JPH1079301A - Chip type fuse resistor and its electrode structure - Google Patents

Chip type fuse resistor and its electrode structure

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Publication number
JPH1079301A
JPH1079301A JP8235320A JP23532096A JPH1079301A JP H1079301 A JPH1079301 A JP H1079301A JP 8235320 A JP8235320 A JP 8235320A JP 23532096 A JP23532096 A JP 23532096A JP H1079301 A JPH1079301 A JP H1079301A
Authority
JP
Japan
Prior art keywords
film
fuse
electrode
resistor
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8235320A
Other languages
Japanese (ja)
Other versions
JP2984914B2 (en
Inventor
Tatsuki Hirano
立樹 平野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kamaya Electric Co Ltd
Original Assignee
Kamaya Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kamaya Electric Co Ltd filed Critical Kamaya Electric Co Ltd
Priority to JP8235320A priority Critical patent/JP2984914B2/en
Publication of JPH1079301A publication Critical patent/JPH1079301A/en
Application granted granted Critical
Publication of JP2984914B2 publication Critical patent/JP2984914B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To simplify the process of manufacture by a method wherein a resistance film, comprising a ruthenium material fuse part and a resistance part are formed on a glaze film, a fuse part, which is thinner and narrower than the resistance part, and a glass film is formed as a protective film. SOLUTION: An SiO2 glass film is printed on the whole surface of an alumina insulated substrate 1, and a glaze film 2 is formed by firing. A stripe ruthenium oxide film is formed on the upper surface of the glaze film 2 as a resistance film, and the fuse part 4 in the center part, which pertinents to an electrode part 7, is thinly formed and a resistance part 8 is thickly formed. A trimming trace 9 is formed on the resistance part 8. An Ag electrode 10 is laminated on the part ranging from above the electrode part 7 to the side face of the substrate 1, a glass film 11 is covered, as a protective film, on the entire surface of the Ag electrode 10 and the exposed resistance film 3, and besides, a terminal electrode 12 is formed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はチップ型ヒューズ抵
抗器、特にそのヒューズ性を有する抵抗膜の材料と、チ
ップ型ヒューズ抵抗器の電極構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chip type fuse resistor, and more particularly to a material for a resistive film having a fuse property and an electrode structure of the chip type fuse resistor.

【0002】[0002]

【従来の技術】いままで、ヒューズ部と抵抗部を異種の
材料で分離してなるチップ型ヒューズ抵抗器があり、ま
たヒューズ部を有しない単なるチップ型抵抗器の抵抗膜
に酸化ルテニウム(RuO2)系のペーストを均一の厚
さで印刷・焼成して用いたものがある。
2. Description of the Related Art Heretofore, there has been a chip type fuse resistor in which a fuse portion and a resistor portion are separated by different materials, and ruthenium oxide (RuO 2) is used as a resistor film of a simple chip type resistor having no fuse portion. ) -Based paste is used by printing and baking with a uniform thickness.

【0003】上記後者のチップ型抵抗器における、単な
る抵抗膜のみからなる酸化ルテニウムは、電極との関係
で、電極がAuやAg−Pt系、Ag−Pd系の場合に
その拡散を防止し、抵抗の特性の劣化を防止するといっ
た単なるチップ型抵抗器では意味があったが、ヒューズ
部を有するチップ型抵抗器の場合にはヒューズ部の過負
荷による発炎、発火、炸裂等が生じ、そのために集積回
路基板上の他の部品へのダメージを及ぼすというチップ
型ヒューズ抵抗器の問題点を解決したものではない。特
に、このヒューズ部の発炎、発火、炸裂は、近年の電子
機器の回路の小型化にともなって上記ダメージはより深
刻であり、集積回路の低価格化とも相俟って上記問題点
を増幅している。
[0003] In the latter chip type resistor, ruthenium oxide consisting only of a resistive film is prevented from diffusing when the electrode is Au, Ag-Pt type or Ag-Pd type in relation to the electrode. Although it was meaningful for a simple chip-type resistor to prevent the deterioration of the resistance characteristics, in the case of a chip-type resistor with a fuse part, flames, fires, explosions, etc. occurred due to overload of the fuse part. However, this does not solve the problem of the chip type fuse resistor that damages other components on the integrated circuit substrate. In particular, the flaming, firing, and explosion of the fuse part are more serious in the recent years as the circuit size of electronic devices is reduced, and the above problems are amplified in conjunction with the reduction in the price of integrated circuits. doing.

