JPH11214447A - Mounting structure for semiconductor device and mounting method therefor - Google Patents

Mounting structure for semiconductor device and mounting method therefor

Info

Publication number
JPH11214447A
JPH11214447A JP1383598A JP1383598A JPH11214447A JP H11214447 A JPH11214447 A JP H11214447A JP 1383598 A JP1383598 A JP 1383598A JP 1383598 A JP1383598 A JP 1383598A JP H11214447 A JPH11214447 A JP H11214447A
Authority
JP
Japan
Prior art keywords
solder
semiconductor device
mounting
bump
voids
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1383598A
Other languages
Japanese (ja)
Inventor
Masaya Sakurai
雅也 櫻井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP1383598A priority Critical patent/JPH11214447A/en
Publication of JPH11214447A publication Critical patent/JPH11214447A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • H05K3/3431Leadless components
    • H05K3/3436Leadless components having an array of bottom contacts, e.g. pad grid array or ball grid array components

Abstract

PROBLEM TO BE SOLVED: To relax thermal stresses concentrating on solder bumps and to thereby prevent break of the solder bumps due to thermal fatigue, by providing a mounting board and solder bumps to be mounted on electrodes of the mounting board having the solder bumps with uniform voids. SOLUTION: A wet back step is performed by setting a wet back melting temperature to a temperature lower than the melting point +20 deg.C and higher than the melting point +10 deg.C of solder. Countless voids 14 are uniformly formed within a molten solder bump 15. Let us think about the case where a thermal load is applied to a semiconductor device 11 to thereby produce a thermal stress at the bump 15. A gas is present within each void 14, and if it is assumed, e.g. that air is present within each void, the modulus of elasticity of each void is 0.33 MPa, which is a value negligible compared with that of the solder. It means that the voids 14 have formed free surfaces at all the parts of the bump 15, and thus any displacements within the bump 15 are absorbed by the voids 14. As a result, the capability of relaxing produced thermal stresses is increased, and thus the life of the solder bump against thermal fatigue can be improved.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、接続端子に半田バ
ンプが使用されている半導体装置の実装構造及びその実
装方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mounting structure of a semiconductor device in which solder bumps are used for connection terminals and a mounting method thereof.

【0002】[0002]

【従来の技術】従来、接続端子に半田バンプが使用され
ているような半導体装置としては、以下に示すようなも
のがあった。図3及び図4はかかる従来の半導体装置の
半田バンプ部の断面図である。図3に示すように、半導
体装置1の半田バンプ5自身が溶融して実装基板3に接
続している場合や、図4に示すように、半導体装置1の
高融点半田バンプ6が低融点半田7が溶融することによ
り接続している場合があり、ともに共通して、バンプ内
部は金属が充填している。
2. Description of the Related Art Conventionally, there have been the following semiconductor devices in which solder bumps are used for connection terminals. FIGS. 3 and 4 are cross-sectional views of a solder bump portion of such a conventional semiconductor device. As shown in FIG. 3, when the solder bump 5 of the semiconductor device 1 itself is melted and connected to the mounting substrate 3, or as shown in FIG. 7 may be connected by melting, and the inside of the bump is commonly filled with metal.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、上記し
た従来の構造では以下に記すような問題点があった。半
田バンプ5,6,7付き半導体装置1を実装基板3上に
接続後、熱的な負荷が加わった場合、半導体装置1と実
装基板3の熱膨張係数の差により、熱応力が発生する。
この時、その熱応力は充填樹脂2によって殆どが緩和さ
れるが、充填樹脂2で緩和しきれない熱応力は、半田バ
ンプ5,6,7に集中し歪みを発生させる。この熱的な
負荷が何回か繰り返されると、歪みが溜まり、やがて半
田バンプ5,6,7は熱疲労破壊によって破断してしま
う。
However, the conventional structure described above has the following problems. When a thermal load is applied after connecting the semiconductor device 1 with the solder bumps 5, 6, and 7 on the mounting substrate 3, a thermal stress is generated due to a difference in thermal expansion coefficient between the semiconductor device 1 and the mounting substrate 3.
At this time, most of the thermal stress is alleviated by the filling resin 2, but the thermal stress that cannot be alleviated by the filling resin 2 concentrates on the solder bumps 5, 6, and 7 to generate distortion. If this thermal load is repeated several times, strain accumulates, and the solder bumps 5, 6, and 7 eventually break due to thermal fatigue failure.

