JPH11233408A - Substrate stage and aligner using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce the size of a substrate transportation mechanism by improving various substrate stages used for an exposure device, etc. SOLUTION: Related to a sensitized substrate stage 1 of an exposure device A, a new substrate transportation arm 7 is attached to a substrate holder 6. The substrate transportation arm 7 is reciprcically moved in vertical direction Z by a substrate movement/exchange driving device 8 when overlapped with the substrate holder 6 for delivery of a sensitized substrate W to the substrate holder 6, while reciprocally moved in back and forth direction X relative to the substrate holder 6 by a substrate transportation driving device 9 for protruding above the substrate holder 6. While the substrate transportation arm 7 is overlapped with the substrate holder 6 inside it, a installation space of the substrate transportation arm 7 is not required outside the substrate holder 6, while a space s between them is smaller when a sensitized substrate movement/exchange part 4 approaches the sensitized substrate stage 1.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate stage and an exposure apparatus using the substrate stage, and more particularly, to a substrate stage on which a mask having a pattern or a photosensitive substrate is mounted and moved, and to which the substrate stage is used. It is preferable to use the present invention in an exposure apparatus that exposes a mask pattern to a photosensitive substrate.

[0002]

2. Description of the Related Art Conventionally, in a photosensitive substrate stage of an exposure apparatus schematically shown in FIG. 12, although not shown in detail, the photosensitive substrate is loaded and unloaded through the following schematic steps.

The photosensitive substrate before exposure is transferred from an external device (not shown) to a substrate mounting table 31 of a first photosensitive substrate transport section, a substrate support table 28 of a photosensitive substrate transfer section, or a substrate mounting table 3 of a second photosensitive substrate transport section.
After passing through 3, the substrate is carried into the substrate holder 6 of the photosensitive substrate stage of the exposure apparatus. After the exposure is completed, the exposed photosensitive substrate is again moved from the substrate holder 6 of the photosensitive substrate stage of the exposure apparatus through the carry-in path to the carry-out direction opposite to the carry-in direction. And the substrate support 28 of the photosensitive substrate transfer unit and the substrate mounting table 3 of the second photosensitive substrate transport unit
1 and is carried out to an external device (not shown). Normally, in such a substrate transport mechanism, the positions of loading and unloading the photosensitive substrate are adjusted on the substrate support 28.

[0004]

However, under the current situation where the size of the photosensitive substrate is increasing, the size of the substrate transport mechanism increases in proportion to the size of the photosensitive substrate. Costs and the like increase, and even on the customer side, productivity per occupied space decreases.

However, in the above-described conventional substrate transfer mechanism, in the space S between the substrate support 28 and the substrate holder 6 of the photosensitive substrate stage, the substrate mounting table 33 of the second photosensitive substrate transfer unit is exposed to light. Since the space S is provided separately from the substrate stage, the space occupied by the space S increases, and the substrate transport mechanism increases in size.

SUMMARY OF THE INVENTION It is an object of the present invention to improve various substrate stages to reduce the size of a substrate transport mechanism.

[0007]

The present invention will be described with reference to the reference numerals in the drawings of the following embodiments (FIGS. 1 to 11). The substrate stage (1, 2) according to the first aspect of the present invention is for mounting various substrates (W, M), and has the following configuration.

The substrate stage (1, 2) is provided with a first holding member (6) capable of holding the substrate (W, M), and is relatively moved with respect to the first holding member (6) to perform the first holding. A second holding member (7) for transferring the substrate (W, M) to and from the member (6); and a direction substantially perpendicular to the direction (Z) of the relative movement. (X). The second holding member (7) has a function of carrying the substrate (W, M) into the first holding member (6) and a function of carrying out the substrate (W, M) from the first holding member (6).

[0009] The second aspect of the invention adds the following configuration to the first aspect of the invention. The first holding member (6) and the second holding member (7) move relative to each other along the vertical direction (Z). The first holding member (6) and the second holding member (7)
Move relative to each other in the vertical direction (Z) to transfer the substrate (W, M).

The third aspect of the present invention adds the following configuration to the first or second aspect of the invention. Second retaining member (7), said substrate (W, M) of the size (L _1, L ₂₎ intervals corresponding to (G _1, G ₂₎ are arranged in a pair of arm members (7a, 7a And 7b, 7b). The substrate (W, M) is held between the two arm members (7a, 7a and 7b, 7b).

[0011] The invention of claim 4 adds the following configuration to the invention of claim 3. A pair of arm members (7a, 7a
And 7b, 7b) are the dimensions (L ₁ ,
L ₂ ). Plural sets of both arm members (7a, 7a and 7b, 7b) of the substrate (W, M) of the size (L _1, L ₂₎ both arm members in accordance with (7a, 7a and 7b, 7b) between Hold the substrate (W, M).

The invention according to claim 5 is the invention according to claims 1 to 4.
The following configuration is added to any one of the inventions. The first holding member (6) has an opening (1) larger than the second holding member (7) at a position substantially opposed to the second holding member (7).
3, 14) are formed. The second holding member (7)
The first holding member (6) passes through the openings (13, 14).
Moves relative to.

