JPH11219987A - Tab semiconductor device and manufacture thereof - Google Patents

Tab semiconductor device and manufacture thereof

Info

Publication number
JPH11219987A
JPH11219987A JP10017626A JP1762698A JPH11219987A JP H11219987 A JPH11219987 A JP H11219987A JP 10017626 A JP10017626 A JP 10017626A JP 1762698 A JP1762698 A JP 1762698A JP H11219987 A JPH11219987 A JP H11219987A
Authority
JP
Japan
Prior art keywords
hole
resin
lead
tab
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10017626A
Other languages
Japanese (ja)
Inventor
Kazuhisa Kobayashi
和久 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP10017626A priority Critical patent/JPH11219987A/en
Publication of JPH11219987A publication Critical patent/JPH11219987A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/50Tape automated bonding [TAB] connectors, i.e. film carriers; Manufacturing methods related thereto

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Wire Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent degradation in moisture resistance by, meeting the increased number of electrodes of a TAB semiconductor device, allowing a resin for coating a pellet to infiltrate to a rear surface side of a tape for perfect connection between the tape and the pellet. SOLUTION: A conductive pattern is laminated on an insulating tape 1 comprising a through hole 1b and a part of it is extended in the through hole from at least a counter position of the through hole to constitute an inner lead, while a first leads 8a arrayed at an interval sufficiently wider than the lead width and a second leads 8b arrayed narrower than the array interval of the leads are also constituted, and a semiconductor pellet 4 is allocated in the through hole of a TAB tape 3, wherein a protruding part 9 which regulates flow of a resin 5 is formed in the region where at least no inner lead exists at the edge of a rear surface side through hole to a conductive pattern formation surface, and an electrode 4a on the pellet and the leads are electrically connected and a min part comprising a connection part and a semiconductor pellet upper surface is coated with a resin.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はTABテープを用い
た半導体装置に関する。
The present invention relates to a semiconductor device using a TAB tape.

【0002】[0002]

