JPH11130585A - Apparatus for pulling single crystal - Google Patents

Apparatus for pulling single crystal

Info

Publication number
JPH11130585A
JPH11130585A JP29739097A JP29739097A JPH11130585A JP H11130585 A JPH11130585 A JP H11130585A JP 29739097 A JP29739097 A JP 29739097A JP 29739097 A JP29739097 A JP 29739097A JP H11130585 A JPH11130585 A JP H11130585A
Authority
JP
Japan
Prior art keywords
single crystal
dimensional camera
diameter
neck
image signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29739097A
Other languages
Japanese (ja)
Other versions
JP3592909B2 (en
Inventor
Masayuki Watanabe
正幸 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP29739097A priority Critical patent/JP3592909B2/en
Publication of JPH11130585A publication Critical patent/JPH11130585A/en
Application granted granted Critical
Publication of JP3592909B2 publication Critical patent/JP3592909B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an apparatus for pulling a single crystal capable of accurately monitoring the growth control of a neck with a high accuracy, reproducibility of dimensional accuracy of the shape of a supporting part for supporting a crystal and the diameter of a large-caliber single crystal and suitable for pulling the large-caliber single crystal. SOLUTION: This apparatus for pulling a single crystal comprises the first two-dimensional camera 15 focusing on a neck growth region An for growing a single crystal, the second two-dimensional camera 16 focusing on a straight drum part for growing the single crystal and a means 17 for changing over an image signal for controlling the shape capable of changing pulling conditions during a period from the completion of the neck growth of the grown single crystal to the start of the growth of the straight drum part from an image signal of the first two-dimensional camera 15 to that of the second two-dimensional camera 16.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は単結晶引上装置に係
わり、特に大口径の単結晶を引き上げるのに適する単結
晶引上装置に関する。
The present invention relates to a single crystal pulling apparatus, and more particularly to a single crystal pulling apparatus suitable for pulling a large-diameter single crystal.

【0002】[0002]

【従来の技術】一般にシリコンウェーハを製造するに
は、多結晶シリコンからチョコラルスキー法(以下、C
Z法という。)によりシリコン単結晶のインゴットを作
り、このインゴットをスライシングマシンで所定の厚さ
に切断し、シリコンウェーハを製造する。
2. Description of the Related Art In general, a silicon wafer is manufactured from polycrystalline silicon by the Czochralski method (hereinafter referred to as C).
It is called Z method. ) To produce a silicon single crystal ingot, and cut the ingot to a predetermined thickness by a slicing machine to produce a silicon wafer.

【0003】しかし、半導体デバイスの製造コストの低
減等からシリコンウェーハの大口径化が要求されてお
り、これに伴いシリコンウェーハの素材となるシリコン
単結晶にも大口径化が要求されている。
[0003] However, in order to reduce the manufacturing cost of semiconductor devices and the like, silicon wafers are required to have a large diameter, and accordingly, silicon single crystals used as materials for silicon wafers are also required to have a large diameter.

【0004】従来、CZ法によるシリコン単結晶引上装
置30は図7に示すように水冷された炉体31内に石英
ルツボ32が設けられている。この石英ルツボ32は黒
鉛ルツボ33に保持され、黒鉛ルツボ33は回転・上下
動自在なルツボ回転軸34に支持されている。
Conventionally, a silicon single crystal pulling apparatus 30 by the CZ method has a quartz crucible 32 provided in a water-cooled furnace body 31 as shown in FIG. The quartz crucible 32 is held by a graphite crucible 33, and the graphite crucible 33 is supported by a crucible rotating shaft 34 that can rotate and move up and down.

【0005】石英ルツボ32内に供給された原料のポリ
シリコンは石英ルツボ32を囲繞するように設けられた
ヒータ35により加熱されシリコン融液Mとなる。ワイ
ヤリール回転装置37を介して引き上げ用ワイヤー38
が石英ルツボ32の中心線上に懸垂されている。引き上
げ用ワイヤー38の先端にはシードチャック39を介し
てシード40が保持されている。
[0005] Polysilicon as a raw material supplied into the quartz crucible 32 is heated by a heater 35 provided so as to surround the quartz crucible 32 to become a silicon melt M. Pull-up wire 38 via wire reel rotating device 37
Are suspended on the center line of the quartz crucible 32. A seed 40 is held at the tip of the lifting wire 38 via a seed chuck 39.

【0006】シード40の先端をシリコン融液Mに接触
させ、なじませた後引き上げを開始する。無転位成長の
ためには数mmの細いネックNを長く作製する必要があ
る。
[0006] The tip of the seed 40 is brought into contact with the silicon melt M, and after being blended, lifting is started. For dislocation-free growth, it is necessary to form a long neck N of several mm long.

【0007】その後徐々に結晶を成長(太らせる)さ
せ、クラウンC成長を介して直胴部Sの結晶成長に移行
する。
Thereafter, the crystal is gradually grown (thickened), and the process proceeds to the crystal growth of the straight body portion S through the growth of the crown C.

【0008】シード40も回転、上下動自在になってい
る。成長結晶の形状はカメラポート41を通して撮像範
囲が石英ルツボ32の中心から周縁に至る一次元カメラ
(ラインイメージセンサ)や撮像範囲が広い二次元カメ
ラ(エリアセンサカメラ)42等で監視し、その直径信
号に基づいてヒータ35への供給電力や、単結晶引き上
げ速度などをパラメータとして引き上げ条件を調整して
いる。
The seed 40 is also rotatable and vertically movable. The shape of the grown crystal is monitored by a one-dimensional camera (line image sensor) whose imaging range extends from the center to the periphery of the quartz crucible 32 through a camera port 41 or a two-dimensional camera (area sensor camera) 42 having a wide imaging range. The pulling conditions are adjusted using the power supplied to the heater 35, the single crystal pulling speed, and the like as parameters based on the signal.

【0009】このような単結晶引上装置30は、引き上
げられる単結晶が比較的小さなシード径から直胴部(ボ
ディ)まで順次大きな直径へとクラウン(コーン部)と
して成長していくため、上述直径モニタの撮像範囲は、
単結晶の回転中心から周縁に至る比較的広い範囲に設定
する必要がある。
In such a single crystal pulling apparatus 30, the single crystal to be pulled grows as a crown (cone part) from a relatively small seed diameter to a large diameter from a relatively small seed diameter to a straight body (body). The imaging range of the diameter monitor is
It is necessary to set a relatively wide range from the rotation center of the single crystal to the periphery.

【0010】直径モニタの撮像範囲を単結晶の回転中心
から周縁に至る比較的広い範囲に設定する場合、直胴部
のように大きな直径を有する部分の成長に関しては、上
述直径モニタの直径信号で十分な分解能が得られるが、
きわめて小さな直径のシード、およびクラウン初期部分
の成長においては、分解能が不足して精度良く引き上げ
ることが難しくなる。
When the imaging range of the diameter monitor is set to a relatively wide range from the rotation center of the single crystal to the periphery, the growth of a portion having a large diameter, such as a straight body, is determined by the diameter signal of the diameter monitor. Although sufficient resolution can be obtained,
In the growth of a seed having an extremely small diameter and an initial portion of the crown, the resolution is insufficient and it is difficult to accurately raise the seed.

