JP2892149B2 - Positioning apparatus and film exposure apparatus using the apparatus - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to, for example, TAB (Tape Automated Bonding).
The present invention relates to an alignment apparatus for manufacturing a film circuit board used for mounting electronic components, such as a method, and an exposure apparatus using the same.

[Prior Art] A photolithography technique is known as a technique for performing fine processing on the surface of an object. This technology is applied not only to semiconductor integrated circuits but also to the fabrication of film circuit boards used for mounting TAB-type electronic components recently.

In the production of a film circuit board, if a transferred circuit pattern is displaced, it appears as a mounting error. For this reason, it is necessary to align the reticle pattern at the correct position with respect to the film to be conveyed so that the reticle pattern is exposed. The accuracy of this alignment is, for example, ±
It is required to be within 10 μm.

Conventionally, this alignment has been performed as follows.

That is, first, before the exposure processing, the exposure sample provided with the alignment mark is arranged on the stage,
The light from the lamp is exposed through an alignment mark on the reticle provided corresponding to the alignment mark. As a result, the image of the reticle-side alignment mark is projected, and both the alignment mark on the exposure sample and the image of the formed reticle-side alignment mark are observed with a microscope via the semi-transparent thin film ( JP-A-1-191151).

The position adjustment mechanism of the reticle is operated in the X and Y directions so that the alignment mark image on the reticle side is aligned with the alignment mark on the exposure sample.

FIG. 9 shows an example of a conventional reticle M, in which a circuit pattern MP is formed at the center, and reticle-side alignment marks MM ₁ (hereinafter, referred to as reticle-side marks) are formed on both sides thereof. This reticle side mark MM ₁
It is configured such that a cross-shaped transparent portion is provided in a rectangular opaque portion.

Then, the alignment is performed with the alignment mark of the exposure sample placed on the stage as described above. After aligning the reticle so as to correspond to the correct exposure position in this way, the exposure sample is removed and the exposure operation is performed.

In this exposure, in order to correctly position one frame of the film, the distance of the film feed by the feed roller is set in advance, and the accuracy of the feed direction is improved by the sprocket roller. Further, after the film has been fed by a preset distance, the stage having the positioning pin moves up for one frame of the stopped film, and the positioning pin fits into the perforation of one frame portion of the film from below. Positioning is performed in a plane perpendicular to the optical axis with respect to the image plane. Positioning with respect to the image plane in the optical axis direction is performed by a holding plate that holds one frame of the film pushed up from below by the stage.

In this way, when the exposure operation is started, processing is continuously performed according to the position set before the exposure. That is, during the exposure operation, no feedback control is performed even if a displacement occurs between the exposure position and the reticle. Of course, it is possible to stop the exposure operation once, place the exposure sample on the stage again, and perform the same alignment, but it is time-consuming.

Under such circumstances, there has recently been a method of providing an alignment mark on a film and automatically aligning the position before exposure every time one frame to be exposed is conveyed (Japanese Patent Application No. Hei. 81336).

[Problem to be Solved by the Invention] However, in the above-described method, the reticle is scanned in the X direction and the Y direction for each frame of the film, and after the alignment by the total of two scans, the circuit pattern is scanned. , The workability is poor and a lot of time is required.

SUMMARY OF THE INVENTION It is an object of the present invention to provide a positioning apparatus which can move a reticle at one time when positioning a film and a reticle, and an exposure apparatus using the same.

