JPH0517211A - Substrate material and circuit substrate - Google Patents

Substrate material and circuit substrate

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Publication number
JPH0517211A
JPH0517211A JP3041656A JP4165691A JPH0517211A JP H0517211 A JPH0517211 A JP H0517211A JP 3041656 A JP3041656 A JP 3041656A JP 4165691 A JP4165691 A JP 4165691A JP H0517211 A JPH0517211 A JP H0517211A
Authority
JP
Japan
Prior art keywords
substrate
glass
copper
conductor
silver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3041656A
Other languages
Japanese (ja)
Inventor
Yoshiaki Yamade
善章 山出
Kazuhiro Minagawa
和弘 皆川
Tadahisa Arahori
忠久 荒堀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP3041656A priority Critical patent/JPH0517211A/en
Publication of JPH0517211A publication Critical patent/JPH0517211A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To ensure a low dielectric constant, to increase signal processing speed and to enhance yield and reliability by mixing specified powder with crystalline mullite and/or forsterite and sintering this mixture. CONSTITUTION:Glass forming powder is obtd. by blending compds. so that 60-80wt.% SiO2, 0-4wt.% Al2O3, 0-3wt % K2O, 0-3wt.% Li2O and 15-30wt.% B2O3 are contained by >=95wt.% total amt. when the compds. are expressed in terms of oxides and 50-70wt.% of the powder is mixed with 30-50wt.% crystalline mullite and/or forsterite to obtain a starting material mixture. This mixture is melted at 1,450-1,550 deg.C and water-ground and the resulting glass is sintered at 850-1,000 deg.C to produce a substrate material. When this material is laminated and copper or silver is disposed as an internal conductor, a circuit substrate is produced.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は基板材料及び回路基板、
より詳細には多層配線回路基板等に有用であり、銅また
は銀等の導体材料との適合性が良好である基板材料及び
それを使用した回路基板に関する。
The present invention relates to a substrate material and a circuit board,
More specifically, the present invention relates to a board material which is useful for a multilayer wiring circuit board and the like and has good compatibility with a conductor material such as copper or silver, and a circuit board using the same.

【0002】[0002]

【従来の技術】一般に、多層セラミックス基板材料とし
ては、従来からアルミナが用いられ、回路導体としては
タングステン及びモリブデン等の高融点金属が使用され
ているが、価格が高いばかりでなく、回路の微細化及び
高集積化を図るという点からはこれら導体材料は内部抵
抗が高い等の問題があった。そこで、電気抵抗が小さ
く、安価である導体材料として銅または銀等が用いられ
始めている。しかし、銅または銀等を用いるためにはこ
れら導体と同時に焼成する基板の焼成温度を、銅ペース
ト等の焼成温度である850〜1000℃程度にする必
要があり、回路導体内装用の低焼成温度の基板材料が数
多く研究されている。
2. Description of the Related Art Generally, alumina has been conventionally used as a material for a multilayer ceramic substrate and refractory metals such as tungsten and molybdenum have been used as circuit conductors. From the standpoint of achieving higher integration and higher integration, these conductor materials have problems such as high internal resistance. Therefore, copper, silver, or the like has begun to be used as an inexpensive conductor material having a low electric resistance. However, in order to use copper or silver, it is necessary to set the firing temperature of the substrate that is fired at the same time as these conductors to about 850 to 1000 ° C., which is the firing temperature of copper paste, etc. Many substrate materials have been studied.

【0003】例えば、特開昭59−162169号公報
においては、クリストバライト、石英、ベリリア、コラ
ンダム、マグネシア、安定化ジルコニア、トリア、ステ
アタイト、フォルステライト、スピネル及びジルコン磁
器のうち少なくとも1種からなる無機フィラーと低融点
ガラスとからなる、1000℃以下で焼結可能な基板材
料が提案されている。ただし、この場合は低融点ガラス
としてホウケイ酸ガラスを用いた場合のクリストバライ
ト析出については制御ができなかった。一般にホウケイ
酸ガラスを高温で焼成するとクリストバライトが析出
し、熱膨張係数が大きくなり過ぎる傾向にある。
For example, in JP-A-59-162169, an inorganic material comprising at least one of cristobalite, quartz, beryllia, corundum, magnesia, stabilized zirconia, thoria, steatite, forsterite, spinel and zircon porcelain. A substrate material has been proposed which is composed of a filler and a low melting point glass and can be sintered at 1000 ° C or lower. However, in this case, it was not possible to control the cristobalite precipitation when borosilicate glass was used as the low melting point glass. Generally, when borosilicate glass is fired at a high temperature, cristobalite is precipitated and the coefficient of thermal expansion tends to be too large.