【0011】この問題の解決として、小さな直径部の単
結晶の成長時は、二次元カメラをズームアップして使用
する方法があり、直径200mmまでの比較的小口径の
単結晶の引き上げにおいては、この方法でもあまり問題
はなかった。
As a solution to this problem, there is a method in which a two-dimensional camera is used by zooming up when growing a single crystal having a small diameter. In pulling a relatively small diameter single crystal up to 200 mm in diameter, there is a method. There was no problem with this method.

【0012】しかしながら、大口径、例えば直径300
mmや400mmと大きくなると、上述小さな直径部に
二次元カメラの焦点を合わせたズームアップする方式で
は、大きな直径の周縁部の分解能が落ちる問題が発生す
る。
However, a large diameter, for example, a diameter of 300
When the diameter becomes large, such as mm or 400 mm, in the zoom-up method in which the two-dimensional camera focuses on the small diameter portion, there is a problem that the resolution of the peripheral portion having the large diameter is reduced.

【0013】また、大口径の単結晶を引き上げる場合、
引き上げ速度が低下するため、輻射シールドを使用して
石英ルツボやシリコン融液の表面から結晶への輻射熱を
遮蔽し、単結晶引き上げ速度の低下を防ぐ方法は有効で
あるが、遮蔽シールドを用いる場台、単結晶の直径が直
胴部まで広がった時点では、二次元カメラによるモニタ
は、輻射シールドに遮られて単結晶の回転中心から周縁
に至る直径について行うのは不可能である。
When pulling a large-diameter single crystal,
Since the pulling speed decreases, it is effective to use a radiation shield to shield the radiant heat from the surface of the quartz crucible or silicon melt to the crystal to prevent the single crystal pulling speed from lowering. At the time when the diameter of the base and the single crystal has spread to the straight body, it is impossible to monitor with a two-dimensional camera for the diameter from the rotation center of the single crystal to the periphery due to the radiation shield.

【0014】このような場合には、ある程度小直径部の
制御は犠牲にしても、二次元カメラの焦点を撮像範囲に
収まった直胴部の円弧の部分に当て、その円弧を真円に
画像処理して、その真円から直径を読みとる方法がとら
れる。
In such a case, even if the control of the small diameter portion is sacrificed to some extent, the focus of the two-dimensional camera is focused on the arc portion of the straight body portion within the imaging range, and the arc is formed into a perfect circle image. Then, a method of reading the diameter from the perfect circle is used.

【0015】さらに、特開昭58―135197号公報
のように、2台の二次元カメラを用いて、直径の小さな
ネック部は第1の二次元カメラを用い、直径が大きくな
り第1二次元カメラの視野からはずれる場合から第2の
二次元カメラを併用する方法や、あるいは特開平4―8
6509号公報のように、直径の小さなネック部は二次
元カメラを用い、直径が大きくなった場合から一次元カ
メラを選択的に用いる方法もある。
Further, as disclosed in Japanese Patent Application Laid-Open No. 58-135197, two two-dimensional cameras are used, and a neck portion having a small diameter uses a first two-dimensional camera. A method in which the second two-dimensional camera is used together when the camera deviates from the field of view of the camera,
As disclosed in Japanese Patent No. 6509, there is a method of using a two-dimensional camera for a neck part having a small diameter and selectively using a one-dimensional camera when the diameter becomes large.

【0016】しかし、これらいずれの方法も、単結晶の
直胴部のように大きな直径を有する部分とネック部のよ
うな極めて小さな直径部をともに精度良く測定する必要
がある大口径の単結晶の引上げ装置モニタには不十分で
あった。
However, in any of these methods, it is necessary to accurately measure both a portion having a large diameter such as a straight body portion of a single crystal and an extremely small diameter portion such as a neck portion of a single crystal having a large diameter. Insufficient for puller monitor.

【0017】また、本発明者の検討結果では、単結晶の
重量が200Kg以上で直径が300mmや400mm
の大口径の単結晶を引き上げる場合には、従来の2mm
ないし3mmの直径のネックでは耐加重が不十分であ
り、ネックを6mmに程度に太くする必要があり、かつ
無転位成長のためには一定のネック直径で長く引き上げ
る必要があり、かつこれまでよりも高精度のネック成長
制御が必要であることが判明した。
According to the results of the study by the present inventors, the weight of the single crystal is 200 kg or more and the diameter is 300 mm or 400 mm.
When pulling a large diameter single crystal, the conventional 2 mm
With a neck having a diameter of 3 mm or less, the load resistance is insufficient, the neck needs to be thickened to about 6 mm, and it is necessary to raise the neck long at a constant neck diameter for dislocation-free growth. It was also found that high-precision neck growth control was necessary.

【0018】一方、大重量の単結晶の引き上げにおける
ネック部分の重量対策として、引き上げ単結晶のクラウ
ン部を一度絞ってコブ状の支持部を作り、この支持部の
所に結晶支持用の支持装置を取付け、結晶を引き上げて
いく方法が提案されており、この方式では従来のネック
制御で十分であるが、この支持部を利用して結晶を支持
し結晶を引き上げていく方法の場合には、炉体外からの
遠隔操作で結晶用の支持装置で支持部を介して成長結晶
をうまく掴みとるためには支持部の形状の寸法精度の再
現性が必要になることが判明した。
On the other hand, as a measure against the weight of the neck portion in pulling a heavy single crystal, a crown portion of the pulled single crystal is once squeezed to form a bump-shaped support portion, and a support device for supporting a crystal is provided at the support portion. A method has been proposed in which the crystal is pulled up.In this method, the conventional neck control is sufficient, but in the case of a method of pulling up the crystal by supporting the crystal using this support, It has been found that reproducibility of the dimensional accuracy of the shape of the support portion is necessary in order to grasp the grown crystal via the support portion with the support device for the crystal by remote control from outside the furnace body.

【0019】そこで、上述のように高精度のネックの成
長制御、結晶用の支持部形状の寸法精度の再現性および
大口径の単結晶の直径制御のために、正確にモニタ可能
な単結晶引上装置が要望されていた。
Therefore, as described above, in order to control the growth of the neck with high accuracy, the reproducibility of the dimensional accuracy of the shape of the supporting portion for the crystal, and the diameter control of the single crystal having a large diameter, the single crystal pulling which can be accurately monitored. An upper device was desired.

【0020】本発明は上述した事情を考慮してなされた
もので、高精度のネックの成長制御、結晶支持用の支持
部形状の寸法精度の再現性および大口径の単結晶の直径
を正確にモニタ可能で大口径の単結晶の引き上げに適す
る単結晶引上装置を提供することを目的とする。
The present invention has been made in view of the above-described circumstances, and has a high-accuracy neck growth control, reproducibility of the dimensional accuracy of the shape of a supporting portion for supporting a crystal, and accurate determination of the diameter of a large-diameter single crystal. An object of the present invention is to provide a single crystal pulling apparatus which can be monitored and is suitable for pulling a large diameter single crystal.

