JPH11253928A - Treatment of waste liquid of hypophosphorous acid and phosphorus acid - Google Patents

Treatment of waste liquid of hypophosphorous acid and phosphorus acid

Info

Publication number
JPH11253928A
JPH11253928A JP7305598A JP7305598A JPH11253928A JP H11253928 A JPH11253928 A JP H11253928A JP 7305598 A JP7305598 A JP 7305598A JP 7305598 A JP7305598 A JP 7305598A JP H11253928 A JPH11253928 A JP H11253928A
Authority
JP
Japan
Prior art keywords
copper
waste liquid
acid
chloride
phosphorous acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7305598A
Other languages
Japanese (ja)
Other versions
JP3448730B2 (en
Inventor
Yoshinobu Shitsu
佳伸 四津
Kenji Takayoshi
健二 高吉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ISHIZAKI SANGYO KK
Original Assignee
ISHIZAKI SANGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ISHIZAKI SANGYO KK filed Critical ISHIZAKI SANGYO KK
Priority to JP07305598A priority Critical patent/JP3448730B2/en
Publication of JPH11253928A publication Critical patent/JPH11253928A/en
Application granted granted Critical
Publication of JP3448730B2 publication Critical patent/JP3448730B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Removal Of Specific Substances (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)

Abstract

PROBLEM TO BE SOLVED: To treat a waste liquid containing hypophosphrous acid and phosphorous acid of high concentration efficiently by a method in which, in the treatment of the waste liquid including a nonelectrolytic plating waste liquid, the liquid is heated at a predetermined temperature in the presence of divalent copper ions. SOLUTION: In the treatment of a waste liquid containing hypophosphorous acid and phosphorous acid, the liquid, after being added with a copper (II) salt, is heated at a predetermined temperature, namely at 40 deg.C or above to oxidize the hypophosphorous acid and phosphorous acid. When copper (II) sulfate or copper(II) acetate is used as divalent copper ions, the ions are recovered as metallic copper. When copper (II) chloride is added, a white precipitate [copper (I) chloride] is recovered. Although the obtained metallic copper is powdery and filtered difficultly, the obtained white precipitate can be easily precipitated and dewatered, and the water content is low to facilitate solid-liquid separation. Therefore, it is preferable to use copper (II) chloride.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は例えば無電解ニッケ
ルメッキ液の還元剤として含まれる次亜リン酸とこの次
亜リン酸を含むメッキ液が老化して亜リン酸をも含んだ
廃液の処理方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the treatment of, for example, hypophosphorous acid contained as a reducing agent for an electroless nickel plating solution and a waste solution containing a phosphorous acid which ages due to aging of the plating solution containing this hypophosphorous acid. It is about the method.

【0002】[0002]

【従来の技術】無電解めっき法は、電解CNめっき法と異
なり外部電流を使用せず、プラスチックスにもめっき可
能なため、その適用は大きく広がった。それに伴って、
無電解メッキ液の排出量も増加した。この廃液には、重
金属や有機物を多く含むだけでなく、次亜リン酸とこの
次亜リン酸が老化した亜リン酸とを多く含まれているた
め、一元的に処理するには非常に困難であることが分か
っている。現行の処理方法は重金属のみを対象としたも
のであり、次亜リン酸及び亜リン酸や有機物(COD換算
物)を対象にしたものは非常に少ない。
2. Description of the Related Art Unlike the electrolytic CN plating method, the electroless plating method does not use an external current and can also be applied to plastics. Along with that,
The discharge of the electroless plating solution also increased. This waste liquid not only contains a lot of heavy metals and organic substances, but also contains a lot of hypophosphorous acid and this hypophosphorous acid, which is aged. I know that Current treatment methods are for heavy metals only, and very few are for hypophosphorous acid and phosphorous acid or organic substances (COD equivalent).

