JPH11102077A - Method and device for carrying and positioning belt-like work - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent the positional deviation of belt-like work in a carrying direction and to accurately carry and position the belt-like work even though there are plural kinds of carrying pitches. SOLUTION: The belt-like work W is moved by a specified amount corresponding to the pitch PwW1 of a pattern area and stopped, a light irradiation part LH irradiates the alignment mark MAM of a mask M, and the positional deviation δ1 between a mask alignment mark image and a work alignment mark is stored. The work W is moved by the specified amount corresponding to the pitch PW2 and stopped, and the positional deviation δ2 is similarly stored. Next, when the belt-like work is moved by the specified amount corresponding to the pitch PW1, the specified amount is corrected by the positional deviation δ1 and the belt-like work is moved. Next, when the belt-like work is moved by the specified amount corresponding to the pitch PW2, the specified amount is corrected by the positional deviation δ2 and the belt-like work is moved.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION In order to form a plurality of various electronic elements on a strip-shaped workpiece, the strip-shaped workpiece is transported and stopped for each predetermined pattern area (each exposure area on the strip-shaped workpiece), and a mask and a strip-shaped workpiece are transferred. After performing alignment with each pattern area of the work, an exposure step of exposing the mask pattern onto the work is performed. The present invention relates to a method and an apparatus for transporting and positioning a strip-shaped workpiece for stopping the transport of the workpiece in a predetermined pattern area in the above-described exposure process and the like. The present invention relates to a method and an apparatus for transporting / positioning a strip-shaped workpiece, which can accurately transport and position the strip-shaped workpiece even when a pattern area is arranged and the transport amount of the strip-shaped workpiece differs for each pattern.

[0002]

2. Description of the Related Art In the above-mentioned exposure process, a thin strip-like work (a stainless steel sheet having a thickness of about 20 .mu.m spread in a roll shape) is pulled out from a reel, transported and stopped in predetermined pattern areas, and each pattern area is stopped. Exposure. The length of the work to be used is about 100 m, the pattern area is 100 to 200 mm square, and about 1000 exposures are performed in one process. When the belt-like work is pulled out from the reel and transported / stopped for each predetermined pattern area, it is necessary to transport / stop the belt-shaped workpiece without applying tension.

[0005] For this reason, a transfer apparatus shown in FIG. 4 is usually used. In FIG. 4, WS is a work stage, and many suction holes VC are formed on the surface of the work stage WS.
H is formed, and when the strip-shaped work conveyed in the direction of the arrow in the figure stops at a predetermined position, the strip-shaped work W is sucked by the suction holes VCH, and the mask and the work are aligned as described later. After that, it is exposed.

A drive roller DR is disposed downstream of the work stage WS, and the belt-shaped work W is driven by the drive roller DR in the direction of the arrow in FIG. Also,
On the upstream side of the work stage WS, a brake roller BR for applying a brake to the belt-shaped work W to prevent waving is arranged, and the drive roller DR and the brake roller BR constitute a transfer device. Drive roller DR
Are mounted at both ends of the drive roller shaft DRS, a motor M having an encoder EC1 connected to the drive roller shaft DRS is mounted, the rotation amount of the drive roller DR is detected by the encoder EC1, and the position of the strip-shaped workpiece W in the traveling direction is determined. Control.

[0005] Press rollers DR ', DR' are arranged on the drive roller DR so as to be able to move up and down. The press rollers DR ', DR' are lowered, and both ends of the strip-shaped work W are attached to the rotating drive roller DR. Is driven by pressing a non-exposed portion of the substrate. The brake rollers BR are attached to both ends of the brake roller shaft BRS, and the brake shaft BRS is connected to a rotation controller BC which exerts a braking effect by suppressing the rotation of a bearing. Pressing rollers BR ', BR' are arranged on the brake roller BR so as to be movable up and down, and the pressing rollers BR ', BR' are lowered so that the non-exposed portions at both ends of the band-shaped work W are applied to the brake roller BR. Press to apply a brake on the strip-shaped workpiece W,
The wavy work W is prevented.

When the belt-shaped work W is transported, the drive roller DR is driven by the motor MT while blowing air from the suction holes VCH provided in the work stage WS, and the belt-shaped workpiece W is transported. When a predetermined pattern area comes on the work stage WS, the drive of the motor MT is stopped, and the suction hole VCH is set to a negative pressure to suck the band-shaped work W. As described above, during conveyance, the suction holes VC
By supplying air from H, it is possible to prevent the back surface of the band-shaped work W from being rubbed against the work stage WS and being damaged. As described above, the belt-shaped work W is conveyed by the driving force of the drive roller DR while the brake is applied by the brake roller BR, thereby preventing waving of the band-shaped work W and applying no great tension to the band-shaped work W. Can be transported.