【0004】本発明は、上記問題点を除去し、半田バン
プに集中する熱応力を緩和して、半田バンプの熱疲労破
壊を防止することができる半導体装置の実装構造及びそ
の実装方法を提供することを目的とする。
The present invention provides a mounting structure of a semiconductor device and a mounting method thereof, which can eliminate the above-mentioned problems, reduce thermal stress concentrated on solder bumps, and prevent thermal fatigue damage of solder bumps. The purpose is to:

【0005】[0005]

【課題を解決するための手段】本発明は、上記目的を達
成するために、 〔1〕半田バンプを有する半導体装置の実装構造におい
て、実装基板と、この実装基板の電極上に実装される一
様にボイドを有する半田バンプを有する半導体装置を具
備するようにしたものである。
In order to achieve the above object, the present invention provides: [1] In a mounting structure of a semiconductor device having a solder bump, a mounting substrate and an electrode mounted on an electrode of the mounting substrate are provided. Thus, a semiconductor device having solder bumps having voids is provided.

【0006】〔2〕半田バンプを有する半導体装置の実
装構造において、実装基板と、この実装基板の電極上に
正確に実装される高融点半田の電極となるバンプと、ボ
イドを有する低融点接続半田とを具備するようにしたも
のである。 〔3〕半田バンプを有する半導体装置の実装方法におい
て、実装基板の電極上に実装される半導体装置に半田の
電極を形成する際、ウェットバックの溶融温度を融点+
20℃以下10℃以上にして、バンプ内に一様にボイド
を形成し、熱応力が負荷される時に前記バンプ内のボイ
ドにより、熱応力を緩和して、前記半導体装置を前記実
装基板に実装するようにしたものである。
[2] In a mounting structure of a semiconductor device having solder bumps, a mounting board, a bump serving as an electrode of a high melting point solder accurately mounted on an electrode of the mounting board, and a low melting point connection solder having a void Are provided. [3] In the method of mounting a semiconductor device having solder bumps, when forming a solder electrode on a semiconductor device mounted on an electrode of a mounting substrate, the melting temperature of wet back is set to the melting point +
The semiconductor device is mounted on the mounting substrate by forming a void uniformly in the bump at a temperature of 20 ° C. or less and 10 ° C. or more, and relaxing the thermal stress by the void in the bump when thermal stress is applied. It is something to do.

【0007】〔4〕半田バンプを有する半導体装置の実
装方法において、実装基板の電極上に実装される半導体
装置に高融点半田の電極を形成し、前記実装基板の電極
上に低融点接続半田を塗布し、前記半導体装置を前記実
装基板上に実装する際に、前記高融点半田の電極となる
バンプと前記実装基板の電極の位置を正確に合わせて、
前記低融点接続半田内にボイドを形成するようにしたも
のである。
[4] In the method of mounting a semiconductor device having solder bumps, a high melting point solder electrode is formed on a semiconductor device mounted on an electrode of a mounting board, and a low melting point connection solder is formed on the mounting board electrode. When applying, when mounting the semiconductor device on the mounting board, the positions of the electrodes of the mounting board and the bumps serving as the electrodes of the high melting point solder are accurately aligned,
A void is formed in the low melting point connection solder.

【0008】[0008]

【発明の実施の形態】以下、本発明の実施の形態につい
て詳細に説明する。図1は本発明の第1実施例の半導体
装置の実装構造を示す断面図である。この図において、
11は半導体装置、12は充填樹脂、13は実装基板、
14はボイド、15は半田バンプである。
Embodiments of the present invention will be described below in detail. FIG. 1 is a sectional view showing a mounting structure of a semiconductor device according to a first embodiment of the present invention. In this figure,
11 is a semiconductor device, 12 is a filling resin, 13 is a mounting board,
14 is a void and 15 is a solder bump.