【0003】従って、総合的な処理プロセスを確立する
際、次亜リン酸及び亜リン酸を含む廃液の酸化処理法の
開発・確立が重要課題となる。これまでの研究では、次
亜リン酸のFe(III)イオンによる化学的酸化処理法が
報告されているが、取り扱う次亜リン酸や共存物質の濃
度は低く、無電解ニッケルメッキ廃液のように高濃度の
廃液への適用にはまだ至っていない。
Therefore, when establishing a comprehensive treatment process, it is important to develop and establish a method for oxidizing waste liquid containing hypophosphorous acid and phosphorous acid. Previous studies have reported a chemical oxidation treatment of hypophosphorous acid with Fe (III) ions, but the concentration of hypophosphorous acid and coexisting substances to be handled is low, and it is difficult to use electroless nickel plating wastewater. It has not yet been applied to highly concentrated waste liquids.

【0004】[0004]

【発明が解決しようとする課題】そこで、本発明者らは
鋭意努力の結果、次亜リン酸及び亜リン酸を酸化する酸
化剤をいくつか選び、検討した結果、2価の銅イオンを
利用することで次亜リン酸及び亜リン酸の酸化、そして
再度銅塩として固体回収が可能であることが示唆され、
本発明に至った。
The inventors of the present invention have made intensive efforts to select hypophosphorous acid and some oxidizing agents for oxidizing phosphorous acid, and as a result, have studied the use of divalent copper ions. This suggests that it is possible to oxidize hypophosphorous acid and phosphorous acid, and to recover solid as a copper salt again,
The present invention has been reached.

【0005】本発明は、無電解ニッケルメッキ廃液のよ
うに高濃度の次亜リン酸及び亜リン酸を含む廃液の処理
法を得ることを目的とする。更には、プリント基板のエ
ッチング工程などで排出される塩化銅(II)廃液から塩化
銅(I)を回収することのできる次亜リン酸及び亜リン酸
を含む廃液の処理法を得ることを目的とする。
An object of the present invention is to provide a method for treating a waste liquid containing a high concentration of hypophosphorous acid and phosphorous acid such as an electroless nickel plating waste liquid. Another object of the present invention is to provide a method for treating hypophosphorous acid and a wastewater containing phosphorous acid capable of recovering copper (I) chloride from a copper (II) wastewater discharged in a printed circuit board etching step or the like. And

【0006】[0006]

【課題を解決するための手段】本請求項1に記載された
発明に係る次亜リン酸及び亜リン酸廃液の処理法では、
次亜リン酸及び亜リン酸を含む廃液を2価の銅イオン存
在下で、予め定められた温度に加温する方法である。
According to the method for treating hypophosphorous acid and the waste solution of phosphorous acid according to the first aspect of the present invention,
This is a method in which a waste liquid containing hypophosphorous acid and phosphorous acid is heated to a predetermined temperature in the presence of divalent copper ions.

【0007】本請求項2に記載された発明に係る次亜リ
ン酸及び亜リン酸廃液の処理法では、請求項1に記載さ
れた予め定められた温度として、40℃以上に加温する
方法である。
[0007] In the method for treating hypophosphorous acid and phosphorous acid waste liquid according to the second aspect of the present invention, a method of heating to a predetermined temperature of 40 ° C or more according to the first aspect. It is.

【0008】本請求項3に記載された発明に係る次亜リ
ン酸及び亜リン酸廃液の処理法では、請求項2に記載さ
れため定められた温度として、60℃以上80℃以下に
加温する方法である。
[0008] In the method for treating hypophosphorous acid and a waste solution of phosphorous acid according to the third aspect of the present invention, the temperature is set to be not less than 60 ° C and not more than 80 ° C as set forth in the second aspect. How to

【0009】本請求項4に記載された発明に係る次亜リ
ン酸及び亜リン酸廃液の処理法では、請求項1に記載さ
れた2価の銅イオンとして、塩化銅(II)廃液を用いる方
法である。
In the method for treating a hypophosphorous acid and a phosphorous acid waste liquid according to the invention described in claim 4, copper (II) chloride waste liquid is used as the divalent copper ion described in claim 1. Is the way.

【0010】[0010]

【発明の実施の形態】本発明においては、次亜リン酸及
び亜リン酸を含む廃液に2価の銅塩を添加した後、予め
定められた温度に加温することにより、次亜リン酸及び
亜リン酸を酸化することができる。詳しい反応は次の示
す通りであると考えられる。
BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, hypophosphorous acid is added to a waste liquid containing hypophosphorous acid and phosphorous acid, and then heated to a predetermined temperature. And phosphorous acid can be oxidized. The detailed reaction is considered to be as follows.