【従来の技術】電子回路装置を高機能、高性能を保って
小型化するためにTAB式半導体装置が一般的に用いら
れる。この一例を図7及び図8から説明する。図におい
て、1は長尺の耐熱性を有する絶縁テープで、両側に沿
って送り用の穴1a、1aを、幅方向中間で長手方向に
一定間隔で矩形状の透孔1bをそれぞれ穿設している。
2は絶縁テープ1に積層した導電箔をエッチングして形
成した導電パターンで、前記透孔1b内に延在するイン
ナリード2aと、このインナリード2aに接続されて絶
縁テープ1上に延びるアウタリード2bを構成してい
る。各リード2a、2bは平行に延び、扇形の非平行部
分2cによってリードの配列間隔が変えられている。こ
の絶縁テープ1と導電パターン2の一体物でTABテー
プ3を構成する。4は透孔1b内に配置された半導体ペ
レットで、上面の周縁に多数の電極4aを有し、この電
極4aとインナリード2aとが熱圧着などの手段により
電気的に接続されて、半導体中間構体を構成する。イン
ナリード2aは半導体ペレット4を接続後、図8に示す
ように弾力性を有するポンチ(図示せず)を用いて中間
部に段差が形成されている。5は半導体中間構体の透孔
1b内で半導体ペレット4の表面と電極4a及びインナ
リード2aの接続部分を被覆して、外部の腐食性ガスや
外力から保護する封止用樹脂を示す。ところで電極数が
多く高密度実装が要求される電子回路装置、例えば液晶
表示装置の駆動用半導体装置では、半導体ペレット4上
の電極が入力側と出力側に分離配置され、また電極数が
入力側と出力側とで極端に相違し、電極数が多い側では
電極の幅とピッチとを挟小化して対応している。例え
ば、電極4aの寸法が巾60μm、長さ90μm、高さ
20μmとすると、電極数が少ない入力側では電極巾に
比して十分広い間隔で電極を配列することができる。こ
れに対して、電極数が多い出力側では電極の配列間隔を
例えば70μmにして、電極間隔を電極巾より狭い10
μmに設定している。そして例えば厚さ18μmの導電
箔を巾60μ、配列間隔70μmにエッチングしてイン
ナリード2aを形成し上記電極4aに対応させている。
この半導体装置の樹脂5は一般的にスクリーン印刷法に
より被覆形成される。これを図9から説明する。図にお
いて、6は厚さ100μm程度の金属薄板を用いたマス
クで、半導体中間構体の透孔1bと対応する位置に開口
窓6aを複数形成している。このマスク6は予め半導体
ペレット4が接続され、定位置で位置決めされたTAB
テープ3の透孔1bおよび半導体ペレット4の表面を開
口窓6aから露呈するように覆う。7は開口窓6a上を
横切りマスク6上を往復動するスキージで、マスク6上
に供給した流動性を有する樹脂5を図10に示すように
開口窓6aからほぼ一定量供給し余剰の樹脂を開口窓6
aに対して供給側とは反対側に移動させる。図示例で
は、スキージ7は一つだけ示すが、一般的には2つのス
キージを側面ハの字状に配置して進行方向前方のスキー
ジを上昇させ後方のスキージにより樹脂を移動させるこ
とにより、スキージ7の往復動作で連続して被覆作業を
行うようにしている。図10に示す作業が完了すると半
導体中間構体からマスク6を除去しTABテープ3を次
工程に移動させる。透孔2b内の樹脂5は未硬化である
ため工程移動中に流動して透孔1bと半導体ペレット4
の間からTABテープ3の裏面側に回り込み、図11に
示すようにTABテープ3と半導体ペレット4とを一体
化する。ここで、TABテープ3の透孔1bの両開口端
の周縁1c、1dに樹脂5がはみ出して接着するため、
TABテープ3と半導体ペレット4は強固に一体化され
る。このようにして樹脂被覆された半導体中間構体は樹
脂5を十分硬化させた後、TABテープ3を所定形状に
打ち抜いて個々の半導体装置に分離されて使用される。
2. Description of the Related Art A TAB semiconductor device is generally used to reduce the size of an electronic circuit device while maintaining high performance and high performance. An example of this will be described with reference to FIGS. In the drawing, reference numeral 1 denotes a long heat-resistant insulating tape, which is provided with feed holes 1a and 1a along both sides, and rectangular through-holes 1b at regular intervals in the longitudinal direction at the middle in the width direction. ing.
Reference numeral 2 denotes a conductive pattern formed by etching a conductive foil laminated on the insulating tape 1. The inner lead 2a extends into the through hole 1b, and the outer lead 2b connected to the inner lead 2a and extending on the insulating tape 1. Is composed. The leads 2a, 2b extend in parallel, and the arrangement intervals of the leads are changed by a non-parallel portion 2c having a fan shape. The TAB tape 3 is constituted by an integral body of the insulating tape 1 and the conductive pattern 2. Reference numeral 4 denotes a semiconductor pellet disposed in the through hole 1b, which has a large number of electrodes 4a on the peripheral edge of the upper surface, and the electrodes 4a and the inner leads 2a are electrically connected by means such as thermocompression bonding. Make up the structure. After the semiconductor pellets 4 are connected to the inner leads 2a, a step is formed in the middle using an elastic punch (not shown) as shown in FIG. Reference numeral 5 denotes a sealing resin that covers the surface of the semiconductor pellet 4 and the connection between the electrode 4a and the inner lead 2a in the through hole 1b of the semiconductor intermediate structure and protects it from external corrosive gas and external force. By the way, in an electronic circuit device having a large number of electrodes and requiring high-density mounting, for example, a semiconductor device for driving a liquid crystal display device, the electrodes on the semiconductor pellet 4 are arranged separately on the input side and the output side, and The output side and the output side are extremely different. On the side where the number of electrodes is large, the width and pitch of the electrodes are reduced. For example, when the dimensions of the electrode 4a are 60 μm in width, 90 μm in length, and 20 μm in height, the input side having a small number of electrodes can arrange the electrodes at sufficiently large intervals as compared with the electrode width. On the other hand, on the output side where the number of electrodes is large, the arrangement interval of the electrodes is set to, for example, 70 μm, and the electrode interval is smaller than the electrode width.
It is set to μm. Then, for example, a conductive foil having a thickness of 18 μm is etched to a width of 60 μm and an arrangement interval of 70 μm to form an inner lead 2a corresponding to the electrode 4a.
The resin 5 of the semiconductor device is generally formed by coating by a screen printing method. This will be described with reference to FIG. In the figure, reference numeral 6 denotes a mask using a thin metal plate having a thickness of about 100 μm, and a plurality of opening windows 6a are formed at positions corresponding to the through holes 1b of the semiconductor intermediate structure. The mask 6 has a semiconductor pellet 4 connected thereto in advance and a TAB positioned at a fixed position.
The surface of the through hole 1b of the tape 3 and the surface of the semiconductor pellet 4 are covered so as to be exposed from the opening window 6a. Reference numeral 7 denotes a squeegee which traverses over the opening window 6a and reciprocates on the mask 6. The squeegee 7 supplies an approximately constant amount of the fluid resin 5 supplied onto the mask 6 from the opening window 6a as shown in FIG. Open window 6
It is moved to the side opposite to the supply side with respect to a. In the illustrated example, only one squeegee 7 is shown. However, generally, two squeegees are arranged in a C-shape on the side, the squeegee in the forward direction in the traveling direction is raised, and the resin is moved by the squeegee in the rear. The coating operation is continuously performed by seven reciprocating operations. When the operation shown in FIG. 10 is completed, the mask 6 is removed from the semiconductor intermediate structure, and the TAB tape 3 is moved to the next step. Since the resin 5 in the through-hole 2b is uncured, it flows during the process movement and flows through the through-hole 1b and the semiconductor pellet 4.
Then, the TAB tape 3 goes around to the back side of the TAB tape 3 to integrate the TAB tape 3 and the semiconductor pellet 4 as shown in FIG. Here, since the resin 5 protrudes and adheres to the peripheral edges 1c and 1d at both open ends of the through hole 1b of the TAB tape 3,
The TAB tape 3 and the semiconductor pellet 4 are firmly integrated. After the resin 5 is sufficiently cured, the resin-coated semiconductor intermediate structure is punched out of the TAB tape 3 into a predetermined shape and separated into individual semiconductor devices for use.