The invention according to claim 6 is configured as follows. An exposure apparatus (A) for exposing the pattern of a mask (M), which is a substrate having a pattern, to a photosensitive substrate (W)
6. The method according to claim 1, wherein at least one of a photosensitive substrate stage (1) on which the photosensitive substrate (W) is mounted and a mask stage (2) on which the mask (M) is mounted. The substrate stage described in any one was used.
At the photosensitive substrate stage (1) and the mask stage (2) of the exposure apparatus (A), the loading and unloading of the photosensitive substrate (W) and the mask (M) are performed as described above.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will now be described with reference to FIGS.
This will be described with reference to FIG. FIG. 1 shows a liquid crystal display element pattern manufacturing system according to an embodiment of the present invention,
This liquid crystal display element pattern manufacturing system includes an exposure apparatus A
And a substrate storage device B for storing a plurality of photosensitive substrates W, a photosensitive substrate transfer unit 4 for transporting the photosensitive substrate W between the exposure device A and the substrate storage device B, and a photosensitive substrate transport unit 5. .

The exposure apparatus A exposes a pattern for forming a liquid crystal display element formed on a mask M to a photosensitive substrate W which is a square glass plate, and has the following configuration.

The illumination optical system 23 illuminates the mask M by using the I-line and G-line emitted from a light source (not shown) as uniform exposure light. The mask M is vacuum-adsorbed on a mask stage 2 that can move on an XY two-dimensional plane shown in FIG. The mask exchange mechanism 20 holds a mask M having a plurality of different patterns, and exchanges the mask M with the mask stage 2. Mask alignment optical system 21
Detects an alignment mark formed on the mask M, and outputs the detection result to the control device 3 described later.

The exposure light transmitted through the mask M can be moved in the XYZθ direction shown in FIG. 1 by the projection optical system 24, and forms an image on a photosensitive substrate W mounted on a photosensitive substrate stage 1 (described in detail later). Is done. The position of the photosensitive substrate stage 1 is measured by the laser interferometer 25, and the measurement result is also output to the control device 3.

On the outer periphery of the projection optical system 24, a so-called quasis substrate alignment optical system 22 is provided. The substrate alignment optical system 22 detects an alignment mark formed on the photosensitive substrate W, and outputs the detection result to the control device 3. The controller 3 controls the entire exposure apparatus A. In this embodiment, in particular, in the present embodiment, the controller 3 controls a substrate transfer driver 8 and a substrate transport driver 9 to control the transport of the photosensitive substrate W. I do.

As schematically shown in FIGS. 1 to 4, the photosensitive substrate stage 1 is roughly divided into a substrate holder 6 (first holding member), a substrate transfer arm 7 (second holding member), and a substrate transfer driving device. 8, a substrate transfer driving device 9 (moving means), and a stage driving unit 10.

The substrate holder 6 is for mounting the photosensitive substrate W thereon, and the base plate 11 supported on the stage driving unit 10.
And a vacuum suction function (positioning means) on the base plate 11.
Is provided. The base plate 11 has a pair of openings 13 and 14 (relative movement allowable space) penetrating in the Z direction (vertical direction) in the figure at predetermined intervals in the Y direction in the figure.

The substrate transfer arm 7 transfers the photosensitive substrate W to and from the substrate holder 6, and corresponds to the left and right sides of the substrate mounting surface 12 of the base plate 11 in the substrate holder 6, respectively. It is arranged. Substrate transfer arm 7
Has a pair of arm pieces 7a and 7b (arm members) arranged in the Y direction in the figure. The pair of arm pieces 7 a and 7 b are supported by the support 15. An intake hole (not shown) for vacuum-sucking the photosensitive substrate W is formed on the substrate transfer arm 7.

[0022] placed photosensitive substrate W by a pair of arm pieces 7a arranged by intervals G _1, likewise a photosensitive substrate W by the pair of arm pieces 7b arranged by spacing G ₂ is placed. This is for mounting photosensitive substrates W having different sizes. Each of the openings 13 and 14 is connected to each of the arms 7a and 7b so that the arms 7a and 7b can pass through the openings 13 and 14 of the base plate 11 in the substrate holder 6.
7b.

The substrate transfer driving device 8 includes a substrate transfer arm 7
In the Z direction, is installed facing the lower side of the base plate 11 of the substrate holder 6, and is supported by each guide mechanism provided on the stage driving unit 10, for example, a linear rail 18. The vertical movement mechanism is constituted by, for example, an air cylinder 19. A support rod 15 of each of the arm pieces 7a and 7b is attached to a piston rod 19a of each of the air cylinders 19. When each of the piston rods 19a moves up and down, each of the arm pieces 7a and 7b also moves to the base plate 1 of the substrate holder 6.
1, the arm pieces 7a and 7b pass through the openings 13 and 14 of the base plate 11, and move from the base plate 11 as shown in FIGS. 6 (b) and 7 (b). FIG. 6F and FIG. 7 show a state where the substrate W is projected upward from the substrate mounting surface 12 (a position where the substrate transfer arm 7 receives the substrate W from the substrate holder 6).
As shown in (f), a state in which the substrate W is immersed below the substrate mounting surface 12 (a position where the substrate W is transferred from the substrate transfer arm 7 to the substrate holder 6) can be taken.

The substrate transfer driving device 9 includes a substrate transfer arm 7
Are driven in the X direction. Each linear rail is installed facing the lower side of the base plate 11 of the substrate holder 6, and is supported by each air cylinder 19 and extended in the X direction as described above. 18. When the movable body 18a of each linear rail 18 reciprocates in the X direction with the pair of arm pieces 7a and 7b protruding upward from the substrate mounting surface 12 of the base plate 11, the arm pieces 7a and 7b also become The openings 13 and 14 of the base plate 11 are aligned with the substrate mounting surface 12 by X
The arm pieces 7a and 7b reciprocate in the directions shown in FIGS.
7 (e) and FIG. 7 (e), the position where the substrate holder 6 is carried onto the base plate 11 and overlapped in the Z direction, and FIG.
In addition, as shown in FIG. 7C, a position where the substrate is carried out from the base plate 11 of the substrate holder 6 toward the photosensitive substrate transfer unit 4 and protrudes therefrom can be taken.