【0021】[0021]

【課題を解決するための手段】上記目的を達成するため
になされた本願請求項1の発明は、シリコン融液と成長
単結晶との境界部分を二次元カメラによって撮像し、こ
の二次元カメラの画像信号に基づいて成長単結晶の直径
を制御するチョコラルスキー法による単結晶引上装置に
おいて、ネック成長領域に焦点が合わせられ境界部分を
撮像し画像信号を出力する第1二次元カメラと、直胴部
成長領域に焦点が合わせられ境界部分を撮像し画像信号
を出力する第2二次元カメラと、成長単結晶のネック成
長終了から直胴部成長開始までの間に引き上げ条件を変
更する形状制御用画像信号を第1二次元カメラの画像信
号から第2二次元カメラの画像信号に切り替える手段を
具備したことを特徴とした単結晶引上装置であることを
要旨としている。
SUMMARY OF THE INVENTION In order to achieve the above-mentioned object, the invention of claim 1 of the present application captures an image of a boundary portion between a silicon melt and a grown single crystal by a two-dimensional camera. In a single crystal pulling apparatus based on the Czochralski method for controlling the diameter of a grown single crystal based on an image signal, a first two-dimensional camera that focuses on a neck growth region, images a boundary portion, and outputs an image signal; A second two-dimensional camera that focuses on the torso growth region and captures an image of the boundary portion and outputs an image signal, and shape control that changes the pulling condition between the end of the neck growth of the grown single crystal and the start of the straight torso growth The subject matter of the present invention is a single crystal pulling apparatus characterized by comprising means for switching an image signal for use from an image signal of a first two-dimensional camera to an image signal of a second two-dimensional camera.

【0022】本願請求項2の発明は、第1二次元カメラ
を第2二次元カメラよりも低い位置に取り付け、かつ第
1二次元カメラと第2二次元カメラの光軸を交差させる
こと特徴とする請求項1記載の単結晶引上装置であるこ
とを要旨としている。
According to a second aspect of the present invention, the first two-dimensional camera is mounted at a lower position than the second two-dimensional camera, and the optical axes of the first two-dimensional camera and the second two-dimensional camera are crossed. The gist of the present invention is a single crystal pulling apparatus according to claim 1.

【0023】本願請求項3の発明は、シリコン融液表面
から結晶への輻射熱を遮蔽する輻射シールドを設けたこ
とを特徴とする請求項1記載の単結晶引上装置であるこ
とを要旨としている。
According to a third aspect of the present invention, there is provided a single crystal pulling apparatus according to the first aspect, wherein a radiation shield for shielding radiant heat from the surface of the silicon melt to the crystal is provided. .

【0024】本願請求項4の発明は、第1二次元カメラ
が、ネック成長とこのネックに設けられるコブ状の支持
部の成長および成長単結晶のクラウン初期の成長の工程
を撮像することを特徴とする請求項1記載の単結晶引上
装置であることを要旨としている。
[0024] The invention of claim 4 of the present application is characterized in that the first two-dimensional camera captures an image of a step of growing a neck, growing a bump-shaped support provided on the neck, and growing a single crystal in the initial stage of a crown. The gist is a single crystal pulling apparatus according to claim 1.

【0025】本願請求項5の発明は、コブ状の支持部の
直径と成長単結晶のクラウンの直径がほぼ同じになった
時点で、第1二次元カメラから第2二次元カメラに画像
信号を切り替えることを特徴とする請求項4記載の単結
晶引上装置であることを要旨としている。
According to a fifth aspect of the present invention, an image signal is transmitted from the first two-dimensional camera to the second two-dimensional camera when the diameter of the bump-shaped support portion and the diameter of the crown of the grown single crystal become substantially the same. The gist is a single crystal pulling apparatus according to claim 4, wherein the apparatus is switched.

【0026】[0026]

【発明の実施の形態】以下、本発明に係る単結晶引上装
置の実施の形態について添付図面に基づき説明する。図
1は本発明に係る単結晶引上装置1で、この引き上げ装
置1は水冷された炉体2と、この炉体2に収納され原料
であるポリシリコンを溶融し溶融シリコンMにする石英
ルツボ3と、この石英ルツボ3を保持する黒鉛ルツボ4
と、この黒鉛ルツボ4を囲繞するヒータ5とを有してい
る。この黒鉛ルツボ4は炉体2を貫通し、モータ6に結
合されて回転され、かつ昇降装置7によって昇降される
ルツボ回転軸8に取り付けられている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of a single crystal pulling apparatus according to the present invention will be described with reference to the accompanying drawings. FIG. 1 shows a single crystal pulling apparatus 1 according to the present invention. The pulling apparatus 1 comprises a water-cooled furnace body 2 and a quartz crucible which melts polysilicon as a raw material stored in the furnace body 2 into molten silicon M. 3 and a graphite crucible 4 holding the quartz crucible 3
And a heater 5 surrounding the graphite crucible 4. The graphite crucible 4 penetrates the furnace body 2, is connected to a motor 6, is rotated, and is attached to a crucible rotating shaft 8 that is raised and lowered by a lifting device 7.

【0027】また、石英ルツボ3の上方には、単結晶引
き上げのためのシード9を保持するシードチャック10
が取り付けられた引き上げ用のワイヤー11が設けられ
ている。
A seed chuck 10 for holding a seed 9 for pulling a single crystal is provided above the quartz crucible 3.
There is provided a pulling wire 11 to which is attached.

【0028】さらに、ワイヤー11は炉体2外に設けら
れモータ(図示せず)により付勢されワイヤー11を巻
き取ると共に回転させるワイヤー回転装置12が取り付
けられている。
Further, the wire 11 is provided outside the furnace body 2 and is equipped with a wire rotating device 12 which is urged by a motor (not shown) to wind up and rotate the wire 11.

【0029】またさらに、炉体2のショルダー2a外壁
には、透孔を耐熱ガラスにより塞ぎ透光可能な第1カメ
ラポート13と第2カメラポート14が設けられてい
る。第1カメラポート13は第2カメラポート14より
ショルダー2aの外壁の低い位置に設けられている。
Further, on the outer wall of the shoulder 2a of the furnace body 2, there are provided a first camera port 13 and a second camera port 14 which are capable of transmitting light by closing the through holes with heat resistant glass. The first camera port 13 is provided at a position lower than the second camera port 14 on the outer wall of the shoulder 2a.

【0030】第1カメラポート13を貫通する光軸L1
を有する第1二次元カメラ15はその焦点がネック成長
領域に合わされて設置されており、また第2カメラポー
ト16を貫通する光軸L2 を有する第2二次元カメラ1
4は直胴部成長領域As に合わされて設置されている。
炉体2のルツボ3内において、ネック成長領域Anは直胴
部成長領域As の常に内側(炉芯側)あるため、炉体2
の外壁の低い位置に設けられた第1二次元カメラ15の
光軸L1 と第1二次元カメラ15より高い位置に設けら
れた第2二次元カメラ16の光軸L2 は常に交差する関
係になる。
An optical axis L1 penetrating the first camera port 13
The first two-dimensional camera 15 having the optical axis L2 penetrating through the second camera port 16 is installed so that the focal point is set to the neck growth region.
Numeral 4 is set in accordance with the straight body growth area As.
In the crucible 3 of the furnace body 2, the neck growth region An is always inside (core side) the straight body growth region As.
The optical axis L1 of the first two-dimensional camera 15 provided at a lower position on the outer wall of the camera and the optical axis L2 of the second two-dimensional camera 16 provided at a higher position than the first two-dimensional camera 15 always intersect. .