【0011】 H2PO2 -+H2O→HPO3 2-+H++2H0 …(1) Cu2++2H0 →Cu↓+2H+ …(2) CuCl2+H0 →CuCl↓+HCl …(3) Cu2++HPO3 2-+H2O→Cu↓+HPO4 2-+2H+ …(4) 2CuCl2+HPO3 2-+H2O→2CuCl↓+HPO4 2-+HCl …(5)H 2 PO 2 + H 2 O → HPO 3 2− + H + + 2H 0 (1) Cu 2+ + 2H 0 → Cu ↓ + 2H + (2) CuCl 2 + H 0 → CuCl ↓ + HCl (3) Cu 2+ + HPO 3 2+ H 2 O → Cu ↓ + HPO 4 2+ 2H + ... (4) 2CuCl 2 + HPO 3 2+ H 2 O → 2CuCl ↓ + HPO 4 2+ HCl ... (5)

【0012】即ち、(1)式に示す通り、次亜リン酸は
亜リン酸に至る過程で2つの水素原子(H0)を放出す
る。この水素原子は(2)式に示す通り、2価の銅イオ
ンを金属銅として析出させる。また、特別に塩化銅(II)
を用いた場合には、塩化銅(II)中の2価の銅イオンが金
属銅として析出する前に、(3)式に示す通り、塩化銅
(II)を塩化銅(I)にして析出させる。また、亜リン酸は
同じく還元性が高いため、(4)式に示す通り、メタリ
ン酸に至る過程で銅イオンを析出させたり、(5)式に
示す通り、塩化銅(II)を塩化銅(I)にして析出させる。
That is, as shown in the formula (1), hypophosphorous acid releases two hydrogen atoms (H 0 ) in the process of reaching phosphorous acid. This hydrogen atom precipitates divalent copper ions as metallic copper as shown in equation (2). Also specially copper (II) chloride
Is used, before the divalent copper ions in copper (II) chloride precipitate as metallic copper, as shown in equation (3),
(II) is converted to copper (I) chloride and precipitated. Also, since phosphorous acid has a high reducibility, copper ions are precipitated in the process of metaphosphoric acid as shown in equation (4), and copper (II) chloride is converted to copper chloride as shown in equation (5). (I) and precipitated.

【0013】銅塩の中でも塩化銅(II)についてはその形
態に関係なく塩化銅(I)として回収でき、添加する銅塩
が固体状態でも溶液状態でも、反応は同じように進行
し、30分程度でほぼ反応が終了する。
Among copper salts, copper (II) chloride can be recovered as copper (I) chloride irrespective of its form, and the reaction proceeds in the same manner regardless of whether the added copper salt is in a solid state or a solution state, and the reaction proceeds for 30 minutes. The reaction is almost completed when the reaction is completed.

【0014】本発明においては、前述の金属銅及び塩化
銅(I)の析出反応を起こさせるには、好ましくは40℃
以上に加温する必要があることが判った。また、60℃
以上の加温で析出量がほぼ平衡状態となるため、より好
ましくは、60℃以上に加温する必要があることが判っ
た。尚、80℃を越えて加温することは、加温に対する
析出量もさほど変わりがなく、エネルギー面、熱に対す
る加熱槽の対処等を考慮して、80℃以下の加温で充分
である。
In the present invention, in order to cause the above-described precipitation reaction of metallic copper and copper (I) chloride, the reaction is preferably carried out at 40 ° C.
It turned out that it was necessary to heat above. Also, 60 ° C
It has been found that it is necessary to heat to 60 ° C. or more, more preferably, because the amount of precipitation becomes almost equilibrium by the above heating. Heating above 80 ° C. does not significantly change the amount of deposition with respect to heating, and heating at 80 ° C. or less is sufficient in consideration of the energy surface and how the heating tank handles heat.