【0004】また、上記前者の場合における異種の材料
で分離したチップ型ヒューズ抵抗器として酸化ルテニウ
ムを採用したものもあるが、これはヒューズ抵抗器の厚
膜抵抗部にのみ使用したもので、溶断するヒューズ部と
しては従来通り金、銀、白金、ロジウム、パラジウム等
の金属有機ペーストを薄膜溶断部として異種材料を各別
に機能されたもので、酸化ルテニウムにより溶断性をも
たせたものではない。したがって、この従来構造はヒュ
ーズ部における熱集中による溶断機能を金属有機ペース
トに持たせて、発炎を防止し、厚膜抵抗部は酸化ルテニ
ウムを用いたものである。作り方としては、厚膜抵抗部
をスクリーン印刷法により、薄膜ヒューズ部をスクリー
ン印刷法及び/又はフォトエッチング法といった別々の
工程で製作するためにコスト高は避けられず、上記低価
格化に沿わないだけでなく、高い抵抗値に対応できない
といった問題点を残している。
In the former case, ruthenium oxide is used as a chip-type fuse resistor separated by a different material, but this is used only for the thick-film resistor portion of the fuse resistor, and is blown. As a conventional fuse portion, a metal organic paste such as gold, silver, platinum, rhodium, palladium, or the like is used as a thin film fusing portion, and different types of materials are separately functioned, and the fusing portion is not provided with ruthenium oxide. Therefore, in this conventional structure, the metal organic paste has a fusing function due to heat concentration in the fuse portion to prevent the occurrence of flame, and the thick film resistor portion uses ruthenium oxide. As a manufacturing method, the cost is unavoidable because the thick-film resistance portion is manufactured by a screen printing method and the thin-film fuse portion is manufactured by a separate process such as a screen printing method and / or a photo-etching method. In addition, it has a problem that it cannot cope with a high resistance value.

【0005】[0005]

【発明が解決しようとする課題】それでは安価な酸化ル
テニウムだけでヒューズ部と抵抗部とからなるヒューズ
器を作ってみてはどうかという考えもあるが、酸化ルテ
ニウムのみでは速断といった溶断特性は向上しないとい
うヒューズとしての根本的な欠点がある。
There is an idea to make a fuse unit composed of a fuse portion and a resistance portion only with inexpensive ruthenium oxide. There is a fundamental drawback as a fuse.

【0006】一方、溶断特性のよい上記金、銀などの金
属有機ペーストのみを用いると抵抗値を高くすることが
困難となり、特に保護膜が有機物の樹脂である場合に発
炎が多発することになる。
On the other hand, it is difficult to increase the resistance value by using only the above-mentioned metal organic paste of gold, silver or the like having good fusing characteristics. Particularly, when the protective film is made of an organic resin, flaming frequently occurs. Become.

【0007】そこで、本発明のチップ型ヒューズ抵抗器
の目的はヒューズ部と抵抗部をともに一種類の材料によ
り、製造工程の簡易化を図り、かつ一種類にした場合の
金属有機ペーストに較べてヒューズ部における溶断性の
悪いところを絶縁基板上に熱伝導性の低い材料層を形成
することで補い、さらに保護膜をガラス膜としたことに
よって、発炎などを防止して量産性の向上を図ることに
よって市場ニーズにあった安価なチップ型ヒューズ抵抗
器を提供せんとする。
Therefore, the purpose of the chip type fuse resistor of the present invention is to simplify the manufacturing process by using one type of material for both the fuse part and the resistance part, and to compare with the metal organic paste in the case where only one type is used. Poor fusing characteristics in the fuse area are compensated for by forming a material layer with low thermal conductivity on the insulating substrate, and the protective film is made of glass, preventing flames and other problems, improving mass productivity. By doing so, we will provide an inexpensive chip-type fuse resistor that meets the needs of the market.

