JPH10326014A5 - - Google Patents
Info
- Publication number
- JPH10326014A5 JPH10326014A5 JP1997082855A JP8285597A JPH10326014A5 JP H10326014 A5 JPH10326014 A5 JP H10326014A5 JP 1997082855 A JP1997082855 A JP 1997082855A JP 8285597 A JP8285597 A JP 8285597A JP H10326014 A5 JPH10326014 A5 JP H10326014A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- positive photoresist
- deep ultraviolet
- photoresist composition
- exposure according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08285597A JP3797506B2 (ja) | 1997-03-27 | 1997-04-01 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| KR10-1998-0010768A KR100479275B1 (ko) | 1997-03-27 | 1998-03-27 | 원자외선노광용포지티브포토레지스트조성물 |
| US09/048,787 US6242153B1 (en) | 1997-03-27 | 1998-03-27 | Positive photoresist composition for far ultraviolet ray exposure |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9-75644 | 1997-03-27 | ||
| JP7564497 | 1997-03-27 | ||
| JP08285597A JP3797506B2 (ja) | 1997-03-27 | 1997-04-01 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10326014A JPH10326014A (ja) | 1998-12-08 |
| JPH10326014A5 true JPH10326014A5 (enExample) | 2004-10-07 |
| JP3797506B2 JP3797506B2 (ja) | 2006-07-19 |
Family
ID=26416793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP08285597A Expired - Fee Related JP3797506B2 (ja) | 1997-03-27 | 1997-04-01 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3797506B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8017303B2 (en) * | 2009-02-23 | 2011-09-13 | International Business Machines Corporation | Ultra low post exposure bake photoresist materials |
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1997
- 1997-04-01 JP JP08285597A patent/JP3797506B2/ja not_active Expired - Fee Related