【0004】また、特開昭64−87555号公報にお
いては、ムライト−ホウケイ酸ガラス複合体にアルミ
ナ、フォルステライト、ステアタイト等のセラミックス
粉末及び/または石英、コーディエライト、β−スポジ
ュメント等のセラミックス粉末を添加することで、基板
強度が向上することが示されている。
Further, in JP-A-64-87555, a mullite-borosilicate glass composite is added to a ceramic powder such as alumina, forsterite and steatite and / or a ceramic such as quartz, cordierite and β-spodement. It has been shown that the addition of powder improves substrate strength.

【0005】さらに、特開平2−141458号公報に
おいては、ガラス組成を酸化物換算で、SiO2 が50
〜70wt%、Al23 が5〜20wt%、CaOが
5〜25wt%、MgOが0〜5wt%、B23 が8
〜13wt%にし、無機フィラーを添加することによっ
て銅等の導電性の良好な導体との同時焼成が可能とな
り、反り及び曲がりのない基板材料が得られることが示
されている。
Further, in Japanese Patent Application Laid-Open No. 2-141458, SiO 2 is 50 when the glass composition is converted into oxide.
~70wt%, Al 2 O 3 is 5 to 20 wt%, CaO is 5-25 wt%, MgO is 0~5wt%, B 2 O 3 is 8
It has been shown that the addition of an inorganic filler in an amount of ˜13 wt% enables simultaneous firing with a conductor having good conductivity such as copper, and a substrate material without warpage and bending can be obtained.

【0006】[0006]

【発明が解決しようとする課題】回路導体内装用の積層
基板材料として低焼成温度の基板材料を用いる場合、そ
の基板材料がガラス単体では強度が不足するために、セ
ラミックス粉体との複合化が必要とされており、上記し
たガラス/セラミックスの複合基板材料においては、主
に焼成温度の調整と焼結体の平滑性について検討されて
いる。他方、信号処理の高速化に対応するためには基板
材料の低誘電率化が必要であるが、焼結温度、平滑性及
び低誘電率性のいずれの特性をも満足させる基板材料に
ついては検討されておらず、低誘電率化のためには主に
ガラス組成を適切なものにする必要がある。
When a substrate material having a low firing temperature is used as a laminated substrate material for the interior of a circuit conductor, the glass material alone is insufficient in strength, so that it cannot be combined with ceramic powder. In the above-mentioned glass / ceramic composite substrate material, which is required, adjustment of the firing temperature and smoothness of the sintered body are mainly studied. On the other hand, it is necessary to lower the permittivity of the substrate material in order to respond to the speeding up of signal processing, but we will consider a substrate material that satisfies all characteristics of sintering temperature, smoothness and low permittivity. However, the glass composition is mainly required to be appropriate for lowering the dielectric constant.

【0007】これら基板材料を用いてセラミックス基板
を作成し部品化する際電極となるピンのピン付け強度が
必要とされるが、セラミックス基板と、一般に半導体チ
ップとして用いられているシリコンとの熱膨張係数を完
全に合わせると、前記ピン等の電極材料との間に残留熱
応力が生じ、部品破壊の原因となり基板の信頼性及び製
品の歩留まりが低下するという課題があった。
When a ceramics substrate is formed using these substrate materials and made into a component, the pinning strength of pins serving as electrodes is required. Thermal expansion of the ceramics substrate and silicon generally used as a semiconductor chip. If the coefficients are perfectly matched, there is a problem that residual thermal stress is generated between the material such as the pins and the like, causing damage to the components, and reducing the reliability of the substrate and the yield of products.