However, in the above-described conveying method, a pulse motor that rotates by an amount corresponding to the drive pulse is used as the motor MT, and even if the rotation amount is detected by the encoder EC1, the next pattern area is determined due to the processing accuracy of the roller. Specified single feed amount to move to
0 to 200 mm), ± 0.1 to 0.2 mm
A slight shift in the traveling direction of the belt-like work is inevitable. If the feed is repeated 1000 times even with a shift of 0.1 mm in one feed, the shift is accumulated every time, and the shift becomes 100 mm near the end point of the strip-shaped workpiece W. If these deviations accumulate, the workpiece alignment mark deviates from the field of view of the alignment unit during alignment of the mask M and the strip-shaped workpiece W, which will be described later, and alignment cannot be performed.

When the mask M and the band-shaped work W are aligned, if the mask M is not moved as described later, but the work stage WS is moved to move the band-shaped work W, the accumulation of the deviation is suppressed. . However,
When the work stage WS is moved to some extent, the band-shaped work W is wrinkled or damaged, so that the movable range of the work stage WS is limited. Therefore, if the shift amount is larger than the movable range of the work stage WS, the above alignment cannot be realized only by moving the work stage WS, and the mask M also needs to be moved. Eventually, it becomes difficult to absorb the accumulated displacement,
Eventually, as described above, the alignment becomes impossible. Therefore, in order to prevent the occurrence of the above-described deviation and accurately stop the band-shaped work W in the designated pattern area,
Conventionally, exposure has been performed by carrying and positioning by the following method.

[0009] Hereinafter, the transfer, positioning, and exposure of a conventional strip-shaped work W will be described using a projection exposure apparatus that projects and exposes a mask pattern on the strip-shaped work W as an example. A. Method using sprocket FIG. 5A shows a conventional strip-shaped workpiece W using a sprocket.
FIG. 1B shows a configuration of a projection exposure apparatus of FIG.
The perforation hole PH which engages with a sprocket of a brake roller and a drive roller is formed on the non-exposed surface of the strip-shaped workpiece W as shown in FIG. , A work alignment mark WAM for aligning the mask M and the band-shaped work W is described later.

In FIG. 1A, R1 is an unwinding reel on which an unexposed strip-shaped work W is wound, BR1 is a brake roller with a sprocket, WS is a work stage, DR
1 is a drive roller with a sprocket, and R2 is a take-up reel. Brake roller BR with sprocket
1. A transport device is constituted by a drive roller DR1 with a sprocket and a work stage WS, and is basically the same as that shown in FIG. 4 except that a sprocket is provided on the drive roller DR1 and the brake roller BR1. Configuration.

Reference numeral AU denotes an alignment unit. The alignment unit AU forms a mask alignment mark MAM (hereinafter referred to as a mask mark MAM) formed on the strip-shaped work W and a work alignment mark WAM (marked on the strip-shaped work W). (Hereinafter referred to as a work mark WAM), and the mask mark MAM and the work mark W are detected.
The mask stage MS is moved so that the AM overlaps, and the mask M and the strip-shaped workpiece W are aligned.

Next, the exposure process of the strip-shaped work W will be described with reference to FIG. (1) Air is released from the suction hole VCH, and the drive roller DR1 with sprocket is rotated a predetermined number by the motor MT to move the strip-shaped work W by a predetermined amount. Since the drive roller DR1 with a sprocket is used as described above, the strip-shaped work W is accurately moved by an amount corresponding to the rotation of the motor MT, and by controlling the rotation amount of the motor MT, the strip-shaped work W can be accurately adjusted. Can be positioned. (2) Insert a positioning pin or the like (not shown) into a perforation hole PH formed in the strip-shaped work W so that the work mark WAM is in the field of view of the alignment unit AU during alignment, perform rough alignment of the strip-shaped work W, and Stop the rotation of.

(3) The release of air from the suction holes VCH is stopped, and the strip-shaped work W is vacuum-adsorbed and fixed by the suction holes VCH. Next, the alignment unit AU is inserted into a predetermined position where the work mark WAM can be observed. (4) Move the work stage WS to the Z axis (work stage WS
After correcting the aberration due to non-exposure by moving the mask M and the projection lens L in the Z-axis direction), the non-exposure light is emitted from the light irradiation unit LH. To form an image of the mask mark MAM on the strip-shaped work W.

