JPH11236668A - Thin film forming device and vacuum deposition device - Google Patents

Thin film forming device and vacuum deposition device

Info

Publication number
JPH11236668A
JPH11236668A JP5901798A JP5901798A JPH11236668A JP H11236668 A JPH11236668 A JP H11236668A JP 5901798 A JP5901798 A JP 5901798A JP 5901798 A JP5901798 A JP 5901798A JP H11236668 A JPH11236668 A JP H11236668A
Authority
JP
Japan
Prior art keywords
mask
rotary
outer peripheral
peripheral surface
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP5901798A
Other languages
Japanese (ja)
Inventor
Masaru Segawa
勝 瀬川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP5901798A priority Critical patent/JPH11236668A/en
Publication of JPH11236668A publication Critical patent/JPH11236668A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To increase the producting time and to improve operating ratio and productivity by moving one of members for preventing the deposition onto the unnecessary part of a belt-like member along the outer circumferential face of a rotary can. SOLUTION: A rotary mask 20 is composed of four mask units 21 to 24 fitted in freely attachably and detachably to a rotatable axis 18. A fixed mask 4 has openings 21b to 24b regulating the vapor depositing region corresponding to an opening 4a, and a magnetic material evaporated from a heat generating source 3 passes through the opening 21b of the rotary mask 20 and the opeing 4a of the fixed mask 4 and is deposited into the surface of a film 2 to form a thin film. Since, as the depositing process progresses, the deposited materials in a mask unit, particularly, at the lower part 21a' increase, till the time when the quantity of the deposited materials reach the prescribed amount or when the mask unit 22 reaches the initial position of the mask unit 21 for every predetermined film length, the rotary mask 20 is turned to turn the mask units 23 and 24 successively, thereby the deposition is executed. In this way, the deposited materials on the mask units 21 to 24 is prevented from being excessively grown.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、真空槽内で帯状の
基材に連続的に薄膜を形成するための装置、成膜材料を
溶融蒸発させて基材に蒸着することにより薄膜形成する
真空蒸着装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for continuously forming a thin film on a belt-like substrate in a vacuum chamber, and a vacuum for forming a thin film by melting and evaporating a film-forming material and depositing the material on the substrate. It relates to a vapor deposition device.

【0002】[0002]

【従来の技術】基材表面に、これとは別種の材料よりな
る薄膜を形成する手段として様々なものが開発されてい
るが、中でも、真空中での蒸着工程は広く普及している
ものである。使用される基材としては、ガラスなど板状
のものもあるが、その他に、高分子フィルムなどのフレ
キシブルな基材の表面に蒸着を施したものが包装材料、
装飾材料、並びに磁気記録媒体などの分野で用いられて
いる。
2. Description of the Related Art Various means have been developed for forming a thin film made of a different material on the surface of a base material. Among them, a vacuum deposition process is widely used. is there. The substrate used is, for example, a plate-like material such as glass, but in addition, a material obtained by vapor-depositing the surface of a flexible substrate such as a polymer film is a packaging material,
It is used in the field of decorative materials and magnetic recording media.