【0008】本発明はこのような課題に鑑み発明された
ものであって、銅または銀等の導体との低温同時焼成が
可能で、低誘電率であるとともに、半導体チップとして
用いられているシリコンと導体やピン等の金属との中間
の熱膨張係数を有しそれぞれに対する熱膨張係数差が小
さいことにより、信頼性の高い製品を作ることのできる
基板材料及び内部導体として銅または銀等の導体が用い
られた回路基板を提供することを目的としている。
The present invention has been invented in view of the above problems, and is capable of low temperature co-firing with a conductor such as copper or silver, has a low dielectric constant, and is used as a semiconductor chip. And a metal such as a conductor or a pin have a coefficient of thermal expansion intermediate between them and the difference in coefficient of thermal expansion between them is small, so that a highly reliable product can be made of a substrate material and a conductor such as copper or silver as an internal conductor. It is intended to provide a circuit board in which is used.

【0009】[0009]

【課題を解決するための手段】上記目的を達成するため
に本発明に係る基板材料は、酸化物換算で、SiO2
60〜80wt%、Al23 が0〜4wt%、K2
が0〜3wt%、Li2 Oが0〜3wt%、B23
15〜30wt%の組成範囲のものの総量が95wt%
以上となるガラス組成物粉末50〜70wt%と、結晶
質であるムライト及び/またはフォルステライト30〜
50wt%とからなる原料混合物の焼結体であることを
特徴とし、さらに、本発明に係る回路基板は上記基板材
料が積層化され、内部導体として銅または銀が用いられ
ていることを特徴としている。
In order to achieve the above object, the substrate material according to the present invention comprises, in terms of oxide, 60 to 80 wt% of SiO 2, 0 to 4 wt% of Al 2 O 3 , and K 2 O.
Is 0 to 3 wt%, Li 2 O is 0 to 3 wt%, and B 2 O 3 is in the composition range of 15 to 30 wt%, the total amount is 95 wt%.
50 to 70 wt% of the above glass composition powder and 30 to 30 of crystalline mullite and / or forsterite
It is characterized in that it is a sintered body of a raw material mixture consisting of 50 wt%, and further, the circuit board according to the present invention is characterized in that the above board materials are laminated and copper or silver is used as an internal conductor. There is.

【0010】一般に材料の誘電率及び熱膨張係数はそれ
ぞれ固有の物性値であり、組成に大きく依存する。複合
材料については混合則に従って変化するが、多くの場
合、焼結時に化学反応により出発時とは異なる物質が生
じ、それらの特性は混合則からはずれる。本発明者ら
は、ガラス組成について種々検討した結果、銅または銀
導体との同時焼成が可能な基板材料として、上記したガ
ラス組成が適切な特性を有することを見出した。さら
に、ムライト及び/またはフォルステライトを添加する
ことにより銅または銀等の導体との同時焼結性及び強度
に優れたものが得られ、基板材料の熱膨張係数をシリコ
ンと金属との中間に調整することができ、ワイヤーボン
ディング、ピン立て等における安定性も向上することを
見出し、本発明に至ったものである。
Generally, the dielectric constant and the thermal expansion coefficient of a material are their own physical property values, which greatly depend on the composition. For composites, the rules of mixing vary, but in many cases chemical reactions during sintering give rise to different substances than at the start, and their properties deviate from the rules of mixing. As a result of various studies on the glass composition, the present inventors have found that the above glass composition has suitable characteristics as a substrate material that can be co-fired with a copper or silver conductor. Furthermore, by adding mullite and / or forsterite, one having excellent co-sinterability with a conductor such as copper or silver and strength can be obtained, and the thermal expansion coefficient of the substrate material is adjusted to be between that of silicon and metal. The present invention has been made, and it has been found that the stability in wire bonding, pin stand, etc. is also improved.