【0031】なお、第1二次元カメラ15は、石英ルツ
ボ3の軸方向の位置や原料のチャージ量によって変わる
融液面レベルに応じて焦点を微調整できる。第1二次元
カメラ16は、引き上げる単結晶の狙い直径(200m
m,300mm,400mm等)に応じて焦点を微調整
できる。
The first two-dimensional camera 15 can finely adjust the focal point in accordance with the position of the quartz crucible 3 in the axial direction and the level of the melt surface which changes depending on the charge amount of the raw material. The first two-dimensional camera 16 moves the target diameter of the single crystal (200 m
m, 300 mm, 400 mm, etc.).

【0032】第1二次元カメラ15と第2二次元カメラ
16は切替スイッチ17に接続され、この切替スイッチ
17により、第1二次元カメラ15と第2二次元カメラ
16の画像信号はそのいずれか一方が選択的に2値化回
路18に供給される。
The first two-dimensional camera 15 and the second two-dimensional camera 16 are connected to a changeover switch 17, and the changeover switch 17 causes the image signals of the first two-dimensional camera 15 and the second two-dimensional camera 16 to be changed to one of them. One of them is selectively supplied to the binarization circuit 18.

【0033】切替スイッチ17は第1二次元カメラ15
からの画像信号を用いて成長結晶の直径制御を行うか、
第2二次元カメラ16からの画像信号を用いて成長結晶
の直径制御を行うかの選択切り替えを行うもので、スイ
ッチ制御回路19により制御される。2値化回路Xによ
り入力電圧は2値化され画像処理装置20に供給され、
画像処理装置20により画像処理されて成長結晶直径を
検出して出力する。
The changeover switch 17 is a first two-dimensional camera 15
Controlling the diameter of the grown crystal using the image signal from
The selection control is performed by using the image signal from the second two-dimensional camera 16 to control whether the diameter of the grown crystal is controlled or not, and is controlled by the switch control circuit 19. The input voltage is binarized by the binarization circuit X and supplied to the image processing device 20,
Image processing is performed by the image processing device 20 to detect and output the diameter of the grown crystal.

【0034】この出力は制御装置21に供給され、シリ
コン融液の温度を制御するヒータ5の供給電力量を制御
するヒータ制御器22、石英ルツボ3の回転数を制御す
るモータ制御器23、石英ルツボ3の高さを制御する昇
降装置制御器24、成長結晶の引き上げ速度と回転数を
制御するワイヤーリール回転装置制御装置25などを制
御する。これら各制御器22、23、24、25などを
制御して、引き上げ条件を変更し、成長結晶の直径を制
御する。
This output is supplied to a controller 21 for controlling the amount of electric power supplied to the heater 5 for controlling the temperature of the silicon melt, a motor controller 23 for controlling the rotation speed of the quartz crucible 3, a quartz controller, The elevator controller 24 for controlling the height of the crucible 3 and the wire reel rotating device controller 25 for controlling the pulling speed and rotation speed of the grown crystal are controlled. By controlling these controllers 22, 23, 24, 25, etc., the pulling conditions are changed and the diameter of the grown crystal is controlled.

【0035】なお、結晶育成のどの段階で使用画像信号
の切り替えを行うかは、事前に制御装置21にプログラ
ムされ、この制御装置21からスイッチ制御回路19に
切り替え信号を送信する。
It is to be noted that at which stage of crystal growth the switching of the image signal to be used is programmed in the control device 21 in advance, and the control device 21 transmits a switching signal to the switch control circuit 19.

【0036】本発明に係る単結晶引上装置は以上のよう
な構造になっているから、例えば口径300mmウェー
ハ用として削り代を考慮した口径310mmのシリコン
単結晶を引き上げるには、ナゲット状ポリシリコンを石
英ルツボ3に入れ、プログラム化された引き上げ工程に
より引き上げ作業は自動的に行われる。
Since the single crystal pulling apparatus according to the present invention has the above-described structure, for example, in order to pull up a silicon single crystal having a diameter of 310 mm in consideration of a cutting allowance for a wafer having a diameter of 300 mm, a nugget-like polysilicon is required. Is put into the quartz crucible 3, and the lifting operation is automatically performed by a programmed lifting process.

【0037】一方、第1二次元カメラ15は、ネック成
長領域An 、例えばネックの直径を6mmに作製するの
で石英ルツボ3の中心から3mm外側に偏位した位置に
焦点を合わせ、かつ引き上げの開始時点から撮像可能な
電源ONの状態にしておく。
On the other hand, the first two-dimensional camera 15 focuses on a position deviated outward by 3 mm from the center of the quartz crucible 3 and starts pulling up since the neck growth region An, for example, the diameter of the neck is 6 mm. From the point in time, the power is turned on so that imaging can be performed.

【0038】第2二次元カメラ16は、例えば石英ルツ
ボ3の中心から155mm外側に偏位した位置に焦点を
合わせ、かつ引き上げの開始時点では撮像不能な電源を
OFFの状態にしておく。
The second two-dimensional camera 16 focuses, for example, on a position deviated 155 mm outside from the center of the quartz crucible 3, and keeps the power supply that cannot image at the start of pulling off.

【0039】引き上げ準備完了後、不活性ガス、例えば
アルゴンガスを炉体2の上方より炉体2内に流入させ、
ヒータ5を付勢して石英ルツボ3を加熱し、モータ6を
付勢してこのモータ6に結合されたルツボ回転軸8を回
転させて石英ルツボ3を回転させる。
After the completion of the preparation for lifting, an inert gas, for example, argon gas is caused to flow into the furnace body 2 from above the furnace body 2,
The quartz crucible 3 is heated by energizing the heater 5 and the motor 6 is energized to rotate the crucible rotating shaft 8 coupled to the motor 6 to rotate the quartz crucible 3.

【0040】一定時間が経過した後、ワイヤー11を下
ろし、シード9をシリコン融液Mの液面に接触させなじ
ませる。
After a certain period of time, the wire 11 is lowered, and the seed 9 is brought into contact with the liquid surface of the silicon melt M to be blended.

【0041】しかる後、引き上げを開始し、図2(A)
のように第1二次元カメラ15でネック成長領域Anを
モニタする。
After that, the lifting is started, and FIG.
The neck growth area An is monitored by the first two-dimensional camera 15 as described above.

【0042】この第1二次元カメラ15の画像信号は2
値化回路18に供給され、さらに2値化回路18からの
入力電圧は2値化され、またさらに画像処理装置20に
供給され、画像処理装置20により画像処理されて無転
位成長のためのネックNの直径d1 が検出されて出力さ
れる。
The image signal of the first two-dimensional camera 15 is 2
The input voltage from the binarizing circuit 18 is further binarized, and further supplied to the image processing unit 20, where the image processing is performed by the image processing unit 20, and a bottleneck for dislocation-free growth is obtained. The diameter d1 of N is detected and output.