【0003】このように高分子フィルムに真空蒸着を施
す場合、基材となるフィルムは通常ロール状に数千〜数
万m巻かれたものを使用し、このロールを真空槽内にセ
ットして、連続して1ロールの蒸着を行う方法がとられ
ている。このとき、基材である高分子フィルムの耐熱性
が十分でない場合は、真空槽内に冷却した円筒状の回転
キャンを配設し、この回転キャンの外周面に蒸着部分の
フィルム基材を密着させることが一般的である。このよ
うな装置においては、冷却された回転キャンに蒸着材料
が付着しないように、フィルム基材のエッジ部分を覆う
必要がある。さらに、このような真空蒸着装置を使用し
て磁気記録媒体を製造する場合には、得られる磁気記録
媒体の電磁変換特性上の要求から、フィルム基材に対し
て、蒸発した飛来粒子の入射角を厳密に規制する必要が
あり(このように入射角を規制して蒸着を行う方法を、
一般に斜方蒸着法と呼ぶ)、いずれの場合にも、不適切
な部分への蒸着を防ぐために蒸着部分近傍領域に覆いを
配設している。このような覆いを、通常、マスク(防着
マスク、防着板、遮蔽板などを含む)、あるいは、総称
して防着用部材と呼ぶ。
When vacuum deposition is performed on a polymer film as described above, a film serving as a substrate is usually wound in a roll form of several thousands to tens of thousands of meters, and the roll is set in a vacuum chamber. , One roll is continuously deposited. At this time, if the heat resistance of the polymer film as the base material is not sufficient, a cooled cylindrical rotating can is provided in the vacuum chamber, and the film base of the vapor deposition portion is adhered to the outer peripheral surface of the rotating can. It is common to let them. In such an apparatus, it is necessary to cover the edge portion of the film substrate so that the vapor deposition material does not adhere to the cooled rotary can. Further, when a magnetic recording medium is manufactured by using such a vacuum evaporation apparatus, the incident angle of the evaporating flying particles with respect to the film substrate is required due to the requirement of the electromagnetic conversion characteristics of the obtained magnetic recording medium. Must be strictly regulated.
In each case, a cover is provided in the vicinity of the deposition portion in order to prevent deposition on an inappropriate portion. Such a cover is usually referred to as a mask (including a protection mask, a protection plate, a shielding plate, etc.) or a protection member.

【0004】図2は従来の真空蒸着装置、具体的には、
一例として磁気テープなどの磁気記録媒体を製造するた
めの真空蒸着装置における蒸着部主要部の防着構造を示
した図であり、真空槽内に配設された円筒状の回転キャ
ン1の外周面に基板材料、すなわち、フィルム2が密着
しながら移動する。回転キャン1の下方には磁性材料の
蒸発源、例えば、磁性材料を収容したルツボ3が配設さ
れ、また、回転キャンの蒸着部近傍を覆って防着用部
材、すなわち、マスク4が配設されている。マスク4に
は、フィルム2への蒸着領域を規制するための開口4a
が形成されており、例えば、走行系を支持する真空槽内
基準板5に脱着可能に取り付けられている。
FIG. 2 shows a conventional vacuum deposition apparatus, specifically,
FIG. 2 is a diagram showing a deposition prevention structure of a main part of a vapor deposition unit in a vacuum vapor deposition apparatus for manufacturing a magnetic recording medium such as a magnetic tape as an example, and an outer peripheral surface of a cylindrical rotary can 1 disposed in a vacuum chamber. The substrate material, that is, the film 2 moves while being in close contact with the substrate material. Below the rotary can 1, an evaporation source of the magnetic material, for example, a crucible 3 containing the magnetic material is provided, and a wear-protecting member, that is, a mask 4, is provided so as to cover the vicinity of the deposition portion of the rotary can. ing. The mask 4 has an opening 4 a for regulating a deposition area on the film 2.
And is detachably attached to, for example, a reference plate 5 in a vacuum chamber that supports the traveling system.

【0005】[0005]

【発明が解決しようとする課題】上述したような装置に
おいて、長尺のフィルムへ連続して蒸着を行うと、マス
クへの無効蒸気による付着物が次第に増加し、結果的に
は大量の付着物のために蒸着工程に支障をきたすという
問題がある。具体的には、成膜時間の経過とともに付着
堆積物が成長してマスクの開口4aが狭くなったり、あ
るいは、付着堆積物の塊の落下によるダストの発生、蒸
発源、例えばルツボ3への落下による溶融材料の飛散な
どが発生する。したがって、連続的に蒸着を行うことが
可能な処理長には限界があり、これを解消するために
は、定期的に装置内の真空を解除し、真空槽を解放する
と同時に、蒸発源3の加熱も中断して付着物の除去を行
うか、あるいは、マスク4を取り外し、別途用意した同
一形状のマスクと交換するか、いずれかの手段をとる必
要がある。しかしながら、いずれの場合も、蒸着を再開
するためには、装置内を再び真空引きし、さらにルツボ
3も再加熱する必要があるため、多大な手間と時間を要
し、これによって、装置の稼働率、生産性が著しく低下
するという問題がある。
In the above-described apparatus, when vapor deposition is continuously performed on a long film, the amount of deposits due to ineffective vapor on the mask gradually increases, and as a result, a large amount of deposits is formed. Therefore, there is a problem that the deposition process is hindered. More specifically, the deposit 4 grows as the film deposition time elapses, and the opening 4a of the mask becomes narrower, or dust is generated due to the drop of the lump of the deposit, and the deposit 4 drops to the evaporation source, for example, the crucible 3. The scattering of the molten material due to the above-mentioned phenomenon occurs. Therefore, there is a limit to the processing length at which continuous vapor deposition can be performed. To solve this problem, the vacuum in the apparatus is periodically released, the vacuum chamber is released, and at the same time, the evaporation source 3 is removed. It is necessary to take any means, such as removing the deposits by interrupting the heating, or removing the mask 4 and replacing it with a separately prepared mask of the same shape. However, in any case, in order to restart the vapor deposition, the inside of the apparatus needs to be evacuated again and the crucible 3 needs to be reheated, which requires a great deal of labor and time. There is a problem that the rate and productivity are significantly reduced.