The stage driving section 10 drives the photosensitive substrate W to an X-direction position, a Y-direction position, a Z-direction position, and a θ-direction position (rotational position about the Z direction), so that the desired Is to form a pattern of the mask M in the region of FIG.

As shown schematically in FIGS. 1 and 4, the photosensitive substrate transfer unit 4 is installed outside the substrate holder 6 on the photosensitive substrate stage 1, and includes a position adjustment drive unit 26 and a substrate transfer drive unit. 27 and a substrate support 28. The substrate transfer driving device 27 has a shaft 27a that is provided on the position adjustment driving unit 26 and that moves in the Z direction and rotates about the Z direction. The substrate support 28 is attached to the shaft 27a and can move up and down and rotate. On the substrate support 28, a substrate mounting surface 28a having a suction function is provided.
Is provided. The position adjustment drive unit 26 adjusts the X-direction position, the Y-direction position, and the θ-direction position (rotational position about the Z-direction) of the substrate support 28. When the substrate support base 28 moves up and down in a state where the substrate transfer arm 7 of the photosensitive substrate stage 1 is at a position protruding toward the photosensitive substrate transfer unit 4 side, FIG.
As shown in FIG. 7D and FIG. 7D, transfer of the photosensitive substrate W is performed between the photosensitive substrate W and the substrate transfer arm 7.

As schematically shown in FIGS. 1 and 4, the photosensitive substrate transport section 5 includes a substrate transfer driving device 30 and a substrate mounting table 31. The substrate transfer driving device 30 has a shaft 30a that moves in the X direction and rotates around the Z direction. The substrate mounting table 31 is attached to the shaft 30a and can move back and forth and rotate. The substrate mounting table 31 is provided with a substrate mounting surface 31a having a suction function.
When the substrate mounting table 31 moves up and down with the substrate mounting table 31 moved to the substrate supporting table 28 of the photosensitive substrate transfer unit 4, as shown in FIGS. 5B and 8B. The transfer of the photosensitive substrate W to and from the substrate mounting table 31 is performed.

As schematically shown in FIG. 1, the substrate storage device B has a plurality of storage cassettes 32 for storing the photosensitive substrates W, and a predetermined storage cassette 32 moves to a transfer position. I have. With the substrate mounting table 31 of the photosensitive substrate transport section 5 moved to the substrate storage device B, the transfer of the photosensitive substrate W is performed between the storage cassette 32 at the transfer position and the substrate mounting table 31.

The operation of the liquid crystal display element pattern manufacturing system configured as described above will be described. FIG. 11 is a flowchart showing the transfer of the photosensitive substrate W.
The transfer of the photosensitive substrate W will be described with reference to FIG. In addition,
The control device 3 communicates with a transfer control device (not shown) that controls the photosensitive substrate transfer unit 4 and the photosensitive substrate transfer unit 5 to transfer the photosensitive substrate W to the photosensitive substrate stage 1.

A transfer control device (not shown) controls the photosensitive substrate transfer section 5 to transfer the photosensitive substrate W stored in the substrate storage device B to the substrate mounting table 31 (step 1). The transfer control device (not shown) transfers the photosensitive substrate W mounted on the substrate mounting table 31 to the substrate support table 28 of the photosensitive substrate transfer section 4 (Step 2).

The step 2 is described in detail in FIG.
As shown in (a), the substrate mounting table 3 of the photosensitive substrate transport unit 5
The photosensitive substrate W held at 1 is located above the substrate support 28 which is in a down state in the photosensitive substrate transfer unit 4.

Then, in the state shown in FIG. 5A, when the substrate support 28 moves upward in the photosensitive substrate transfer section 4, the photosensitive substrate W is transferred from the photosensitive substrate mounting table 31 to the substrate support 28. It is positioned on the substrate mounting surface 28a. After that, the substrate mounting table 31 retreats from the photosensitive substrate transfer unit 4.
Next, the carry-in position of the photosensitive substrate W on the substrate support base 28 is adjusted by the position adjustment drive unit 26.

The control device 3 communicates with a transfer control device (not shown) to transfer the photosensitive substrate W supported on the substrate support 28 to the photosensitive substrate stage 1 (step 3). The step 3 will be described in detail. As shown in FIG. 6A, in the photosensitive substrate stage 1, each opening 1 of the substrate holder 6 is provided.
Each of the substrate transfer arms 7 is immersed and overlaps in the substrates 3 and 14 (see FIGS. 2 and 3).

As shown in FIG. 6B, in the photosensitive substrate stage 1, each arm piece 7a,
7b both arm pieces 7a intervals G ₁ of the (see FIGS. 2 and 3)
Only the upper part moves up from both the openings 13 of the substrate holder 6 and projects above the substrate mounting surface 12 and overlaps.

As shown in FIG. 6C, in the photosensitive substrate stage 1, only the two arm pieces 7a are moved by the substrate transport driving device 9 from the inside of the substrate holder 6 to the outside of the photosensitive substrate transfer section. 4 and moves to and protrudes from the substrate support table 28.