【0043】この画像処理装置20からの出力は制御装
置21に供給され、ヒータ制御器22、モータ制御器2
3、昇降装置制御器24、およびワイヤーリール回転装
置制御器25を制御し、直径d1 が6mmのネックNは
一定の長さl、例えば300mmまで引き上が継続され
る。
The output from the image processing device 20 is supplied to a control device 21 where a heater controller 22, a motor controller 2
3. By controlling the lifting device controller 24 and the wire reel rotating device controller 25, the neck N having a diameter d1 of 6 mm is continuously pulled up to a certain length l, for example, 300 mm.

【0044】ネックNが300mmになった時点で制御
装置21に組み込まれた工程用のプログラムにより制御
装置21を介してヒータ制御器22、モータ制御器2
3、昇降装置制御器24、およびワイヤーリール回転装
置制御器25を制御し、単結晶の引き上げは、図2
(B)に示すクラウンCの作製工程に入る。
When the neck N becomes 300 mm, the heater controller 22 and the motor controller 2 are controlled by the process program incorporated in the controller 21 through the controller 21.
3, the lifting device controller 24 and the wire reel rotating device controller 25 are controlled to pull up the single crystal as shown in FIG.
The process for manufacturing a crown C shown in FIG.

【0045】第1二次元カメラ12でクラウン成長領域
Cn をモニタし、第1二次元カメラ15からの画像信号
は2値化回路18、2値化回路18、画像処理装置20
を介して制御装置21に供給される。
The crown growth area Cn is monitored by the first two-dimensional camera 12, and the image signal from the first two-dimensional camera 15 is converted into a binarizing circuit 18, a binarizing circuit 18, and an image processing device 20.
Is supplied to the control device 21 via the.

【0046】この制御装置21からの出力によりヒータ
制御器22、モータ制御器23、昇降装置制御器24、
およびワイヤーリール回転装置制御器25を制御し、成
長結晶の直径が順次大きくなり、クラウンCを形成する
ように引き上げ条件を制御する。
The heater controller 22, the motor controller 23, the elevator controller 24,
Further, the controller controls the wire reel rotating device controller 25 to control the pulling condition so that the diameter of the grown crystal is gradually increased and the crown C is formed.

【0047】さらに引き上げを継続し、クラウンCを成
長させ、クラウンCの直径が200mmにたった時点の
第1二次元カメラ15からの画像信号が2値化回路1
8、画像処理装置20を介して出力として制御装置21
に供給される。
Further, the pulling is continued, the crown C is grown, and the image signal from the first two-dimensional camera 15 at the time when the diameter of the crown C reaches 200 mm is converted into a binarization circuit 1.
8. Control device 21 as output via image processing device 20
Supplied to

【0048】この制御装置21はスイッチ制御回路19
を制御して切替スイッチ17を作動させ、第2二次元カ
メラ16を停止状態から動作状態し、一方第1二次元カ
メラ15を動作状態から停止状態にする。すなわち、2
値化回路18への画像信号を、第1二次元カメラ15の
画像信号から第2二次元カメラ16の画像信号に切り替
える。
The control device 21 includes a switch control circuit 19
Is operated to switch the second two-dimensional camera 16 from the stopped state to the operating state, while the first two-dimensional camera 15 is changed from the operating state to the stopped state. That is, 2
The image signal to the value conversion circuit 18 is switched from the image signal of the first two-dimensional camera 15 to the image signal of the second two-dimensional camera 16.

【0049】なお、制御装置21はあらかじめ、上述ず
図2(B)および図3のK1 に示すようにクラウンCの
直径が200mmになった状態の出力が供給されると、
第1二次元カメラ15から第2二次元カメラ16に成長
領域のモニタを切り替えるようにスイッチ制御回路19
を制御するプログラムが組み込まれている。
When the output of the state in which the diameter of the crown C is 200 mm is supplied in advance to the control device 21 as shown in FIG. 2B and K1 in FIG.
A switch control circuit 19 for switching the monitor of the growth area from the first two-dimensional camera 15 to the second two-dimensional camera 16
The program which controls is installed.

【0050】さらに、第2二次元カメラ16による成長
領域のモニタ下で引き上げを継続してクラウンCの成長
を続行する。
Further, the pull-up is continued under the monitor of the growth area by the second two-dimensional camera 16, and the growth of the crown C is continued.

【0051】図3の点P3 に示すように、クラウンCの
直径d3 が310mmになった時点の第2二次元カメラ
13からの画像信号が、2値化回路18、画像処理装置
20を介して出力として制御装置21に供給される。
As shown at point P3 in FIG. 3, the image signal from the second two-dimensional camera 13 at the time when the diameter d3 of the crown C reaches 310 mm is transmitted via the binarization circuit 18 and the image processing device 20. The output is supplied to the control device 21.

【0052】この制御装置21からの出力によりヒータ
制御器22、モータ制御器23、昇降装置制御器24、
およびワイヤーリール回転装置制御器25を制御し、成
長結晶の直径310mmを維持して直胴部Sを形成する
よう引き上げ条件を制御する。
The heater controller 22, the motor controller 23, the elevating device controller 24,
Further, the controller 25 controls the wire reel rotating device controller 25 to control the pulling condition so that the straight body S is formed while maintaining the diameter of the grown crystal at 310 mm.

【0053】すなわち、図3のように、2個の二次元カ
メラ15、16による単結晶成長領域のモニタを、単結
晶引き上げ工程の進捗に従って切り替えるもので、引き
上げ点P1 〜点P2 の工程(ネック領域)および点P1
〜点P2 の工程(クラウン領域)の点K1 の切り替え点
までは、第1二次元カメラ15によってモニタし、点K
1 での切り替え以降のクラウン領域およびP3 点以降の
直胴部領域の工程は、第2二次元カメラ16で行うもの
である。
That is, as shown in FIG. 3, the monitoring of the single crystal growth region by the two two-dimensional cameras 15 and 16 is switched in accordance with the progress of the single crystal pulling process, and the process of pulling points P1 to P2 (neck) Area) and point P1
The first two-dimensional camera 15 monitors the point K1 until the point K1 in the process (crown region) from the point P2 to the point K1.
The processes of the crown region after the switching in 1 and the straight body region after the point P3 are performed by the second two-dimensional camera 16.

【0054】なお、本発明の実施の形態では、第1二次
元カメラ15から第2二次元カメラ16への切り替え
を、事前に制御装置21にプログラム化しているが、第
1二次元カメラ15の読み取り直径とそのときの目標直
径値との差と、第2二次元カメラ16の読み取り直径と
第1二次元カメラ16の目標直径値との差が一致した時
点で行うように制御装置21にプログラム化しておいて
もよい。
In the embodiment of the present invention, the switching from the first two-dimensional camera 15 to the second two-dimensional camera 16 is programmed in the control device 21 in advance. The controller 21 is programmed to execute the processing when the difference between the read diameter and the target diameter value at that time matches the difference between the read diameter of the second two-dimensional camera 16 and the target diameter value of the first two-dimensional camera 16. You may make it.