[Means for Solving the Problems] In order to achieve the above object, an alignment apparatus of the present invention includes an irradiation unit, and two or more V arranged at positions where light from the irradiation unit is irradiated. A reticle provided with a transparent mark for alignment approximate to a letter or a V-shape, a position adjusting mechanism for moving the reticle in a direction perpendicular to the optical axis, and a controller for driving and controlling the position adjusting mechanism,
A projection lens for projecting the image of the reticle, a transport mechanism for transporting an object to be exposed having a hole or a transparent portion corresponding to the transparent mark to a position where the image is projected by the projection lens, A detector that detects light through the hole or the transparent portion, wherein the controller is configured to control the position of the reticle in a direction perpendicular to an optical axis by the position adjustment mechanism. Information for position adjustment is obtained from the temporal change state of the output, and the position adjustment mechanism of the reticle is driven. In addition, the film exposure apparatus of the present invention is a film exposure apparatus that sequentially exposes a projection pattern to a belt-shaped film along a length direction, and an irradiation unit and light from the irradiation unit are irradiated. A reticle provided with a transparent mark for alignment approximately two or more V-shaped or V-shaped arranged at a position, and a position adjustment mechanism for moving the reticle in a direction perpendicular to the optical axis, A controller for driving and controlling the position adjusting mechanism, a projection lens for projecting an image of the reticle, and a film having a film side of a hole or a transparent portion corresponding to the transparent mark, the projection position of the image by the projection lens. A film feed mechanism for conveying,
A detector that detects light transmitted through the transparent mark through the film-side mark, and the controller includes:
The position adjustment mechanism of the reticle is obtained by obtaining information for position adjustment from the temporal change state of the signal output of the detector obtained when the reticle is moved in a direction perpendicular to the optical axis by the position adjustment mechanism. To drive.

According to the above-described means, in the positioning apparatus and the film exposure apparatus using the apparatus, two V-shaped or V-shaped positioning marks are provided on the object (or film) to be exposed. In the process of relative movement with respect to the marked mark, a detection signal is obtained only at a portion where both marks overlap, and information for position adjustment can be obtained from a temporal change state of the detection output. Therefore, even if a displacement occurs between the reticle and the object to be exposed during the exposure operation, accurate positioning can be performed, and only one reticle can be used.
By scanning only in the direction, information for position adjustment can be obtained, and workability can be improved.

Example An example of the present invention will be described below with reference to the drawings.

FIG. 1 is a block diagram showing a film exposure apparatus according to the present invention, and FIG. 2 is a block diagram showing details of an exposure unit.

In FIG. 1, reference numeral 10 denotes an irradiating unit, which has a built-in lamp 11 such as an ultra-high pressure mercury lamp capable of efficiently emitting light having sensitivity to a resist. Further, the irradiation unit 10 has a built-in filter for switching between light having an exposure wavelength at which the resist has sensitivity and light having an alignment wavelength at which the resist has no sensitivity. By switching this filter, the reticle M is irradiated with light having an alignment wavelength at the time of alignment, and is irradiated with light at the exposure wavelength at the time of exposure. As this filter, for example, a resist having a sensitivity of 500 nm
A sharp cut filter that cuts the following light is used. At the time of exposure, the sharp cut filter is retracted from the optical path.

At the position where the light from the irradiation unit 10 is irradiated, the reticle M
Are arranged. On the reticle M, a transparent reticle-side mark and a circuit pattern are formed as shown in the related art.

The position adjusting mechanism M10 on which the reticle M is set includes a reticle holder M11 for holding the reticle M and a servo motor M12. When the servo motor M12 is driven by a signal from a system controller 50 described later, the reticle holder M11 moves. Then, the reticle M is controlled to follow. The reticle holder M11 can adjust the position of the reticle M in two directions (X direction and Y direction) perpendicular to each other in a plane perpendicular to the optical axis. Rotational adjustment (adjustment of θ) is possible. Therefore, three servo motors M12 for driving the reticle holder M11 are actually provided so that each of the X, Y, and θ can be driven.

Reference numeral 20 denotes a projection lens which projects an image of the reticle M irradiated. The projection lens 20 has a resolution of, for example, an exposure line width of about 5 μm.