As shown in FIG. 6D, when the substrate support 28 moves down in the photosensitive substrate transfer section 4, the photosensitive substrate W is transferred from the substrate support 28 to the two arm pieces 7a. As shown in FIG. 6E, in the photosensitive substrate stage 1, two arm pieces 7a holding the photosensitive substrate W are
The substrate is moved by the substrate transfer driving device 9 so as to face the opening 13 formed in the substrate holder 6.

As shown in FIG. 6 (f), the two arm pieces 7a are moved downward by the substrate transfer driving device 8, and
The photosensitive substrate W is transferred to and positioned on the substrate mounting surface 12. The two arm pieces 7a are positioned so as not to protrude from the substrate mounting surface 12.

After positioning the mask M and the photosensitive substrate W, the controller 3 changes the pattern of the mask M to the photosensitive substrate W.
(Step 4). When the exposure is completed, the controller 3 transports the photosensitive substrate W from the photosensitive substrate stage 1 to the substrate support 28 (Step 5).

The step 5 is described in detail in FIG.
(A) and (b), the two arm pieces 7a move upward to receive the exposed photosensitive substrate W from the substrate mounting surface 12 of the substrate holder 6, and the photosensitive substrate W is transferred to the substrate mounting surface 17 Is positioned.

As shown in FIG. 7C, the two arm pieces 7a holding the exposed photosensitive substrate W are moved from the inside to the outside of the substrate holder 6 to the substrate support 28 of the photosensitive substrate transfer unit 4. It moves up to and protrudes.

As shown in FIG. 7D, when the substrate support 28 moves upward in the photosensitive substrate transfer section 4, the exposed photosensitive substrate W is transferred to the substrate support 28 from the two arm pieces 7a. Then, it is positioned on the substrate mounting surface 28a.

As shown in FIG. 7 (e), the two arm pieces 7 a separating the exposed photosensitive substrate W are opposed to the opening 13 formed in the substrate holder 6 by the substrate transport driving device 9. To move.

As shown in FIG. 7 (f), two arm pieces 7a inside the substrate holder 6 are moved by the substrate transfer driving device 8 along the Z direction so as to be immersed in the respective openings 13. I do.

The transfer control device (not shown) includes a substrate support 28
Is transferred to the substrate mounting table 31 (step 6). The process of Step 6 will be described in detail.
As shown in FIG. 8A, the unloading position of the photosensitive substrate W on the substrate support 28 in the photosensitive substrate transfer unit 4 is adjusted by the position adjustment driving unit 26. After that, the substrate mounting table 31 of the photosensitive substrate transport section 5 moves to the substrate support table 28.

As shown in FIG. 8B, when the substrate support 28 moves down in the photosensitive substrate transfer unit 4, the exposed photosensitive substrate W is transferred to the substrate mounting table 31 of the photosensitive substrate transport unit 5. And is held on the substrate mounting surface 31a.

The transfer control device (not shown) includes a substrate mounting table 31
Is transferred to the substrate storage device B (step 7). In the photosensitive substrate transfer method described above, as shown in FIG. 9 (a) (b), by using the arm pieces 7a intervals G _1, large photosensitive substrate W in the horizontal direction width L ₁
We carry in and carry out.

In the above-described photosensitive substrate transport method, the method shown in FIG.
0 as shown in (a) (b), when performing loading and unloading of small photosensitive substrate W having lateral width L ₂ utilizes the arm pieces 7b spacing G _2.

<Features of the present embodiment>
(Other than the other technical ideas described below). * In the photosensitive substrate stage 1, a substrate transfer arm 7 is newly added to the conventional substrate holder 6. Then, the substrate transfer arm 7 is provided with the components shown in FIGS.
As shown in FIG. 7F and FIGS. 7A, 7B, 7E, and 7F, the photosensitive substrate W is reciprocated in the Z direction while being overlapped with the substrate holder 6, and is moved between the substrate holder 6 and the photosensitive substrate W. And reciprocates in the X direction with respect to the substrate holder 6 to protrude from above the substrate holder 6. In other words, the function of the substrate mounting table 33 of the second photosensitive substrate transport unit described in the related art is changed to the substrate transport arm 7 of the photosensitive substrate stage 1.
Fulfills. Therefore, as shown in FIG. 1, when the substrate transfer arm 7 overlaps the substrate holder 6 inside the substrate holder 6, a space for installing the substrate transfer arm 7 outside the substrate holder 6 is required. Instead, the photosensitive substrate transfer unit 4 can be brought closer to the photosensitive substrate stage 1 to reduce the space S between them. Accordingly, it is possible to reduce the size of the substrate transport mechanism for loading the unexposed photosensitive substrate W into the substrate holder 6 of the photosensitive substrate stage 1 and unloading the exposed photosensitive substrate W from the substrate holder 6.

* The substrate transfer arm 7 newly attached to the conventional substrate holder 6 relatively moves along the Z direction. Therefore, the transfer of the photosensitive substrate W between the substrate transfer arm 7 and the substrate holder 6 can be easily performed.

* As shown in FIGS. 9 and 10, the substrate transfer arm 7 has an interval G corresponding to the width L ₁ of the photosensitive substrate W in the left-right direction.
Two arm pieces 7a disposed in ₁ is set wider spacing G ₁ corresponding to the lateral width L ₁ of the photosensitive substrate W, the two arm pieces 7b according to lateral width L ₂ of the photosensitive substrate W is set to the interval G ₂ was. Therefore, it is possible to easily and reliably transfer the photosensitive substrate W between the substrate transfer arm 7 and the substrate holder 6 according to the widths L ₁ and L ₂ of the photosensitive substrate W in the left-right direction.