【0008】また、本発明の他の目的は、上記目的の基
で抵抗膜をルテニウム系材料一種類とし、このルテニウ
ムの溶断性の悪いところを絶縁基板上のヒューズ部と抵
抗部の厚さを異ならせることで補い、しかもルテニウム
系材料を用いることによる溶断特性(速断性と抵抗値を
高くする)を良好にした。
Another object of the present invention is to provide a resistive film made of one kind of ruthenium-based material based on the above-mentioned object, and to reduce the fusing property of ruthenium by reducing the thickness of a fuse portion and a resistor portion on an insulating substrate. The difference was compensated for, and the fusing characteristics (rapid cutting performance and resistance value) were improved by using a ruthenium-based material.

【0009】本発明のその他の目的は、ヒューズ部の熱
集中による保護膜における発炎などを防止せんとする。
Another object of the present invention is to prevent the occurrence of a flame or the like in the protective film due to the heat concentration of the fuse portion.

【0010】本発明の別の目的は、熱伝導率を低くした
グレーズ層を絶縁基板面上に、ルテニウム系材料で層状
に形成することによって、Ag,Ag−Pd,金,白金
合金ペーストなどの電極との密着性を良好にすると共
に、電極上のめっきつけ性を良好にしたチップ型ヒュー
ズ抵抗器を提供する。
Another object of the present invention is to form a glaze layer having a reduced thermal conductivity on a surface of an insulating substrate in the form of a layer of a ruthenium-based material to form a layer of Ag, Ag-Pd, gold, a platinum alloy paste, or the like. Provided is a chip-type fuse resistor which has good adhesion to an electrode and good plating properties on the electrode.

【0011】また、本発明のさらに別の目的は、ヒュー
ズ抵抗器の電極の層構造を、絶縁基板上のグレーズ層上
にAg系電極層を形成すると互いの密着力が悪いという
欠点が生じるため、これらの間にルテニウム系材料の層
を介在することで解消し、しかもグレーズ層上にルテニ
ウム系を抵抗膜と同じように絶縁基板全面に施している
ので、電極部における新たなる工程が必要なく生産が向
上できるということも考慮した。
Still another object of the present invention is to form a layer structure of an electrode of a fuse resistor and to form an Ag-based electrode layer on a glaze layer on an insulating substrate. The problem is solved by interposing a ruthenium-based material layer between them, and furthermore, since the ruthenium-based material is applied on the entire surface of the insulating substrate in the same manner as the resistive film on the glaze layer, a new process in the electrode portion is not required. We also considered that production could be improved.

【0012】[0012]

【課題を解決するための手段】本発明は、上記目的に鑑
みてなされたものであり、その要旨は絶縁基板と、保護
膜と、これらの間に挾まれたヒューズ部と抵抗部を備え
たヒューズ性を有する抵抗膜と、抵抗膜の両端に位置す
る電極と、を備えたチップ型ヒューズ抵抗器であって、
前記絶縁基板上にグレース層を形成するとともに、その
上の前記抵抗膜が薄膜のヒューズ部と厚膜の抵抗部をル
テニウム系材料とし、かつ前記保護膜をガラス膜とした
ことを特徴とするチップ型ヒューズ抵抗器にある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned object, and its gist is to provide an insulating substrate, a protective film, and a fuse portion and a resistor portion sandwiched therebetween. A chip-type fuse resistor including a resistive film having a fuse property and electrodes located at both ends of the resistive film,
A chip, wherein a grace layer is formed on the insulating substrate, and the resistive film thereon is a thin film fuse portion and a thick film resistive portion is made of a ruthenium-based material, and the protective film is a glass film. Type fuse resistor.

【0013】ここで、絶縁基板としては片面/又は両面
にスリットを入れたアルミナセラミック、ムライトや窒
化アルミなどが用いられる。
Here, as the insulating substrate, alumina ceramic, mullite, aluminum nitride, or the like having slits on one or both surfaces is used.