【0015】本発明で用いる2価の銅イオンとしては、
前述の反応式に示す通り、硫酸銅(II)、酢酸銅(II)とい
った銅塩を添加すると金属銅として回収でき、塩化銅(I
I)を添加した場合、白色沈殿物[塩化銅(I)〕として回
収できる。得られる金属銅は微粉状で、濾過性に乏しい
が、得られる白色沈殿物[塩化銅(I)]は沈降性及び脱
水性がよく、含水率も15%程度と低く、固液分離を行い
やすいため、2価の銅イオンとしては塩化銅(II)を用い
ることが好ましい。
The divalent copper ions used in the present invention include:
As shown in the above reaction formula, when copper salts such as copper (II) sulfate and copper (II) acetate are added, it can be recovered as metallic copper, and copper chloride (I
When I) is added, it can be recovered as a white precipitate [copper (I) chloride]. The resulting metallic copper is in the form of fine powder and poor in filterability, but the resulting white precipitate [copper (I) chloride] has good sedimentation and dehydration properties, has a low water content of about 15%, and undergoes solid-liquid separation. It is preferable to use copper (II) chloride as the divalent copper ion.

【0016】本発明で用いる塩化銅(II)としては、塩化
銅(II)廃液を利用してもよい。この塩化銅(II)廃液は、
電子部品の需要増加とともに、その排出量が大きく増大
しているプリント基板のエッチング工程などで排出され
るものである。この塩化銅廃液には多量の2価の銅イオ
ンが含まれており、銅の濃度は十万mg/リットル以上と
非常に高い。そのため廃液中の銅の回収・リサイクル化
が大きく注目される。また、他の銅含有廃液でもその銅
化合物の種類によっては金属銅としてリサイクルが可能
である。
As the copper (II) chloride used in the present invention, a copper (II) chloride waste liquid may be used. This copper (II) chloride waste liquid,
With the increase in demand for electronic components, these are emitted in a process of etching a printed circuit board, the amount of which is greatly increasing. This copper chloride waste liquid contains a large amount of divalent copper ions, and the concentration of copper is as high as 100,000 mg / liter or more. Therefore, attention is paid to the collection and recycling of copper in waste liquid. Further, other copper-containing waste liquid can be recycled as metallic copper depending on the type of the copper compound.

【0017】従って、本発明は、次亜リン酸及び亜リン
酸廃液を利用して塩化銅(II)廃液から銅を回収する方法
という側面を有する。本発明は次亜リン酸及び亜リン酸
廃液の一次処理法としても有効であるだけでなく、銅の
リサイクルとしても有効であるという両面性をもつもの
である。
Accordingly, the present invention has an aspect of a method for recovering copper from a copper (II) chloride waste liquid by using hypophosphorous acid and a phosphorous acid waste liquid. INDUSTRIAL APPLICABILITY The present invention is effective not only as a primary treatment method for hypophosphorous acid and phosphorous acid waste liquid, but also for recycling copper.

【0018】[0018]

【実施例】1.試料 実験に使用した次亜リン酸及び亜リン酸含有廃液は3種
類でその組成を以下の表1に示す。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Samples The hypophosphorous acid and phosphorous acid-containing waste liquid used in the experiment were of three types, and their compositions are shown in Table 1 below.

【0019】[0019]

【表1】 [Table 1]

【0020】塩化銅溶液は薬品から調整したものと、実
廃液との2種類を使用した。各々の銅イオン濃度、及び
比重を表2に示す。
Two types of copper chloride solutions were used, one prepared from chemicals and the other, a real waste liquid. Table 2 shows the respective copper ion concentrations and specific gravities.

【0021】[0021]

【表2】 [Table 2]

【0022】2.基本操作 実験液(無電解ニッケルメッキ廃液)を適量取り、液温
調節した後、塩化銅廃液および酸を添加し、反応を観測
するとともに、目的に応じて析出した銅、COD,P量
などを測定した。
2. Basic operation Take an appropriate amount of experimental solution (electroless nickel plating waste solution), adjust the temperature of the solution, add copper chloride waste solution and acid, observe the reaction, and determine the amount of copper, COD, P, etc. deposited according to the purpose. It was measured.