* The substrate holder 6 is formed with openings 13 and 14 which are larger than the substrate transfer arm 7 at positions substantially opposed to the substrate transfer arm 7. Therefore, when moving the substrate transfer arm 7 with respect to the substrate holder 6, the substrate transfer arm 7 can take a state of being immersed in the openings 13 and 14 and a state of protruding from the openings 13 and 14. Therefore, the transfer of the photosensitive substrate W between the substrate transfer arm 7 and the substrate holder 6 can be reliably performed.

[Other Embodiments] In addition to the above-described embodiments, the present invention may be configured as indicated by * below. In the above embodiment, the horizontal photosensitive substrate stage 1 in which the substrate holder 6 and the substrate transfer arm 7 relatively move along the vertical direction Z (vertical direction) to transfer the photosensitive substrate W to each other has been exemplified. In addition to the horizontal photosensitive substrate stage 1, the present invention is applied to a vertical photosensitive substrate stage 1 in which a substrate holder 6 and a substrate transfer arm 7 relatively move along the horizontal direction to transfer photosensitive substrates W to each other. Become

In the above-described embodiment, the photosensitive substrate stage 1 in which the substrate transfer arm 7 moves in the vertical direction Z (vertical direction) with respect to the substrate holder 6 and transfers the photosensitive substrate W to each other is exemplified. Conversely, the present invention is embodied in the photosensitive substrate stage 1 in which the substrate holder 6 moves in the vertical direction Z (vertical direction) with respect to the substrate transfer arm 7 and transfers the photosensitive substrate W to each other. In this case, in the substrate transfer driving device 8 of the embodiment, the air cylinder 19 serving as the vertical movement mechanism is used.
Is omitted, and a mechanism for moving the substrate holder 6 up and down in the above embodiment is provided instead.

In the above-described embodiment, the photosensitive substrate W before exposure is carried into the photosensitive substrate stage 1 of the exposure apparatus A from the substrate storage device B via the photosensitive substrate transport section 5 and the photosensitive substrate transfer section 4, and After the exposure for W is completed, the exposed photosensitive substrate W passes again from the photosensitive substrate stage 1 of the exposure apparatus A to the carry-out path to the carry-out direction opposite to the carry-in direction. It is carried out to the substrate storage device B via the section 5. In addition to making the carry-in path and the carry-out path the same as described above, other carry-out paths are provided in addition to the carry-in path to make them separate paths.

[0055] * In the above embodiment, is provided with the two pairs of substrate transport arm 7 by the arm pieces 7b of the arm pieces 7a and spacing G ₂ intervals G _1, a pair of substrate transport arm 7
Only, or three or more sets of substrate transfer arms 7 according to the size of the photosensitive substrate W.

In the above embodiment, two sets of substrate transfer arms 7 are provided, but three or more sets of substrate transfer arms 7 are provided.
Is provided. In this case, the predetermined set of substrate transfer arms 7 is used exclusively for loading, and the predetermined set of substrate transfer arms 7 is used exclusively for unloading.

* In the above embodiment, the exposure apparatus A
The present invention has been exemplified only for the photosensitive substrate stage 1. In the above embodiment, the present invention is also embodied in the mask stage 2 of the exposure apparatus A. Further, the present invention is embodied only in the mask stage 2. In this case, the basic structure of the mask stage 2 is the same as that of the photosensitive substrate stage 1 except that the mask M is transported instead of the photosensitive substrate W. Here, the substrate is a concept including a wafer, a glass plate, a magnetic head, a reticle, a photomask, and the like, and the present invention is embodied in various devices that handle them.

* The substrate transfer driving device of the photosensitive substrate stage reciprocates the substrate transfer arm to the substrate storage device so that the substrate transfer arm of the photosensitive substrate stage can transfer the photosensitive substrate to and from the substrate storage device. Let it.

[Other technical ideas] The technical ideas (other than the claims) that can be grasped from the embodiment will be described together with the effects. (A) In the substrate stage according to any one of claims 1 to 5, the second holding member (7) is carried into the first holding member (6) and overlaps with the first holding member. (6) A substrate stage capable of taking a position where it is carried out from the inside to the outside and protrudes. Therefore,
In a state where the second holding member (7) overlaps the first holding member (6) inside the first holding member (6), the second holding member is located outside the first holding member (6). (7) The installation space (S) is reduced without requiring the installation space,
The substrate transport mechanism can be downsized.

(B) In the above (A), the second holding member (7) moves relative to the first holding member (6) in the direction of movement (Z).
A substrate stage characterized in that the substrate stage overlaps. Therefore, the transfer of the substrate (W, M) between the second holding member (7) and the first holding member (6) can be easily performed.

(C) A substrate stage (1, 2) for positioning the substrate (W, M), and the substrate stage (1, 2)
And a substrate processing function unit (3) for performing various processing on the substrate (W, M) positioned in the substrate stage (1, 2). M), a substrate transfer arm (7) for transferring a substrate (W, M) between the substrate holder (6), and the substrate transfer arm (7).
The substrate transfer arm is provided so that a position where the substrate (W, M) is transferred from the substrate holder to the substrate holder (6) and a position where the substrate transfer arm (7) receives the substrate (W, M) from the substrate holder (6). (7) a substrate transfer driving means (8) for relatively moving the substrate holder (6), and the substrate transfer arm (7)
The substrate transfer arm (7) is moved so as to take a position where the substrate is carried into and overlapped with the substrate holder (6) and a position where the substrate is carried out from the inside of the substrate holder (6) to the outside and projected therefrom. A substrate transport mechanism in various substrate processing apparatuses, comprising: a substrate transport driving unit (9).