【0011】[0011]

【作用】上記した構成によれば、酸化物換算で、SiO
2 が60〜80wt%、Al23 が0〜4wt%、K2
Oが0〜3wt%、Li2 Oが0〜3wt%、B23
が15〜30wt%の組成範囲のものの総量が95w
t%以上となるガラス組成物粉末50〜70wt%と、
結晶質であるムライト及び/またはフォルステライト3
0〜50wt%とからなる原料混合物の焼結体であるの
で、銅及び銀等の導体との低温同時焼成が可能で、低誘
電率であるとともに、半導体チップとして用いられてい
るシリコン及び導体やピン等の金属との熱膨張係数の差
も小さいものとなる。
According to the above-mentioned structure, SiO is calculated in terms of oxide.
2 is 60-80 wt%, Al 2 O 3 is 0-4 wt%, K 2
O is 0 to 3 wt%, Li 2 O is 0 to 3 wt%, B 2 O 3
The total amount of the composition range of 15 to 30 wt% is 95w
50 to 70 wt% of a glass composition powder of t% or more,
Crystalline mullite and / or forsterite 3
Since it is a sintered body of a raw material mixture consisting of 0 to 50 wt%, it can be co-fired at low temperature with a conductor such as copper and silver, has a low dielectric constant, and silicon and conductors used as a semiconductor chip. The difference in the coefficient of thermal expansion with the metal such as the pin is also small.

【0012】また、上記した構成の回路基板によれば、
上記基板材料が積層化され、内部導体として銅または銀
が用いられているので、電気抵抗が小さく、安価でしか
も安定した特性を有する製品が得られることとなる。
According to the circuit board having the above structure,
Since the above substrate materials are laminated and copper or silver is used as the internal conductor, a product having low electric resistance, low cost and stable characteristics can be obtained.

【0013】各成分を上記した範囲に限定したのは、S
iO2 の含有量がガラス組成中60wt%未満ではガラ
スの化学的安定性が悪化し、熱膨張係数が大きくなる。
一方、80wt%を越えると軟化温度が上昇し、100
0℃以下の焼成温度で十分に緻密化しなくなるためであ
る。
The limitation of each component to the above range is due to S
When the content of iO 2 is less than 60 wt% in the glass composition, the chemical stability of glass deteriorates and the coefficient of thermal expansion increases.
On the other hand, when it exceeds 80 wt%, the softening temperature rises to 100
This is because densification does not occur sufficiently at a firing temperature of 0 ° C or lower.

【0014】また、Al23 を含有させることにより
機械的強度は上昇するが、Al23 の含有量がガラス
組成中4wt%を越えると軟化点が上昇する。
Further, the mechanical strength by containing the Al 2 O 3 is increased, the content of Al 2 O 3 is softening point exceeds 4 wt% in the glass composition is increased.

【0015】さらに、K2 O及びLi2 Oを含有させる
ことによりガラスの軟化点が低下するが、K2 O及びL
2 Oの含有量がガラス組成中3wt%を越えると化学
的安定性の低下、特に添加セラミックスとの反応が生
じ、熱膨張係数等の上昇が起こる。
Further, the softening point of the glass is lowered by adding K 2 O and Li 2 O, but K 2 O and L
If the content of i 2 O exceeds 3 wt% in the glass composition, the chemical stability is lowered, and particularly the reaction with the added ceramics occurs, and the thermal expansion coefficient and the like increase.

【0016】また、B23 を含有させることによりガ
ラスの軟化点が低下してガラスフリットの作成が容易と
なるが、B23 の含有量がガラス組成中15wt%未
満では900℃での粘度が高く、基板の緻密化が不十分
となる。一方、30wt%を越えると誘電率が上昇し、
基板材料としては不適当となる。
Further, the addition of B 2 O 3 lowers the softening point of the glass and facilitates the production of a glass frit. However, when the content of B 2 O 3 is less than 15 wt% in the glass composition, it is 900 ° C. Has a high viscosity, resulting in insufficient densification of the substrate. On the other hand, when it exceeds 30 wt%, the dielectric constant increases,
It is not suitable as a substrate material.

【0017】また、ガラス組成物粉末を原料混合物の5
0wt%より少なくすると1000℃以下の焼結温度で
十分緻密化しない。一方、70wt%を越えると、85
0℃より低い温度でガラスの軟化による基板の変形が生
じるため、銅または銀等の導体との同時焼成が不可能と
なる。
Further, the glass composition powder is added to the raw material mixture 5
If it is less than 0 wt%, it will not be sufficiently densified at a sintering temperature of 1000 ° C or lower. On the other hand, if it exceeds 70 wt%, it will be 85
Since the substrate is deformed by the softening of the glass at a temperature lower than 0 ° C., it is impossible to co-fire with a conductor such as copper or silver.