【0003】[0003]

【発明が解決しようとする課題】図11に示す構造の半
導体装置は厚みがTABテープ3や半導体ペレット4の
厚みで決定されともに薄いため高密度実装に対応し易
い。この特徴を保ちTABテープ3や半導体ペレット4
の外形寸法を変えずに電極数を増加させるには電極の寸
法を縮小する必要があり、電極の巾を縮小した上で千鳥
状配列して電極の配列間隔を縮小し、これにインナリー
ド2aを対応させている。一方、電極の平面寸法を小さ
くすると電極の高さが制限され、インナリードの間隔も
インナリードの厚みで制限されるため、製造の容易性も
考慮してそれぞれの寸法が決定される。ところで樹脂5
は熱硬化性エポキシ樹脂などのベース樹脂に充填材や硬
化促進材、着色材などを混合したものが用いられるが、
電極4a、インナリード2aのそれぞれの巾を60μ
m、配列間隔を70μmとした場合、インナリード2a
の間隔は10μmとなり、リード間を通過する樹脂5に
は重力による沈降にリード壁面への粘着性が作用しリー
ドの厚さはリードの間隔より大きいため流動性が低下し
た樹脂のリード間の通過に時間を要し、時間の経過とと
もに樹脂5の硬化が進行すると樹脂の流動性は一層低下
する。樹脂5のリードに対する粘着性はリードに被覆し
ためっき材料や表面状態によっても異なる。このように
TABテープ3上の開口部周縁1cではマスク6の開口
窓6aによって樹脂の被覆領域が正確に決定されても、
TABテープ3裏面の開口部周縁1dではインナリード
が延在する部分とそうでない部分とで樹脂5の流動性に
大きな差を生じるため被覆状態がばらつく。また、液晶
表示装置の駆動用半導体装置のように、入力側と出力側
とで電極数が大幅に異なるものでは、インナリード2a
の間隔も入力側と出力側とで大幅に異なり、インナリー
ド部分でも樹脂の流動性に大きな差がある。その結果、
樹脂5が図12に示すように、透孔1b内周壁の下端1
eで止まり、TABテープ3の裏面側周縁1dに回り込
ませることができない場合、TABテープ3を打ち抜く
際のかかる外力によって樹脂5が透孔1b内周から剥離
したり、割れや欠けを生じ、剥離部分からインナリード
2aに外力が作用して機械的強度を低下させたり、半導
体ペレット4上の樹脂被覆が不完全となって耐湿性が低
下するなどの問題があった。このような問題を改善する
ために樹脂5の充填材の材料を変更したりその粒径を小
さくしたり、その混合比率を変更してリード間の流動性
を改善するようにしているが、充填材の粒径を小さくす
ると却って流動性が低下するということもあり、インナ
リード2aが延在する部分とそうでない部分での樹脂の
流動性の差による被覆状態のばらつきを根本的に改善す
ることはできなかった。
The thickness of the semiconductor device having the structure shown in FIG. 11 is determined by the thickness of the TAB tape 3 and the thickness of the semiconductor pellet 4, and both are thin, so that it is easy to cope with high-density mounting. Keeping this feature, TAB tape 3 and semiconductor pellet 4
In order to increase the number of electrodes without changing the external dimensions of the electrodes, it is necessary to reduce the dimensions of the electrodes. After reducing the width of the electrodes, the electrodes are arranged in a staggered pattern to reduce the arrangement interval of the electrodes. Is made to correspond. On the other hand, when the planar dimension of the electrode is reduced, the height of the electrode is limited, and the interval between the inner leads is also limited by the thickness of the inner lead. Therefore, each dimension is determined in consideration of ease of manufacturing. By the way, resin 5
A mixture of a base resin such as a thermosetting epoxy resin, a filler, a curing accelerator, and a coloring material is used.
The width of each of the electrode 4a and the inner lead 2a is 60 μm.
m, when the arrangement interval is 70 μm, the inner lead 2a
The distance between the leads is 10 μm, and the resin 5 passing between the leads has adhesion to the lead wall surface due to sedimentation caused by gravity, and the thickness of the leads is larger than the distance between the leads. , And as the curing of the resin 5 progresses with the elapse of time, the fluidity of the resin further decreases. The adhesiveness of the resin 5 to the lead differs depending on the plating material coated on the lead and the surface condition. As described above, even if the resin coating area is accurately determined by the opening window 6a of the mask 6 at the opening edge 1c on the TAB tape 3,
At the periphery 1d of the opening on the back surface of the TAB tape 3, there is a large difference in the fluidity of the resin 5 between the portion where the inner lead extends and the portion where the inner lead does not extend, so that the covering state varies. In the case of a semiconductor device for driving a liquid crystal display device in which the number of electrodes is significantly different between the input side and the output side, the inner lead 2a
Are significantly different between the input side and the output side, and there is a large difference in the fluidity of the resin even in the inner lead portion. as a result,
As shown in FIG. 12, the resin 5 has the lower end 1 of the inner peripheral wall of the through hole 1b.
e, the resin 5 cannot be wrapped around the back side peripheral edge 1d of the TAB tape 3, and the resin 5 peels off from the inner periphery of the through hole 1b due to the external force applied when the TAB tape 3 is punched out, and cracks or chipping occurs. There were problems such as a reduction in mechanical strength due to external force acting on the inner lead 2a from a portion, and a decrease in moisture resistance due to incomplete resin coating on the semiconductor pellet 4. In order to solve such a problem, the material of the filler of the resin 5 is changed, the particle size is reduced, and the mixing ratio is changed to improve the fluidity between the leads. If the particle diameter of the material is reduced, the fluidity may be reduced, and the variation in the coating state due to the difference in the fluidity of the resin between the portion where the inner lead 2a extends and the portion where the inner lead 2a does not extend is fundamentally improved. Could not.