【0009】まず、半導体装置11の電極上に錫鉛合金
等の材料によって半田バンプ15をメッキで形成する。
形成方法としては、例えば、電極上のNiを陽極として
錫、鉛の順に電気メッキ法にて形成する方法がある。メ
ッキ後、半田材料を溶融させ形状を整形する作業(以
下、ウェットバックという)を行う。通常ウェットバッ
ク時には、半田材の融点+40℃近辺の温度を負荷する
が、この場合、半田材の融点+20℃以下+10℃以上
の温度を負荷する。例えば、95:5=Pb:Snの場
合は、融点が314℃なので通常のウェットバック温度
が355℃近辺であるところを324〜330℃で行
い、63:37=Pb:Snの場合は、融点が183℃
なので、通常のウェットバック温度が220℃近辺であ
るところを193〜203℃で行う。
First, solder bumps 15 are formed on the electrodes of the semiconductor device 11 by plating with a material such as a tin-lead alloy.
As a forming method, for example, there is a method of forming by electroplating in the order of tin and lead using Ni on the electrode as an anode. After plating, an operation of melting the solder material and shaping the shape (hereinafter, referred to as wet back) is performed. Normally, at the time of wet back, a temperature around the melting point of the solder material + 40 ° C. is applied. In this case, a temperature of + 20 ° C. or less + 10 ° C. or more is applied. For example, in the case of 95: 5 = Pb: Sn, the melting point is 314 ° C., so that the normal wet back temperature is around 355 ° C., and the temperature is set to 324 to 330 ° C. In the case of 63: 37 = Pb: Sn, the melting point is Is 183 ° C
Therefore, the process is performed at 193 to 203 ° C. where the normal wet back temperature is around 220 ° C.

【0010】この方法で、ウェットバックを行うと、溶
融後の半田バンプ15内に無数のボイド14が形成され
る。ボイド14は半田バンプ15内に一様に存在する。
このように構成したので、半導体装置11に熱的な負荷
が加わり半田バンプ15に熱応力が発生した場合、熱応
力が負荷された半田バンプ15の中にボイド14が存在
する場合、ボイド14の中は気体であるため、例えば、
中身を空気と考えると、弾性率は0.33MPaであ
り、半田材料の弾性率に比べて無視できる値である。ボ
イド14は半田バンプ15内のあらゆる箇所で自由表面
を作ったことになり、半田バンプ15内の変位は全てボ
イド14に吸収される。即ち、スポンジと同じ性質を持
ち、応力吸収係数は増大する。見かけ弾性率が小さくな
り、自身の変形能力も向上する。
When wet back is performed by this method, countless voids 14 are formed in the solder bumps 15 after melting. The voids 14 are uniformly present in the solder bumps 15.
With this configuration, when a thermal load is applied to the semiconductor device 11 and a thermal stress is generated in the solder bump 15, when the void 14 exists in the solder bump 15 to which the thermal stress is applied, Since the inside is a gas, for example,
When the content is considered to be air, the elastic modulus is 0.33 MPa, which is negligible compared to the elastic modulus of the solder material. The void 14 has created a free surface everywhere in the solder bump 15, and any displacement in the solder bump 15 is absorbed by the void 14. That is, it has the same properties as the sponge, and the stress absorption coefficient increases. The apparent modulus of elasticity is reduced, and its own deformability is also improved.

【0011】このように、第1実施例によれば、発生す
る熱応力を緩和する能力が増大するため、通常の半田バ
ンプと比較して熱疲労寿命の向上を図ることができる。
なお、ボイドの測定には、マイクロX線検査機(例え
ば、メデイアエックステック社製)を使用する。この検
査機を使用してバンプのX線写真を影り、ボイドの存在
する割合を2値化処理された写真から検出し、最終的に
は面積をもって判断する。より具体的には、その検査機
を使用してウエハ直上からX線でバンプを透過する。ボ
イドが存在する場合、その場所は周辺の半田の詰まって
いる黒い部分と比較して、白く見えるため、その部分の
面積と濃淡の度合いを積分することで、バンプ内のボイ
ドの体積を計算し、ボイドの量を測定することができ
る。
As described above, according to the first embodiment, the ability to alleviate the generated thermal stress is increased, so that the fatigue life can be improved as compared with a normal solder bump.
In addition, a micro X-ray inspection machine (for example, manufactured by Media X Tech) is used for the measurement of voids. Using this inspection machine, the X-ray photograph of the bump is shaded, the proportion of the voids is detected from the binarized photograph, and finally the area is determined. More specifically, the bump is transmitted by X-rays from immediately above the wafer using the inspection device. If there is a void, the area looks whiter than the black area where the surrounding solder is clogged, so the volume of the void in the bump is calculated by integrating the area of the area and the degree of shading. , The amount of voids can be measured.