【0006】また、磁気テープなどの磁気記録媒体の製
造装置においては、電子ビームにより蒸発源を加熱する
方法が用いられ、また、蒸発材料は強磁性材料であるた
め、このような強磁性材料の付着物が時間と共に成長す
ると、電子ビームをコントロールするための磁界に影響
を及ぼし、その結果、電子ビームの位置制御が困難にな
ってしまうという問題がある。したがって、この場合
も、連続的に蒸着を行える処理長、すなわち、連続生産
時間には限界があり、生産コストの上昇を招く結果とな
っている。
[0006] Further, in a manufacturing apparatus of a magnetic recording medium such as a magnetic tape, a method of heating an evaporation source by an electron beam is used, and since the evaporation material is a ferromagnetic material, such a ferromagnetic material is used. If the deposit grows over time, it affects the magnetic field for controlling the electron beam, and as a result, there is a problem that it is difficult to control the position of the electron beam. Therefore, also in this case, there is a limit to the processing length that enables continuous vapor deposition, that is, the continuous production time, which results in an increase in production cost.

【0007】[0007]

【課題を解決するための手段】本発明者は、上記の問題
を解消し、生産コストの上昇を招くことなく、装置の稼
働率及び生産性の向上を達成するために種々検討を重ね
た結果、防着用部材の少なくとも1つが移動可能な機構
を備え、このマスクが所定時間毎に移動すれば、付着物
の一箇所での成長を防止することが可能となるとの着想
を得た。
SUMMARY OF THE INVENTION The present inventor has made various studies to solve the above problems and to improve the operation rate and productivity of the apparatus without increasing the production cost. At least one of the anti-wear members is provided with a movable mechanism, and the idea is that if the mask moves at predetermined time intervals, it is possible to prevent the growth of the attached matter at one location.

【0008】すなわち、本発明によれば、真空槽内に円
筒状の回転キャンを備え、この回転キャンの外周面に沿
って移動する帯状の基材に連続的に薄膜を形成する薄膜
形成装置に、前記帯状基材の不要部への付着を防止する
ための防着用部材が配置されるとともに、この防着用部
材の少なくとも1つが前記回転キャンの外周面に沿って
移動する機構を備えたものが提供される。
That is, according to the present invention, there is provided a thin film forming apparatus which comprises a cylindrical rotary can in a vacuum chamber and continuously forms a thin film on a strip-shaped substrate moving along the outer peripheral surface of the rotary can. An anti-wear member for preventing the band-shaped base material from adhering to an unnecessary portion is provided, and a mechanism is provided in which at least one of the anti-wear members moves along the outer peripheral surface of the rotary can. Provided.

【0009】さらには、真空槽内に円筒状の回転キャン
と、この円筒状回転キャンの外周面に沿って移動する帯
状の基材に対向する蒸着材料の蒸発源と、この蒸発源か
ら前記基材に至る前記蒸着材料の蒸気流を部分的に遮断
し不要部への付着を防止するための防着用部材とを備え
た真空蒸着装置に、前記防着用部材の少なくとも1つが
前記回転キャンの外周面に沿って移動する機構を備えた
ものも提供される。
Further, a cylindrical rotary can in a vacuum chamber, an evaporation source of a vapor deposition material facing a strip-shaped base material moving along the outer peripheral surface of the cylindrical rotary can, and A deposition member for partially blocking the vapor flow of the vapor deposition material reaching the material and preventing adhesion to unnecessary portions, wherein at least one of the deposition prevention members has an outer periphery of the rotary can. Also provided is one with a mechanism for moving along a surface.