【0004】[0004]

【課題を解決するための手段】本発明は上記課題の解決
を目的とし提案されたもので、透孔を有する絶縁テープ
に導電パターンを積層し、その一部を透孔の少なくとも
対向する位置から前記透孔内に延在させて、リード巾よ
り十分広い間隔で配列された第1のリード群とこのリー
ド群の配列間隔より狭く配列された第2のリード群とを
構成し、導電パターン形成面に対して裏面側透孔周縁の
少なくともインナリードのない領域に樹脂の流れを規制
する突部を形成したTABテープの前記透孔内に半導体
ペレットを配置し、半導体ペレット上の電極とインナリ
ードとを電気的に接続し、半導体ペレット上面と前記接
続部とを含む主要部分を樹脂にて被覆したことを特徴と
するTAB式半導体装置を提供する。
SUMMARY OF THE INVENTION The present invention has been proposed to solve the above-mentioned problems, and has been proposed in which a conductive pattern is laminated on an insulating tape having a through hole, and a part of the conductive pattern is formed at least from a position facing the through hole. A first lead group arranged at intervals sufficiently wider than the lead width and a second lead group arranged narrower than the arrangement interval of the lead groups by extending into the through-hole; A semiconductor pellet is disposed in the through hole of the TAB tape having a protrusion for restricting resin flow at least in a region where there is no inner lead at the periphery of the through hole on the back surface side with respect to the surface. Are electrically connected to each other, and a main portion including the upper surface of the semiconductor pellet and the connection portion is covered with a resin.

【0005】[0005]

【発明の実施の形態】本発明によるTAB式半導体装置
は、リード間隔が異なる第1、第2のリード群を有する
TABテープの導電パターン形成面に対して裏面側透孔
周縁の少なくともインナリードのない領域に樹脂の流れ
を規制する突部を形成したことを特徴とするが、透孔の
角部に位置する突部内壁を多角状または円弧状に形成す
ることにより、降下する樹脂の水平方向への移動を良好
にできる。またリード間隔が狭く設定された第2のリー
ド群側の透孔周縁に突部を形成し、この突部を他の部分
に形成された突部より巾広にしたり、他の部分より透孔
に近接させることもできる。第2のリード群側に形成さ
れた突部を透孔に近接させる場合には、この突部のリー
ド配列方向中間部を透孔に近接させるようにすれば良
い。
DESCRIPTION OF THE PREFERRED EMBODIMENTS In a TAB type semiconductor device according to the present invention, at least an inner lead on a peripheral edge of a back side through-hole with respect to a conductive pattern forming surface of a TAB tape having first and second lead groups having different lead intervals. It is characterized by forming a protrusion that regulates the flow of resin in the area where there is no, but by forming the inner wall of the protrusion located at the corner of the through-hole in a polygonal or arc shape, the horizontal direction of the resin descending The transfer to can be improved. In addition, a protrusion is formed on the periphery of the through hole on the second lead group side where the lead interval is set to be narrow, and this protrusion is made wider than the protrusion formed in the other portion, or the through hole is formed more than the other portion. Can also be brought into proximity. In the case where the protrusion formed on the second lead group side is made to approach the through hole, an intermediate portion of the protrusion in the lead arrangement direction may be made to approach the through hole.

【0006】[0006]