【0018】さらに、ムライトを添加することにより機
械的強度が向上するとともに、ガラス冷却過程で生じる
クリストバライトの析出が抑制され、基板材料の熱膨張
係数が低く抑えられる。また、フォルステライトを添加
することにより、基板材料の強度が向上するとともに、
ガラス成分とムライトのみでは熱膨張係数が低くなり過
ぎることがあるのが抑えられ、熱膨張係数が増加してシ
リコンと金属との中間に調節可能となる。従って、ムラ
イト及び/またはフォルステライトを30〜50wt%
とすることにより、目的とする熱膨張係数、比誘電率が
得られる。
Furthermore, the addition of mullite improves the mechanical strength, suppresses the precipitation of cristobalite that occurs during the glass cooling process, and suppresses the coefficient of thermal expansion of the substrate material to be low. Also, the addition of forsterite improves the strength of the substrate material, and
It is possible to prevent the coefficient of thermal expansion from becoming too low only with the glass component and mullite, and the coefficient of thermal expansion is increased so that it can be adjusted between silicon and metal. Therefore, 30 to 50 wt% of mullite and / or forsterite
By setting the above, the desired thermal expansion coefficient and relative permittivity can be obtained.

【0019】また、ムライト及びフォルステライトをそ
れぞれ結晶質で添加するのは、ガラス質に対して結晶質
の方が機械的強度にまさり、上記ガラス組成のみでは不
十分な強度が結晶質セラミックスと複合化されることで
向上するためである。
Mullite and forsterite are added in crystalline form, respectively. The crystalline is superior to the glass in mechanical strength, and the glass composition alone has insufficient strength in combination with crystalline ceramics. This is because it will be improved as a result.

【0020】[0020]

【実施例】以下、本発明に係る実施例を比較例とともに
説明する。まず、表1に示した組成になるように原料を
混合して、1450〜1550℃の温度で溶融、水砕
し、ガラスを得た。
EXAMPLES Examples according to the present invention will be described below together with comparative examples. First, the raw materials were mixed so as to have the composition shown in Table 1, melted at a temperature of 1450 to 1550 ° C., and water-granulated to obtain glass.

【0021】[0021]

【表1】 [Table 1]

【0022】なお、表中※印は本発明の範囲内のもの、
それ以外は本発明の範囲外のものを示している。
In the table, * marks are within the scope of the present invention,
Other than that, those outside the scope of the present invention are shown.

【0023】表1より明らかなように、本発明の範囲内
の組成によって得られたガラスは、目的とする低温焼
成、低誘電率基板材料を作成するのに適していることが
分かる。
As is clear from Table 1, the glass obtained with the composition within the scope of the present invention is suitable for producing the target low temperature firing, low dielectric constant substrate material.

【0024】さらに、試料番号1で得られたガラス組成
物とムライト及びフォルステライトとを表2に示した組
成で、ボールミルにて粉砕混合し、キシレン、ブタノー
ルを溶媒とし、アクリル樹脂を加え、ドクターブレード
法により厚さ200μmのグリーンシートを作成した。
さらにグリーンシートを3〜10層、プレスにより積層
したものを850〜1000℃のN2ガス中で焼成し、基
板材料を作成した。
Further, the glass composition obtained in Sample No. 1 and mullite and forsterite having the compositions shown in Table 2 were pulverized and mixed in a ball mill, xylene and butanol were used as solvents, an acrylic resin was added, and a doctor was added. A 200 μm thick green sheet was prepared by the blade method.
Further, 3 to 10 layers of green sheets, laminated by pressing, were fired in N 2 gas at 850 to 1000 ° C. to prepare a substrate material.

【0025】得られた基板材料それぞれについて密度及
び気孔率を測定し、焼結性を評価した。またインピーダ
ンスアナライザーで比誘電率を、熱膨張計で熱膨張係数
を評価した。
The density and porosity of each of the obtained substrate materials were measured to evaluate the sinterability. The relative permittivity was evaluated with an impedance analyzer and the thermal expansion coefficient was evaluated with a thermal expansion meter.