【0023】3.実験例1(反応温度の影響) 添加する塩化銅と次亜リン酸(P2)の比(Cu/P2)を
一定にし、反応させる液温の影響について検討した。図
1は廃液Aと廃液Zとを用いた場合の所定の温度での銅
の回収率及び回収量を示す線図である。図2は廃液Bと
調整液とを用いた場合の所定の温度での銅の回収率及び
回収量を示す線図である。図3は廃液Cと調整液とを用
いた場合(Cu/P2=1.0)の所定の温度での銅の回収率
及び回収量を示す線図である。図4は廃液Cと調整液と
を用いた場合(Cu/P2=2.0)の所定の温度での銅の回
収率及び回収量を示す線図である。
3. Experimental Example 1 (Effect of Reaction Temperature) The ratio of the added copper chloride and hypophosphorous acid (P 2 ) (Cu / P 2 ) was kept constant, and the effect of the liquid temperature for the reaction was examined. FIG. 1 is a diagram showing the recovery rate and the recovery amount of copper at a predetermined temperature when waste liquid A and waste liquid Z are used. FIG. 2 is a diagram showing the recovery rate and the recovery amount of copper at a predetermined temperature when the waste liquid B and the adjustment liquid are used. FIG. 3 is a diagram showing the recovery rate and the recovery amount of copper at a predetermined temperature when the waste liquid C and the adjustment liquid are used (Cu / P 2 = 1.0). FIG. 4 is a diagram showing the recovery rate and the recovery amount of copper at a predetermined temperature when the waste liquid C and the adjustment liquid are used (Cu / P 2 = 2.0).

【0024】図1〜図4に示す通り、反応する温度の上
昇に応じて析出する塩化銅(I)の量が増えることが判っ
た。図1においては図2〜図4とは相違した傾向が見ら
れた。しかし、廃液Bや廃液Cと廃液Zとを反応させて
も図2〜図4と同じ傾向であったことから、この傾向の
相違は廃液Zによるものではなく、廃液Aに含まれてい
る他の成分によるものと考えられた。また、図2〜図4
に示す通り塩化銅(I)の沈殿物生成は60℃でほぼ平衡
となることが判った。
As shown in FIGS. 1 to 4, it was found that the amount of precipitated copper (I) chloride increased as the reaction temperature increased. In FIG. 1, a tendency different from FIGS. 2 to 4 was observed. However, even when the waste liquid B or the waste liquid C was reacted with the waste liquid Z, the tendency was the same as in FIGS. 2 to 4. Therefore, the difference in the tendency was not due to the waste liquid Z but included in the waste liquid A. It was thought to be due to the components of 2 to 4
It was found that the formation of a precipitate of copper (I) chloride was almost equilibrated at 60 ° C. as shown in FIG.

【0025】4.実験2(銅とリン(P2)との比(Cu
/P2)による影響) 反応温度を一定に保ち(80℃)、塩化銅の添加量を変化
させ、銅の回収に及ぼす銅/リン比(Cu/P2)の影響
について検討した。図5は廃液Aと廃液Zとを用いて銅
とリンとの比を相違させた場合の銅の回収率及び回収量
を示す線図である。図6は廃液Bと調整液とを用いて銅
とリンとの比を相違させた場合の銅の回収率及び回収量
を示す線図である。図7は廃液Cと調整液とを用いて銅
とリンとの比を相違させた場合の銅の回収率及び回収量
を示す線図である。
4. Experiment 2 (copper to phosphorus (P 2 ) ratio (Cu
/ P 2 ) The reaction temperature was kept constant (80 ° C.), the amount of copper chloride added was varied, and the effect of the copper / phosphorus ratio (Cu / P 2 ) on copper recovery was examined. FIG. 5 is a diagram showing the recovery rate and the recovery amount of copper when the ratio of copper to phosphorus is changed using the waste liquid A and the waste liquid Z. FIG. 6 is a diagram showing the recovery rate and the recovery amount of copper when the ratio of copper to phosphorus is changed using the waste liquid B and the adjustment liquid. FIG. 7 is a diagram showing the recovery rate and the recovery amount of copper when the ratio of copper to phosphorus is changed using the waste liquid C and the adjustment liquid.