【実施例】以下に本発明の実施例を図1乃至図4から説
明する。図において、図7および図8と同一物には同一
符号を付し重複する説明を省略する。図中相異するのは
導電パターン2としてリード巾より十分広い間隔で配列
された第1のリード群8aとこのリード群8aの配列間
隔より狭く配列された第2のリード群8bとを含み、第
1、第2のリード群8a、8bを透孔1bの少なくとも
対向する位置から透孔1b内に延在させたことと、前記
リード群に関連して、TABテープ3の導電パターン形
成面に対して裏面側透孔1b周縁の少なくともインナリ
ードのない領域および間隔が十分広い第1のリード群8
aが位置する領域に樹脂5の流れを規制する突部9を形
成したことのみである。この突部9は図1および図2に
示すようにリード配列間隔が広く設定された第1のリー
ド群8a側より略コの字状乃至略C字状に形成される。
この構造により半導体ペレット4の表面を被覆した樹脂
が透孔1bと半導体ペレット4の間からTABテープ3
の裏面側に回り込むとき、透孔1b周縁のうちリード群
8a、8bのない領域では樹脂流動の障害となるものが
ないため樹脂5は速やかにTABテープ3の裏面側へ回
り込む。また第1のリード群8aが位置する領域もリー
ド間隔が広いため樹脂の流動性の低下も少なく短時間で
TABテープ3の裏面側に回り込む。これに対して第2
のリード群8b部分では、インナリードの間隔がきわめ
て狭いため樹脂の降下に時間を要し、他の部分から供給
された樹脂がTABテープ3の裏面側へ到達しても十分
な量の樹脂をTABテープ3の裏面側に到達させること
はできない。本発明による半導体装置では、TABテー
プ3の裏面の所定位置に所定形状の突部9を形成してい
るため、先にTABテープ3の裏面に回り込んだ樹脂5
は突部9によってTABテープ3裏面上の進行が停止さ
れ、半導体ペレット4の側壁に沿う降下は進行する。こ
の降下樹脂の断面積は半導体ペレット4と透孔1bの間
の開口断面積から半導体ペレット4と突部9間の開口断
面積に拡大するため、時間当たりの降下量は小さくな
り、上方からの樹脂の供給がなくなった時点で樹脂の降
下は停止する。また、第2のリード群8bが対向する透
孔1b裏面領域と隣り合う領域には突部9の両端部分が
配置されているため、この領域に速やかに拡がった樹脂
5は、第2のリード群8bの対向領域に進入し、第2の
リード群8bのリード間から供給される樹脂と一体化す
る。そのため時間が十分経過し樹脂が半硬化状態となっ
て流動が停止した状態では、TABテープ3に対して図
3および図4に示すように透孔1b開口端周縁が全周に
わたって樹脂被覆され、第2のリード群8bの配列方向
中間部(図示符号5a部分)の樹脂のはみ出し量は小さ
いが、両端部(図示符号5b部分)のはみ出し量は十分
大きいためTABテープ3と半導体ペレット4は強固に
一体化される。このように第2のリード群8b部分での
樹脂の流動性がきわめて悪いことに起因する問題を突部
9を適正に形成することにより、解決できる。図4では
透孔1bの角部に位置する突部9の内壁を透孔1bの矩
形形状に合わせて90度に設定しているが、この部分を
多角状または円弧状にすることにより、透孔1b内を降
下しTABテープ3の面に沿って水平方向へ移動する樹
脂が突部9によって停止された後、透孔1bの周縁方向
への移動を容易にすることができ、速やかにTABテー
プ3の裏面側へ降下した樹脂の余剰分を樹脂の降下に時
間を要する部分に供給することができる。この突部9は
TABテープ3を製造する課程で、スクリーン印刷法に
より所定パターンに樹脂インクを印刷して形成すること
ができる。この場合、スクリーン印刷用のマスクに形成
する塗布窓が細くて長い場合には、塗布窓を複数に分割
し、分割窓と分割窓の隣接部分、即ち突部9が形成され
ない部分は樹脂5が流入し易い部分に配置ればよい。ま
た、この突部9はスクリーン印刷法だけでなく、転写法
を用いて形成することができる。この場合には、樹脂5
を塗布する工程より前であれば任意の製造工程で形成す
ることができる。図5は本発明によるTAB式半導体装
置の他の実施例を示す。図において図1と同一物には同
一符号を付し重複する説明を省略する。図中、10はT
ABテープ3の裏面で第2のリード群8b側の透孔1b
周縁に形成された第2の突部で、図示例では透孔1bの
開口縁に沿って一直線状に形成され、両端が図1におけ
る突部(第1の突部)9に接続されている。この第1、
第2の突部9、10は透孔1bからの距離がほぼ等しく
配置され、角部は円弧状に形成されている。この半導体
装置は、リード間隔が狭く設定された第2のリード8b
部分にも第2の突部10を配置したから、第1の突部9
によって水平面内の移動が停止された樹脂の余剰分を突
部10領域に移動させ、速やかに第2の突部10で囲ま
れる領域を樹脂被覆し、透孔1bの開口端周縁を全周に
わたって樹脂被覆することができ、半導体ペレット4と
TABテープ3の機械的接続を確実にできる。この半導
体装置は第1、第2の突部9、10を透孔1bから等距
離に配置したが、短時間で樹脂5が降下する第1の突部
9は第2の突部10より透孔1bから離隔させてもよ
い。また第2の突部10を透孔1bに近接させることに
よって、透孔1b周縁の被覆樹脂の巾が突部10部分で
狭くなる場合には、予め第2の突部10を外方に広く形
成しその巾を十分広く設定しておくことができる。これ
により第2の突部10と一体化させた樹脂5の巾を拡げ
ることができ、透孔1b周縁での樹脂5の接着強度を高
めることができ、TABテープ3と半導体ペレット4を
強固に一体化できる。図6は本発明によるTAB式半導
体装置の他の実施例を示す。図において図1と同一物に
は同一符号を付し重複する説明を省略する。図中、11
はTABテープ3の裏面で第2のリード群8b側の透孔
1b周縁に形成された第2の突部で、略C字状の第1の
突部9の両端の開口部と対向し、図示例では透孔1bの
開口縁に沿って略くの字状に形成され、両端が第1の突
部9の両端から離隔し、中間が透孔1bに近接するよう
に配置されている。この実施例では図1実施例と同様
に、リード群8のない領域およびリード間隔が広い第1
のリード群8aが位置する領域では樹脂5がTABテー
プ3の裏面の透孔1b周縁に速やかに広がり、リード間
隔が狭い第2のリード群8b部分では遅れて樹脂5が拡
がるが、この領域と隣り合う部分で先行して拡がった樹
脂は第2の突部11によって外方への広がりが停止され
る。この突部11は両端から中間部に向かって透孔1b
に近接するように配置されているため、第2の突部11
の両端部分に先行して拡がった樹脂5はこの突部11内
壁に沿って中間部に移動し、速やかに透孔1bと第2の
突部11の間を埋め、第2のリード群8b間から遅れて
供給される樹脂5と一体化する。第1、第2の突部9、
11は両端が開放されているが、それぞれの両端を接続
してもよい。この場合には、接続部の形状を樹脂が停滞
することなく一方向に移動し得るように形成することが
望ましい。また、第2の突部11はくの字状だけでなく
透孔1b側の内壁が略くの字状であれば三角形状でも、
台形形状でも良い。この実施例では図1実施例に比して
樹脂5の拡がる範囲が第1、第2の突部9、11によっ
て規制されるため、所望する範囲に確実に樹脂を被覆す
ることができる。尚、上記実施例では第1、第2の突部
9、10、11はともに透孔1bと対向する面を連続さ
せているが、リード群8a、8bがない透孔1bの角部
と対向する部分に配置した突部に凹部を形成してこの凹
部で余剰の樹脂を十分収容させたり、少なくとも第2の
突部10、11の透孔1bの角部を除く部分と対向する
部分に櫛状の凹凸を形成して、この凹凸部の凸部を透孔
1bに近接させ、凹部で少量の樹脂を収容させて、供給
される樹脂量が少ない部分にも対応させることができ
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. In the figure, the same components as those in FIGS. 7 and 8 are denoted by the same reference numerals, and redundant description will be omitted. What is different in the figure is that the conductive patterns 2 include a first lead group 8a arranged at intervals sufficiently larger than the lead width and a second lead group 8b arranged narrower than the arrangement interval of the lead groups 8a, The first and second lead groups 8a and 8b are extended into the through-hole 1b from at least positions facing the through-hole 1b, and the lead group 8a and 8b are connected to the conductive pattern forming surface of the TAB tape 3 in association with the lead group. On the other hand, the first lead group 8 having at least a region on the periphery of the back surface side through-hole 1b where there is no inner lead and a sufficiently large interval.
The only difference is that the protrusion 9 for restricting the flow of the resin 5 is formed in the area where “a” is located. As shown in FIGS. 1 and 2, the protrusion 9 is formed in a substantially U-shape or a substantially C-shape from the side of the first lead group 8a where the lead arrangement interval is set wide.
With this structure, the resin covering the surface of the semiconductor pellet 4 is coated with the TAB tape 3 between the through hole 1 b and the semiconductor pellet 4.
In the area around the through hole 1b where there is no lead group 8a or 8b, there is no obstacle to the resin flow, so that the resin 5 quickly goes around to the back side of the TAB tape 3. Also, since the lead interval is wide in the area where the first lead group 8a is located, the flowability of the resin is less reduced and the resin is wrapped around the back surface of the TAB tape 3 in a short time. The second
In the part of the lead group 8b, it takes a long time for the resin to descend because the interval between the inner leads is extremely narrow, and a sufficient amount of resin is supplied even if the resin supplied from other parts reaches the back side of the TAB tape 3. It cannot reach the back side of the TAB tape 3. In the semiconductor device according to the present invention, since the protrusion 9 having a predetermined shape is formed at a predetermined position on the back surface of the TAB tape 3, the resin 5 that has previously wrapped around the back surface of the TAB tape 3 is formed.
The protrusion on the back surface of the TAB tape 3 is stopped by the protrusion 9, and the descent along the side wall of the semiconductor pellet 4 proceeds. Since the cross-sectional area of the falling resin increases from the cross-sectional area of the opening between the semiconductor pellet 4 and the through hole 1b to the cross-sectional area of the opening between the semiconductor pellet 4 and the protrusion 9, the amount of drop per unit time becomes small, and When the supply of the resin stops, the descent of the resin stops. Further, since both end portions of the protrusion 9 are arranged in a region adjacent to the rear surface region of the through hole 1b opposed to the second lead group 8b, the resin 5 which has rapidly spread in this region is the second lead. It enters the facing area of the group 8b and is integrated with the resin supplied from between the leads of the second lead group 8b. For this reason, in a state where the time has sufficiently passed and the resin is in a semi-cured state and the flow has stopped, as shown in FIG. 3 and FIG. Although the amount of protrusion of the resin at the intermediate portion (the portion denoted by reference numeral 