【0010】上記の各構成において、防着用部材の1つ
が、前記円筒状回転キャンの外周面に対応する湾曲面を
有するとともに、この湾曲面が前記回転キャンの外周面
に沿って回動可能となるように軸支されている構造とす
ることが好ましい。
In each of the above constructions, one of the wear prevention members has a curved surface corresponding to the outer peripheral surface of the cylindrical rotary can, and the curved surface is rotatable along the outer peripheral surface of the rotary can. It is preferable to adopt a structure in which the shaft is supported.

【0011】[0011]

【発明の実施の形態】本発明は、真空槽内で基材表面に
薄膜を形成する装置として広く利用が可能であるが、な
かでも、真空蒸着装置、さらには、蒸着材料として強磁
性材料を使用する磁気記録媒体の製造装置として特に有
用である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention can be widely used as an apparatus for forming a thin film on the surface of a substrate in a vacuum chamber, and among them, a vacuum evaporation apparatus, and further, a ferromagnetic material is used as an evaporation material. The present invention is particularly useful as an apparatus for manufacturing a magnetic recording medium to be used.

【0012】以下、一例として、磁気テープの製造装置
について説明する。図1は、磁気テープの製造工程に使
用される真空蒸着装置の構成の一例であり、図中、図2
と同一の構成要素には同一の符号を付してある。真空槽
内でフィルム2は供給ロール6から巻き出され、ガイド
ロール7〜11、回転キャン1、及びガイドロール1
2、13を経て巻取りロール14に巻取られる。ガイド
ロール10と11の間には、フィルム2を帯電させるこ
とにより回転キャンの表面に密着させるための前処理装
置15が、また、ガイドロール12の前段にはフィルム
2を除電する後処理装置16ならびにガイドロール12
の後段には、フィルム2のシワを取るための後処理装置
17がそれぞれ配設されている。
Hereinafter, a magnetic tape manufacturing apparatus will be described as an example. FIG. 1 is an example of a configuration of a vacuum evaporation apparatus used in a manufacturing process of a magnetic tape.
The same components as those described above are denoted by the same reference numerals. The film 2 is unwound from the supply roll 6 in the vacuum chamber, and the guide rolls 7 to 11, the rotary can 1, and the guide roll 1
After passing through 2 and 13, it is wound on a winding roll 14. Between the guide rolls 10 and 11, there is provided a pre-processing device 15 for charging the film 2 to make it adhere to the surface of the rotary can, and a post-processing device 16 for discharging the film 2 before the guide roll 12 is provided. And guide roll 12
At the subsequent stage, post-processing devices 17 for removing wrinkles of the film 2 are provided.

【0013】回転キャン1の外周面には、これを覆って
固定マスク4と回転式マスク20とから構成される防着
機構が配設されている。固定マスク4としては、従来の
構造のものが使用され、これには蒸着領域を規制するた
めの開口4aが形成されている。回転式マスク20は、
例えば、回転キャン1の軸と同軸で、これとは別個に回
転可能な軸18に脱着自在に取り付けられた複数個、こ
こでは4個のマスクユニット21〜24から構成されて
いる。各マスクユニット21〜24には固定マスク4の
外周面に沿う湾曲面21a〜24aが形成され、これら
の湾曲面21a〜24aには、固定マスク4の開口4a
に対応して、蒸着領域を規制するための開口21b〜2
4bがそれぞれ形成されている。図に示したように、回
転キャン1の下方に設置された磁性材料を収容したルツ
ボ3から蒸発した材料は回転式マスク20のマスクユニ
ット21の開口21b、及び、固定マスク4の開口4a
を経てフィルム2の表面に付着する。なお、図中、符号
19は蒸発源3から蒸発する材料の図中左方への飛散を
防止するための遮蔽板である。
On the outer peripheral surface of the rotary can 1, there is provided an anti-adhesion mechanism comprising the fixed mask 4 and the rotary mask 20 so as to cover the rotary can 1. The fixed mask 4 has a conventional structure, and has an opening 4a for regulating the deposition region. The rotary mask 20
For example, it comprises a plurality of, here four mask units 21 to 24 which are coaxial with the axis of the rotary can 1 and which are detachably attached to a shaft 18 which is rotatable separately therefrom. In each of the mask units 21 to 24, curved surfaces 21a to 24a are formed along the outer peripheral surface of the fixed mask 4, and the curved surfaces 21a to 24a are provided with openings 4a of the fixed mask 4.
Corresponding to the openings 21b to 21b for regulating the deposition region
4b are formed respectively. As shown in the figure, the material evaporated from the crucible 3 containing the magnetic material placed below the rotary can 1 is supplied to the opening 21b of the mask unit 21 of the rotary mask 20 and the opening 4a of the fixed mask 4.
And adheres to the surface of the film 2. In the drawing, reference numeral 19 denotes a shielding plate for preventing the material evaporated from the evaporation source 3 from scattering to the left in the drawing.