30 is a stage. As shown in FIG. 2, the upper surface is a reference surface, and air is blown out during step feeding of the film F, and a vacuum suction hole for vacuum suctioning the film F during exposure.
31 are provided. Also. 32 is a vacuum pump and 34 is a valve. In this example, the vacuum suction hole 31 also serves as a blowing hole for floating the film F with air when the film F is step-fed. Further, 33 is a compressor, 35 is a valve, and 36 and 37 are elevating rollers for lifting the front and rear portions of the film F when the film F is stepped.
The valves 34 and 35 are controlled by a system controller 50.

Reference numeral 40 denotes a detection unit 40, which is a unit configured by integrating the objective lens 41, the condenser lens 42, and the detector 43.
Are embedded in the stage 30, and the objective lens 41 is arranged at a position facing the hole as the film side mark FM. As the detector 43, a high-sensitivity photoelectric converter (for example, a photoelectric tube, a photodiode, or the like) is used, and its output signal is amplified by an amplifier 44, and the output signal is applied to a system controller 50.

Reference numeral 60 denotes a film feed mechanism for step-feeding one frame F10 of the film F to a position where an image is projected by the projection lens 20. Reference numeral 61 denotes a feed roller disposed on one side of the exposure unit, 62 denotes a motor that rotationally drives the feed roller 61, 63
Is a press roller that presses against the feed roller 61 via the film F, 64 is a feed roller disposed on the other side of the exposure unit,
65 is a press roller that presses against the feed roller 64 via the film F, 66 and 67 are auxiliary rollers, 68 is a supply reel for supplying the film F to the feed roller 64 via the auxiliary roller 66, and 69 is an exposed reel. This is a winding reel for winding the film F.

FIG. 3 is a plan view of a reticle 70 used in the exposure apparatus of the present invention. A circuit pattern MP is formed in the center, and a “V” -shaped reticle side mark MM is formed on both sides.
_Two are provided. The reticle side mark MM ₂ is the bottom of the "V" shape is directed in the Y scanning direction.

Figure 4 shows a plan view of the film F used for the exposure apparatus of the present invention, have the same film-side mark FM and shown in FIG. 10, imaging the reticle side mark MM ₂ to the film-side mark FM on The image MM ₂ ′ is projected. SR is a sprocket.

Next, the film exposure method of the present invention using the reticle 70 shown in FIG. 3 will be described with reference to FIGS.

When the film feed mechanism 60 is one frame F10 of the film F has been step feed, detecting unit whether the film-side mark FM according to the one frame F10 has reached the projection position of the image of the reticle side mark MM ₂ Detect by 40.

First, a drive start signal is sent from the system controller 50 to the motor 62, and the motor 62 starts rotating at a constant speed in accordance with a preset control characteristic. When a predetermined time is reached, a signal from the system controller 50 controls the speed of the motor 62. Is decelerated. This time is set in advance according to the length of one frame F10 of the film F or the like.

In a state where the speed is reduced, the system controller 50 that has received the detection signal from the detection unit 40 outputs a stop signal to stop the motor 62. In this state, the film F is roughly conveyed. That is, the film side mark FM is in a state of being caught in the hole of the detector 40. From this state, accurate positioning is performed. Detector 40 is film F
Are provided in the width direction of the system controller.
5, two signals of the form shown in FIG. 5 are sent simultaneously. However, since the feeding direction of the film F is not usually a perfect right angle in the width direction, the signals from the two detection units 40 are Sent slightly off.

The process of conveying the film F, because the reticle side mark MM ₂ is formed into a "V" shape, the relationship arises as shown in Figure 6 in accordance with the relative positions of the reticle side mark MM ₂ and the film-side mark FM. 5 in the figure corresponds to that in FIG. 5, and indicates the following states.

: Projection image MM ₂ ′ of reticle side mark MM ₂ does not reach film side mark FM.

: Located time t _1, the state in which the leading edge of the projected image MM ₂ 'is in contact with the contour of the film-side mark FM.

: A state in which the film-side mark FM overlaps one leg (right side) of the “V” -shaped projection image MM ₂ ′.