5a) of the second lead group 8b in the arrangement direction is small, the amount of protrusion at both ends (portion denoted by reference numeral 5b) is sufficiently large, so that the TAB tape 3 and the semiconductor pellet 4 are strong. Integrated into Thus, the problem caused by the extremely poor fluidity of the resin in the second lead group 8b can be solved by appropriately forming the projections 9. In FIG. 4, the inner wall of the projection 9 located at the corner of the through hole 1b is set at 90 degrees in accordance with the rectangular shape of the through hole 1b. After the resin descending in the hole 1b and moving in the horizontal direction along the surface of the TAB tape 3 is stopped by the protrusion 9, the movement of the through hole 1b in the peripheral direction can be facilitated, and the TAB can be quickly performed. The surplus resin that has fallen to the back side of the tape 3 can be supplied to a portion that requires time for the resin to descend. The projection 9 is a process of manufacturing the TAB tape 3 and can be formed by printing resin ink in a predetermined pattern by a screen printing method. In this case, when the application window formed on the screen printing mask is thin and long, the application window is divided into a plurality of portions, and the portion adjacent to the divided window and the divided window, that is, the portion where the protrusion 9 is not formed, is formed of the resin 5. What is necessary is just to arrange in the part which flows in easily. The projection 9 can be formed not only by a screen printing method but also by a transfer method. In this case, the resin 5
It can be formed in any manufacturing process as long as it is before the step of applying a. FIG. 5 shows another embodiment of the TAB type semiconductor device according to the present invention. In the figure, the same components as those in FIG. 1 are denoted by the same reference numerals, and redundant description will be omitted. In the figure, 10 is T
Through hole 1b on the second lead group 8b side on the back surface of AB tape 3
In the illustrated example, the second protrusion is formed in a straight line along the opening edge of the through hole 1b, and both ends are connected to the protrusion (first protrusion) 9 in FIG. . This first,
The second protrusions 9 and 10 are disposed at substantially the same distance from the through hole 1b, and the corners are formed in an arc shape. This semiconductor device includes a second lead 8b having a narrow lead interval.
Since the second protruding portion 10 is also arranged at the portion, the first protruding portion 9
As a result, the surplus of the resin whose movement in the horizontal plane has been stopped is moved to the protrusion 10 region, the region surrounded by the second protrusion 10 is quickly covered with the resin, and the opening end periphery of the through hole 1b is extended over the entire circumference. Resin coating can be performed, and mechanical connection between the semiconductor pellet 4 and the TAB tape 3 can be ensured. In this semiconductor device, the first and second protrusions 9 and 10 are arranged at the same distance from the through hole 1b, but the first protrusion 9 from which the resin 5 descends in a short time passes through the second protrusion 10. It may be separated from the hole 1b. When the width of the coating resin on the periphery of the through hole 1b becomes narrow at the portion of the protrusion 10 by bringing the second protrusion 10 close to the through hole 1b, the second protrusion 10 is widened outward in advance. It can be formed and its width can be set sufficiently wide. As a result, the width of the resin 5 integrated with the second protrusion 10 can be increased, the adhesive strength of the resin 5 at the periphery of the through hole 1b can be increased, and the TAB tape 3 and the semiconductor pellet 4 can be firmly bonded. Can be integrated. FIG. 6 shows another embodiment of the TAB type semiconductor device according to the present invention. In the figure, the same components as those in FIG. 1 are denoted by the same reference numerals, and redundant description will be omitted. In the figure, 11
Is a second protrusion formed on the back surface of the TAB tape 3 at the periphery of the through hole 1b on the second lead group 8b side, facing the openings at both ends of the substantially C-shaped first protrusion 9; In the illustrated example, it is formed in a substantially rectangular shape along the opening edge of the through hole 1b, and both ends are separated from both ends of the first projection 9, and the middle is arranged so as to be close to the through hole 1b. In this embodiment, as in the embodiment shown in FIG. 1, a region having no lead group 8 and a first lead having a wide lead interval are used.
In the area where the lead group 8a is located, the resin 5 quickly spreads around the through hole 1b on the back surface of the TAB tape 3, and the resin 5 spreads later in the second lead group 8b where the lead interval is small. The resin that has spread earlier in the adjacent portion is stopped from spreading outward by the second protrusion 11. The projecting portion 11 has a through hole 1b from both ends toward the middle portion.
, The second protrusion 11
The resin 5 that has spread before the both end portions moves to the intermediate portion along the inner wall of the protrusion 11 and quickly fills the space between the through hole 1b and the second protrusion 11 to form the second lead group 8b. From the resin 5 supplied later. First and second projections 9,
11 is open at both ends, but may be connected at both ends. In this case, it is desirable to form the shape of the connection portion so that the resin can move in one direction without stagnation. In addition, the second protrusion 11 may be not only in the shape of a letter but also in the shape of a triangle if the inner wall on the side of the through hole 1b is in the shape of a letter.
It may be trapezoidal. In this embodiment, the range in which the resin 5 spreads is restricted by the first and second protrusions 9 and 11 as compared with the embodiment in FIG. 1, so that the desired range can be surely covered with the resin. In the above embodiment, the first and second projections 9, 10, and 11 both have the surface facing the through hole 1b continuous, but face the corner of the through hole 1b without the lead groups 8a and 8b. A concave portion is formed in the protrusion disposed at the portion to be formed, and excess resin is sufficiently accommodated in the concave portion, or at least a portion of the second protrusions 10 and 11 opposed to the portion excluding the corner of the through hole 1b is combed. By forming a convex-concave shape, the convex portion of the concave-convex portion is brought close to the through hole 1b, and a small amount of resin is accommodated in the concave portion, so that it can correspond to a portion where the amount of supplied resin is small.