【0055】引き続きこのような引き上げ条件を維持
し、所定の長さの直胴部を形成させ引き上げは完了す
る。
Subsequently, the pulling condition is maintained, a straight body portion having a predetermined length is formed, and the pulling is completed.

【0056】ネック直径6mm±0.1mm、ネック長
さ300mm、直胴部直径が310mm±5mmで25
0kgの単結晶を得ることができた。
25 mm with a neck diameter of 6 mm ± 0.1 mm, a neck length of 300 mm, and a straight body diameter of 310 mm ± 5 mm.
0 kg of a single crystal was obtained.

【0057】2個の二次元カメラを用いて結晶成長領域
にモニタを行うと共に、単結晶のネック成長の終了と直
胴部成長の開始までに2個の二次元カメラのモニタの切
り替えを行い、特に単結晶育成に重要なネック領域と直
胴部領域にそれぞれ二次元カメラの焦点を合わせること
により、両成長領域を精緻にモニタすることができる。
The monitor of the crystal growth region is performed using two two-dimensional cameras, and the monitor of the two two-dimensional cameras is switched between the end of the neck growth of the single crystal and the start of the growth of the straight body portion. In particular, by focusing the two-dimensional camera on the neck region and the straight body region, which are important for growing a single crystal, both growth regions can be precisely monitored.

【0058】従って、形状が精度良く制御されたシリコ
ン単結晶を得ることができる。
Therefore, it is possible to obtain a silicon single crystal whose shape is precisely controlled.

【0059】次に本発明に係る単結晶引上装置の他の実
施の形態について図4に基づき説明する。
Next, another embodiment of the single crystal pulling apparatus according to the present invention will be described with reference to FIG.

【0060】図1で示される引き上げ装置1の石英ルツ
ボ3の上方に石英ルツボ3やシリコン融液Mの表面から
結晶への輻射熱を遮蔽し、単結晶引き上げ速度の低下を
防ぐ輻射シールド26が設けられている。
A radiation shield 26 is provided above the quartz crucible 3 of the pulling apparatus 1 shown in FIG. 1 to shield radiant heat from the surface of the quartz crucible 3 and the silicon melt M to the crystal and to prevent a drop in the single crystal pulling speed. Have been.

【0061】この輻射シールド26は焦点がネック成長
領域に合わされた第1二次元カメラ15の光軸L1 を遮
らないように据え付けられている。
The radiation shield 26 is installed so as not to block the optical axis L1 of the first two-dimensional camera 15 whose focus is set on the neck growth region.

【0062】本実施の形態の単結晶引上装置1で引き上
げを行う場合には、図3の点k2 のクラウンCが150
mmまで成長した時点で第1二次元カメラ15から第2
二次元カメラ16への切り替えを行う。
When pulling is performed by the single crystal pulling apparatus 1 of the present embodiment, the crown C at the point k2 in FIG.
mm from the first two-dimensional camera 15 to the second
Switching to the two-dimensional camera 16 is performed.

【0063】クラウンCが150mmまで成長した時点
で二次元カメラ15から二次元カメラ16へのモニタの
切り替えを行い、輻射シールド26が第1二次元カメラ
15のモニタの障害になるにもかかわらず、成長領域の
モニタを第2二次元カメラ16で確実に行うことができ
る。
When the crown C has grown to 150 mm, the monitor is switched from the two-dimensional camera 15 to the two-dimensional camera 16, and the radiation shield 26 obstructs the monitor of the first two-dimensional camera 15. The monitoring of the growth area can be reliably performed by the second two-dimensional camera 16.

【0064】なお、輻射シールド26の高さなどの関係
で、輻射シールド26により第1二次元カメラ15の光
軸L1 を遮るような場合には、光軸L1 に対応する輻射
シールド26の一部に透光可能な小さな透孔、スリット
のような透孔部を設けてもよい。透孔部の開口面積は小
さいので輻射シールド26の機能を低下させることはな
い。
If the radiation shield 26 blocks the optical axis L1 of the first two-dimensional camera 15 due to the height of the radiation shield 26 or the like, a part of the radiation shield 26 corresponding to the optical axis L1 is required. A small through-hole capable of transmitting light, or a through-hole such as a slit may be provided in the light emitting element. Since the opening area of the through hole is small, the function of the radiation shield 26 is not reduced.

【0065】本実施の形態の単結晶引上装置において
も、輻射シールド26を設けたにもかかわらず、成長領
域のモニタを確実に行うことができるので、形状が精度
良く制御されたシリコン単結晶を得ることができる。
In the single crystal pulling apparatus according to the present embodiment, the growth region can be reliably monitored in spite of the provision of the radiation shield 26, so that the silicon single crystal whose shape is controlled with high precision is provided. Can be obtained.

【0066】上述図1に基づく実施の形態の単結晶引上
装置で引き上げを行った場合と同様にネック直径6mm
±0.1mm、ネック長さ300mm、直胴部直径が3
10mm±5mmで250kgの単結晶を得ることがで
きた。
As in the case where the single crystal pulling apparatus according to the embodiment shown in FIG.
± 0.1mm, neck length 300mm, straight body diameter 3
A single crystal of 250 kg was obtained at 10 mm ± 5 mm.

【0067】さらに、図4に示された本発明に係る単結
晶引上装置は図1で示される引き上げ装置1のワイヤー
11に、外部から開閉制御される一対の支持部材27
a、27bを有する結晶支持用の支持装置27が設けら
れている。
Further, the single crystal pulling apparatus according to the present invention shown in FIG. 4 is provided with a pair of support members 27 which are controlled to be opened and closed from the outside to the wire 11 of the pulling apparatus 1 shown in FIG.
A support device 27 for supporting a crystal having a and 27b is provided.

【0068】大重量の単結晶の引き上げにおけるネック
N部分の重量対策として、単結晶の引き上げにおけるネ
ッククラウンを一度絞ってコブ状の支持部Tを作り、こ
の支持部Tを支持装置27で支持するものである。
As a measure against the weight of the neck N portion in pulling a heavy single crystal, the neck crown in pulling the single crystal is once narrowed to form a bump-shaped support portion T, and this support portion T is supported by the support device 27. Things.

【0069】なお、コブ状の支持部Tの形状を精度良く
制御するため、第2二次元カメラ16も可能な限り低い
位置に取り付け成長結晶を横から見るようにすることが
望ましい。
In order to accurately control the shape of the bump-shaped support portion T, it is desirable that the second two-dimensional camera 16 is also mounted at a position as low as possible so that the grown crystal can be viewed from the side.

【0070】本実施の形態の単結晶引上装置による引き
上げも上述図1に基づく実施の形態の単結晶引上装置で
引き上げを行う場合と同様に行う。
The pulling by the single crystal pulling apparatus of the present embodiment is performed in the same manner as the pulling by the single crystal pulling apparatus of the embodiment based on FIG.

【0071】ネックNが300mmになった時点で、ク
ラウンCの作製工程に入る。
When the neck N becomes 300 mm, the process for manufacturing the crown C is started.