: A state where the film side mark FM is in contact with the contour of the other (left side) leg of the “V” -shaped projection image MM ₂ ′.

: A state in which the film-side mark FM overlaps the other leg of the “V” -shaped projection image MM ₂ ′.

: Film image mark MM ₂ ′ is out of film mark FM.

From the following detection situation, the position in the X direction and the Y direction at the center of the hole of the film side mark FM can be detected. For example, it is possible in the intermediate t ₅ times t ₁ and t ₂ can detect the position of the X direction of the film F, to detect the position in the Y direction from the time difference between time t ₁ and t _4. The position in the Y direction is the seventh
As shown, the time difference from the displacement of the relative position with respect to the film width direction of the film-side mark FM is changed with respect to the reticle side mark MM _2. Therefore, the position in the Y direction can be known by comparing this change state with a value stored in advance and stored in the system controller 50.

Thereafter, a drive signal is sent from the system controller 50 to the valves 34 and 35, whereby the valves are opened, the compressor 33 is closed, and the vacuum pump 32 is opened. As a result, one frame F10 of the film F becomes the stage 30
Is adsorbed in vacuum.

Then, the reticle 70 is moved in accordance with the film F. That is, 1 to a position of each of the film-side mark FM of frames F10, corresponding image on the reticle side mark MM ₂ drives the position adjusting mechanism M10 as projecting the position of the reticle 70 in the X and Y directions The reticle 70 is positioned by performing tracking control while moving and rotating about the optical axis. In this case, since the motor M12 uses a servomotor, the movement amount of the reticle 70 can be known by counting the output pulses of the attached encoder.

After the alignment of the reticle 70 is completed as described above, the sharp cut filter is retracted, and the light of the exposure wavelength is emitted from the irradiation unit 10 so that the one frame F10 held at the projection position is emitted. Then, the circuit pattern MP of the reticle 70 is exposed.

 The present inventor tried to carry out under the following conditions.

Reticle side mark MM ₂ of the V-width: about 100 [mu] m V-shaped opening angle: 45 ° to 60 ° the film-side mark FM size: 500 [mu] m result, the time required for movement of the reticle is 0.5 seconds, After that, it took 0.5 seconds to place it in the correct position, but it was found that the time could be significantly reduced compared to the conventional case.

In the above embodiment, the reticle is moved once, but information for position adjustment can be obtained by only one movement, and this may be performed a plurality of times. And although the film side mark FM is a round hole, it is not limited to a hole.

Furthermore, although the reticle side mark MM ₂ were in a V-shape, as shown in FIG. 8 is not limited to this, if it is the angle between the linear and the other linear with a slope in at least one formed (Fig. 8).

Further, in the above embodiment, the exposure target is a film, but is not limited thereto, and may be a wafer.

[Effects of the Invention] The present invention is configured as described above, and has the following effects.

In the positioning device according to claim (1), the irradiation unit is disposed at a position where light from the irradiation unit is irradiated.
A reticle provided with two or more V-shaped or V-shaped transparent marks for alignment, a position adjusting mechanism for moving the reticle in a direction perpendicular to the optical axis, and driving the position adjusting mechanism A controller that controls the projector, a projection lens that projects the image of the reticle, a transport mechanism that transports an exposure target having a hole or a transparent portion corresponding to the transparent mark to a position where the projection lens projects an image, and the transparent lens. A detector that detects light transmitted through a mark through the hole or the transparent portion, wherein the controller is configured to move the reticle in a direction perpendicular to an optical axis by the position adjustment mechanism. The information for position adjustment is obtained from the temporal change state of the signal output of the detector, and the position adjustment mechanism of the reticle is driven. Even if a positional shift can be accurate alignment, also be possible to improve the workability can obtain the information for position adjustment by causing scanning only the reticle only in one direction. The film exposure apparatus according to claim (2) is a film exposure apparatus that sequentially exposes a belt-like film with a projection pattern along a length direction, wherein an irradiation unit and light from the irradiation unit are irradiated. And a reticle provided with at least two or more V-shaped or V-shaped transparent marks for alignment, and position adjustment for moving the reticle in a direction perpendicular to the optical axis. Mechanism, a controller for driving and controlling the position adjusting mechanism, a projection lens for projecting an image of the reticle, a film having a hole or a transparent portion film side mark corresponding to the transparent mark, and an image formed by the projection lens. A film feed mechanism for transporting the light to the projection position, and a detector for detecting light transmitted through the transparent mark through the film-side mark, wherein the controller , To obtain information for adjusting the position of said reticle from a temporal change state of the signal output of the detector obtained when moving in a direction perpendicular to the optical axis by the position adjusting mechanism,
Since the reticle position adjustment mechanism is driven, accurate alignment can be performed even if the reticle and the film are misaligned during the exposure operation.
By scanning only in the direction, information for position adjustment can be obtained, and workability can be improved.