【0012】次に、本発明の第2実施例について説明す
る。図2は本発明の第2実施例の半導体装置の実装構造
を示す断面図である。この図において、21は半導体装
置、22は充填樹脂、23は実装基板、24は高融点半
田バンプ、25は低融点半田バンプ、26はボイド、2
7は実装基板の電極である。
Next, a second embodiment of the present invention will be described. FIG. 2 is a sectional view showing a mounting structure of a semiconductor device according to a second embodiment of the present invention. In this figure, 21 is a semiconductor device, 22 is a filling resin, 23 is a mounting board, 24 is a high melting point solder bump, 25 is a low melting point solder bump, 26 is a void, 2
Reference numeral 7 denotes an electrode of the mounting board.

【0013】この実施例は、実装基板23の電極27上
に、予め、錫鉛共晶合金等の低融点半田25を形成して
おき、その上に高融点半田バンプ24付き半導体装置2
1を実装するようにしたものである。低融点半田バンプ
25が予め形成されている電極27上に高融点半田バン
プ24を接続する際は、1/3程度電極27から高融点
半田バンプ24をずらして実装するとボイド26の発生
が抑えられるという報告がある。このため、高融点半田
バンプ24を電極27上に正確に実装すると、溶融する
低融点半田25内にボイド26が発生することとなる。
In this embodiment, a low melting point solder 25 such as a tin-lead eutectic alloy is formed in advance on an electrode 27 of a mounting substrate 23, and a semiconductor device 2 having a high melting point solder bump 24 is formed thereon.
1 is implemented. When the high melting point solder bump 24 is connected to the electrode 27 on which the low melting point solder bump 25 is formed in advance, the generation of the void 26 can be suppressed by displacing the high melting point solder bump 24 from the electrode 27 by about 1/3. There is a report. Therefore, if the high melting point solder bumps 24 are accurately mounted on the electrodes 27, voids 26 will be generated in the low melting point solder 25 to be melted.

【0014】このように構成したので、半導体装置21
に熱的な負荷が加わり半田バンプ24、25に熱応力が
発生した場合、熱応力が負荷された低融点半田バンプ2
5内にボイド26が存在しているので、ボイド26の中
は気体であるため、例えば、中身を空気と考えると弾性
率は0.33MPaであり、半田材料の弾性率に比べて
無視できる値である。
With this configuration, the semiconductor device 21
When a thermal load is applied to the solder bumps 24 and 25 to generate a thermal stress, the low melting point solder bump 2 to which the thermal stress is applied is applied.
Since the void 26 is present in the space 5, the void 26 is a gas. For example, when the content is air, the elastic modulus is 0.33 MPa, which is negligible compared to the elastic modulus of the solder material. It is.

【0015】ボイド26は低融点半田バンプ25内のあ
らゆる箇所で自由表面を作ったことになり、半田バンプ
内の変位は全てボイド26に吸収される。即ちスポンジ
と同じ性質を持ち、応力吸収係数は増大する。見かけ弾
性率が小さくなり自身の変形能力も向上する。このよう
に、第2実施例によれば、発生する熱応力を緩和する能
力が増大するため、通常の半田バンプと比較して熱疲労
寿命の向上を図ることができる。
The void 26 forms a free surface everywhere in the low melting point solder bump 25, and any displacement in the solder bump is absorbed by the void 26. That is, it has the same properties as the sponge, and the stress absorption coefficient increases. The apparent elastic modulus is reduced, and the deformability of the device itself is improved. As described above, according to the second embodiment, the ability to alleviate the generated thermal stress is increased, so that the thermal fatigue life can be improved as compared with a normal solder bump.

【0016】なお、本発明は上記実施例に限定されるも
のではなく、本発明の趣旨に基づいて種々の変形が可能
であり、これらを本発明の範囲から排除するものではな
い。
It should be noted that the present invention is not limited to the above embodiment, and various modifications can be made based on the spirit of the present invention, and these are not excluded from the scope of the present invention.