【0072】第1二次元カメラ15でクラウン成長領域
Cn をモニタし、図5に示すように、クラウンCの直径
d4 が50mmになった時点(図5の点K3 )の画像信
号は第1二次元カメラ15から2値化回路18、画像処
理装置20を介して制御装置21供給される。この制御
装置21からの出力によりヒータ制御器22、モータ制
御器23、昇降装置制御器24、およびワイヤーリール
回転装置制御器25を制御し、成長結晶の直径が順次小
さくなるようにクラウンCを絞る。このクラウンCはコ
ブ状で支持部Tを形成する。
The crown growth area Cn is monitored by the first two-dimensional camera 15, and as shown in FIG. 5, the image signal at the time when the diameter d4 of the crown C becomes 50 mm (point K3 in FIG. 5) is the first two-dimensional camera. The control device 21 is supplied from the dimensional camera 15 via the binarization circuit 18 and the image processing device 20. The output from the controller 21 controls the heater controller 22, the motor controller 23, the elevating device controller 24, and the wire reel rotating device controller 25, and squeezes the crown C so that the diameter of the grown crystal becomes smaller sequentially. . The crown C forms a bump-shaped support portion T.

【0073】クラウンCの直径が25mmまで絞られた
時点の画像信号に基づく制御装置21からの出力により
ヒータ制御器22、モータ制御器23、昇降装置制御器
24、およびワイヤーリール回転装置制御器25を制御
し引き上げ条件を制御して、成長結晶の直径を再び順次
大きくしてクラウンCを形成する。
The heater controller 22, the motor controller 23, the elevating device controller 24, and the wire reel rotating device controller 25 are output from the control device 21 based on the image signal at the time when the diameter of the crown C is reduced to 25 mm. And the pulling conditions are controlled to gradually increase the diameter of the grown crystal again to form the crown C.

【0074】さらに引き上げを継続し、クラウンCを成
長させ、クラウンCの直径が50mmになった時点の第
1二次元カメラ15からの画像信号が2値化回路18、
画像処理装置20を介して出力として制御装置21に供
給される。この制御装置21はスイッチ制御回路19を
制御して切替スイッチ17を作動させ、第2二次元カメ
ラ16を動作状態し、2値化回路18への画像信号を第
2二次元カメラ16からの画像信号に切り替える。
Further, the pulling is continued, the crown C is grown, and the image signal from the first two-dimensional camera 15 at the time when the diameter of the crown C becomes 50 mm is converted to a binarization circuit 18.
The output is supplied to the control device 21 via the image processing device 20. The control device 21 controls the switch control circuit 19 to operate the changeover switch 17, activates the second two-dimensional camera 16, and converts an image signal to the binarization circuit 18 into an image from the second two-dimensional camera 16. Switch to signal.

【0075】モニタの第1二次元カメラ15から第2二
次元カメラ16への切り替えに係わらず、上述図1によ
る引き上げと同様の引き上げを継続する。
Regardless of the switching of the monitor from the first two-dimensional camera 15 to the second two-dimensional camera 16, the same pulling up as in FIG. 1 is continued.

【0076】上述クラウンCの直径50mmの時点での
より低い位置に据え付けられた第1二次カメラから高い
位置に据え付けられた第2二次カメラへの切り替えによ
り、輻射シールド26、コブ状のTにより第1二次カメ
ラ15、第2二次カメラ16の視界が遮られることもな
く、両成長領域を精緻にモニタすることができる。従っ
て、形状を精度良く制御できる。直胴部直径が310m
m±5mmで200kgの単結晶を得ることができた。
By switching from the first secondary camera installed at a lower position to the second secondary camera installed at a higher position at the time when the diameter of the crown C is 50 mm, the radiation shield 26 and the bumpy T Accordingly, the fields of view of the first secondary camera 15 and the second secondary camera 16 are not obstructed, and both growth areas can be monitored precisely. Therefore, the shape can be accurately controlled. Straight body diameter is 310m
A single crystal of 200 kg was obtained at m ± 5 mm.

【0077】[0077]

【発明の効果】以上に述べたように本発明に係る単結晶
引上装置において、単結晶のネック成長の終了と直胴部
成長の開始までに2個の二次元カメラのモニタの切り替
えを行い、特に単結晶育成に重要なネック領域と直胴部
領域にそれぞれ二次元カメラの焦点を合わせることによ
り、両成長領域を精緻にモニタすることがでる。
As described above, in the single crystal pulling apparatus according to the present invention, two two-dimensional camera monitors are switched between the end of single crystal neck growth and the start of straight body growth. In particular, by focusing the two-dimensional camera on the neck region and the straight body region, which are particularly important for growing a single crystal, both growth regions can be precisely monitored.

【0078】従って単結晶のネック、コブ状支持部、直
胴部の形状が精度良く制御された単結晶が製造できる単
結晶引上装置を提供できる。
Accordingly, it is possible to provide a single crystal pulling apparatus capable of manufacturing a single crystal in which the shapes of the neck, the bump-shaped support portion, and the straight body portion of the single crystal are controlled with high accuracy.

【0079】さらに、より低い位置に据え付けられた第
1二次カメラから高い位置に据え付けられた第2二次カ
メラへの切り替えにより、輻射シールド、コブ状の支持
部により二次カメラの視界が遮られることもなく、両成
長領域を精緻にモニタすることができる。従って、輻射
シールドを使用可能で、かつコブ状の支持部を必要とす
る大口径単結晶の引き上げにも適する単結晶引上装置を
提供できる。
Further, by switching from the first secondary camera installed at a lower position to the second secondary camera installed at a higher position, the field of view of the secondary camera is blocked by a radiation shield and a bump-shaped support. Without monitoring, both growth regions can be monitored precisely. Therefore, it is possible to provide a single crystal pulling apparatus which can use a radiation shield and is suitable for pulling a large-diameter single crystal requiring a bump-shaped support.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係わる単結晶引上装置の概要図。FIG. 1 is a schematic diagram of a single crystal pulling apparatus according to the present invention.

【図2】図1による単結晶の引き上げ状態を示す説明
図。
FIG. 2 is an explanatory view showing a pulled state of the single crystal according to FIG. 1;

【図3】図1で用いられる二次元カメラのモニタ切り替
え時点の説明図。
FIG. 3 is an explanatory diagram at the time of switching a monitor of the two-dimensional camera used in FIG. 1;

【図4】本発明に係わる他の実施形態の単結晶引上装置
の概要図。
FIG. 4 is a schematic diagram of a single crystal pulling apparatus according to another embodiment of the present invention.

【図5】図4で用いられる二次元カメラのモニタ切り替
え時点の説明図。
FIG. 5 is an explanatory diagram at the time of switching the monitor of the two-dimensional camera used in FIG. 4;

【図6】本発明に係わる他の実施の形態の単結晶引上装
置の概要図。
FIG. 6 is a schematic diagram of a single crystal pulling apparatus according to another embodiment of the present invention.

【図7】従来の単結晶引上装置の概要図。FIG. 7 is a schematic diagram of a conventional single crystal pulling apparatus.