[Brief description of the drawings]

1 is a configuration diagram showing a film exposure apparatus according to one embodiment of the present invention, FIG. 2 is a configuration diagram showing details of an exposure unit, FIG. 3 is a plan view showing a reticle used in the exposure apparatus of the present invention, FIG. 4 shows a film F used in the exposure apparatus of the present invention.
FIG. 5 is a waveform diagram showing a detection signal waveform by the detection unit. FIG. 6 is a diagram showing a relative positional relationship between the film side mark FM and the projected image MM ₂ ′ of the reticle side mark MM ₂ at the time of alignment. 7, FIG. 7 is an explanatory view showing a mark positional relationship at the time of detecting a Y-direction position, FIG. 8 is a plan view showing another example of a reticle side mark, and FIG. 9 is an example of a conventional reticle M. FIG. In the figure. 10: Irradiation unit, 20: Projection lens 30: Stage, 40: Detection unit 50: System controller 60: Film feed mechanism M10: Position adjustment mechanism F: Film FM: Film side mark F10: 1 frame M: Reticle M11: Reticle holder M12: Servo motor MM ₂ : Reticle mark MP: Circuit pattern

Claims (2)

(57) [Claims] A reticle provided with an irradiating portion and two or more V-shaped or V-shaped approximate transparent marks arranged at positions where light from the irradiating portion is irradiated. A position adjustment mechanism for moving the reticle in a direction perpendicular to the optical axis, a controller for driving and controlling the position adjustment mechanism, a projection lens for projecting an image of the reticle, and a hole or a hole corresponding to the transparent mark. A transport mechanism that transports the object to be exposed having a transparent portion to a position where an image is projected by the projection lens, and a detector that detects light transmitted through the transparent mark through the hole or the transparent portion, and the controller Obtains information for position adjustment from the temporal change state of the signal output of the detector obtained when the reticle is moved in a direction perpendicular to the optical axis by the position adjustment mechanism, Aligning apparatus characterized by driving the position adjusting mechanism of the. 2. A film exposure apparatus for sequentially exposing a projection pattern on a belt-like film along a length direction, wherein the film exposure apparatus is arranged at an irradiation section and at a position where light from the irradiation section is irradiated. A reticle provided with two or more V-shaped or transparent marks for alignment approximate to the V-shape, a position adjusting mechanism for moving the reticle in a direction perpendicular to the optical axis, and the position adjusting mechanism. A controller for driving control;
A projection lens for projecting the image of the reticle, a film having a hole or a transparent portion of the film side mark corresponding to the transparent mark, a film feeding mechanism for transporting the projection lens to an image projection position, and the transparent lens A detector for detecting the light transmitted through the mark through the film-side mark, wherein the controller detects the light obtained when the reticle is moved in a direction perpendicular to the optical axis by the position adjusting mechanism. A film exposure apparatus which obtains information for position adjustment from a temporal change state of a signal output of a container and drives a reticle position adjustment mechanism.