【0017】[0017]

【発明の効果】以上、詳細に説明したように、本発明に
よれば、次のような効果を奏することができる。 (1)請求項1又は3記載の発明によれば、半田バンプ
内にボイドを生成させることにより、発生する熱応力を
緩和する能力が増大するため、通常の半田バンプと比較
して熱疲労寿命の向上を図ることができる。 (2)請求項2又は4記載の発明によれば、高融点半田
バンプを実装基板の電極に正確に位置決めし、低融点接
続半田バンプ内にボイドを生成させることにより、発生
する熱応力を緩和する能力が増大するため、通常の半田
バンプと比較して熱疲労寿命の向上を図ることができ
る。
As described above, according to the present invention, the following effects can be obtained. (1) According to the first or third aspect of the present invention, since voids are generated in the solder bumps, the ability to alleviate the generated thermal stress is increased, so that the thermal fatigue life is longer than that of ordinary solder bumps. Can be improved. (2) According to the second or fourth aspect of the invention, the high-melting-point solder bumps are accurately positioned on the electrodes of the mounting board, and voids are generated in the low-melting-point connection solder bumps, thereby reducing the generated thermal stress. Therefore, the thermal fatigue life can be improved as compared with ordinary solder bumps.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1実施例の半導体装置の実装構造を
示す断面図である。
FIG. 1 is a sectional view showing a mounting structure of a semiconductor device according to a first embodiment of the present invention.

【図2】本発明の第2実施例の半導体装置の実装構造を
示す断面図である。
FIG. 2 is a sectional view showing a mounting structure of a semiconductor device according to a second embodiment of the present invention.

【図3】従来の第1の半導体装置の実装構造を示す断面
図である。
FIG. 3 is a cross-sectional view showing a mounting structure of a conventional first semiconductor device.

【図4】従来の第2の半導体装置の実装構造を示す断面
図である。
FIG. 4 is a sectional view showing a mounting structure of a conventional second semiconductor device.

【符号の説明】[Explanation of symbols]

11,21 半導体装置 12,22 充填樹脂 13,23 実装基板 14,26 ボイド 15 半田バンプ 24 高融点半田バンプ 25 低融点半田バンプ 27 実装基板の電極 11, 21 Semiconductor device 12, 22 Filling resin 13, 23 Mounting board 14, 26 Void 15 Solder bump 24 High melting point solder bump 25 Low melting point solder bump 27 Electrode of mounting board

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 半田バンプを有する半導体装置の実装構
造において、(a)実装基板と、(b)該実装基板の電
極上に実装される一様にボイドを有する半田バンプを有
する半導体装置を具備する半導体装置の実装構造。
1. A mounting structure of a semiconductor device having a solder bump, comprising: (a) a mounting substrate; and (b) a semiconductor device having a solder bump having a uniform void mounted on an electrode of the mounting substrate. Semiconductor device mounting structure.
【請求項2】 半田バンプを有する半導体装置の実装構
造において、(a)実装基板と、(b)該実装基板の電
極上に正確に実装される高融点半田の電極となるバンプ
と、(c)ボイドを有する低融点接続半田とを具備する
ことを特徴とする半田バンプを有する半導体装置の実装
構造。
2. A mounting structure for a semiconductor device having solder bumps, comprising: (a) a mounting board; (b) a bump serving as an electrode of a high melting point solder that is accurately mounted on an electrode of the mounting board; A) mounting structure of a semiconductor device having solder bumps, comprising: a low-melting connection solder having voids;
【請求項3】 半田バンプを有する半導体装置の実装方
法において、(a)実装基板の電極上に実装される半導
体装置に半田の電極を形成する際、ウェットバックの溶
融温度を融点+20℃以下10℃以上にして、バンプ内
に一様にボイドを形成し、(b)熱応力が負荷される時
に前記バンプのボイドにより、熱応力を緩和して、前記
半導体装置を前記実装基板に実装することを特徴とする
半田バンプを有する半導体装置の実装方法。
3. A method of mounting a semiconductor device having solder bumps, wherein (a) when forming a solder electrode on a semiconductor device mounted on an electrode of a mounting substrate, the melting temperature of wet back is set to a melting point + 20 ° C. or less. C. or higher to uniformly form voids in the bumps, and (b) mounting the semiconductor device on the mounting substrate by relaxing the thermal stress by the voids in the bumps when thermal stress is applied. A method for mounting a semiconductor device having solder bumps, the method comprising:
【請求項4】 半田バンプを有する半導体装置の実装方
法において、(a)実装基板の電極上に実装される半導
体装置に高融点半田の電極を形成し、前記実装基板の電
極上に低融点接続半田を塗布し、(b)前記半導体装置
を前記実装基板上に実装する際に、前記高融点半田の電
極となるバンプと前記実装基板の電極の位置を正確に合
わせて、前記低融点接続半田内にボイドを形成すること
を特徴とする半導体装置の実装方法。
4. A method of mounting a semiconductor device having solder bumps, comprising: (a) forming a high-melting-point solder electrode on a semiconductor device mounted on an electrode of a mounting board; (B) when mounting the semiconductor device on the mounting board, precisely aligning the bumps serving as the electrodes of the high melting point solder with the electrodes of the mounting board; A method of mounting a semiconductor device, wherein a void is formed in a semiconductor device.
JP1383598A 1998-01-27 1998-01-27 Mounting structure for semiconductor device and mounting method therefor Withdrawn JPH11214447A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1383598A JPH11214447A (en) 1998-01-27 1998-01-27 Mounting structure for semiconductor device and mounting method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1383598A JPH11214447A (en) 1998-01-27 1998-01-27 Mounting structure for semiconductor device and mounting method therefor