(5) The mask mark MAM and the work mark WAM are detected by the alignment unit AU, and the mask M is moved so that the two marks overlap each other to perform precise alignment. (6) Stop emitting non-exposure light from the light irradiation unit LH, and retract the alignment unit AU. Next, exposure light is emitted from the light irradiation unit LH, and exposure is performed by forming an image of the mask pattern written on the mask M on the strip-shaped workpiece W.
The emission of the exposure light from the light irradiation unit LH is stopped. (7) The motor MT rotates the drive roller DR by a predetermined amount so as to move the band-shaped work W by a predetermined amount so that the next pattern area is on the work stage WS. Steps (2) to (7) are repeated.

B. A method using a work stop mark instead of the perforation hole PH. FIG. 6A is a diagram illustrating a configuration of a conventional belt-shaped workpiece W projection exposure apparatus using a workpiece stop mark, and FIG. 6B is a diagram illustrating the belt-shaped workpiece W. As shown in the figure, a work stop mark WSM is formed, and a work mark WAM for aligning the mask M and the band-shaped work W is written on the exposure surface (pattern area) as described later. I have. In FIG.
The same components as those shown in FIG. 5 are denoted by the same reference numerals, and in FIG. 6, a mask stop mark MSM for determining the stop position of the strip-shaped work W is written on the mask M. A stop mark detection alignment unit (not shown: a field of view larger than the alignment unit), the mask stop mark MSM and the work stop mark WSM.
And coarse alignment is performed.

Next, the exposure process of the strip-shaped work will be described with reference to FIGS. (1) The drive roller DR is rotated at a constant speed by a motor MT (for example, a pulse motor) to convey the strip-shaped work W. Further, non-exposure light is irradiated from the light irradiation device LH,
An image of the mask stop mark MSA on the mask M is formed on the strip-shaped workpiece W. (2) Since the mark pitch of the work stop mark WSA is known in advance, the conveyance speed is conveyed by a predetermined amount at a high speed, and when the stop position of the strip-shaped work W is approached, the rotation speed of the motor MT is reduced. Next, the work stop mark WS is set by the stop mark detection alignment unit (not shown).
M and a stop mark MSA imaged on the strip-shaped workpiece W are detected, and when they match, the motor MT is stopped (coarse alignment). Note that, as described above, the image receiving element CCD
, The coincidence of the positions of both marks may be detected. (3) Perform steps (3) to (7) in the above-mentioned “A.
Step (3) is repeated.

[0017]

The above-mentioned conventional method has the following problems. (1) "Method using sprocket" described in A above
In the case of (1), an apparatus for forming perforation holes in the strip-shaped work is separately required, and a step of forming perforation holes is required. Further, it is necessary to prepare the above-mentioned devices according to the material and width of the strip-shaped work, and the material and width of the strip-shaped work to be used may be limited by the above-mentioned device. In addition, dust such as burrs in the perforation hole may be generated,
This may reduce the yield.

(2) In the case of the “method using a work stop mark” described in B, an apparatus for forming a work stop mark on a strip-shaped work is separately required, and a step of forming a work stop mark is required. I do. In addition, the above (1)
Similarly to the above, the above devices need to be prepared according to the material and width of the strip-shaped work, and the material and width of the strip-shaped work to be used may be limited by the above-mentioned device. Further, it is necessary to provide an alignment unit for the stop mark or an observation system such as an image receiving element for observing the stop mark on the work stage, which complicates the configuration of the apparatus.

In order to solve the above-mentioned problems of the prior art, the present inventors first obtained the positional deviation amount between the mask alignment mark MAM image and the work alignment mark WAM when the strip-shaped workpiece W was moved. When the band-shaped work W is moved to the next pattern area, the band-shaped work W is moved by an amount in which the positional shift amount δ is added to a predetermined amount corresponding to the pitch of the pattern area of the band-shaped work W,
A method and an apparatus for transporting and positioning a strip-shaped work which corrects each time a shift in the traveling direction of the strip-shaped work W is exposed have been proposed (Japanese Patent Application No. 8-82455).