【0014】このような構成の蒸着装置において、蒸着
の開始とともに、冷却された回転キャン1は図中矢線で
示したように時計回りに回転し、回転式マスク20は当
初図示された位置、すなわち、マスクユニット21の開
口21bが固定マスク4の開口4aに対応する位置とな
るようにセットされている。蒸発源3からは加熱された
磁性材料が蒸発し、回転式マスク20のマスクユニット
21の開口21b及び固定マスクの開口4aを経てフィ
ルム2の表面に到達し薄膜が形成される。蒸着工程が進
むにつれて、マスクユニット21の湾曲面21aの特に
下部21a’の付着堆積物が増加するため、付着堆積物
が所定量となった時点で、あるいは、あらかじめ決めら
れたフィルム処理長毎に、マスクユニット22が当初の
マスクユニット21の位置にくるまで回転式マスク20
を回動させる(図中、矢線で示す反時計回りの方向)。
以下、同様にマスクユニット23、24と順次回動させ
て蒸着を行う。
In the vapor deposition apparatus having such a configuration, upon the start of vapor deposition, the cooled rotary can 1 rotates clockwise as indicated by the arrow in the figure, and the rotary mask 20 is moved to the position shown initially, that is, Are set so that the opening 21b of the mask unit 21 corresponds to the opening 4a of the fixed mask 4. The heated magnetic material evaporates from the evaporation source 3 and reaches the surface of the film 2 via the opening 21b of the mask unit 21 of the rotary mask 20 and the opening 4a of the fixed mask to form a thin film. As the deposition process progresses, the amount of deposits particularly on the lower surface 21a 'of the curved surface 21a of the mask unit 21 increases, so that when the amount of deposits becomes a predetermined amount, or at every predetermined film processing length. , Until the mask unit 22 comes to the original mask unit 21 position.
Is turned (counterclockwise direction indicated by an arrow in the figure).
Hereinafter, vapor deposition is performed by sequentially rotating the mask units 23 and 24 in the same manner.

【0015】上述したように、回転式マスク20を順次
回動させて、蒸着領域に新たなマスクユニットを配置す
ることにより、付着堆積物が大量となる領域でのマスク
の滞在時間が限られたものになるため、付着物が過度に
成長することが防止される。したがって、従来に比べて
フィルム処理長すなわち連続生産時間を飛躍的に増大す
ることが可能となり、装置の稼働率及び生産性が向上す
る。なお、回転式マスク20を固定マスク4の上に配設
したことによるフィルムへの成膜工程への影響は、フィ
ルム2の成膜部分がフィルムの幅方向(紙面に垂直な方
向)で僅かに影響を受けたのみであり、磁気テープとし
ての品質には影響はない。さらに、ここでは回転式マス
ク20は4個のマスクユニットからなる分割型とした場
合について述べたが、ユニットの数は特に限定されるも
のではない。また、回転式マスクを、このような分割型
ではなく、一体型とすることも可能である。しかし、取
り扱いやメンテナンスなどの観点からみると、分割型と
したほうが有利である。
As described above, by rotating the rotary mask 20 sequentially and arranging a new mask unit in the deposition area, the residence time of the mask in the area where the amount of deposits is large is limited. Therefore, the deposits are prevented from growing excessively. Therefore, the film processing length, that is, the continuous production time can be significantly increased as compared with the conventional case, and the operation rate and productivity of the apparatus are improved. Note that the influence of the arrangement of the rotary mask 20 on the fixed mask 4 on the film formation step on the film is such that the film formation portion of the film 2 is slightly changed in the width direction of the film (the direction perpendicular to the paper surface). It was only affected and did not affect the quality of the magnetic tape. Further, here, the case where the rotary mask 20 is a divided type including four mask units has been described, but the number of units is not particularly limited. In addition, the rotary mask may be an integral type instead of such a split type. However, from the viewpoint of handling and maintenance, it is more advantageous to use the split type.

