
は、図1に示すハッチングで囲んだ領域となる。
At other composition ratios, the dielectric constant was low, and sintering at a low temperature of 900 ° C. was confirmed.
A specific range of the composition ratio of the borosilicate glass is a region surrounded by hatching shown in FIG.

【0020】[0020]

【発明の効果】以上のように、本発明に係る低温焼結誘
電体磁器組成物では、低誘電率で誘電損失を低くし、し
かも、AgやAg−Pd,Cu等の低抵抗な導体と一体
焼結可能な低温焼成で十分な焼結密度を得ることができ
る。従って、高周波領域で使用する積層インダクタ,コ
ンデンサ,共振器等の高周波用多層セラミックス基板と
して有効に使用することができる。
As described above, the low-temperature sintered dielectric ceramic composition according to the present invention has a low dielectric constant, a low dielectric loss, and a low-resistance conductor such as Ag, Ag-Pd, or Cu. Sufficient sintering density can be obtained by low-temperature sintering that can be integrally sintered. Therefore, it can be effectively used as a multilayer ceramic substrate for high frequency such as a laminated inductor, a capacitor, and a resonator used in a high frequency region.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明で用いられる硼珪酸ガラスの組成範囲を
示す図である。
FIG. 1 is a view showing a composition range of a borosilicate glass used in the present invention.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 石英が20〜40wt%と、硼珪酸ガラ
スが60〜80wt%からなり、 前記硼珪酸ガラスの成分が、SiOとして75〜85
wt%,Bとして14〜20wt%,KOとし
て1〜5wt%含み、さらにAlが硼珪酸ガラス
に対して0.1〜5wt%添加されていることを特徴と
する低温焼結誘電体磁器組成物。
1. Quartz comprises 20 to 40% by weight, borosilicate glass comprises 60 to 80% by weight, and the component of the borosilicate glass is 75 to 85 as SiO 2.
wt%, 14~20wt% as B 2 O 3, comprising 1-5 wt% as K 2 O, and more Al 2 O 3, characterized in that it is added 0.1-5 wt% relative to borosilicate glass Low temperature sintered dielectric porcelain composition.
JP10122678A 1998-04-17 1998-04-17 Low temperature sintered dielectric porcelain composition Pending JPH11302075A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10122678A JPH11302075A (en) 1998-04-17 1998-04-17 Low temperature sintered dielectric porcelain composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10122678A JPH11302075A (en) 1998-04-17 1998-04-17 Low temperature sintered dielectric porcelain composition

Publications (1)

Publication Number Publication Date
JPH11302075A true JPH11302075A (en) 1999-11-02

Family

ID=14841933

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH11302075A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002187768A (en) * 2000-12-20 2002-07-05 Nippon Electric Glass Co Ltd Low temperature sintering dielectric material for high frequency and sintered body of the same
JP2019108263A (en) * 2017-11-07 2019-07-04 フエロ コーポレーション Low dielectric constant (low k) dielectric composition for high frequency application

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002187768A (en) * 2000-12-20 2002-07-05 Nippon Electric Glass Co Ltd Low temperature sintering dielectric material for high frequency and sintered body of the same
JP4569000B2 (en) * 2000-12-20 2010-10-27 日本電気硝子株式会社 Low-frequency sintered dielectric material for high frequency and its sintered body
JP2019108263A (en) * 2017-11-07 2019-07-04 フエロ コーポレーション Low dielectric constant (low k) dielectric composition for high frequency application

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