【0007】[0007]

【発明の効果】以上のように本発明によれば、TABテ
ープの透孔内に延在させたインナリードの間隔が狭くて
も、TABテープの表面から透孔内に供給した樹脂を裏
面側透孔周縁にまわり込ませることができ、半導体ペレ
ットとTABテープとを確実に一体化でき、十分な機械
的強度と耐湿性を有する半導体装置を実現できる。
As described above, according to the present invention, even if the interval between the inner leads extended into the through hole of the TAB tape is narrow, the resin supplied into the through hole from the front surface of the TAB tape can be supplied to the back side. The semiconductor device can be wrapped around the periphery of the through hole, the semiconductor pellet and the TAB tape can be reliably integrated, and a semiconductor device having sufficient mechanical strength and moisture resistance can be realized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明によるTAB式半導体装置の製造中間
構体を示す側断面図
FIG. 1 is a side sectional view showing an intermediate structure for manufacturing a TAB semiconductor device according to the present invention.

【図2】 図1半導体中間構体の側断面図FIG. 2 is a side sectional view of the semiconductor intermediate structure shown in FIG. 1;

【図3】 本発明による半導体装置を示す側断面図FIG. 3 is a side sectional view showing a semiconductor device according to the present invention.

【図4】 図3に示す半導体装置の裏面図FIG. 4 is a back view of the semiconductor device shown in FIG. 3;

【図5】 本発明の他の実施例を示す裏面図FIG. 5 is a rear view showing another embodiment of the present invention.

【図6】 本発明の他の実施例を示す裏面図FIG. 6 is a rear view showing another embodiment of the present invention.

【図7】 TAB式半導体装置の一例を示す一部透視斜
視図
FIG. 7 is a partially transparent perspective view showing an example of a TAB type semiconductor device.