【0026】また、上記のように作成したグリーンシー
トを用いて銅導体または銀導体を内部導体とし、5〜1
0層の積層によって同時焼成のセラミック基板を得た。
得られたセラミック基板にシリコンチップを実装した回
路基板の特性を、シリコンと電極とのマッチングとして
評価した。それらの結果を表2に示す。
Further, using the green sheet prepared as described above, a copper conductor or a silver conductor is used as an inner conductor, and
A co-fired ceramic substrate was obtained by stacking 0 layers.
The characteristics of the circuit board obtained by mounting a silicon chip on the obtained ceramic substrate were evaluated as matching between silicon and electrodes. The results are shown in Table 2.

【0027】[0027]

【表2】 [Table 2]

【0028】なお、表中※印は本発明の範囲内のもの、
それ以外は本発明の範囲外のものを示している。表2よ
り明らかなように、本発明の範囲内の組成で作成した基
板材料はいずれも、焼結性、誘電率及び熱膨張係数に優
れている。さらに、銅導体または銀導体を用いた同時焼
成回路基板としても有効であることが分かる。
In the table, * marks are within the scope of the present invention,
Other than that, those outside the scope of the present invention are shown. As is clear from Table 2, all the substrate materials prepared with the composition within the range of the present invention are excellent in sinterability, dielectric constant and thermal expansion coefficient. Further, it can be seen that it is also effective as a co-firing circuit board using a copper conductor or a silver conductor.

【0029】このような組成によって形成された基板材
料は、銅または銀等の導体との低温同時焼成が可能で、
低誘電率を実現できるので、信号処理の高速化に対応す
ることが可能となる。また、一般に半導体チップとして
用いられているシリコン及び導体やピン等の金属との熱
膨張係数の差を小さくすることができるので、基板とシ
リコン及び基板と導体やピン等の金属との間に生じる残
留熱応力を抑制することができる。従って、製品として
信頼性の高いものを作製することが可能となる。さら
に、内部導体として銅または銀が用いられているので、
電気抵抗が小さく、安価な回路基板を得ることができ
る。
The substrate material formed by such a composition can be co-fired at a low temperature with a conductor such as copper or silver,
Since a low dielectric constant can be realized, it becomes possible to cope with speeding up of signal processing. Further, since it is possible to reduce the difference in the coefficient of thermal expansion between silicon and a metal such as a conductor or a pin which is generally used as a semiconductor chip, a difference occurs between the substrate and silicon, and between the substrate and the metal such as a conductor or a pin. Residual thermal stress can be suppressed. Therefore, it is possible to manufacture a highly reliable product. Furthermore, since copper or silver is used as the inner conductor,
An inexpensive circuit board having a low electric resistance can be obtained.

【0030】[0030]

【発明の効果】以上詳述したように本発明に係る基板材
料にあっては、酸化物換算で、SiO2 が60〜80w
t%、Al23 が0〜4wt%、K2 Oが0〜3wt
%、Li2 Oが0〜3wt%、B23 が15〜30w
t%の組成範囲のものの総量が95wt%以上となるガ
ラス組成物粉末50〜70wt%と、結晶質であるムラ
イト及び/またはフォルステライト30〜50wt%と
からなる原料混合物の焼結体であるので、銅及び銀等の
導体との低温同時焼成が可能で、低誘電率を実現するこ
とができ、信号処理の高速化に対応することが可能とな
る。また、半導体チップとして用いられているシリコン
及び導体やピン等の金属との熱膨張係数の差を調節する
ことができ、ピン付け及びワイヤーボンディング等にお
ける歩留まりを向上させ、製品として信頼性の高いもの
を提供することができる。
As described above in detail, in the substrate material according to the present invention, SiO 2 is 60 to 80 w in terms of oxide.
t%, Al 2 O 3 is 0 to 4 wt%, K 2 O is 0 to 3 wt%.
%, Li 2 O is 0 to 3 wt%, B 2 O 3 is 15 to 30 w
Since it is a sintered body of a raw material mixture consisting of 50 to 70 wt% of a glass composition powder whose total amount in the composition range of t% is 95 wt% or more, and 30 to 50 wt% of crystalline mullite and / or forsterite. It is possible to perform low temperature co-firing with conductors such as copper, silver and the like, and it is possible to realize a low dielectric constant and to cope with high-speed signal processing. Further, it is possible to adjust the difference in thermal expansion coefficient between silicon used as a semiconductor chip and a metal such as a conductor or a pin, which improves the yield in pin-bonding and wire-bonding. Can be provided.