FIG. 7 is a view for explaining a method of transporting and positioning the above-mentioned strip-shaped work. As shown in FIG.
When the belt-shaped workpiece W is moved to move the pattern area 1 to the exposure area, the mask mark MAM and the workpiece mark W are moved.
When the position shift δ occurs in the AM, the position shift amount δ is stored. Then, work mark WAM and mask mark MA
The mask M is moved so that M overlaps, fine alignment is performed, and a mask pattern written on the mask is imaged on the strip-shaped work W to perform exposure. Next, the belt-shaped work is moved to the next pattern area, and the belt-shaped work W is stopped. At this time, the moving amount of the band-shaped work W is equal to the displacement amount δ.
[Pitch Pw + shift amount δ]. in this case,
Since the value of the shift amount δ is negative, the movement amount is P
W−δ.

As described above, the moving amount of the band-shaped work W is
By setting w + δ, when the next pattern area 2 is moved to the exposure area (area to which the exposure light is irradiated), FIG.
As shown in (b), the strip-shaped work W can be accurately positioned. That is, when the strip-shaped work W moves by an amount corresponding to the pitch Pw of the pattern area, the shift amount δ is corrected, and the work mark WAM in the pattern area 2 of the strip-shaped work W substantially matches the mask mark MAM. Further, even if the moving amount of the strip-shaped work W at this time shifts again due to the stop error, the previous position shift amount δ is corrected, and therefore the position shift amount δ does not accumulate.

According to the above-described method, when the pitch Pw of the pattern area on the strip-shaped work W is equal, the strip-shaped work W can be accurately positioned. In addition to a case where one type of circuit pattern is repeated, a set pattern including a plurality of types of circuit patterns as a set may be repeated. When the above exposure is performed, the pitch Pw of the pattern area is different, and the moving amount of the strip-shaped work W is also different for each exposure.

For example, as shown in FIG. 8, a relatively coarse large pattern P1 is exposed on a strip-shaped work W in a first exposure, and a relatively fine repetitive pattern P2 is converted into the pattern P1 in a second exposure. Exposure may be repeated. In this case, as shown in the drawing, the amount of movement when the belt-shaped workpiece is moved to expose the area P02 after exposing the pattern to the area P01 is Pw1, but the movement amount is Pw1.
Is Pw2 when exposing is performed. When the pitch of the pattern area on the strip-shaped workpiece W is different as described above, the strip-shaped workpiece cannot be accurately positioned by the method disclosed in Japanese Patent Application No. 8-82455. The alignment mark of the workpiece is not captured in the field of view of the microscope due to the problem.

For example, as shown in FIG.
In the case of exposing the pattern areas 01 to 21 and 02 to 22 in w2, when the exposure is performed by the above-described method, the positional deviation amount is as follows. (1) The belt-shaped work W is transported from the area 01 to the area 02 (pitch Pw1). The shift amount at that time is defined as Pw1 + δ1.
The alignment is performed by moving the mask, and the deviation amount + δ1 is stored. At this time, the set movement amount, the actual movement amount, and the deviation are shown in FIG.
0. (2) After exposing the area 02, it is transported from the area 02 to the area 11 (pitch Pw2). In the conventional method, since the displacement amount at the time of the previous movement is taken into account, the set movement amount Pw2 is calculated as Pw2−δ.
It is reset to 1 and transported. Assuming that the shift amount after the conveyance is + δ2, the shift amount stored after the alignment is + δ2, and the set movement amount, the movement amount, and the shift amount are as shown in FIG.

(3) After the area 11 is exposed, it is transported from the area 11 to the area 12 (pitch Pw1). In consideration of the previous shift amount, the set movement amount is reset from Pw1 to Pw1−δ2, and the sheet is conveyed. Assuming that the deviation amount at that time is δ3, the deviation amount stored after the alignment is + δ3, and the set movement amount, the movement amount, and the deviation amount are as shown in FIG. (4) After the area 12 is exposed, the area 12 is conveyed from the area 12 to the area 21 (pitch Pw2). Since the set movement amount in the above (2) was Pw2−δ1, considering the previous deviation amount,
The set movement amount at this time is Pw2-δ1-δ3. Assuming that the shift amount after the conveyance is + δ4, the shift amount stored after the alignment is + δ4, and the set movement amount, the movement amount, and the shift amount are as shown in FIG.

The above-described procedure is repeated to carry out the transfer. Here, the shift amount + δ2, + δ3,
+ Δ4,... Are shift amounts related to both the pitches Pw1 and Pw2, and are not stable because the shift amounts are increased or decreased. For this reason, the position of the work mark WAM within the field of view of the alignment unit fluctuates according to the pitches Pw1 and Pw2, and in some cases, does not fall within the field of view of the alignment unit. The present invention has been made in view of the above-described circumstances.For example, when a plurality of types of circuit patterns are repeatedly exposed, such as in a case where a set pattern including a plurality of types of circuit patterns is repeatedly exposed, even when there are a plurality of types of transport pitches, An object of the present invention is to provide a method and an apparatus for transporting and positioning a strip-shaped workpiece, which can transport and position the workpiece accurately.