【0016】<実施例>図1に示した装置において、回
転キャン1の直径を1000mm、幅を600mmと
し、フィルム2の幅を580mm、成膜幅を550m
m、さらに、蒸発源3すなわちルツボの幅を700mm
とした。ルツボ内の磁性材料の溶融、蒸着は、出力30
0kW、90°偏向のピアス型電子銃を用いた。固定マ
スク4及び回転式マスク20の各ユニット21〜24は
すべて厚さ15mmのステンレス製とした。また、ルツ
ボ近傍には電子ビームの適正な入射に必要な偏向用マグ
ネットを設置した。この装置を用いて以下の各実験を行
った。
<Embodiment> In the apparatus shown in FIG. 1, the diameter of the rotating can 1 is 1000 mm, the width is 600 mm, the width of the film 2 is 580 mm, and the film forming width is 550 m.
m, and the width of the evaporation source 3, ie, the crucible, is 700 mm
And The melting and vapor deposition of the magnetic material in the crucible has an output of 30
A pierce-type electron gun with 0 kW and 90 ° deflection was used. All the units 21 to 24 of the fixed mask 4 and the rotary mask 20 were made of stainless steel having a thickness of 15 mm. In addition, near the crucible, a deflecting magnet necessary for proper incidence of the electron beam was installed. The following experiments were performed using this apparatus.

【0017】(実験1)蒸着の基材として厚さ10μm
のPET(ポリエチレンテレフタレート)フィルムを、
蒸着材料として純コバルトを用い、基材フィルムの走行
速度100m/min、成膜厚さ0.2μmの条件で成
膜した。この初期の条件に沿って材料が蒸発するように
ルツボ上の材料蒸気濃度を原子吸光式モニターで監視
し、蒸発量を一定に保った。このような条件で、固定マ
スクのみを用いて、15000mの基材フィルム上にコ
バルトを成膜した。この工程における固定マスクへの付
着堆積状況とルツボ内の電子ビームの位置を観察した結
果、連続成膜処理長が約10500mの時点で電子ビー
ムの位置がルツボ長手エッジ部分で制御することが困難
となった。また、付着堆積物は約12000mの成膜処
理後に落下してしまい、12000〜15000mの間
は成膜を続行することが不可能となった。以上の結果か
ら、固定マスクのみで品質の良好な磁気テープを製造す
る場合、連続成膜処理長は10500〜12000mと
なり、さらに、危険性や歩留りを考慮すると、連続成膜
処理長は10000mが限度であることが確認された。
(Experiment 1) 10 μm thick as a substrate for vapor deposition
PET (polyethylene terephthalate) film
Using pure cobalt as an evaporation material, a film was formed under the conditions of a running speed of the substrate film of 100 m / min and a film thickness of 0.2 μm. The vapor concentration of the material on the crucible was monitored by an atomic absorption monitor so that the material evaporated according to the initial conditions, and the evaporation amount was kept constant. Under these conditions, cobalt was formed on a 15000 m base film using only a fixed mask. As a result of observing the state of adhesion and deposition on the fixed mask and the position of the electron beam in the crucible in this process, it was found that it was difficult to control the position of the electron beam at the crucible longitudinal edge when the continuous film formation processing length was about 10500 m. became. Further, the deposited material fell after the film forming process of about 12000 m, and it was impossible to continue the film forming between 12000 and 15000 m. From the above results, when a good quality magnetic tape is manufactured using only the fixed mask, the continuous film formation processing length is 10500 to 12000 m, and further considering the danger and yield, the continuous film formation processing length is limited to 10,000 m. Was confirmed.