Publications (1)

Publication Number Publication Date
JPH11214447A true JPH11214447A (en) 1999-08-06

Family

ID=11844344

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH11214447A (en)

Cited By (10)

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KR100426607B1 (en) * 2001-09-18 2004-04-08 삼성전자주식회사 Solder structure having improved reliability and method of manufacturing same
DE102005043808A1 (en) * 2005-09-13 2007-03-29 Infineon Technologies Ag External contact material for external contacts of a semiconductor device and use of the external contact material
US7268430B2 (en) 2004-08-30 2007-09-11 Renesas Technology Corp. Semiconductor device and process for manufacturing the same
US7301243B2 (en) 2004-08-30 2007-11-27 Sharp Kabushiki Kaisha High-reliable semiconductor device using hermetic sealing of electrodes
JP2008135518A (en) * 2006-11-28 2008-06-12 Matsushita Electric Ind Co Ltd Electronic component mounting structure and method for manufacturing the structure
US8120188B2 (en) 2006-11-28 2012-02-21 Panasonic Corporation Electronic component mounting structure and method for manufacturing the same
DE102010005465B4 (en) * 2009-01-26 2014-11-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Electrical or electronic component and method for making a connection
US9331042B2 (en) 2012-01-17 2016-05-03 Panasonic Intellectual Property Management Co., Ltd. Semiconductor device manufacturing method and semiconductor device
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Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10228509B4 (en) * 2001-09-18 2007-05-24 Samsung Electronics Co., Ltd., Suwon Lotstruktur for electrical and / or mechanical contacting and device and method for their preparation
KR100426607B1 (en) * 2001-09-18 2004-04-08 삼성전자주식회사 Solder structure having improved reliability and method of manufacturing same
US7268430B2 (en) 2004-08-30 2007-09-11 Renesas Technology Corp. Semiconductor device and process for manufacturing the same
US7301243B2 (en) 2004-08-30 2007-11-27 Sharp Kabushiki Kaisha High-reliable semiconductor device using hermetic sealing of electrodes
US7776735B2 (en) 2004-08-30 2010-08-17 Renesas Technology Corp. Semiconductor device and process for manufacturing the same
US7893532B2 (en) 2005-09-13 2011-02-22 Infineon Technologies Ag External contact material for external contacts of a semiconductor device and method of making the same
DE102005043808A1 (en) * 2005-09-13 2007-03-29 Infineon Technologies Ag External contact material for external contacts of a semiconductor device and use of the external contact material
DE102005043808B4 (en) * 2005-09-13 2007-11-29 Infineon Technologies Ag External contact material for external contacts of a semiconductor device and method for producing the external contact material
JP2008135518A (en) * 2006-11-28 2008-06-12 Matsushita Electric Ind Co Ltd Electronic component mounting structure and method for manufacturing the structure
US8120188B2 (en) 2006-11-28 2012-02-21 Panasonic Corporation Electronic component mounting structure and method for manufacturing the same
DE102010005465B4 (en) * 2009-01-26 2014-11-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Electrical or electronic component and method for making a connection
US9331042B2 (en) 2012-01-17 2016-05-03 Panasonic Intellectual Property Management Co., Ltd. Semiconductor device manufacturing method and semiconductor device
JP2018037601A (en) * 2016-09-02 2018-03-08 株式会社リコー Laminate, light emitting device, light source unit, laser device, and ignition device
CN110958784A (en) * 2018-09-26 2020-04-03 佳能株式会社 Image pickup module, method of manufacturing image pickup module, and electronic apparatus

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