【符号の説明】[Explanation of symbols]

1 単結晶引上装置 2 炉体 3 石英ルツボ 4 黒鉛ルツボ 5 ヒータ 6 モータ 7 ルツボ回転軸 8 昇降装置 9 シード 10 シードチャック 11 ワイヤー 12 ワイヤーリール回転装置 13 第1カメラポート 14 第2カメラポート 15 第1二次元カメラ 16 第2二次元カメラ 17 切換スイッチ 18 2値化回路 19 スイッチ制御回路 20 画像処理装置 21 制御装置 22 ヒータ制御器 23 モータ制御器 24 昇降装置制御器 25 ワイヤーリール回転装置制御回路 M シリコン融液 N ネック C クラウン S 直胴 An ネック領域 Ac クラウン成長領域 As 直胴部領域 26 輻射シールド 27 支持装置 27a、27b 支持部材 T 支持部 DESCRIPTION OF SYMBOLS 1 Single crystal pulling apparatus 2 Furnace body 3 Quartz crucible 4 Graphite crucible 5 Heater 6 Motor 7 Crucible rotating shaft 8 Elevating device 9 Seed 10 Seed chuck 11 Wire 12 Wire reel rotating device 13 First camera port 14 Second camera port 15 Second 1 2D camera 16 2D camera 17 Changeover switch 18 Binarization circuit 19 Switch control circuit 20 Image processing device 21 Controller 22 Heater controller 23 Motor controller 24 Elevating device controller 25 Wire reel rotating device control circuit M Silicon melt N neck C Crown S Straight body An neck area Ac Crown growth area As Straight body area 26 Radiation shield 27 Supporting devices 27a, 27b Support member T Support

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 シリコン融液と成長単結晶との境界部分
を二次元カメラによって撮像し、この二次元カメラの画
像信号に基づいて成長単結晶の直径を制御するチョコラ
ルスキー法による単結晶引上装置において、ネック成長
領域に焦点が合わせられ境界部分を撮像し画像信号を出
力する第1二次元カメラと、直胴部成長領域に焦点が合
わせられ境界部分を撮像し画像信号を出力する第2二次
元カメラと、成長単結晶のネック成長終了から直胴部成
長開始までの間に引き上げ条件を変更する形状制御用画
像信号を第1二次元カメラの画像信号から第2二次元カ
メラの画像信号に切り替える手段を具備したことを特徴
とした単結晶引上装置。
An image of a boundary between a silicon melt and a grown single crystal is taken by a two-dimensional camera, and a single crystal is pulled by a Czochralski method in which a diameter of the grown single crystal is controlled based on an image signal of the two-dimensional camera. In the apparatus, a first two-dimensional camera that focuses on the neck growth region and captures the boundary portion and outputs an image signal, and a second two-dimensional camera that focuses on the straight body growth region and captures the boundary portion and outputs an image signal A two-dimensional camera, and a shape control image signal for changing a pulling condition between the end of the neck growth of the grown single crystal and the start of the growth of the straight body part, from the image signal of the first two-dimensional camera to the image signal of the second two-dimensional camera A single crystal pulling apparatus, comprising: means for switching to a single crystal.
【請求項2】 第1二次元カメラを第2二次元カメラよ
りも低い位置に取り付け、かつ第1二次元カメラと第2
二次元カメラの光軸を交差させることを特徴とする請求
項1記載の単結晶引上装置。
2. The first two-dimensional camera is mounted at a lower position than the second two-dimensional camera, and the first two-dimensional camera is connected to the second two-dimensional camera.
The single crystal pulling apparatus according to claim 1, wherein the optical axes of the two-dimensional camera are crossed.
【請求項3】 シリコン融液表面から結晶への輻射熱を
遮蔽する輻射シールドを設けたことを特徴とする請求項
1記載の単結晶引上装置。
3. The single crystal pulling apparatus according to claim 1, further comprising a radiation shield for shielding radiation heat from the surface of the silicon melt to the crystal.
【請求項4】 第1二次元カメラが、成長単結晶のネッ
ク成長とこのネックに設けられるコブ状の支持部の成長
および成長単結晶のクラウン初期の成長の工程を撮像す
ることを特徴とする請求項1記載の単結晶引上装置。
4. A method according to claim 1, wherein the first two-dimensional camera captures an image of a step of growing a neck of the grown single crystal, a step of growing a bump-shaped support provided on the neck, and a step of initially growing the crown of the grown single crystal. The single crystal pulling apparatus according to claim 1.
【請求項5】 コブ状の支持部の直径と成長単結晶のク
ラウンの直径がほぼ同じになった時点で、第1二次元カ
メラから第2二次元カメラに画像信号を切り替えること
を特徴とする請求項4記載の単結晶引上装置。
5. The image signal is switched from the first two-dimensional camera to the second two-dimensional camera when the diameter of the bump-shaped support part and the diameter of the crown of the grown single crystal become substantially the same. The single crystal pulling apparatus according to claim 4.
JP29739097A 1997-10-29 1997-10-29 Single crystal pulling device Expired - Lifetime JP3592909B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29739097A JP3592909B2 (en) 1997-10-29 1997-10-29 Single crystal pulling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29739097A JP3592909B2 (en) 1997-10-29 1997-10-29 Single crystal pulling device

Publications (2)

Publication Number Publication Date
JPH11130585A true JPH11130585A (en) 1999-05-18
JP3592909B2 JP3592909B2 (en) 2004-11-24

Family

ID=17845878

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3592909B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010132489A (en) * 2008-12-04 2010-06-17 Shin Etsu Handotai Co Ltd Method for producing silicon single crystal
KR20110085992A (en) * 2008-10-21 2011-07-27 신에쯔 한도타이 가부시키가이샤 Method of determining diameter of single crystal, process for producing single crystal using same, and device for producing single crystal
CN103215641A (en) * 2013-04-10 2013-07-24 江苏双良新能源装备有限公司 Sapphire video seeding system using kyropoulos method and controlling method thereof
KR101379800B1 (en) * 2012-07-18 2014-04-01 주식회사 엘지실트론 An apparatus for growing silicon single crystal and a method of growing the same
CN108344742A (en) * 2018-04-13 2018-07-31 太原理工大学 A kind of sapphire inoculation detection device and method based on multiple image movable information

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110085992A (en) * 2008-10-21 2011-07-27 신에쯔 한도타이 가부시키가이샤 Method of determining diameter of single crystal, process for producing single crystal using same, and device for producing single crystal
JP2010132489A (en) * 2008-12-04 2010-06-17 Shin Etsu Handotai Co Ltd Method for producing silicon single crystal
KR101379800B1 (en) * 2012-07-18 2014-04-01 주식회사 엘지실트론 An apparatus for growing silicon single crystal and a method of growing the same
CN103215641A (en) * 2013-04-10 2013-07-24 江苏双良新能源装备有限公司 Sapphire video seeding system using kyropoulos method and controlling method thereof
CN108344742A (en) * 2018-04-13 2018-07-31 太原理工大学 A kind of sapphire inoculation detection device and method based on multiple image movable information

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