[0027]

In order to solve the above-mentioned problems, according to the first and second aspects of the present invention, after the belt-shaped work is moved and stopped by a predetermined amount corresponding to the pitch of the pattern area, the light is turned off. Irradiating exposure light or non-exposure light from the irradiation unit to a mask alignment mark of a mask having a mask pattern and a mask alignment mark, and detecting a mask alignment mark image and a work alignment mark provided on the strip-shaped work; The amount of positional deviation between the mask alignment mark image and the work alignment mark in the traveling direction of the strip-shaped work corresponding to the plurality of pitches is obtained. Then, when the band-shaped workpiece is moved by a predetermined amount corresponding to the plurality of pitches and then moved to the next pattern area, the above-described obtained when the band-shaped work is moved by the predetermined amount corresponding to the same pitch as that pitch is obtained. The belt-like work is moved and stopped by an amount that takes into account the amount of displacement.

In the first and second aspects of the present invention,
As described above, the amount of positional deviation between the mask alignment mark image and the work alignment mark in the traveling direction of the band-shaped work corresponding to a plurality of pitches is determined,
When the belt-shaped workpiece is moved by a predetermined amount corresponding to the plurality of pitches and is moved to the next pattern area, the position shift obtained when the band-shaped work is moved by the predetermined amount corresponding to the same pitch as the pitch is obtained. Since the band-shaped work is moved and stopped by an amount in consideration of the amount, the band-shaped work can be accurately conveyed and positioned even when there are a plurality of types of conveyance pitches.

[0029]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described by taking a projection exposure apparatus for projecting and exposing a mask pattern on a strip-shaped workpiece W as an example. The present invention can be applied not only to the projection exposure apparatus shown in the following embodiments, but also to a contact exposure apparatus for bringing a mask and a work into contact for exposure, and a proximity exposure apparatus for bringing a mask and a work close to each other for exposure.

FIG. 1 is a view showing an embodiment of the present invention. FIG. 1A shows the configuration of a projection exposure apparatus of the present embodiment.
(B) shows the strip-shaped work W of the present embodiment. The strip-shaped work W of the present embodiment is conveyed at the pitches Pw1 and Pw2 as shown in FIG. 9 and a mask pattern is exposed on each pattern area. You. A work alignment mark WAM is written in each pattern area. 5A, the same components as those shown in FIG. 5 are denoted by the same reference numerals, and have the same configuration as FIG.

In FIG. 3A, R1 is an unwinding reel on which an unexposed strip-shaped work W is wound, BR is a brake roller, and a second encoder EC2 is mounted on the shaft of the brake roller BR. . WS is a work stage, DR is a drive roller, and a drive roller DR
As shown in FIG. 4, the first encoder EC1 and the motor MT (for example, a pulse motor) are attached to the. R2 is a take-up reel. The transport device shown in FIG. 4 is constituted by the brake roller BR, the drive roller DR, and the work stage WS, and is the same as that shown in FIG. 4 except that a second encoder is provided on the brake roller BR. It is a structure of.

LH is a light irradiation section for irradiating exposure light / non-exposure light, M is a mask on which a mask pattern and a mask alignment mark MAM (hereinafter referred to as a mask mark MAM) are written, and MS is a mask on which the mask M is mounted. The stage L is a projection lens, and the exposure light / non-exposure light emitted from the light irradiation unit LH is irradiated onto the mask M, and the mask pattern MA and the mask mark MA are provided on the mask M as described above.
M is projected onto the band-shaped work W on the work stage WS via the projection lens L. AU is an alignment unit. The alignment unit AU detects the mask mark MAM formed on the work W and the work mark WAM written on the work W, and performs masking so that the mask mark MAM matches the work mark WAM. Stage MS
Is moved to align the mask M and the strip-shaped workpiece W.

The alignment unit AU is a belt-like work W
A number corresponding to the work mark WAM described above is provided,
It is configured to be movable in the direction of the arrow in FIG. If the alignment unit AU is in the exposure area when performing alignment, the alignment unit AU is retracted from the exposure area when exposing the strip-shaped workpiece W. C
nt denotes a control device, and the mask mark MAM image and the work mark WA received by the alignment unit AU.
The M image and the rotation amounts of the drive roller DR and the brake roller BR detected by the encoders EC1 and EC2 are sent to the control device Cnt, and the control device Cnt controls the rotation amount of the motor MT to control the rotation of the belt-shaped work W as described later. The positioning is performed, and the mask stage MAM is driven to perform alignment between the mask M and the strip-shaped workpiece W.