【0031】また、本発明に係る回路基板にあっては上
記基板材料が積層化され、内部導体として銅または銀が
用いられているので、電気抵抗が小さく、安価でしかも
安定した特性を有する製品を提供することができる。
Further, in the circuit board according to the present invention, since the above board materials are laminated and copper or silver is used as the internal conductor, a product having a small electric resistance, an inexpensive price and stable characteristics Can be provided.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 酸化物換算で、SiO2 が60〜80w
t%、Al23 が0〜4wt%、K2 Oが0〜3wt
%、Li2 Oが0〜3wt%、B23 が15〜30w
t%の組成範囲のものの総量が95wt%以上となるガ
ラス組成物粉末50〜70wt%と、結晶質であるムラ
イト及び/またはフォルステライト30〜50wt%と
からなる原料混合物の焼結体であることを特徴とする基
板材料。
1. SiO 2 is 60 to 80 w in terms of oxide.
t%, Al 2 O 3 is 0 to 4 wt%, K 2 O is 0 to 3 wt%.
%, Li 2 O is 0 to 3 wt%, B 2 O 3 is 15 to 30 w
It should be a sintered body of a raw material mixture consisting of 50 to 70 wt% of a glass composition powder having a total content of 95 wt% or more in the composition range of t% and 30 to 50 wt% of crystalline mullite and / or forsterite. Substrate material characterized by.
【請求項2】 請求項1記載の基板材料が積層化され、
内部導体として銅または銀が用いられていることを特徴
とする回路基板。
2. The substrate material according to claim 1, which is laminated,
A circuit board using copper or silver as an inner conductor.
JP3041656A 1991-03-07 1991-03-07 Substrate material and circuit substrate Pending JPH0517211A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3041656A JPH0517211A (en) 1991-03-07 1991-03-07 Substrate material and circuit substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3041656A JPH0517211A (en) 1991-03-07 1991-03-07 Substrate material and circuit substrate

Publications (1)

Publication Number Publication Date
JPH0517211A true JPH0517211A (en) 1993-01-26

Family

ID=12614414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3041656A Pending JPH0517211A (en) 1991-03-07 1991-03-07 Substrate material and circuit substrate

Country Status (1)

Country Link
JP (1) JPH0517211A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7309669B2 (en) 2001-12-25 2007-12-18 Ngk Spark Plug Co., Ltd. Dielectric material and dielectric sintered body, and wiring board using the same
US7903395B2 (en) 2005-12-27 2011-03-08 Nifco Inc. Electronic device mounting structure
US8587958B2 (en) 2011-07-11 2013-11-19 Kabushiki Kaisha Toshiba Wall hanger and display
JP5673561B2 (en) * 2010-02-01 2015-02-18 旭硝子株式会社 Light emitting element mounting support, light emitting device, and method of manufacturing light emitting element mounting support
JP2017210389A (en) * 2016-05-26 2017-11-30 株式会社村田製作所 Glass-ceramic-ferrite composition and electronic component
JPWO2018100863A1 (en) * 2016-11-30 2019-10-17 株式会社村田製作所 Composite electronic component and method of manufacturing the composite electronic component

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7309669B2 (en) 2001-12-25 2007-12-18 Ngk Spark Plug Co., Ltd. Dielectric material and dielectric sintered body, and wiring board using the same
US7903395B2 (en) 2005-12-27 2011-03-08 Nifco Inc. Electronic device mounting structure
JP5673561B2 (en) * 2010-02-01 2015-02-18 旭硝子株式会社 Light emitting element mounting support, light emitting device, and method of manufacturing light emitting element mounting support
US8587958B2 (en) 2011-07-11 2013-11-19 Kabushiki Kaisha Toshiba Wall hanger and display
JP2017210389A (en) * 2016-05-26 2017-11-30 株式会社村田製作所 Glass-ceramic-ferrite composition and electronic component
JPWO2018100863A1 (en) * 2016-11-30 2019-10-17 株式会社村田製作所 Composite electronic component and method of manufacturing the composite electronic component

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