Therefore, in a state where the substrate transfer arm (7) overlaps with the substrate holder (6) inside the substrate holder (6), the substrate transfer arm (7) is located outside the substrate holder (6). The installation space (S) is not required, and the installation space (S) can be reduced, so that the substrate transport mechanism can be downsized.

(D) In the above (c), a substrate transfer section (4) for transferring a substrate (W, M) to and from the substrate stage (1, 2) is provided. 4) is installed outside the substrate holder (6), and the substrate stage (1, 2)
A substrate support (28) for transferring a substrate (W, M) to and from the substrate transfer arm (7), and a substrate (28) between the substrate transfer arm (7) and the substrate support (28). (W, M) so that the substrate transfer arm (7) and the substrate support table (28) are relatively moved so that the substrate transfer arm (7) can be transferred.
7) A substrate transport mechanism in various substrate processing apparatuses, comprising:

Therefore, in a state where the substrate transfer arm (7) overlaps with the substrate holder (6) inside the substrate holder (6), the substrate transfer arm (7) is located outside the substrate holder (6). No need for installation space, board transfer unit (4)
Can be brought closer to the substrate stage (1, 2) to reduce the space (S) between them, and the substrate transport mechanism can be downsized.

(E) In the above (d), a substrate transfer unit (5) for transferring a substrate (W, M) between the substrate transfer unit (4) and the external device (B) is provided. In the substrate transfer section (5), the substrate support (2) of the substrate transfer section (4) is used.
8), a substrate mounting table (31) for transferring the substrates (W, M), the substrate supporting table (28) and the substrate mounting table (3).
A substrate transfer driving means (30) for relatively moving the substrate support (28) and the substrate mounting table (31) so that the substrate (W, M) can be transferred between the substrate support (28) and (1). A substrate transport mechanism in various substrate processing apparatuses.

Accordingly, the size of the substrate transfer mechanism can be reduced in the same manner as in (d). (F) The above (c) or the above (d) or the above (e)
In the substrate stages (1, 2), the substrate transfer arm (7) overlaps in the relative movement direction (Z) between the substrate transfer arm (7) and the substrate holder (6). Substrate transfer mechanism in processing equipment.

Therefore, the transfer of the substrates (W, M) between the substrate transfer arm (7) and the substrate holder (6) can be easily performed. (G) The above (c) or (d) or the above (e)
Alternatively, in the above (f), the substrate transfer arm (7) is provided on the substrate holder (6) on the substrate stage (1, 2).
Space (1) allowing relative movement between the substrate holder (6)
A substrate transport mechanism in various substrate processing apparatuses, wherein (3) and (14) are provided.

Accordingly, the substrate transfer arm (7) passes through the relative movement allowable space (13, 14) and the substrate holder (6).
, The substrate (W, M) can be reliably transferred between the substrate transfer arm (7) and the substrate holder (6).

(H) In the above (C), (D), (E), (F), or (G), the substrate stage (1, 2) is provided with the substrate transfer driving means ( 8) and the substrate transfer driving means (9) are provided facing the substrate holder (6) in the relative movement direction (Z) between the substrate transfer arm (7) and the substrate holder (6). A substrate transport mechanism in various substrate processing apparatuses.

Therefore, the substrate stages (1, 2) can be made compact, and the substrate transport mechanism can be downsized. (I) The above (c) or the above (d) or the above (e)
Alternatively, in the above (f), the above (g), or the above (h), in the substrate stage (1, 2), the substrate transport driving means (9) is provided with the substrate mounting surface (1) on the substrate holder (6).
A board transfer arm (7) in the board transfer direction (X) along 2)
Is moved to the substrate stage (1, 2), and the substrate transfer arm (7) is mounted on the substrate holder (6) on both sides in the direction (Y) orthogonal to the substrate transfer direction (X). A first substrate transfer arm (7) and a second substrate transfer arm (7) provided on the surface (12), and the substrate mounting surface (12) of the substrate holder (6) is provided with the first substrate transfer arm (7). A substrate transport mechanism in various substrate processing apparatuses, wherein the substrate transport mechanism is open between an arm (7) and a second substrate transport arm (7).

Therefore, while holding the substrates (W, M) between the first substrate transfer arm (7) and the second substrate transfer arm (7), the two substrate transfer arms (7) and the substrate holder ( The substrate (W, M) can be easily and reliably transferred to and from 6).

(V) In (i) above, in the substrate stage (1, 2), the first substrate transfer arm (7) and the second substrate transfer arm (7) are each provided with a plurality of arm pieces ( 7a, 7b), one of the arm pieces (7a, 7b) of the first substrate transfer arm (7), and each arm of the second substrate transfer arm (7). Arm piece (7a, 7b)
A substrate transfer mechanism in various substrate processing apparatuses, wherein a plurality of sets of the substrate transfer arms (7) are configured as a single set of the substrate transfer arms (7) comprising the substrate transfer arm (7b).

Therefore, the plurality of sets of the substrate transfer arms (7) are properly used, and the substrate transfer arm (7) and the substrate holder (6) are used.
The substrate (W, M) can be easily and reliably exchanged with the substrate.