【0014】上記保護膜にはエポキシ系やフェノール系
など従来から使用されている合成樹脂ではなく、CaO
−BaO−SiO2系やCaO−Al23−SiO2系の
ガラス膜を用いる。
The protective film is not made of a conventionally used synthetic resin such as an epoxy resin or a phenol resin, but is made of CaO.
-BaO-SiO 2 system and CaO-Al 2 O 3 using a glass film of -SiO 2 system.

【0015】また、ヒューズ性を有する抵抗膜としては
速断性かつ抵抗値を上げたという理由からルテニウム酸
鉛やルテニウム酸ビスマスなどのルテニウム系材料の各
一種類を用いるが、当然溶断するヒューズ部を抵抗部よ
り狭幅及び/又は抵抗部より膜厚を薄くする。ヒューズ
部と抵抗部の幅を略同じとすると、前者の膜厚を3μm
〜10μm(3μm以下だと定格電流が確保できず、1
0μm以上だと溶断といったヒューズ機能が得られにく
い)といった場合に後者の膜厚はそれより5μm〜15
μm厚くすることで良好な溶断特性が得られる。この場
合、5μm以下だと耐久性が悪く、10μm以上だと速
断性が劣る。
As the resistive film having the fuse property, one kind of each of ruthenium-based materials such as lead ruthenate and bismuth ruthenate is used because of its quick cutting property and the increased resistance value. The width is smaller than the resistance part and / or the film thickness is smaller than the resistance part. Assuming that the widths of the fuse portion and the resistor portion are substantially the same, the film thickness of the former is 3 μm.
10 μm to 10 μm (If it is 3 μm or less, the rated current cannot be
If it is 0 μm or more, it is difficult to obtain a fuse function such as blowing).
By increasing the thickness by μm, good fusing characteristics can be obtained. In this case, if it is 5 μm or less, the durability is poor, and if it is 10 μm or more, the quick-breaking property is poor.

【0016】上記グルーズ層は、CaO,SiO2また
はこれらの混合物が考えられる。
The glue layer may be made of CaO, SiO 2 or a mixture thereof.

【0017】さらに、ルテニウム系材料としては、ルチ
ル構造の酸化ルテニウムの他にパイロクロア構造のルテ
ニウム酸鉛などがある。
Further, examples of the ruthenium-based material include ruthenium oxide having a pyrochlore structure in addition to rutile oxide having a rutile structure.

【0018】本発明の別の要旨としては、絶縁基板と、
保護膜と、これらの間に挾まれたヒューズ部と抵抗部を
有するヒューズ性を有する抵抗膜と、抵抗膜の両端に位
置する電極と、を備えたチップ型ヒューズ抵抗器にあっ
て、前記電極が、絶縁基板のグレーズ層上にルテニウム
系材料を、その上にAg系膜、さらにその最上層にスズ
−鉛合金などのめっきの層を形成したものであることを
特徴とするチップ型ヒューズ抵抗器の電極構造がある。
According to another aspect of the present invention, there is provided an insulating substrate;
A chip-type fuse resistor comprising: a protective film; a resistive film having a fuse portion and a resistive portion sandwiched therebetween; and electrodes located at both ends of the resistive film. Characterized in that a ruthenium-based material is formed on a glaze layer of an insulating substrate, an Ag-based film is formed thereon, and a plating layer of a tin-lead alloy or the like is further formed on the uppermost layer. There is an electrode structure of the vessel.

【0019】ここでAg系膜には、Ag単体の他にAg
−Pt,Ag−Pdなどがある。
Here, the Ag-based film includes Ag alone as well as Ag alone.
-Pt, Ag-Pd and the like.