【0018】(実験2)別途用意した新しい固定マスク
を上記の装置に取り付けるとともに、4個のユニットか
ら構成された回転式マスクをその上に取り付けて、実験
1と同様の条件で成膜を行った。基材フィルムは500
00mの長さのものをセットし、成膜処理長10000
m毎に回転式マスクを回動させて次のマスクユニットの
開口が適正な位置にくるように調整した。連続処理長4
0000m以降は固定マスクのみを使用し、50000
mの全域にわたって、付着堆積物の落下などの問題もな
く連続して成膜することが可能であった。また、電子ビ
ームの位置制御も不能になることは全くなかった。
(Experiment 2) A new fixed mask prepared separately was attached to the above-described apparatus, and a rotary mask composed of four units was attached thereon, and film formation was performed under the same conditions as in Experiment 1. Was. Base film is 500
Set a length of 00m and set the film forming process length to 10,000.
The rotary mask was rotated every m so that the opening of the next mask unit was adjusted to an appropriate position. Continuous processing length 4
After 0000m, use only fixed mask and
It was possible to form a film continuously over the entire area of m without any problem such as falling of the deposit. In addition, the position control of the electron beam has never been disabled.

【0019】これらの結果から、本発明の回転式マスク
を固定マスクと併用した蒸着装置では、固定マスクのみ
の従来の蒸着装置に比べて、基材の連続処理長を約5倍
に伸ばすことが可能となり、連続処理時間が大幅に増大
するため、装置の稼働率及び生産性が飛躍的に向上する
ことが確認された。
From these results, in the vapor deposition apparatus using the rotary mask of the present invention in combination with the fixed mask, the continuous processing length of the base material can be extended about five times as compared with the conventional vapor deposition apparatus using only the fixed mask. It became possible and the continuous processing time was greatly increased, so that it was confirmed that the operation rate and productivity of the apparatus were dramatically improved.

【0020】[0020]

【発明の効果】以上詳細に説明したとおり、本発明によ
れば、移動可能な防着用部材を使用することにより連続
的に成膜を行う処理長すなわち、連続生産時間を飛躍的
に増大することができるため装置の稼働率と生産性を大
幅に向上させることが可能となる。特に、フィルム上に
磁性材料を蒸着する、磁気記録媒体の製造装置に応用す
ることにより、高品質の記録媒体を効率良く生産するこ
とができるため、製造コストの低減に極めて有効であ
る。
As described in detail above, according to the present invention, the processing length for continuously forming a film by using a movable anti-wear member, that is, the continuous production time is dramatically increased. Therefore, the operation rate and productivity of the apparatus can be greatly improved. In particular, by applying the present invention to a magnetic recording medium manufacturing apparatus that deposits a magnetic material on a film, a high-quality recording medium can be efficiently produced, which is extremely effective in reducing the manufacturing cost.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の薄膜形成装置の一例である真空蒸着装
置の構成を示した概念図である。
FIG. 1 is a conceptual diagram showing a configuration of a vacuum deposition apparatus which is an example of a thin film forming apparatus of the present invention.

【図2】従来の真空蒸着装置における防着構造を説明す
るための要部斜視図である。
FIG. 2 is a perspective view of a main part for describing a deposition prevention structure in a conventional vacuum deposition apparatus.

【符号の説明】[Explanation of symbols]

1 回転キャン 2 帯状の基材(フィルム) 3 蒸発源(ルツボ) 4 固定マスク 4a 開口 5 真空槽内基準板 6 供給ロール 7〜13 ガイドロール 14 巻取りロール 15 前処理装置 16、17 後処理装置 18 軸 19 遮蔽板 20 回転式マスク 21〜24 マスクユニット 21b〜24b 開口 REFERENCE SIGNS LIST 1 rotating can 2 strip-shaped base material (film) 3 evaporation source (crucible) 4 fixed mask 4a opening 5 reference plate in vacuum chamber 6 supply roll 7-13 guide roll 14 winding roll 15 pre-processing device 16, 17 post-processing device 18 axis 19 shielding plate 20 rotary mask 21-24 mask unit 21b-24b opening