(G) In the above (u), the arm pieces (7a, 7b) of the first substrate transfer arm (7) and the arm pieces of the second substrate transfer arm (7) are used in each set of the substrate transfer arms (7). Each of the arm pieces (7) of the first substrate transfer arm (7) such that the distances (G ₁ , G ₂ ) from (7a, 7b) are different from each other.
a, 7b) and each arm piece (7a, 7b) of the second substrate transfer arm (7) are provided side by side, respectively.

Therefore, a plurality of sets of the substrate transfer arms (7) are selectively used according to the size (L ₁ , L ₂ ) of the substrate (W, M), and the substrate transfer arm (7) and the substrate holder (6) are used separately. The substrate (W, M) can be easily and reliably transferred between them.

(ヲ) The above (c) or (d) or the above (e) or the above (f) or the above (g) or the above (h) or the above (li) or the above (nu) or the above (lu) In the substrate stage (1, 2),
The substrate transfer arm (7) is provided on the substrate mounting surface (12) of the substrate holder (6) on both sides in the left-right direction (Y) orthogonal to the front-rear direction (X) that is the substrate transfer direction. An arm (7) and a right substrate transfer arm (7),
The substrate mounting surface (12) of the substrate holder (6) is opened upward between the left substrate transfer arm (7) and the right substrate transfer arm (7), and is located on the substrate stage (1, 2). ,
The substrate transfer driving means (8) relatively moves the substrate transfer arm (7) and the substrate holder (6) in the up-down direction (Z), and is located on the substrate stage (1, 2). )
The upper substrate mounting surface (12) has a state in which it protrudes upward from the substrate mounting surface (12) on the substrate holder (6) and a state in which it is immersed below the substrate mounting surface (12). A substrate transport mechanism in various substrate processing apparatuses, which can be taken.

Therefore, the transfer of the substrates (W, M) between the substrate transfer arm (7) and the substrate holder (6) can be performed more easily and reliably. (W) With the substrate transfer arm (7) of the substrate stage (1, 2) being moved from inside to outside of the substrate holder (6) of the substrate stage (1, 2), ), The substrate (W, M) is positioned, and then the substrate transfer arm (7) in which the substrate (W, M) is positioned is moved inward from the outside of the substrate holder (6). The substrate (W, M) is moved by moving the substrate transfer arm (7) inside the holder (6) and from the substrate transfer arm (7) to the substrate mounting surface (12) of the substrate holder (6). The substrate (W, M) positioned on the substrate mounting surface (12) of the substrate holder (6) is subjected to various treatments, and then the substrate located inside the substrate holder (6) is positioned. The transfer arm (7) is moved, and the substrate transfer arm (7) holds the processed substrate (W, M) in the substrate holder ( 6) Substrate mounting surface (1)
2) and positioning, and then the processed substrate (W,
A substrate transfer method in various substrate processing apparatuses, wherein the substrate transfer arm (7) in which the position (M) is positioned is moved from inside to outside of the substrate holder (6).

Therefore, it is necessary to carry the substrate (W, M) into the substrate holder (6) of the substrate stage (1, 2) and to carry out the substrate (W, M) from the substrate holder (6). The transport time can be reduced.

(F) The substrate (W, M) is positioned on the substrate support (28) of the substrate transfer section (4), and the substrate transfer arm (7) of the substrate stage (1, 2) is moved to the substrate stage (2). With the substrate holder (6) of (1) and (2) being moved from inside to outside to the substrate support (28) of the substrate transfer section (4), the substrate support ( 28) to move the substrate transfer arm (7) to the substrate transfer section (4).
The substrate (W, M) is transferred and positioned from the substrate support (28) of the above, and then the substrate transfer arm (7) in which the substrate (W, M) is positioned is moved from outside the substrate holder (6). Then, the substrate transfer arm (7) inside the substrate holder (6) is moved to move the substrate transfer arm (7) from the substrate transfer arm (7) to the substrate mounting surface (12) of the substrate holder (6). Substrate (W,
M), the substrate (W, M) positioned on the substrate mounting surface (12) of the substrate holder (6) is subjected to various processes, and then the substrate (6) is subjected to various processes. The substrate transfer arm (7) located inside moves the substrate (W, M) after processing by the substrate transfer arm (7) to the substrate holder (6).
Then, the substrate transfer arm (7) having positioned the processed substrate (W, M) is transferred from the inside to the outside of the substrate holder (6). Moving the substrate support (28) of the transfer unit (4), and then moving the substrate support (28) of the substrate transfer unit (4) to transfer the substrate outside the substrate holder (6). The substrate (W, M) is transferred from the arm (7) to the substrate support (28) of the substrate transfer section (4).
A substrate transport method in various substrate processing apparatuses, wherein the substrate is transferred and positioned.

Accordingly, the substrates (W, M) are carried into the substrate holder (6) of the substrate stages (1, 2) from the substrate transfer section (4), and are also transferred from the substrate holder (6). 4) It is possible to reduce the transport time required to unload the substrate (W, M) to the substrate.