【0020】[0020]

【作用】絶縁基板上にグレーズ層を形成することで熱伝
導率を低下させてヒューズ部に熱が集中するようにする
ためにその上層をルテニウム材料単独で使用しても抵抗
値をあげ、しかも溶断特性の優れたチップ型ヒューズ抵
抗器が得られる。また、ルテニウム系材料がグレーズ層
と接することによりヒューズ部が発熱しても、ルテニウ
ム系材料の上方層の保護膜をガラス膜としたことで発煙
や発火を防止する。ルテニウム系材料でヒューズ部を作
る場合、その溶断特性から3μm〜10μmが好ましい
が、残留抵抗を大きくするためにはヒューズ部の膜厚を
抵抗部のそれより5〜15μm薄くすることが好まし
い。ここで5μm未満にすると通電によりヒューズが切
断し、5μm超によると速断性が劣る。
In order to reduce the thermal conductivity by forming a glaze layer on an insulating substrate so that heat is concentrated on the fuse portion, the resistance value can be increased even if the upper layer is made of a ruthenium material alone. A chip type fuse resistor having excellent fusing characteristics can be obtained. Further, even if the fuse portion generates heat due to the contact of the ruthenium-based material with the glaze layer, smoking and ignition are prevented by using a glass film for the upper protective film of the ruthenium-based material. When a fuse portion is made of a ruthenium-based material, the thickness is preferably 3 μm to 10 μm in view of the fusing characteristics. However, in order to increase the residual resistance, it is preferable that the thickness of the fuse portion be 5 to 15 μm thinner than that of the resistance portion. Here, if the thickness is less than 5 μm, the fuse is cut by energization.

【0021】また、絶縁基板上の電極構造を下からグレ
ーズ層、ルテニウム系材料層、およびAg系厚膜にする
ことでグレーズ層に対する電極としての密着力を良好に
するという作用が得られる。特に、グレーズ層とルテニ
ウム系材料層を接し、ルテニウム層上にAg系厚膜を接
合することで両者の密着力と、Ag系膜上のめっきづけ
性が向上する。
Further, by forming the electrode structure on the insulating substrate from the bottom with a glaze layer, a ruthenium-based material layer, and an Ag-based thick film, an effect of improving the adhesion to the glaze layer as an electrode can be obtained. In particular, by bringing the glaze layer and the ruthenium-based material layer into contact with each other and joining the Ag-based thick film on the ruthenium layer, the adhesion between them and the plating property on the Ag-based film are improved.

【0022】[0022]

【実施例】以下に本発明の好ましい実施例を添付図面に
基づいて説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.

【0023】図1は本発明であるチップ型ヒューズ抵抗
の斜視図であり、図2は図1のA−A断面図である。
FIG. 1 is a perspective view of a chip type fuse resistor according to the present invention, and FIG. 2 is a sectional view taken along line AA of FIG.

【0024】本発明にかかるチップ型ヒューズ抵抗器
は、アルミナ絶縁基板1上の全面にグレーズ膜2として
のSiO2系ガラス膜がスクリーン印刷によって印刷さ
れ、焼成されている。
In the chip type fuse resistor according to the present invention, an SiO 2 glass film as the glaze film 2 is printed on the entire surface of the alumina insulating substrate 1 by screen printing and fired.

【0025】グレーズ膜2の上面には、抵抗膜としての
酸化ルテニウム(RuO2)が両側部5,6を残して帯
状に形成し、該膜中央部のヒューズ部4と両端の電極部
7に該当する箇所を厚さ3μm〜10μmと薄くし、こ
れらの間の抵抗部8をさらに5μm〜15μm厚く形成
する。この抵抗部8にはトリミング跡9がある。
On the upper surface of the glaze film 2, ruthenium oxide (RuO 2 ) as a resistive film is formed in a strip shape except for both side portions 5 and 6, and the fuse portion 4 at the center portion of the film and the electrode portions 7 at both ends are formed. The corresponding portion is thinned to a thickness of 3 μm to 10 μm, and the resistance portion 8 therebetween is further formed to a thickness of 5 μm to 15 μm. The resistance portion 8 has a trimming mark 9.

【0026】そして、上記抵抗膜3の両端にある電極部
7の上に基板の側面に至るまでAg電極10が積層さ
れ、この電極10の一部と上記により露出した抵抗膜3
の全面を保護膜ガラス11としてのCaO−Al23
SiO2で被覆している。
The Ag electrode 10 is laminated on the electrode portions 7 at both ends of the resistance film 3 to the side of the substrate, and a part of the electrode 10 and the exposed resistance film 3
The whole surface of CaO—Al 2 O 3 − as protective film glass 11
It is covered with SiO 2 .

【0027】さらに、アルミナ基板1の両端部には浸漬
あるいは塗布ローラなどによって上記保護膜ガラス11
との間に上記Ag電極10を一部露出させて端面電極1
2を形成する。
Further, the protective film glass 11 is applied to both ends of the alumina substrate 1 by dipping or applying rollers.
The Ag electrode 10 is partially exposed between the
Form 2

【0028】また、端面電極12の全面と上記一部露出
したAg電極10を被ってニッケル及びスズ−鉛合金の
めっき膜が被覆される。
Further, the entire surface of the end face electrode 12 and the partially exposed Ag electrode 10 are covered with a plating film of nickel and a tin-lead alloy.

【0029】上記構成から成る本発明のチップ型ヒュー
ズ抵抗器の製造手順を図3によって説明する。
The procedure for manufacturing the chip type fuse resistor of the present invention having the above-described structure will be described with reference to FIG.

【0030】まず、アルミナ基板1の上にSiO2系ガ
ラスペーストをスクリーン印刷により印刷する(S
1)。そして、この印刷したものを焼成してグレーズ膜
2を形成する(S2)。
First, an SiO 2 glass paste is printed on the alumina substrate 1 by screen printing (S
1). Then, the printed material is fired to form the glaze film 2 (S2).

【0031】つぎに、SiO2系グレーズ膜2上に酸化
ルテニウム3をスクリーン印刷するが、その形態は中央
の膜厚を薄くした膜部(ヒューズ部)4と両端の膜厚が
薄い膜部(Ag電極載置部)10と、これら膜厚が薄い
膜部に対して厚肉にした抵抗部8とを凹凸状に形成した
ものとする(S3)。この凹凸は、技術的にはスクリー
ン目を変えて塗布量を異にする一度のスクリーン印刷で
もできるが、複数回の積層印刷にすることも可能であ
る。そして、この印刷したものを焼成する(S4)。
Next, ruthenium oxide 3 is screen-printed on the SiO 2 -based glaze film 2, in the form of a film portion (fuse portion) 4 having a thinner film at the center and a film portion (fuse portion) having a thin film at both ends. It is assumed that the Ag electrode mounting portion 10 and the resistor portion 8 having a large thickness with respect to the thin film portion are formed in an uneven shape (S3). Although this unevenness can be technically performed by one screen printing in which the application amount is changed by changing the screen pattern, it is also possible to perform multiple times of lamination printing. Then, the printed material is fired (S4).

【0032】さらに、上記酸化ルテニウムの両端の膜厚
が薄い膜部7上にAg電極10を印刷し(S5)焼成す
る(S6)。
Further, an Ag electrode 10 is printed on the thin film portions 7 at both ends of the ruthenium oxide (S5) and fired (S6).

【0033】このようにして、上記電極10を形成した
後に酸化ルテニウムの抵抗膜3にある抵抗部8にトリミ
ング9を施こす(S7)。
After the electrode 10 is formed in this manner, trimming 9 is performed on the resistance portion 8 of the resistance film 3 made of ruthenium oxide (S7).

【0034】抵抗膜3と電極10の一部の上にホウケイ
酸鉛系の保護ガラスを印刷し(S8)、焼成する(S
9)。
A lead borosilicate-based protective glass is printed on the resistive film 3 and a part of the electrode 10 (S8) and baked (S8).
9).

【0035】その後、多数のチップ型ヒューズ抵抗器の
絶縁基板を縦にクラッキングし(S10)、クラッキン
グした端面にロールや浸漬法で端面電極12を塗布など
印刷してから(S11)、焼成し(S12)、さらに横
にクラッキングして1個別のヒューズ抵抗器のチップと
し(S13)、これら多数のチップにめっき膜を施こし
(S14)、最後に品質検査をして完成する(S1
5)。
Thereafter, the insulating substrates of a number of chip type fuse resistors are vertically cracked (S10), and the cracked end surface is coated with an end electrode 12 by a roll or dipping method and printed (S11), and then baked ( S12) Further, the chips are cracked laterally to form one individual fuse resistor chip (S13), and a plating film is applied to many of these chips (S14). Finally, quality inspection is performed to complete the chip (S1).
5).

【0036】[0036]

【発明の効果】以上述べたように、本発明によれば、絶
縁基板上にグレーズ層を形成し、その上に抵抗膜として
薄肉又は/及び狭幅のヒューズ部とヒューズ部より厚肉
または/及び広幅の抵抗部を単一材料のルテニウム系材
料を一度に施こしたので、製造工程が簡略化するだけで
なく、高価な金や銀の有機ペーストを用いることがない
ので安価で量産性に優れたチップ型ヒューズ抵抗器が得
られる。
As described above, according to the present invention, a glaze layer is formed on an insulating substrate, and a thin or / and narrow fuse portion and a thick or / and thicker fuse portion than a fuse portion are formed thereon as a resistive film. In addition, since the single-sided ruthenium-based material is applied to the wide resistor section at a time, the manufacturing process is simplified, and the use of expensive gold or silver organic paste is eliminated, resulting in low cost and mass productivity. An excellent chip type fuse resistor is obtained.

【0037】また、ヒューズ部をルテニウム系材料とす
るだけでは溶断特性が良くないところから、これを良く
するために絶縁基板上にグレーズ層を設けてからルテニ
ウム系材料を層状に形成した。
Further, since the fusing characteristics are not good only by using a ruthenium-based material for the fuse portion, a glaze layer is provided on an insulating substrate and then the ruthenium-based material is formed into a layer to improve this.

【0038】さらに、ルテニウムのヒューズ部が高熱に
なっても保護膜をガラス層としたことにより発炎や発火
を阻止することもできる。
Further, even if the fuse portion of ruthenium becomes high in temperature, the protective film is made of a glass layer, so that it is possible to prevent flaming and firing.

【0039】ルテニウムを用いたヒューズ部の膜厚を3
μm〜10μmとすることで速断性を良くし、この膜厚
よりもさらに5μm〜15μm厚くした抵抗部をもうけ
ることでヒューズ全体の残留抵抗を大きくし、性能をア
ップした。
The thickness of the fuse portion using ruthenium is set to 3
By setting the thickness to between 10 μm and 10 μm, the quick-breaking property is improved, and by providing a resistor portion having a thickness of 5 μm to 15 μm further than this film thickness, the residual resistance of the entire fuse is increased, thereby improving the performance.

【0040】さらにまた、本発明であるチップ型ヒュー
ズ抵抗器の電極構造を下層にルテニウム系材料、その上
をAg系膜、さらにその最上層にスズ−鉛合金めっき膜
からの層にしたので、電極の信頼性(密着力)が良くな
るという効果を奏する。
Further, since the electrode structure of the chip type fuse resistor of the present invention is made of a ruthenium-based material in the lower layer, an Ag-based film on the lower layer, and a tin-lead alloy plating film on the uppermost layer, This has the effect of improving the reliability (adhesion) of the electrode.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明であるチップ型ヒューズ抵抗器とその電
極構造を示す斜視図である。
FIG. 1 is a perspective view showing a chip type fuse resistor according to the present invention and its electrode structure.

【図2】図1のA−A’断面図である。FIG. 2 is a sectional view taken along line A-A 'of FIG.

【図3】図1のチップ型抵抗器の製造手順を示すフロー
チャートである。
FIG. 3 is a flowchart showing a manufacturing procedure of the chip resistor of FIG. 1;

【符号の説明】[Explanation of symbols]

1 アルミナ基板 2 グレーズ膜 3 抵抗膜(ルテニウム) 4 抵抗膜のヒューズ部 7 抵抗膜の両端部 8 抵抗膜の抵抗部 9 トリミング(跡) 10 電極(Ag) 11 保護膜ガラス 12 端面電極 13 めっき膜(スズ−鉛合金) DESCRIPTION OF SYMBOLS 1 Alumina substrate 2 Glaze film 3 Resistance film (ruthenium) 4 Fuse part of resistance film 7 Both ends of resistance film 8 Resistance part of resistance film 9 Trimming (trace) 10 Electrode (Ag) 11 Protective film glass 12 Edge electrode 13 Plating film (Tin-lead alloy)

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基板と、保護膜と、これらの間に挾
まれたヒューズ部と抵抗部を備えたヒューズ性を有する
抵抗膜と、抵抗膜の両端に位置する電極と、を備えたチ
ップ型ヒューズ抵抗器であって、前記絶縁基板上にグレ
ース層を形成するとともに、その上の前記抵抗膜のヒュ
ーズ部と抵抗部を前者を後者より薄膜及び/又は狭幅の
ルテニウム系材料とし、かつ前記保護膜をガラス膜とし
たことを特徴とするチップ型ヒューズ抵抗器。
1. A chip comprising an insulating substrate, a protective film, a resistive film having a fuse portion and a resistor portion sandwiched therebetween, and having a fuse property, and electrodes located at both ends of the resistive film. A fuse resistor, wherein a grace layer is formed on the insulating substrate, and the fuse portion and the resistor portion of the resistive film thereon are made of a ruthenium-based material having a thinner and / or narrower width than the latter, and A chip-type fuse resistor, wherein the protective film is a glass film.
【請求項2】 前記抵抗膜のヒューズ部の膜厚を3μm
〜10μmとし、これより抵抗部の膜厚を5μm〜15
μm厚くしたことを特徴とする請求項1に記載のチップ
型ヒューズ抵抗器。
2. The fuse section of the resistance film has a thickness of 3 μm.
10 μm to 10 μm.
2. The chip-type fuse resistor according to claim 1, wherein the thickness of the chip-type fuse resistor is increased by μm.
【請求項3】 絶縁基板と、保護膜と、これらの間に挾
まれたヒューズ部と抵抗部を備えたヒューズ性を有する
抵抗膜と、抵抗膜の両端に位置する電極と、を備えたチ
ップ型ヒューズ抵抗器にあって、前記電極が、前記絶縁
基板のグレース層上のルテニウム系材料、その上にAg
系膜、さらにその上めっき膜を形成したものであること
を特徴とするチップ型ヒューズ抵抗器の電極構造。
3. A chip comprising an insulating substrate, a protective film, a resistive film having a fuse portion and a resistive portion sandwiched between them, and a resistive film having electrodes and electrodes located at both ends of the resistive film. Wherein the electrode is a ruthenium-based material on a grace layer of the insulating substrate, and an Ag-based material on the ruthenium-based material.
An electrode structure for a chip type fuse resistor, comprising a base film and a plating film formed thereon.
JP8235320A 1996-09-05 1996-09-05 Chip type fuse resistor and its electrode structure Expired - Lifetime JP2984914B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8235320A JP2984914B2 (en) 1996-09-05 1996-09-05 Chip type fuse resistor and its electrode structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8235320A JP2984914B2 (en) 1996-09-05 1996-09-05 Chip type fuse resistor and its electrode structure

Publications (2)

Publication Number Publication Date
JPH1079301A true JPH1079301A (en) 1998-03-24
JP2984914B2 JP2984914B2 (en) 1999-11-29

Family

ID=16984368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8235320A Expired - Lifetime JP2984914B2 (en) 1996-09-05 1996-09-05 Chip type fuse resistor and its electrode structure

Country Status (1)

Country Link
JP (1) JP2984914B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014124920A (en) * 2012-12-27 2014-07-07 Canon Inc Substrate for inkjet head, the inkjet head, and inkjet recording device
JP2014124921A (en) * 2012-12-27 2014-07-07 Canon Inc Substrate for inkjet head, inkjet head and producing method of inkjet head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014124920A (en) * 2012-12-27 2014-07-07 Canon Inc Substrate for inkjet head, the inkjet head, and inkjet recording device
JP2014124921A (en) * 2012-12-27 2014-07-07 Canon Inc Substrate for inkjet head, inkjet head and producing method of inkjet head

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