After moving and stopping the band-shaped workpiece W by the set movement amount corresponding to the plurality of pitches, the mask alignment mark MA corresponding to the plurality of pitches is moved.
The respective positional deviation amounts of the M image and the work alignment mark WAM are obtained, and the respective positional deviation amounts are stored in the storage unit Me1. Then, when moving the band-shaped work W to the next pattern area, the position shift amount obtained when the band work W is moved by the set movement amount corresponding to the pitch is read out from the unit Me1, and the position shift amount is obtained. The belt-shaped work W is moved and stopped by an amount obtained by correcting the set movement amount.

Next, in the case where the pattern areas 01 to 22 are arranged at the pitches Pw1 and Pw2 on the strip-shaped work W as shown in FIG. The exposure step will be described. (1) After exposing the pattern area 01 in FIG. 9, air is blown out from the suction holes VCH provided in the work stage WS to float the strip-shaped work W from the work stage WS, and the drive roller DR is driven by the motor MT. A predetermined number of rotations are performed to move the strip-shaped work W by an amount corresponding to the pitch Pw1 of the pattern area of the strip-shaped work W.
Stop driving. At the same time, the encoders EC1, EC2
, The amounts of rotation of the drive roller DR and the brake roller BR are detected and stored.

(2) The rotation amounts of the drive roller DR and the brake roller BR detected by the encoders EC1 and EC2 are compared. Here, when the belt-shaped work W slips on one or both of the drive roller DR and the brake roller BR, the detection value of the encoder EC2 becomes smaller than the detection value of the encoder EC1. Also,
When the detected values of the encoders EC1 and EC2 match, it is considered that the strip-shaped workpiece W has been accurately fed by a predetermined amount without being affected by the slippage of the rollers.

Therefore, the encoders EC1, EC1
If the two detected values do not match, an error is output on the assumption that slippage has occurred due to wear of the rollers or the like, and the transport operation of the strip-shaped work W is stopped. As described above, even if the rotation amounts of the drive roller DR and the brake roller BR are detected by the encoders EC1 and EC2, as described above, the one-time feed amount (due to the stop accuracy of the drive roller DR connected to the motor MT). (Approximately 100 mm to 200 mm), a deviation of the band-shaped workpiece W in the traveling direction of about ± 0.1 to 0.2 mm cannot be avoided. Therefore, as will be described later, deviations corresponding to the transport pitches Pw1 and Pw2 are respectively detected, and when the belt-shaped workpiece is transported, the set movement amount is corrected by the above-described deviation amount according to the transport pitches Pw1 and Pw2, and the accumulation of the deviations is calculated. To prevent.

(3) The release of air from the suction holes VCH is stopped, and the strip-shaped work W is vacuum-adsorbed and fixed by the suction holes VCH. Next, the alignment unit AU is inserted into a predetermined position where the work mark WAM can be observed (when the alignment unit AU is retracted). (4) After correcting the aberration by the non-exposure light as described above, the non-exposure light is emitted from the light irradiation section LH to form an image of the mask mark MAM on the strip-shaped work W. Instead of irradiating the non-exposure light from the light irradiation unit LH, the exposure light may be partially irradiated on the work mark WAM by an optical fiber or the like.

(5) The mask mark MAM and the work mark WAM are detected by the alignment unit AU, and the shift amount + δ1 between the work mark WAM and the mask mark MAM in the belt-like work traveling direction is obtained and stored (work mark WA).
When M is shifted toward the traveling direction of the strip-shaped workpiece W, δ1
Is negative). FIG. 2 is a view showing a state of conveyance and positioning in the present embodiment. As shown in FIG. 2A, when the belt-shaped work W is moved by the pitch Pw1 to move the pattern area 02 to the exposure area, Mask mark M
If the position deviation δ1 occurs between AM and the work mark WAM,
The displacement δ1 is stored in the storage unit Me1 as the displacement corresponding to the pitch Pw1. The set movement amount, actual movement amount, and deviation at this time are as shown in FIG.

