JPH11195691A5 - - Google Patents
Info
- Publication number
- JPH11195691A5 JPH11195691A5 JP1997369551A JP36955197A JPH11195691A5 JP H11195691 A5 JPH11195691 A5 JP H11195691A5 JP 1997369551 A JP1997369551 A JP 1997369551A JP 36955197 A JP36955197 A JP 36955197A JP H11195691 A5 JPH11195691 A5 JP H11195691A5
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- chamber
- department
- valve body
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP36955197A JP4014059B2 (ja) | 1997-12-29 | 1997-12-29 | 枚葉式真空処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP36955197A JP4014059B2 (ja) | 1997-12-29 | 1997-12-29 | 枚葉式真空処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11195691A JPH11195691A (ja) | 1999-07-21 |
| JPH11195691A5 true JPH11195691A5 (https=) | 2005-06-23 |
| JP4014059B2 JP4014059B2 (ja) | 2007-11-28 |
Family
ID=18494716
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP36955197A Expired - Fee Related JP4014059B2 (ja) | 1997-12-29 | 1997-12-29 | 枚葉式真空処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4014059B2 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6468353B1 (en) * | 1997-06-04 | 2002-10-22 | Applied Materials, Inc. | Method and apparatus for improved substrate handling |
| CN116590679A (zh) * | 2023-06-02 | 2023-08-15 | 湘潭宏大真空技术股份有限公司 | 一种真空磁控溅射卧式双面镀膜系统 |
| CN117845184A (zh) * | 2023-12-28 | 2024-04-09 | 湘潭宏大真空技术股份有限公司 | 一种卧式双面镀膜机 |
-
1997
- 1997-12-29 JP JP36955197A patent/JP4014059B2/ja not_active Expired - Fee Related
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