【図8】 図7半導体装置の側断面図8 is a side sectional view of the semiconductor device in FIG. 7;

【図9】 図7半導体装置の樹脂被覆作業を説明する側
断面図
9 is a sectional side view illustrating a resin coating operation of the semiconductor device in FIG. 7;

【図10】 図7半導体装置の樹脂被覆作業を説明する
側断面図
FIG. 10 is a side sectional view illustrating a resin coating operation of the semiconductor device.

【図11】 図7半導体装置の樹脂被覆作業を説明する
側断面図
FIG. 11 is a side sectional view illustrating a resin coating operation of the semiconductor device.

【図12】 図7半導体装置の課題を示す側断面図FIG. 12 is a side sectional view showing a problem of the semiconductor device in FIG. 7;

【符号の説明】[Explanation of symbols]

1b 透孔 1 絶縁テープ 8 インナリードを含む導電パターン 3 TABテープ 4 半導体ペレット 4a 電極 5 樹脂 8a 第1のリード群 8b 第2のリード群 9 突部 1b Through hole 1 Insulating tape 8 Conductive pattern including inner lead 3 TAB tape 4 Semiconductor pellet 4a Electrode 5 Resin 8a First lead group 8b Second lead group 9 Projection

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】透孔を有する絶縁テープに前記透孔内に延
在する多数本のインナリードを含む導電パターンを積層
形成したTABテープの前記透孔内に半導体ペレットを
配置し、半導体ペレット上の電極とインナリードとを電
気的に接続し、半導体ペレット上面と前記接続部とを含
む主要部分を樹脂にて被覆したTAB式半導体装置にお
いて、 リード巾より十分広い間隔で配列された第1のリード群
とこのリード群の配列間隔より狭く配列された第2のリ
ード群とを含み、第1、第2のリード群を透孔の少なく
とも対向する位置から透孔内に延在させるとともに、前
記TABテープの導電パターン形成面に対して裏面側透
孔周縁の少なくともインナリードのない領域に樹脂の流
れを規制する突部を形成したことを特徴とするTAB式
半導体装置。
A semiconductor pellet is arranged in a through hole of a TAB tape in which a conductive pattern including a plurality of inner leads extending in the through hole is laminated on an insulating tape having the through hole. In the TAB type semiconductor device in which the electrode and the inner lead are electrically connected and the main part including the upper surface of the semiconductor pellet and the connection part is covered with the resin, the first array is arranged at an interval sufficiently wider than the lead width. A lead group and a second lead group arranged narrower than the arrangement interval of the lead group, wherein the first and second lead groups are extended from at least opposing positions of the through hole into the through hole; A TAB-type semiconductor device, wherein a protrusion for restricting resin flow is formed at least in a region where there is no inner lead on the periphery of the back surface side through-hole with respect to the conductive pattern forming surface of the TAB tape. .
【請求項2】透孔の角部に位置する突部の内壁を多角状
または円弧状に形成したことを特徴とする請求項1に記
載のTAB式半導体装置。
2. The TAB semiconductor device according to claim 1, wherein the inner wall of the projection located at the corner of the through hole is formed in a polygonal or arc shape.
【請求項3】TABテープ裏面の第2のリード群側の透
孔周縁に突部を形成したことを特徴とする請求項1に記
載のTAB式半導体装置。
3. The TAB type semiconductor device according to claim 1, wherein a protrusion is formed on the periphery of the through hole on the second lead group side on the back surface of the TAB tape.
【請求項4】第2のリード群側に形成した突部の巾を他
の部分に形成した突部の巾より広く形成したことを特徴
とする請求項3に記載のTAB式半導体装置。
4. The TAB semiconductor device according to claim 3, wherein the width of the protrusion formed on the second lead group side is wider than the width of the protrusion formed on the other part.
【請求項5】第2のリード群側に形成した突部を他の部
分に形成した突部よりも透孔に近接させたことを特徴と
する請求項3に記載のTAB式半導体装置。
5. The TAB type semiconductor device according to claim 3, wherein the protrusion formed on the second lead group side is closer to the through hole than the protrusion formed on the other part.
【請求項6】第2のリード群側に形成した突部を、第2
のリード群の配列方向両端部から中間部に向かって、透
孔に近接配置させたことを特徴とする請求項5に記載の
TAB式半導体装置。
6. A projection formed on the second lead group side, and
6. The TAB type semiconductor device according to claim 5, wherein the lead group is arranged closer to the through hole from both ends in the arrangement direction to the middle part.
【請求項7】第2のリード群側に形成した突部を、第2
のリード群の配列方向両端部から中間部に向かって、巾
広に形成したことを特徴とする請求項6に記載のTAB
式半導体装置。
7. A projection formed on the side of the second lead group,
7. The TAB according to claim 6, wherein the width of the lead group is increased from both ends in the arrangement direction to the middle part.
Type semiconductor device.
JP10017626A 1998-01-30 1998-01-30 Tab semiconductor device and manufacture thereof Pending JPH11219987A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10017626A JPH11219987A (en) 1998-01-30 1998-01-30 Tab semiconductor device and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10017626A JPH11219987A (en) 1998-01-30 1998-01-30 Tab semiconductor device and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH11219987A true JPH11219987A (en) 1999-08-10

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP10017626A Pending JPH11219987A (en) 1998-01-30 1998-01-30 Tab semiconductor device and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH11219987A (en)

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