(G) The substrate (W, M) transferred from the external device (B) to the substrate transfer unit (5) is further transferred to the substrate support (28) of the substrate transfer unit (4) for positioning. And a substrate transfer arm (7) of the substrate stage (1, 2).
Is moved from the inside of the substrate holder (6) of the substrate stage (1, 2) to the outside to the substrate support (28) of the substrate transfer section (4). Substrate support (2
8) is moved to transfer the substrate (W, M) from the substrate support table (28) of the substrate transfer section (4) to the substrate transfer arm (7) for positioning. , M) is moved from outside the substrate holder (6) to the inside thereof, and then the substrate transfer arm (7) inside the substrate holder (6) is moved. Then, the substrate (W, M) is transferred from the substrate transfer arm (7) to the substrate mounting surface (12) of the substrate holder (6) and positioned, and then the substrate mounting surface (12) of the substrate holder (6) is moved. ) Is subjected to various processes, and then the substrate transfer arm (7) inside the substrate holder (6) is moved so that the substrate transfer arm (7) performs processing. The processed substrate (W, M) is received and positioned from the substrate mounting surface (12) of the substrate holder (6). The substrate transfer arm (7) having positioned the plates (W, M) is moved from the inside of the substrate holder (6) to the outside to the substrate support (28) of the substrate transfer section (4). The substrate support (28) of the transfer unit (4) is moved from the substrate transfer arm (7) outside the substrate holder (6) to the substrate support (28) of the substrate transfer unit (4). The substrate (W, M) is transferred and positioned, and then the substrate (W, M) positioned on the substrate support (28) of the substrate transfer section (4) is transferred to the substrate transfer section (5). And transferring the substrate (W, M) from the substrate transfer section (5) to the external device (B).

Accordingly, the transport time can be reduced in the same manner as in (f).

[0083]

According to the substrate stage of the first aspect of the present invention, the second holding member having a function of carrying in the substrate to the first holding member and carrying out the substrate from the first holding member is provided. Since it is provided, the substrate transport mechanism can be downsized.

According to the invention of claim 2, in addition to the effect of the invention of claim 1, the transfer of the substrate between the second holding member and the first holding member can be easily performed. According to the invention of claim 3, in addition to the effect of the invention of claim 1 or 2, it is possible to reliably transfer the substrate between the second holding member and the first holding member.

According to the fourth aspect of the invention, in addition to the effect of the third aspect, the transfer of the substrate between the second holding member and the first holding member is easily and reliably performed according to the size of the substrate. Can be done.

According to the fifth aspect of the present invention, in addition to the effects of any one of the first to fourth aspects, the transfer of the substrate between the second holding member and the first holding member is easy and reliable. Can be done.

According to the sixth aspect of the present invention, the effects of any one of the first to fifth aspects of the present invention can be exerted on a photosensitive substrate stage or a mask stage of an exposure apparatus.

[Brief description of the drawings]

FIG. 1 is a schematic front view showing a photosensitive substrate stage and an exposure apparatus using the same according to the present embodiment.

FIG. 2 is a partial schematic side view showing the photosensitive substrate stage of FIG.

FIG. 3 is a partial schematic plan view showing a photosensitive substrate stage of FIG. 2;

FIG. 4 is a partial schematic perspective view showing the photosensitive substrate stage.

FIG. 5 is an explanatory diagram of an operation of positioning a photosensitive substrate transferred from a substrate storage device to a photosensitive substrate transfer unit by further transferring the photosensitive substrate to a photosensitive substrate transfer unit;

FIG. 6 is an explanatory diagram of an operation of transferring and positioning a photosensitive substrate from a photosensitive substrate transfer section to a photosensitive substrate stage.

FIG. 7 is an explanatory diagram of an operation of transferring and positioning a photosensitive substrate from a photosensitive substrate stage to a photosensitive substrate transfer section.

FIG. 8 is an explanatory diagram of an operation of positioning a photosensitive substrate transferred from a photosensitive substrate stage to a photosensitive substrate transfer unit by further transferring the photosensitive substrate to a photosensitive substrate transfer unit;

FIG. 9 is an explanatory diagram of an operation of transporting a large photosensitive substrate.

FIG. 10 is an explanatory diagram of an operation of transporting a small photosensitive substrate.

FIG. 11 is a flowchart showing the transfer of a photosensitive substrate.

FIG. 12 is a partial perspective view showing a conventional photosensitive substrate stage.

[Explanation of symbols]

Reference Signs List 1 photosensitive substrate stage, 2 mask stage (substrate stage), 6 substrate holder (first holding member), 7 substrate transfer arm (second holding member), 7a, 7b arm piece (arm member), 9 ... Substrate transport driving device (moving means), 1
3, 14 ... opening, A ... exposure apparatus, W ... photosensitive substrate, M ...
Mask (substrate), G ₁ , G ₂ ... interval between arm pieces.

Claims (6)

[Claims] 1. A stage for mounting a substrate, wherein the substrate is transferred between a first holding member capable of holding the substrate and the first holding member by moving relatively to the first holding member. And a moving means for moving the second holding member in a direction substantially perpendicular to the direction of the relative movement. 2. The substrate stage according to claim 1, wherein said first holding member and said second holding member move relative to each other in a vertical direction. 3. The substrate stage according to claim 1, wherein the second holding member is a pair of arm members arranged at intervals according to a size of the substrate. Substrate stage. 4. The substrate stage according to claim 3, wherein a plurality of sets of said pair of arm members are provided according to a size of said substrate. 5. The substrate stage according to claim 1, wherein the first holding member includes:
A substrate stage, wherein an opening larger than the second holding member is formed at a position substantially facing the second holding member. 6. An exposure apparatus for exposing the pattern of a mask which is a substrate having a pattern to a photosensitive substrate, wherein at least one of a photosensitive substrate stage for mounting the photosensitive substrate and a mask stage for mounting the mask On the other hand,
An exposure apparatus using the substrate stage according to any one of claims 1 to 5.