(6) After the mask M is moved and fine alignment is performed so that the work mark WAM and the mask mark MAM overlap, the emission of the non-exposure light from the light irradiation unit LH is stopped, and the alignment unit AU is reset. Retreat (when the alignment unit AU is in the exposure area). Next, as described above, after adjusting the projection image of the mask pattern of the mask M by the exposure light so as to form an image on the strip-shaped work W, the exposure light is emitted from the light irradiation unit LH, and the exposure light is written on the mask M. The mask pattern is imaged on the strip-shaped workpiece W to expose the area 02, and the emission of the exposure light from the light irradiation unit LH is stopped.

(7) The vacuum suction of the work stage WS is released, and air is blown out from the suction holes VCH of the work stage to float the strip-shaped work W from the work stage WS. By rotating, the belt-shaped work W is moved by the pitch Pw2, the motor MT is stopped, and the belt-shaped work W is stopped. (8) As described above, the detected values of the encoders EC1 and EC2 are compared, and after confirming that the strip-shaped work W has been accurately sent by a predetermined amount without being affected by the slippage of the rollers, the strip-shaped work W is removed. Fix by vacuum suction. Then, the mask mark MAM and the work mark WAM are detected by the alignment unit AU, and the shift amount + δ2 between the work mark WAM and the mask mark MAM in the belt-like work traveling direction.
Is stored as the position shift amount corresponding to the pitch Pw2,
1 is stored. [FIG. 2 (b)]. At this time, the set movement amount, the actual movement amount, and the deviation are as shown in FIG.

(9) The mask M is moved so that the work mark WAM and the mask mark MAM overlap each other to perform fine alignment, and the exposure light is radiated from the light irradiating section LH as described above. The region 11 is exposed by forming an image of the mask pattern on the strip-shaped workpiece W. (10) After exposing the area 11, the belt-shaped work W is transported from the area 11 to the area 12. At this time, the set amount of movement is calculated as Pw1−
Reset to δ1. After the conveyance, the mask mark MAM and the work mark WAM are detected as described above, and the shift amount + δ3 (<+ δ1) of the work mark WAM and the mask mark MAM in the belt-like work traveling direction is stored as the position shift amount corresponding to the pitch Pw1. [FIG. 2 (c)]. At this time, the set movement amount, the actual movement amount, and the deviation are as shown in FIG. Then, fine alignment is performed as described above, and the mask M
The mask pattern described above is imaged on the strip-shaped workpiece W to expose the region 12.

(11) After exposing the area 12, the strip-shaped work W
Is transported from the area 12 to the area 21. At this time, the set movement amount is reset to Pw2−δ2 in consideration of the shift amount δ2 at the time of moving the pitch Pw2 last time. After the transfer, the mask mark MAM and the work mark WAM are detected as described above,
The shift amount + δ4 (<+ δ2) between the work mark WAM and the mask mark MAM in the belt-like work traveling direction is stored as the position shift amount corresponding to the pitch Pw2 (FIG. 2D). At this time, the set movement amount, the actual movement amount, and the deviation are as shown in FIG. Next, fine alignment is performed as described above, and the mask pattern written on the mask M is imaged on the strip-shaped work W to expose the region 21. (12) Hereinafter, the procedure of (10) to (11) is repeated,
After carrying and positioning the strip-shaped work W, each area is exposed.

That is, in the present embodiment, the shift amount is divided into a shift corresponding to the pitch Pw1 and a shift corresponding to the pitch Pw2, and each of them is independently corrected in consideration of the previous result. As a result, a shift amount δ1, corresponding to the pitch Pw1,
.., and a shift amount δ2 corresponding to the pitch Pw2.
δ4,... gradually become smaller, and the set movement amount falls to a certain value. Therefore, the position of the work mark WAM within the field of view of the alignment unit is substantially constant regardless of the pitches Pw1 and Pw2.

In the above-described embodiment, the alignment unit AU uses the mask mark MAM and the work mark WA.
M has been described, and the case where the mask M is moved and the fine alignment is performed so that both marks overlap with each other has been described.
In the exposure step in which the positioning accuracy of the exposure position is not so required, the fine alignment is not performed, and the shift amounts of the work mark WAM and the mask mark MAM corresponding to the movement pitches Pw1 and Pw2 in the strip-shaped work traveling direction are stored. When moving the strip-shaped work W next, the strip-shaped work W may be moved by correcting the shift amount δ according to the movement pitches Pw1 and Pw2. As a result, the occurrence of the above-described cumulative deviation can be prevented.

Also, since the accumulated shift amount is always corrected,
The movement amount at the time of precise alignment between the mask mark MAM and the work mark WAM can be within a certain range. Therefore, if the moving amount of the work stage WS corresponding to the moving amount range is such that the band-shaped work W is not wrinkled or scratched, the work stage WS is moved instead of moving the mask M at the time of fine alignment. May be moved.