【0026】図5〜図7に示す通り、塩化銅の添加量を
増やすことにより、回収される銅の量が増えていること
が判った。また、回収率としては塩化銅の添加量の変化
に殆ど変わりがなく、60〜80%となった。
As shown in FIGS. 5 to 7, it was found that the amount of copper recovered was increased by increasing the amount of copper chloride added. In addition, the recovery rate was 60 to 80%, with almost no change in the amount of copper chloride added.

【0027】[0027]

【発明の効果】本発明は以上説明したとおり、無電解ニ
ッケルメッキ廃液のように高濃度の次亜リン酸及び亜リ
ン酸を含む廃液の処理法を得ることができ、更には、プ
リント基板のエッチング工程などで排出される塩化銅(I
I)廃液から塩化銅(I)を回収することのできる次亜リン
酸及び亜リン酸を含む廃液の処理法を得ることができる
という効果がある。
As described above, according to the present invention, it is possible to obtain a method for treating a waste solution containing a high concentration of hypophosphorous acid and phosphorous acid, such as an electroless nickel plating waste solution. Copper chloride (I
I) There is an effect that it is possible to obtain a method for treating a waste liquid containing hypophosphorous acid and phosphorous acid that can recover copper (I) chloride from the waste liquid.

【図面の簡単な説明】[Brief description of the drawings]

【図1】廃液Aと廃液Zとを用いた場合の所定の温度で
の銅の回収率及び回収量を示す線図である。
FIG. 1 is a diagram showing a recovery rate and a recovery amount of copper at a predetermined temperature when a waste liquid A and a waste liquid Z are used.

【図2】廃液Bと調整液とを用いた場合の所定の温度で
の銅の回収率及び回収量を示す線図である。
FIG. 2 is a diagram showing a recovery rate and a recovery amount of copper at a predetermined temperature when a waste liquid B and an adjustment liquid are used.

【図3】廃液Cと調整液とを用いた場合(Cu/P2=1.
0)の所定の温度での銅の回収率及び回収量を示す線図
である。
FIG. 3 shows a case in which a waste liquid C and a conditioning liquid are used (Cu / P 2 = 1.
FIG. 2 is a diagram showing the recovery rate and the recovery amount of copper at a predetermined temperature of 0).

【図4】廃液Cと調整液とを用いた場合(Cu/P2=2.
0)の所定の温度での銅の回収率及び回収量を示す線図
である。
FIG. 4 shows a case in which a waste liquid C and a conditioning liquid are used (Cu / P 2 = 2.
FIG. 2 is a diagram showing the recovery rate and the recovery amount of copper at a predetermined temperature of 0).

【図5】廃液Aと廃液Zとを用いて銅とリンとの比を相
違させた場合の銅の回収率及び回収量を示す線図であ
る。
FIG. 5 is a diagram showing the recovery rate and the recovery amount of copper when the ratio of copper to phosphorus is changed by using the waste liquid A and the waste liquid Z.

【図6】廃液Bと調整液とを用いて銅とリンとの比を相
違させた場合の銅の回収率及び回収量を示す線図であ
る。
FIG. 6 is a graph showing the recovery rate and the recovery amount of copper when the ratio of copper to phosphorus is changed by using the waste liquid B and the adjustment liquid.