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 真空槽内に円筒状の回転キャンを備え、
この回転キャンの外周面に沿って移動する帯状の基材に
連続的に薄膜を形成する薄膜形成装置において、前記帯
状基材の不要部への付着を防止するための防着用部材が
配置されるとともに、この防着用部材の少なくとも1つ
が前記回転キャンの外周面に沿って移動する機構を備え
たことを特徴とする薄膜形成装置。
1. A cylindrical rotating can provided in a vacuum chamber,
In a thin film forming apparatus for continuously forming a thin film on a strip-shaped base material moving along the outer peripheral surface of the rotary can, an anti-wear member for preventing adhesion of the strip-shaped base material to unnecessary portions is arranged. And a mechanism for moving at least one of the attachment members along the outer peripheral surface of the rotary can.
【請求項2】 前記防着用部材が、前記円筒状回転キャ
ンの外周面に対応する湾曲面を有するとともに、この湾
曲面が前記回転キャンの外周面に沿って回動可能となる
ように軸支されている請求項1記載の薄膜形成装置。
2. The anti-wear member has a curved surface corresponding to an outer peripheral surface of the cylindrical rotary can, and a pivotal support such that the curved surface is rotatable along the outer peripheral surface of the rotary can. The thin film forming apparatus according to claim 1, wherein:
【請求項3】 真空槽内に円筒状の回転キャンと、この
円筒状回転キャンの外周面に沿って移動する帯状の基材
に対向する蒸着材料の蒸発源と、この蒸発源から前記基
材に至る前記蒸着材料の蒸気流を部分的に遮断し不要部
への付着を防止するための防着用部材とを備えた真空蒸
着装置において、前記防着用部材の少なくとも1つが前
記回転キャンの外周面に沿って移動する機構を備えたこ
とを特徴とする真空蒸着装置。
3. A cylindrical rotary can in a vacuum chamber, an evaporation source for a vapor-deposited material facing a strip-shaped substrate moving along the outer peripheral surface of the cylindrical rotary can, and A deposition member for partially blocking a vapor flow of the vapor deposition material to prevent adhesion to unnecessary portions, wherein at least one of the deposition prevention members has an outer peripheral surface of the rotary can. A vacuum vapor deposition device comprising a mechanism that moves along a line.
【請求項4】 前記防着用部材が、前記円筒状回転キャ
ンの外周面に対応する湾曲面を有するとともに、この湾
曲面が前記回転キャンの外周面に沿って回動可能となる
ように軸支されている請求項3記載の真空蒸着装置。
4. The anti-wearing member has a curved surface corresponding to the outer peripheral surface of the cylindrical rotary can, and is pivotally supported such that the curved surface is rotatable along the outer peripheral surface of the rotary can. The vacuum evaporation apparatus according to claim 3, wherein
JP5901798A 1998-02-24 1998-02-24 Thin film forming device and vacuum deposition device Withdrawn JPH11236668A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5901798A JPH11236668A (en) 1998-02-24 1998-02-24 Thin film forming device and vacuum deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5901798A JPH11236668A (en) 1998-02-24 1998-02-24 Thin film forming device and vacuum deposition device

Publications (1)

Publication Number Publication Date
JPH11236668A true JPH11236668A (en) 1999-08-31

Family

ID=13101112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5901798A Withdrawn JPH11236668A (en) 1998-02-24 1998-02-24 Thin film forming device and vacuum deposition device

Country Status (1)

Country Link
JP (1) JPH11236668A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007224376A (en) * 2006-02-24 2007-09-06 Showa Shinku:Kk Vacuum vapor deposition apparatus and method
JP2020172706A (en) * 2020-07-03 2020-10-22 デクセリアルズ株式会社 Method of manufacturing optical film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007224376A (en) * 2006-02-24 2007-09-06 Showa Shinku:Kk Vacuum vapor deposition apparatus and method
JP2020172706A (en) * 2020-07-03 2020-10-22 デクセリアルズ株式会社 Method of manufacturing optical film

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