[0047]

As described above, according to the present invention, even when a plurality of types of circuit patterns are repeatedly exposed, such as in the case of repeatedly exposing a set pattern of a plurality of types of circuit patterns, the present invention is not limited to this. Work can be transported and positioned accurately. Therefore, for example, when fine alignment is performed using the alignment unit, there is no problem that the mask mark and the work mark are out of the field of view of the alignment microscope and alignment cannot be performed.

[Brief description of the drawings]

FIG. 1 is a diagram showing an embodiment of the present invention.

FIG. 2 is a diagram illustrating a state of conveyance and positioning in the present embodiment.

FIG. 3 is a diagram showing a set movement amount, an actual movement amount, and a positional deviation amount when a belt-shaped work is moved at pitches Pw1 and Pw2 according to the method of the present embodiment.

FIG. 4 is a diagram showing a configuration of a transport device for transporting a strip-shaped work.

FIG. 5 is a diagram showing a conventional example using a sprocket.

FIG. 6 is a diagram showing a conventional example using a work stop mark.

FIG. 7 is a diagram illustrating an operation when a belt-shaped workpiece is moved in consideration of a previous positional deviation amount.

FIG. 8 is a diagram illustrating a pitch when a set pattern including a plurality of types of circuit patterns is exposed on a strip-shaped work.

FIG. 9 is a diagram showing a pitch and a pattern area.

FIG. 10 shows a method of FIG.
FIG. 9 is a diagram illustrating a set movement amount, an actual movement amount, and a position shift amount when the movement is performed at Pw2.

[Explanation of symbols]

 R1 unwind reel R2 take-up reel W belt work BR brake roller DR drive roller EC1 encoder EC2 encoder MT motor BC rotation controller WS work stage LH light irradiation unit M mask MS mask stage L projection lens AU alignment unit MAM mask mark WAM work Mark Cnt control device Me1 storage means

Claims (2)

[Claims] 1. Exposing a mask pattern to a strip-shaped work,
A method of transporting and positioning a strip-shaped workpiece, in which after the exposure is completed, the strip-shaped workpiece is moved and stopped by a predetermined amount corresponding to the pitch of the pattern area in order to expose a mask pattern to the next pattern area of the strip-shaped workpiece. The pattern area has a plurality of pitches. After moving and stopping the strip-shaped workpiece by a predetermined amount corresponding to the plurality of pitches, the light irradiating unit applies exposure light or non-exposure light to the mask pattern and the mask alignment. Irradiating a mask alignment mark of a mask having a mark, detecting the mask alignment mark image and a work alignment mark provided on the strip-shaped workpiece, and detecting the mask in the traveling direction of the strip-shaped workpiece corresponding to the plurality of pitches; Alignment mark image and work alignment
The position deviation amount of the mark is obtained, and the band-shaped workpiece is moved by a predetermined amount corresponding to the plurality of pitches and moved to the next pattern area, and is moved to the predetermined amount by the predetermined amount corresponding to the same pitch as the pitch. A method for transporting and positioning a strip-shaped work, wherein the strip-shaped work is moved and stopped by an amount that takes into account the displacement amount obtained when the strip-shaped work is moved. 2. Exposing a mask pattern to a strip-shaped workpiece,
A belt-like work transport / positioning device for moving and stopping the belt-like work by a predetermined amount corresponding to the pitch of the pattern region in order to expose a mask pattern to a pattern region next to the belt-like work after the exposure, comprising: A mask having a mask alignment mark, a light irradiating unit for irradiating the mask with exposure light or non-exposure light, and the pattern regions are arranged at a plurality of types of pitches. A work having a work alignment mark irradiated with emitted exposure light or non-exposure light, an alignment unit for detecting the mask alignment mark image and the work alignment mark, and a control unit for controlling movement of the strip-shaped work The control unit is configured to form a band by a predetermined amount corresponding to the plurality of pitches. After moving and stopping the work, a means is provided for obtaining the respective positional deviation amounts of the mask alignment mark image and the work alignment mark corresponding to the plurality of pitches, and storing the respective positional deviation amounts. When the band-shaped workpiece is moved to the next pattern area, the amount of positional deviation obtained when the band-shaped workpiece is moved by a predetermined amount corresponding to the same pitch is read out from the unit, and the predetermined amount is calculated by the positional deviation amount. A transport / positioning device for a belt-like work, wherein the belt-like work is moved and stopped by a corrected amount.