【図7】廃液Cと調整液とを用いて銅とリンとの比を相
違させた場合の銅の回収率及び回収量を示す線図であ
る。
FIG. 7 is a diagram showing a copper recovery rate and a copper recovery amount when the ratio of copper to phosphorus is changed using the waste liquid C and the adjustment liquid.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 次亜リン酸及び亜リン酸を含む廃液を2
価の銅イオン存在下で、予め定められた温度に加温する
ことを特徴とする次亜リン酸及び亜リン酸廃液の処理
法。
1. A waste liquid containing hypophosphorous acid and phosphorous acid
A method for treating hypophosphorous acid and a waste solution of phosphorous acid, comprising heating to a predetermined temperature in the presence of multivalent copper ions.
【請求項2】 前記予め定められた温度として、40℃
以上に加温することを特徴とする請求項1に記載された
次亜リン酸及び亜リン酸廃液の処理法。
2. The predetermined temperature is 40 ° C.
The method for treating hypophosphorous acid and phosphorous acid waste liquid according to claim 1, wherein the heating is performed as described above.
【請求項3】 前記予め定められた温度として、60℃
以上80℃以下に加温することを特徴とする請求項2に
記載された次亜リン酸及び亜リン酸廃液の処理法。
3. The method according to claim 1, wherein the predetermined temperature is 60 ° C.
The method for treating hypophosphorous acid and a phosphorous acid waste solution according to claim 2, wherein the solution is heated to at least 80 ° C.
【請求項4】 前記2価の銅イオンとして、塩化銅(II)
を用いることを特徴とする請求項1に記載された次亜リ
ン酸及び亜リン酸廃液の処理法。
4. The method according to claim 1, wherein said divalent copper ion is copper (II) chloride.
A method for treating hypophosphorous acid and a waste solution of phosphorous acid according to claim 1, characterized by using:
JP07305598A 1998-03-09 1998-03-09 Method for treating hypophosphorous acid and waste liquid of phosphorous acid Expired - Fee Related JP3448730B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP07305598A JP3448730B2 (en) 1998-03-09 1998-03-09 Method for treating hypophosphorous acid and waste liquid of phosphorous acid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07305598A JP3448730B2 (en) 1998-03-09 1998-03-09 Method for treating hypophosphorous acid and waste liquid of phosphorous acid

Publications (2)

Publication Number Publication Date
JPH11253928A true JPH11253928A (en) 1999-09-21
JP3448730B2 JP3448730B2 (en) 2003-09-22

Family

ID=13507304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP07305598A Expired - Fee Related JP3448730B2 (en) 1998-03-09 1998-03-09 Method for treating hypophosphorous acid and waste liquid of phosphorous acid

Country Status (1)

Country Link
JP (1) JP3448730B2 (en)

Also Published As

Publication number Publication date
JP3448730B2 (en) 2003-09-22

Similar Documents

Publication Publication Date Title
US9745193B2 (en) Method for removing iron in the manufacture of phosphoric acid
JP5307478B2 (en) Method and apparatus for recovering copper-containing solid from copper-containing acidic waste liquid
JP5434663B2 (en) Cyanide-containing wastewater treatment method and treatment equipment
JP6158927B2 (en) Sediment leach method
JP4894403B2 (en) Cyanide-containing wastewater treatment method and apparatus
JP5808131B2 (en) Process and recovery method for copper-containing acidic waste liquid and apparatus therefor
RU2119973C1 (en) Method of treatment of etching agent (variants)
JP2002526256A (en) Treatment method for metal contaminated water
CN111039441B (en) Method for treating chemical plating wastewater by generating colloid
US6126807A (en) Process for making sodium gold sulfite solution
JP2007016259A (en) System for collecting gold while recycling iodine ion in gold-removing liquid
JP2018158325A (en) Method for treating liquid to be treated and method for recovering silver
JP5965213B2 (en) Method and apparatus for recovering copper oxide from copper-containing acidic waste liquid
JPH11253928A (en) Treatment of waste liquid of hypophosphorous acid and phosphorus acid
Gylienė et al. The use of organic acids as precipitants for metal recovery from galvanic solutions
JPH0223236B2 (en)
JP2009126759A (en) Method of preparing high-purity solution containing nickel sulfate and cobalt sulfate, and method of producing high-purity nickel with use of the same solution
JP4405281B2 (en) Recycling method of electroless nickel plating waste liquid
JP4815082B2 (en) Treatment method of iron-containing sulfuric acid solution
CN111925012B (en) Electroplating wastewater treatment process
JPH0780479A (en) Treatment of organic compound-containing waste liquid
JPH0475285B2 (en)
TWI267494B (en) Copper plating material, and copper plating method
JP5985925B2 (en) Method and apparatus for treating waste liquid containing heavy metal
JPH0128629B2 (en)

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080711

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090711

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090711

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100711

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100711

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110711

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110711

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120711

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120711

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130711

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130711

Year of fee payment: 10

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130711

Year of fee payment: 10

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees