JPH1046345A5 - - Google Patents

Info

Publication number
JPH1046345A5
JPH1046345A5 JP1996203849A JP20384996A JPH1046345A5 JP H1046345 A5 JPH1046345 A5 JP H1046345A5 JP 1996203849 A JP1996203849 A JP 1996203849A JP 20384996 A JP20384996 A JP 20384996A JP H1046345 A5 JPH1046345 A5 JP H1046345A5
Authority
JP
Japan
Prior art keywords
chamber
workpiece
heat treatment
preheating
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1996203849A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1046345A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8203849A priority Critical patent/JPH1046345A/ja
Priority claimed from JP8203849A external-priority patent/JPH1046345A/ja
Publication of JPH1046345A publication Critical patent/JPH1046345A/ja
Publication of JPH1046345A5 publication Critical patent/JPH1046345A5/ja
Withdrawn legal-status Critical Current

Links

JP8203849A 1996-08-01 1996-08-01 加熱処理装置 Withdrawn JPH1046345A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8203849A JPH1046345A (ja) 1996-08-01 1996-08-01 加熱処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8203849A JPH1046345A (ja) 1996-08-01 1996-08-01 加熱処理装置

Publications (2)

Publication Number Publication Date
JPH1046345A JPH1046345A (ja) 1998-02-17
JPH1046345A5 true JPH1046345A5 (enExample) 2004-08-12

Family

ID=16480722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8203849A Withdrawn JPH1046345A (ja) 1996-08-01 1996-08-01 加熱処理装置

Country Status (1)

Country Link
JP (1) JPH1046345A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200908363A (en) * 2007-07-24 2009-02-16 Applied Materials Inc Apparatuses and methods of substrate temperature control during thin film solar manufacturing

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